Kunitoshi Namba

Person

Machida, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Methods for forming doped silicon oxide thin films
- Patent number 11,302,527
- Issue date Apr 12, 2022
- ASM International N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Formation of SiN thin films
- Patent number 11,133,181
- Issue date Sep 28, 2021
- ASM IP Holding B.V.
- Toshiya Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reaction chamber passivation and selective deposition of metallic f...
- Patent number 10,793,946
- Issue date Oct 6, 2020
- ASM IP Holding B.V.
- Delphine Longrie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming doped silicon oxide thin films
- Patent number 10,784,105
- Issue date Sep 22, 2020
- ASM International N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming doped silicon oxide thin films
- Patent number 10,510,530
- Issue date Dec 17, 2019
- ASM International N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reaction chamber passivation and selective deposition of metallic f...
- Patent number 10,480,064
- Issue date Nov 19, 2019
- ASM IP Holding B.V.
- Delphine Longrie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Formation of SiN thin films
- Patent number 10,410,857
- Issue date Sep 10, 2019
- ASM IP Holding B.V.
- Toshiya Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming doped silicon oxide thin films
- Patent number 10,147,600
- Issue date Dec 4, 2018
- ASM International N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reaction chamber passivation and selective deposition of metallic f...
- Patent number 10,041,166
- Issue date Aug 7, 2018
- ASM IP Holding B.V.
- Delphine Longrie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective deposition of metallic films
- Patent number 10,014,212
- Issue date Jul 3, 2018
- ASM IP Holding B.V.
- Shang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for protecting layer by forming hydrocarbon-based extremely...
- Patent number 9,899,291
- Issue date Feb 20, 2018
- ASM IP Holding B.V.
- Richika Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming doped silicon oxide thin films
- Patent number 9,875,893
- Issue date Jan 23, 2018
- ASM International N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reaction chamber passivation and selective deposition of metallic f...
- Patent number 9,803,277
- Issue date Oct 31, 2017
- ASM IP Holding B.V.
- Delphine Longrie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective deposition of metallic films
- Patent number 9,805,974
- Issue date Oct 31, 2017
- ASM IP Holding B.V.
- Shang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming silicon oxide cap layer for solid state diffusio...
- Patent number 9,607,837
- Issue date Mar 28, 2017
- ASM IP Holding B.V.
- Kunitoshi Namba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition of boron and carbon containing materials
- Patent number 9,576,790
- Issue date Feb 21, 2017
- ASM IP Holding B.V.
- Viljami J. Pore
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for forming doped silicon oxide thin films
- Patent number 9,564,314
- Issue date Feb 7, 2017
- ASM International N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low-oxidation plasma-assisted process
- Patent number 9,464,352
- Issue date Oct 11, 2016
- ASM IP Holding B.V.
- Ryu Nakano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for forming doped silicon oxide thin films
- Patent number 9,368,352
- Issue date Jun 14, 2016
- ASM International N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming doped silicon oxide thin films
- Patent number 9,153,441
- Issue date Oct 6, 2015
- ASM International, NV.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming doped silicon oxide thin films
- Patent number 8,679,958
- Issue date Mar 25, 2014
- ASM International N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of tailoring conformality of Si-containing film
- Patent number 8,669,185
- Issue date Mar 11, 2014
- ASM Japan K.K.
- Shigeyuki Onizawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming conformal film having si-N bonds on high-aspect r...
- Patent number 8,394,466
- Issue date Mar 12, 2013
- ASM Japan K.K.
- Kuo-wei Hong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming metal film by ALD using beta-diketone metal complex
- Patent number 8,133,555
- Issue date Mar 13, 2012
- ASM Japan K.K.
- Hiroshi Shinriki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Atomic composition controlled ruthenium alloy film formed by plasma...
- Patent number 8,084,104
- Issue date Dec 27, 2011
- ASM Japan K.K.
- Hiroshi Shinriki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of processing semiconductor substrate
- Patent number 6,043,162
- Issue date Mar 28, 2000
- ASM Japan K.K.
- Akira Shimizu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS
- Publication number 20230031720
- Publication date Feb 2, 2023
- ASM INTERNATIONAL N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMATION OF SiN THIN FILMS
- Publication number 20220044923
- Publication date Feb 10, 2022
- ASM IP HOLDING B.V.
- TOSHIYA SUZUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS
- Publication number 20200388487
- Publication date Dec 10, 2020
- ASM INTERNATIONAL N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REACTION CHAMBER PASSIVATION AND SELECTIVE DEPOSITION OF METALLIC F...
- Publication number 20200291511
- Publication date Sep 17, 2020
- ASM IP HOLDING B.V.
- Delphine Longrie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS
- Publication number 20200185218
- Publication date Jun 11, 2020
- ASM INTERNATIONAL N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMATION OF SiN THIN FILMS
- Publication number 20190378711
- Publication date Dec 12, 2019
- ASM IP HOLDING B.V.
- TOSHIYA SUZUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS
- Publication number 20190172708
- Publication date Jun 6, 2019
- ASM INTERNATIONAL N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REACTION CHAMBER PASSIVATION AND SELECTIVE DEPOSITION OF METALLIC F...
- Publication number 20190055643
- Publication date Feb 21, 2019
- ASM IP HOLDING B.V.
- Delphine Longrie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS
- Publication number 20180211834
- Publication date Jul 26, 2018
- ASM INTERNATIONAL N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REACTION CHAMBER PASSIVATION AND SELECTIVE DEPOSITION OF METALLIC F...
- Publication number 20180080121
- Publication date Mar 22, 2018
- ASM IP HOLDING B.V.
- Delphine Longrie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE DEPOSITION OF METALLIC FILMS
- Publication number 20170358482
- Publication date Dec 14, 2017
- ASM IP HOLDING B.V.
- Shang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS
- Publication number 20170338111
- Publication date Nov 23, 2017
- ASM INTERNATIONAL N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMATION OF SiN THIN FILMS
- Publication number 20170062204
- Publication date Mar 2, 2017
- ASM IP HOLDING B.V.
- TOSHIYA SUZUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PROTECTING LAYER BY FORMING HYDROCARBON-BASED EXTREMELY...
- Publication number 20170018477
- Publication date Jan 19, 2017
- ASM IP HOLDING B.V.
- Richika Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS
- Publication number 20160196970
- Publication date Jul 7, 2016
- ASM INTERNATIONAL N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Low-Oxidation Plasma-Assisted Process
- Publication number 20150315704
- Publication date Nov 5, 2015
- ASM IP HOLDING B.V.
- Ryu Nakano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION OF BORON AND CARBON CONTAINING MATERIALS
- Publication number 20150287591
- Publication date Oct 8, 2015
- ASM IP HOLDING B.V.
- Viljami J. Pore
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS
- Publication number 20150147875
- Publication date May 28, 2015
- ASM INTERNATIONAL N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS
- Publication number 20150017794
- Publication date Jan 15, 2015
- ASM INTERNATIONAL N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS
- Publication number 20130115763
- Publication date May 9, 2013
- ASM INTERNATIONAL N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Forming Conformal Film Having Si-N Bonds on High-Aspect R...
- Publication number 20120058282
- Publication date Mar 8, 2012
- ASM JAPAN K.K.
- Kuo-wei Hong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF TAILORING CONFORMALITY OF Si-CONTAINING FILM
- Publication number 20120028469
- Publication date Feb 2, 2012
- ASM JAPAN K.K.
- Shigeyuki Onizawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FORMING METAL FILM BY ALD USING BETA-DIKETONE METAL COMPLEX
- Publication number 20100092696
- Publication date Apr 15, 2010
- ASM JAPAN K.K.
- Hiroshi Shinriki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ATOMIC COMPOSITION CONTROLLED RUTHENIUM ALLOY FILM FORMED BY PLASMA...
- Publication number 20100055433
- Publication date Mar 4, 2010
- ASM JAPAN K.K.
- Hiroshi Shinriki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Kunitoshi Namba

