Kyle Moran Hanson

Person

Kalispell, MT, US

People

Patents Grantslast 30 patents

Information Patent Grant
Electroplating system
- Patent number 11,982,008
- Issue date May 14, 2024
- Applied Materials, Inc.
- Paul R McHugh
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Fluid recovery in semiconductor processing
- Patent number 11,788,200
- Issue date Oct 17, 2023
- Applied Materials, Inc.
- Sam Lee
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Multi-compartment electrochemical replenishment cell
- Patent number 11,697,887
- Issue date Jul 11, 2023
- Applied Materials, Inc.
- Nolan L. Zimmerman
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Electroplating systems and methods with increased metal ion concent...
- Patent number 11,686,005
- Issue date Jun 27, 2023
- Applied Materials, Inc.
- Kwan Wook Roh
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Electroplating system
- Patent number 11,578,422
- Issue date Feb 14, 2023
- Applied Materials, Inc.
- Paul R McHugh
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Apparatus for post exposure bake
- Patent number 11,550,224
- Issue date Jan 10, 2023
- Applied Materials, Inc.
- Kyle M. Hanson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for cleaning a substrate after processing
- Patent number 11,551,942
- Issue date Jan 10, 2023
- Applied Materials, Inc.
- Manoj A. Gajendra
- B08 - CLEANING
Information Patent Grant
Fluid recovery in semiconductor processing
- Patent number 11,352,711
- Issue date Jun 7, 2022
- Applied Materials, Inc.
- Sam Lee
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Seal apparatus for an electroplating system
- Patent number 11,274,377
- Issue date Mar 15, 2022
- Applied Materials, Inc.
- Kyle M. Hanson
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Electroplating system
- Patent number 11,268,208
- Issue date Mar 8, 2022
- Applied Materials, Inc.
- Paul R McHugh
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Post exposure processing apparatus
- Patent number 11,262,662
- Issue date Mar 1, 2022
- Applied Materials, Inc.
- Viachslav Babayan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning components and methods in a plating system
- Patent number 11,241,718
- Issue date Feb 8, 2022
- Applied Materials, Inc.
- Joseph Antony Jonathan
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Cleaning components and methods in a plating system
- Patent number 11,214,890
- Issue date Jan 4, 2022
- Applied Materials, Inc.
- Kyle M. Hanson
- B08 - CLEANING
Information Patent Grant
Post exposure processing apparatus
- Patent number 10,845,715
- Issue date Nov 24, 2020
- Applied Materials, Inc.
- Viachslav Babayan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Controlled etch of nitride features
- Patent number 10,840,104
- Issue date Nov 17, 2020
- Applied Materials, Inc.
- Eric J. Bergman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for post exposure bake
- Patent number 10,754,252
- Issue date Aug 25, 2020
- Applied Materials, Inc.
- Kyle M. Hanson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Post exposure processing apparatus
- Patent number 10,401,742
- Issue date Sep 3, 2019
- Applied Materials, Inc.
- Viachslav Babayan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adaptive electric field shielding in an electroplating processor us...
- Patent number 10,240,248
- Issue date Mar 26, 2019
- Applied Materials, Inc.
- Paul Van Valkenburg
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Removing photoresist from a wafer
- Patent number 10,191,379
- Issue date Jan 29, 2019
- Applied Materials, Inc.
- Paul R. McHugh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Systems and methods for rinsing and drying substrates
- Patent number 9,984,867
- Issue date May 29, 2018
- Applied Materials, Inc.
- Ekaterina Mikhaylichenko
- B08 - CLEANING
Information Patent Grant
Post exposure processing apparatus
- Patent number 9,964,863
- Issue date May 8, 2018
- Applied Materials, Inc.
- Viachslav Babayan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for post exposure bake
- Patent number 9,958,782
- Issue date May 1, 2018
- Applied Materials, Inc.
- Kyle M. Hanson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and methods for photomask backside cleaning
- Patent number 9,864,283
- Issue date Jan 9, 2018
- Applied Materials, Inc.
- Jason Rye
- B08 - CLEANING
Information Patent Grant
Substrate rinsing systems and methods
- Patent number 9,859,135
- Issue date Jan 2, 2018
- Applied Materials, Inc.
- Jonathan S. Frankel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing assembly for semiconductor workpiece and methods of proc...
- Patent number 9,799,537
- Issue date Oct 24, 2017
- Applied Materials, Inc.
- Jason Rye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Anneal module for semiconductor wafers
- Patent number 9,245,767
- Issue date Jan 26, 2016
- Applied Materials, Inc.
- Vincent Steffan Francischetti
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrolytic copper process using anion permeable barrier
- Patent number 9,234,293
- Issue date Jan 12, 2016
- Applied Materials, Inc.
- Rajesh Baskaran
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Flow battery systems
- Patent number 9,160,025
- Issue date Oct 13, 2015
- Applied Materials, Inc.
- Gregory J. Wilson
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Electrolytic process using cation permeable barrier
- Patent number 8,961,771
- Issue date Feb 24, 2015
- Applied Materials, Inc.
- Rajesh Baskaran
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Electrolytic process using anion permeable barrier
- Patent number 8,852,417
- Issue date Oct 7, 2014
- Applied Materials, Inc.
- Rajesh Baskaran
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
ELECTROPLATING WETTING CHAMBER WITH REDUCED BUBBLE ENTRAPMENT
- Publication number 20250006519
- Publication date Jan 2, 2025
- Applied Materials, Inc.
