Kyle TANTIWONG

Person

Livermore, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Image-based in-situ process monitoring
- Patent number 11,908,716
- Issue date Feb 20, 2024
- Applied Materials, Inc.
- Guoheng Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas hub for plasma reactor
- Patent number 11,728,141
- Issue date Aug 15, 2023
- Applied Materials, Inc.
- Yan Rozenzon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma reactor with highly symmetrical four-fold gas injection
- Patent number 11,244,811
- Issue date Feb 8, 2022
- Applied Materials, Inc.
- Yan Rozenzon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nozzle for multi-zone gas injection assembly
- Patent number 11,139,150
- Issue date Oct 5, 2021
- Applied Materials, Inc.
- Yan Rozenzon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle detection for substrate processing
- Patent number 11,119,051
- Issue date Sep 14, 2021
- Applied Materials, Inc.
- Todd Egan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metrology system for substrate deformation measurement
- Patent number 10,923,371
- Issue date Feb 16, 2021
- Applied Materials, Inc.
- Mehdi Vaez-Iravani
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Particle detection for substrate processing
- Patent number 10,845,317
- Issue date Nov 24, 2020
- Applied Materials, Inc.
- Todd Egan
- G01 - MEASURING TESTING
Information Patent Grant
Power deposition control in inductively coupled plasma (ICP) reactors
- Patent number 10,553,398
- Issue date Feb 4, 2020
- Applied Materials, Inc.
- Samer Banna
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metrology systems with multiple derivative modules for substrate st...
- Patent number 10,510,624
- Issue date Dec 17, 2019
- Applied Materials, Inc.
- Mehdi Vaez-Iravani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Side gas injection kit for multi-zone gas injection assembly
- Patent number 10,410,841
- Issue date Sep 10, 2019
- Applied Materials, Inc.
- Yan Rozenzon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multi-zone heated ESC with independent edge zones
- Patent number 10,332,772
- Issue date Jun 25, 2019
- Applied Materials, Inc.
- Kyle Tantiwong
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
High efficiency triple-coil inductively coupled plasma source with...
- Patent number 10,271,416
- Issue date Apr 23, 2019
- Applied Materials, Inc.
- Samer Banna
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma reactor with highly symmetrical four-fold gas injection
- Patent number 10,163,606
- Issue date Dec 25, 2018
- Applied Materials, Inc.
- Yan Rozenzon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multi-zone gas injection assembly with azimuthal and radial distrib...
- Patent number 10,008,368
- Issue date Jun 26, 2018
- Applied Materials, Inc.
- Yan Rozenzon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrostatic chuck with concentric cooling base
- Patent number 9,659,803
- Issue date May 23, 2017
- Applied Materials, Inc.
- Dmitry Lubomirsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tunable gas delivery assembly with internal diffuser and angular in...
- Patent number 9,536,710
- Issue date Jan 3, 2017
- Applied Materials, Inc.
- Vladimir Knyazik
- F26 - DRYING
Information Patent Grant
Multiple zone coil antenna with plural radial lobes
- Patent number 9,472,378
- Issue date Oct 18, 2016
- Applied Materials, Inc.
- Vladimir Knyazik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coil antenna with plural radial lobes
- Patent number 9,312,104
- Issue date Apr 12, 2016
- Applied Materials, Inc.
- Vladimir Knyazik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support with advanced edge control provisions
- Patent number 9,287,147
- Issue date Mar 15, 2016
- Applied Materials, Inc.
- Kyle Tantiwong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated method and system for manufacturing monolithic panels of...
- Patent number 8,900,399
- Issue date Dec 2, 2014
- Crystal Solar, Inc.
- Tirunelveli S. Ravi
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...