Person

Patents Grantslast 30 patents

Methods for forming doped silicon oxide thin films

Formation of SiN thin films

Reaction chamber passivation and selective deposition of metallic f...

Methods for forming doped silicon oxide thin films

Methods for forming doped silicon oxide thin films

Reaction chamber passivation and selective deposition of metallic f...

Formation of SiN thin films

Methods for forming doped silicon oxide thin films

Reaction chamber passivation and selective deposition of metallic f...

Selective deposition of metallic films

Method for protecting layer by forming hydrocarbon-based extremely...

Methods for forming doped silicon oxide thin films

Reaction chamber passivation and selective deposition of metallic f...

Selective deposition of metallic films

Method for forming silicon oxide cap layer for solid state diffusio...

Deposition of boron and carbon containing materials

Methods for forming doped silicon oxide thin films

Low-oxidation plasma-assisted process

Methods for forming doped silicon oxide thin films

Methods for forming doped silicon oxide thin films

Methods for forming doped silicon oxide thin films

Method of tailoring conformality of Si-containing film

Method of forming conformal film having si-N bonds on high-aspect r...

Method for forming metal film by ALD using beta-diketone metal complex

Atomic composition controlled ruthenium alloy film formed by plasma...

Method of processing semiconductor substrate

Patents Applicationslast 30 patents

METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS

FORMATION OF SiN THIN FILMS

METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS

REACTION CHAMBER PASSIVATION AND SELECTIVE DEPOSITION OF METALLIC F...

METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS

FORMATION OF SiN THIN FILMS

METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS

REACTION CHAMBER PASSIVATION AND SELECTIVE DEPOSITION OF METALLIC F...

METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS

REACTION CHAMBER PASSIVATION AND SELECTIVE DEPOSITION OF METALLIC F...

SELECTIVE DEPOSITION OF METALLIC FILMS

METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS

FORMATION OF SiN THIN FILMS

METHOD FOR PROTECTING LAYER BY FORMING HYDROCARBON-BASED EXTREMELY...

METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS

Low-Oxidation Plasma-Assisted Process

DEPOSITION OF BORON AND CARBON CONTAINING MATERIALS

METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS

METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS

METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS

Method of Forming Conformal Film Having Si-N Bonds on High-Aspect R...

METHOD OF TAILORING CONFORMALITY OF Si-CONTAINING FILM

METHOD FOR FORMING METAL FILM BY ALD USING BETA-DIKETONE METAL COMPLEX

ATOMIC COMPOSITION CONTROLLED RUTHENIUM ALLOY FILM FORMED BY PLASMA...