Kunihiro Hosono

Person

Hyogo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Cleaning process for photomasks
- Patent number 7,001,470
- Issue date Feb 21, 2006
- Renesas Technology Corp.
- Koji Tange
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing a photomask
- Patent number 6,841,314
- Issue date Jan 11, 2005
- Renesas Technology Corp.
- Kunihiro Hosono
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photo-mask, photo-mask pair, semiconductor device and method of man...
- Patent number 6,620,557
- Issue date Sep 16, 2003
- Mitsubishi Denki Kabushiki Kaisha
- Kunihiro Hosono
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photo mask having film formed from halftone material, method of man...
- Patent number 6,537,709
- Issue date Mar 25, 2003
- Mitsubishi Denki Kabushiki Kaisha
- Kouji Tange
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Manufacturing process for semiconductor device, photomask, and manu...
- Patent number 6,503,852
- Issue date Jan 7, 2003
- Mitsubishi Denki Kabushiki Kaisha
- Kunihiro Hosono
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Manufacturing process for semiconductor device, photomask, and manu...
- Patent number 6,433,437
- Issue date Aug 13, 2002
- Mitsubishi Denki Kabushiki Kaisha
- Kunihiro Hosono
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask, manufacturing method thereof, and semiconductor device
- Patent number 6,340,543
- Issue date Jan 22, 2002
- Mitsubishi Denki Kabushiki Kaisha
- Yoshikazu Nagamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photolithography mask having monitoring marks and manufacturing met...
- Patent number 6,338,923
- Issue date Jan 15, 2002
- Mitsubishi Denki Kabushiki Kaisha
- Koji Tange
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for identifying photomask pattern defects
- Patent number 5,767,974
- Issue date Jun 16, 1998
- Mitsubishi Denki Kabushiki Kaisha
- Hisayoshi Higashiguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask and method for repairing a defect of a phase shift...
- Patent number 5,464,713
- Issue date Nov 7, 1995
- Mitsubishi Denki Kabushiki Kaisha
- Nobuyuki Yoshioka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of correcting defects in the pattern of phase shift mask
- Patent number 5,382,484
- Issue date Jan 17, 1995
- Mitsubishi Denki Kabushiki Kaisha
- Kunihiro Hosono
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for pattern defect correction of a photomask
- Patent number 5,272,116
- Issue date Dec 21, 1993
- Mitsubishi Denki Kabushiki Kaisha
- Kunihiro Hosono
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Scanning electron microscope for observation of cross section and m...
- Patent number 5,093,572
- Issue date Mar 3, 1992
- Mitsubishi Denki Kabushiki Kaisha
- Kunihiro Hosono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of repairing a mask
- Patent number 5,085,957
- Issue date Feb 4, 1992
- Mitsubishi Denki Kabushiki Kaisha
- Kunihiro Hosono
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
X-ray mask and exposure method employing the same
- Patent number 4,887,283
- Issue date Dec 12, 1989
- Mitsubishi Denki Kabushiki Kaisha
- Kunihiro Hosono
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Cleaning process for photomasks
- Publication number 20050274392
- Publication date Dec 15, 2005
- Renesas Technology Corp.
- Koji Tange
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Phase shift mask and method of producing the same
- Publication number 20050255389
- Publication date Nov 17, 2005
- Renesas Technology Corp.
- Koji Tange
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of selecting mask manufacturer of photomask
- Publication number 20040039584
- Publication date Feb 26, 2004
- Mitsubishi Denki Kabushiki Kaisha
- Masayoshi Mori
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method of manufacturing a photomask
- Publication number 20030082462
- Publication date May 1, 2003
- Kunihiro Hosono
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Cleaning process for photomasks
- Publication number 20020155360
- Publication date Oct 24, 2002
- Mitsubishi Denki Kabushiki Kaisha
- Koji Tange
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Manufacturing process for semiconductor device, photomask, and manu...
- Publication number 20020135073
- Publication date Sep 26, 2002
- Mitsubishi Denki Matsubishi Kaisha
- Kunihiro Hosono
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Photo mask having film formed from halftone material, method of man...
- Publication number 20020102473
- Publication date Aug 1, 2002
- Mitsubishi Denki Kabushiki Kaisha
- Kouji Tange
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MANUFACTURING PROCESS FOR SEMICONDUCTOR DEVICE, PHOTOMASK, AND MANU...
- Publication number 20020043725
- Publication date Apr 18, 2002
- Mitsubishi Denki Kabushiki Kaisha
- Kunihiro Hosono
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Kunihiro Hosono

Person

Patents Grantslast 30 patents

Cleaning process for photomasks

Method of manufacturing a photomask

Photo-mask, photo-mask pair, semiconductor device and method of man...

Photo mask having film formed from halftone material, method of man...

Manufacturing process for semiconductor device, photomask, and manu...

Manufacturing process for semiconductor device, photomask, and manu...

Photomask, manufacturing method thereof, and semiconductor device

Photolithography mask having monitoring marks and manufacturing met...

Apparatus and method for identifying photomask pattern defects

Phase shift mask and method for repairing a defect of a phase shift...

Method of correcting defects in the pattern of phase shift mask

Method for pattern defect correction of a photomask

Scanning electron microscope for observation of cross section and m...

Method of repairing a mask

X-ray mask and exposure method employing the same

Patents Applicationslast 30 patents

Cleaning process for photomasks

Phase shift mask and method of producing the same

Method of selecting mask manufacturer of photomask

Method of manufacturing a photomask

Cleaning process for photomasks

Manufacturing process for semiconductor device, photomask, and manu...

Photo mask having film formed from halftone material, method of man...

MANUFACTURING PROCESS FOR SEMICONDUCTOR DEVICE, PHOTOMASK, AND MANU...