Kunihiro Tada

Person

Nirasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Deposition device and deposition method
- Patent number 10,815,567
- Issue date Oct 27, 2020
- Tokyo Electron Limited
- Katsuhito Hirose
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming conformal metal silicide films
- Patent number 8,785,310
- Issue date Jul 22, 2014
- Tokyo Electron Limited
- Toshio Hasegawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ti-containing film formation method and storage medium
- Patent number 8,257,790
- Issue date Sep 4, 2012
- Tokyo Electron Limited
- Kensaku Narushima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 8,124,168
- Issue date Feb 28, 2012
- Tokyo Electron Limited
- Kunihiro Tada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing apparatus and heater unit
- Patent number 8,106,335
- Issue date Jan 31, 2012
- Tokyo Electron Limited
- Seishi Murakami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming Ti film and TiN film, contact structure, compute...
- Patent number 7,737,005
- Issue date Jun 15, 2010
- Tokyo Electron Limited
- Kunihiro Tada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming titanium film by CVD
- Patent number 7,484,513
- Issue date Feb 3, 2009
- Tokyo Electron Limited
- Kunihiro Tada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
TiSiN film forming method, diffusion barrier TiSiN film, semiconduc...
- Patent number 7,153,773
- Issue date Dec 26, 2006
- Tokyo Electron Limited
- Hayashi Otsuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming TiSiN film, diffusion preventive film comprising...
- Patent number 6,919,273
- Issue date Jul 19, 2005
- Tokyo Electron Limited
- Hayashi Otsuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming titanium film by CVD
- Patent number 6,841,203
- Issue date Jan 11, 2005
- Tokyo Electron Limited
- Kunihiro Tada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming a titanium film and a barrier film on a surface o...
- Patent number 6,537,621
- Issue date Mar 25, 2003
- Tokyo Electron Limited
- Yasuo Kobayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming titanium film by chemical vapor deposition
- Patent number 6,451,388
- Issue date Sep 17, 2002
- Tokyo Electron Limited
- Kunihiro Tada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
CVD-Ti film forming method
- Patent number 6,197,674
- Issue date Mar 6, 2001
- Tokyo Electron Limited
- Hideki Yoshikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming titanium film by CVD
- Patent number 6,177,149
- Issue date Jan 23, 2001
- Tokyo Electron Limited
- Kunihiro Tada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process of forming metal films and multi layer structure
- Patent number 6,069,093
- Issue date May 30, 2000
- Tokyo Electron Limited
- Kunihiro Tada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a titanium film and a barrier metal film on a sur...
- Patent number 6,051,281
- Issue date Apr 18, 2000
- Tokyo Electron Limited
- Yasuo Kobayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 6,004,872
- Issue date Dec 21, 1999
- Tokyo Electron Limited
- Yoshihiro Tezuka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for depositing a titanium film
- Patent number 5,942,282
- Issue date Aug 24, 1999
- Tokyo Electron Limited
- Kunihiro Tada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming and dry cleaning apparatus and method
- Patent number 5,709,757
- Issue date Jan 20, 1998
- Tokyo Electron Limited
- Tatsuo Hatano
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
DEPOSITION DEVICE AND DEPOSITION METHOD
- Publication number 20170314130
- Publication date Nov 2, 2017
- TOKYO ELECTRON LIMITED
- Katsuhito HIROSE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING CONFORMAL METAL SILICIDE FILMS
- Publication number 20130196505
- Publication date Aug 1, 2013
- TOKYO ELECTRON LIMITED
- Toshio Hasegawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMATION METHOD AND APPARATUS UTILIZING PLASMA CVD
- Publication number 20100240216
- Publication date Sep 23, 2010
- Kunihiro Tada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FORMING Ti-BASED FILM AND STORAGE MEDIUM
- Publication number 20100227062
- Publication date Sep 9, 2010
- Tokyo Electron Limited
- Kensaku Narushima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FORMING TI FILM AND TIN FILM, CONTACT STRUCTURE, COMPUTE...
- Publication number 20100216304
- Publication date Aug 26, 2010
- TOKYO ELECTRON LIMITED
- Kunihiro Tada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of forming titanium film by CVD
- Publication number 20090071404
- Publication date Mar 19, 2009
- Kunihiro Tada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Processing Apparatus and Heater Unit
- Publication number 20080302781
- Publication date Dec 11, 2008
- TOKYO ELECTRON LIMITED
- Seishi Murakami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Formation of Titanium Nitride Film
- Publication number 20080057344
- Publication date Mar 6, 2008
- Seishi Murakami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate Processing Method and Substrate Processing Apparatus
- Publication number 20070292598
- Publication date Dec 20, 2007
- TOKYO ELECTRON LIMITED
- Kunihiro Tada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for Forming Ti Film and Tin Film, Contact Structure, Compute...
- Publication number 20070257372
- Publication date Nov 8, 2007
- Tokyo Electron Limited
- Kunihiro Tada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Gas Supplying unit and substrate processing apparatus
- Publication number 20070131168
- Publication date Jun 14, 2007
- Hisashi Gomi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Film-forming method and apparatus using plasma CVD
- Publication number 20060231032
- Publication date Oct 19, 2006
- Seishi Murakami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Worktable device, film formation apparatus, and film formation meth...
- Publication number 20050257747
- Publication date Nov 24, 2005
- Satoshi Wakabayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Film formation method and apparatus utilizing plasma CVD
- Publication number 20050233093
- Publication date Oct 20, 2005
- Kunihiro Tada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of forming titanium film by CVD
- Publication number 20050136660
- Publication date Jun 23, 2005
- Kunihiro Tada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TiSiN film forming method, diffusion barrier TiSiN film, semiconduc...
- Publication number 20040232467
- Publication date Nov 25, 2004
- Hayashi Otsuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of forming titanium film by CVD
- Publication number 20030031794
- Publication date Feb 13, 2003
- Kunihiro Tada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Kunihiro Tada