- Kyle M. Hanson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLATING SEAL WITH IMPROVED SURFACE
- Publication number 20240337040
- Publication date Oct 10, 2024
- Applied Materials, Inc.
- Kyle M. Hanson
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
PROCESS CELL FOR FILED GUIDED POST EXPOSURE BAKE PROCESS
- Publication number 20240160117
- Publication date May 16, 2024
- Applied Materials, Inc.
- Dmitry LUBOMIRSKY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR FILM PLATING PERIMETER MAPPING AND COMPENSATION
- Publication number 20240145251
- Publication date May 2, 2024
- Applied Materials, Inc.
- Kyle M. Hanson
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
ELECTROPLATING SYSTEMS AND METHODS WITH INCREASED METAL ION CONCENT...
- Publication number 20230313405
- Publication date Oct 5, 2023
- Applied Materials, Inc.
- Paul R. McHugh
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
ELECTROPLATING SYSTEMS AND METHODS WITH INCREASED METAL ION CONCENT...
- Publication number 20230313406
- Publication date Oct 5, 2023
- Applied Materials, Inc.
- Paul R. McHugh
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
ELECTROPLATING SYSTEMS AND METHODS WITH INCREASED METAL ION CONCENT...
- Publication number 20230272546
- Publication date Aug 31, 2023
- Applied Materials, Inc.
- Kwan Wook Roh
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
ELECTROPLATING SYSTEM
- Publication number 20230167573
- Publication date Jun 1, 2023
- Applied Materials, Inc.
- Paul R McHugh
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
FLUID RECOVERY IN SEMICONDUCTOR PROCESSING
- Publication number 20220259756
- Publication date Aug 18, 2022
- Applied Materials, Inc.
- Sam Lee
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
ELECTROPLATING SYSTEM
- Publication number 20220145489
- Publication date May 12, 2022
- Applied Materials, Inc.
- Paul R McHugh
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
MULTI-COMPARTMENT ELECTROCHEMICAL REPLENISHMENT CELL
- Publication number 20220127747
- Publication date Apr 28, 2022
- Applied Materials, Inc.
- Nolan L. Zimmerman
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
METHODS AND APPARATUS FOR CLEANING A SUBSTRATE AFTER PROCESSING
- Publication number 20220084843
- Publication date Mar 17, 2022
- Applied Materials, Inc.
- Manoj A. GAJENDRA
- B08 - CLEANING
Information Patent Application
ELECTROPLATING SYSTEM
- Publication number 20210348296
- Publication date Nov 11, 2021
- Applied Materials, Inc.
- Paul R McHugh
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
POST EXPOSURE PROCESSING APPARATUS
- Publication number 20210026257
- Publication date Jan 28, 2021
- Applied Materials, Inc.
- Viachslav BABAYAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLUID RECOVERY IN SEMICONDUCTOR PROCESSING
- Publication number 20210017665
- Publication date Jan 21, 2021
- Applied Materials, Inc.
- Sam Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR POST EXPOSURE BAKE
- Publication number 20200387074
- Publication date Dec 10, 2020
- Applied Materials, Inc.
- Kyle M. HANSON
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
POST EXPOSURE PROCESSING APPARATUS
- Publication number 20190377272
- Publication date Dec 12, 2019
- Applied Materials, Inc.
- Viachslav BABAYAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR REMOVING CONTAMINANTS IN ELECTROPLATING SYS...
- Publication number 20190345624
- Publication date Nov 14, 2019
- Applied Materials, Inc.
- Kwan Wook Roh
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
SEAL APPARATUS FOR AN ELECTROPLATING SYSTEM
- Publication number 20190323141
- Publication date Oct 24, 2019
- Applied Materials, Inc.
- Kyle M. Hanson
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
CLEANING COMPONENTS AND METHODS IN A PLATING SYSTEM
- Publication number 20190321861
- Publication date Oct 24, 2019
- Applied Materials, Inc.
- Joseph A. Jonathan
- B08 - CLEANING
Information Patent Application
CLEANING COMPONENTS AND METHODS IN A PLATING SYSTEM
- Publication number 20190233966
- Publication date Aug 1, 2019
- Applied Materials, Inc.
- Kyle M. Hanson
- B08 - CLEANING
Information Patent Application
CONTROLLED ETCH OF NITRIDE FEATURES
- Publication number 20190019688
- Publication date Jan 17, 2019
- Applied Materials, Inc.
- Eric J. Bergman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POST EXPOSURE PROCESSING APPARATUS
- Publication number 20180224754
- Publication date Aug 9, 2018
- Applied Materials, Inc.
- Viachslav BABAYAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS FOR POST EXPOSURE BAKE
- Publication number 20180217504
- Publication date Aug 2, 2018
- Applied Materials, Inc.
- Kyle M. HANSON
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR POST EXPOSURE BAKE
- Publication number 20180107119
- Publication date Apr 19, 2018
- Applied Materials, Inc.
- Kyle M. HANSON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS FOR POST EXPOSURE BAKE
- Publication number 20180004094
- Publication date Jan 4, 2018
- Applied Materials, Inc.
- Kyle M. HANSON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
WAFER PROCESSOR DOOR INTERFACE
- Publication number 20170365492
- Publication date Dec 21, 2017
- Applied Materials, Inc.
- Kyle Moran Hanson
- B08 - CLEANING
Information Patent Application
REMOVING PHOTORESIST FROM A WAFER
- Publication number 20170357158
- Publication date Dec 14, 2017
- Applied Materials, Inc.
- Paul R. McHugh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTIPLE WAFER ROTARY PROCESSING
- Publication number 20170263472
- Publication date Sep 14, 2017
- Applied Materials, Inc.
- John L. Klocke
- B08 - CLEANING
Information Patent Application
APPARATUS AND METHODS FOR PHOTOMASK BACKSIDE CLEANING
- Publication number 20170139334
- Publication date May 18, 2017
- Applied Materials, Inc.
- Jason Rye
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Kyle Moran Hanson