Person

Patents Grantslast 30 patents

Deposition device and deposition method

Method of forming conformal metal silicide films

Ti-containing film formation method and storage medium

Substrate processing method and substrate processing apparatus

Processing apparatus and heater unit

Method for forming Ti film and TiN film, contact structure, compute...

Method of forming titanium film by CVD

TiSiN film forming method, diffusion barrier TiSiN film, semiconduc...

Method for forming TiSiN film, diffusion preventive film comprising...

Method of forming titanium film by CVD

Method of forming a titanium film and a barrier film on a surface o...

Method of forming titanium film by chemical vapor deposition

CVD-Ti film forming method

Method of forming titanium film by CVD

Process of forming metal films and multi layer structure

Method of forming a titanium film and a barrier metal film on a sur...

Method of manufacturing semiconductor device

Method for depositing a titanium film

Film forming and dry cleaning apparatus and method

Patents Applicationslast 30 patents

DEPOSITION DEVICE AND DEPOSITION METHOD

METHOD OF FORMING CONFORMAL METAL SILICIDE FILMS

FILM FORMATION METHOD AND APPARATUS UTILIZING PLASMA CVD

METHOD FOR FORMING Ti-BASED FILM AND STORAGE MEDIUM

METHOD FOR FORMING TI FILM AND TIN FILM, CONTACT STRUCTURE, COMPUTE...

Method of forming titanium film by CVD

Processing Apparatus and Heater Unit

Formation of Titanium Nitride Film

Substrate Processing Method and Substrate Processing Apparatus

Method for Forming Ti Film and Tin Film, Contact Structure, Compute...

Gas Supplying unit and substrate processing apparatus

Film-forming method and apparatus using plasma CVD

Worktable device, film formation apparatus, and film formation meth...

Film formation method and apparatus utilizing plasma CVD

Method of forming titanium film by CVD

TiSiN film forming method, diffusion barrier TiSiN film, semiconduc...

Method of forming titanium film by CVD