Person

Patents Grantslast 30 patents

Electroplating system

Fluid recovery in semiconductor processing

Multi-compartment electrochemical replenishment cell

Electroplating systems and methods with increased metal ion concent...

Electroplating system

Apparatus for post exposure bake

Methods and apparatus for cleaning a substrate after processing

Fluid recovery in semiconductor processing

Seal apparatus for an electroplating system

Electroplating system

Post exposure processing apparatus

Cleaning components and methods in a plating system

Cleaning components and methods in a plating system

Post exposure processing apparatus

Controlled etch of nitride features

Apparatus for post exposure bake

Post exposure processing apparatus

Adaptive electric field shielding in an electroplating processor us...

Removing photoresist from a wafer

Systems and methods for rinsing and drying substrates

Post exposure processing apparatus

Apparatus for post exposure bake

Apparatus and methods for photomask backside cleaning

Substrate rinsing systems and methods

Processing assembly for semiconductor workpiece and methods of proc...

Anneal module for semiconductor wafers

Electrolytic copper process using anion permeable barrier

Flow battery systems

Electrolytic process using cation permeable barrier

Electrolytic process using anion permeable barrier

Patents Applicationslast 30 patents

ELECTROPLATING WETTING CHAMBER WITH REDUCED BUBBLE ENTRAPMENT

PLATING SEAL WITH IMPROVED SURFACE

PROCESS CELL FOR FILED GUIDED POST EXPOSURE BAKE PROCESS

SEMICONDUCTOR FILM PLATING PERIMETER MAPPING AND COMPENSATION

ELECTROPLATING SYSTEMS AND METHODS WITH INCREASED METAL ION CONCENT...

ELECTROPLATING SYSTEMS AND METHODS WITH INCREASED METAL ION CONCENT...

ELECTROPLATING SYSTEMS AND METHODS WITH INCREASED METAL ION CONCENT...

ELECTROPLATING SYSTEM

FLUID RECOVERY IN SEMICONDUCTOR PROCESSING

ELECTROPLATING SYSTEM

MULTI-COMPARTMENT ELECTROCHEMICAL REPLENISHMENT CELL

METHODS AND APPARATUS FOR CLEANING A SUBSTRATE AFTER PROCESSING

ELECTROPLATING SYSTEM

POST EXPOSURE PROCESSING APPARATUS

FLUID RECOVERY IN SEMICONDUCTOR PROCESSING

APPARATUS FOR POST EXPOSURE BAKE

POST EXPOSURE PROCESSING APPARATUS

SYSTEMS AND METHODS FOR REMOVING CONTAMINANTS IN ELECTROPLATING SYS...

SEAL APPARATUS FOR AN ELECTROPLATING SYSTEM

CLEANING COMPONENTS AND METHODS IN A PLATING SYSTEM

CLEANING COMPONENTS AND METHODS IN A PLATING SYSTEM

CONTROLLED ETCH OF NITRIDE FEATURES

POST EXPOSURE PROCESSING APPARATUS

APPARATUS FOR POST EXPOSURE BAKE

APPARATUS FOR POST EXPOSURE BAKE

APPARATUS FOR POST EXPOSURE BAKE

WAFER PROCESSOR DOOR INTERFACE

REMOVING PHOTORESIST FROM A WAFER

MULTIPLE WAFER ROTARY PROCESSING

APPARATUS AND METHODS FOR PHOTOMASK BACKSIDE CLEANING