Patents Applicationslast 30 patents

Information Patent Application
3 PILLAR BOAT IN A LOAD LOCK CHAMBER AND METHODS OF MAKING PILLAR B...
- Publication number 20250218833
- Publication date Jul 3, 2025
- ASM IP HOLDING B.V.
- Zentaro Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Integrated Inspection for Enhanced Hybrid Bonding Yield in Advanced...
- Publication number 20240363446
- Publication date Oct 31, 2024
- Venkatakaushik VOLETI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMAGE-BASED IN-SITU PROCESS MONITORING
- Publication number 20220367217
- Publication date Nov 17, 2022
- Applied Materials, Inc.
- Guoheng Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS HUB FOR PLASMA REACTOR
- Publication number 20220157562
- Publication date May 19, 2022
- Applied Materials, Inc.
- Yan Rozenzon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PARTICLE DETECTION FOR SUBSTRATE PROCESSING
- Publication number 20210018449
- Publication date Jan 21, 2021
- Applied Materials, Inc.
- Todd EGAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REAL-TIME DETECTION OF PARTICULATE MATTER DURING DEPOSITION CHAMBER...
- Publication number 20210005436
- Publication date Jan 7, 2021
- Applied Materials, Inc.
- Mehdi Vaez-Iravani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NOZZLE FOR MULTI-ZONE GAS INJECTION ASSEMBLY
- Publication number 20190385824
- Publication date Dec 19, 2019
- Applied Materials, Inc.
- Yan Rozenzon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Reactor with Highly Symmetrical Four-Fold Gas Injection
- Publication number 20190122861
- Publication date Apr 25, 2019
- Applied Materials, Inc.
- Yan Rozenzon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METROLOGY SYSTEM FOR SUBSTRATE DEFORMATION MEASUREMENT
- Publication number 20190074201
- Publication date Mar 7, 2019
- Applied Materials, Inc.
- Mehdi VAEZ-IRAVANI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PARTICLE DETECTION FOR SUBSTRATE PROCESSING
- Publication number 20190072497
- Publication date Mar 7, 2019
- Applied Materials, Inc.
- Todd EGAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METROLOGY SYSTEMS FOR SUBSTRATE STRESS AND DEFORMATION MEASUREMENT
- Publication number 20190057910
- Publication date Feb 21, 2019
- Applied Materials, Inc.
- Mehdi VAEZ-IRAVANI
- G02 - OPTICS
Information Patent Application
Multi-Zone Gas Injection Assembly with Azimuthal and Radial Distrib...
- Publication number 20180269038
- Publication date Sep 20, 2018
- Applied Materials, Inc.
- Yan Rozenzon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TUNABLE GAS DELIVERY ASSEMBLY WITH INTERNAL DIFFUSER AND ANGULAR IN...
- Publication number 20170110292
- Publication date Apr 20, 2017
- Applied Materials, Inc.
- Vladimir KNYAZIK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA REACTOR WITH HIGHLY SYMMETRICAL FOUR-FOLD GAS INJECTION
- Publication number 20150371826
- Publication date Dec 24, 2015
- Applied Materials, Inc.
- Yan Rozenzon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-ZONE GAS INJECTION ASSEMBLY WITH AZIMUTHAL AND RADIAL DISTRIB...
- Publication number 20150371831
- Publication date Dec 24, 2015
- Applied Materials, Inc.
- Yan Rozenzon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-ZONE HEATED ESC WITH INDEPENDENT EDGE ZONES
- Publication number 20150364354
- Publication date Dec 17, 2015
- APPLIED MATERIALS, INC.
- Kyle TANTIWONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXTREME EDGE AND SKEW CONTROL IN ICP PLASMA REACTOR
- Publication number 20150181684
- Publication date Jun 25, 2015
- Applied Materials, Inc.
- Samer BANNA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COIL ANTENNA WITH PLURAL RADIAL LOBES
- Publication number 20150097478
- Publication date Apr 9, 2015
- Applied Materials, Inc.
- Vladimir Knyazik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE ZONE COIL ANTENNA WITH PLURAL RADIAL LOBES
- Publication number 20150097479
- Publication date Apr 9, 2015
- Applied Materials, Inc.
- Vladimir Knyazik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POWER DEPOSITION CONTROL IN INDUCTIVELY COUPLED PLASMA (ICP) REACTORS
- Publication number 20150068682
- Publication date Mar 12, 2015
- Applied Materials, Inc.
- SAMER BANNA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT WITH ADVANCED EDGE CONTROL PROVISIONS
- Publication number 20140265089
- Publication date Sep 18, 2014
- Kyle TANTIWONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNABLE GAS DELIVERY ASSEMBLY WITH INTERNAL DIFFUSER AND ANGULAR IN...
- Publication number 20140237840
- Publication date Aug 28, 2014
- Applied Materials, Inc.
- Vladimir KNYAZIK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK WITH CONCENTRIC COOLING BASE
- Publication number 20140209596
- Publication date Jul 31, 2014
- Applied Materials, Inc.
- Dmitry LUBOMIRSKY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ESC WITH COOLING BASE
- Publication number 20130276980
- Publication date Oct 24, 2013
- Dmitry LUBOMIRSKY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH EFFICIENCY TRIPLE-COIL INDUCTIVELY COUPLED PLASMA SOURCE WITH...
- Publication number 20130105086
- Publication date May 2, 2013
- Applied Materials, Inc.
- SAMER BANNA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Kyle TANTIWONG

Person

Patents Grantslast 30 patents

Image-based in-situ process monitoring

Gas hub for plasma reactor

Plasma reactor with highly symmetrical four-fold gas injection

Nozzle for multi-zone gas injection assembly

Particle detection for substrate processing

Metrology system for substrate deformation measurement

Particle detection for substrate processing

Power deposition control in inductively coupled plasma (ICP) reactors

Metrology systems with multiple derivative modules for substrate st...

Side gas injection kit for multi-zone gas injection assembly

Multi-zone heated ESC with independent edge zones

High efficiency triple-coil inductively coupled plasma source with...

Plasma reactor with highly symmetrical four-fold gas injection

Multi-zone gas injection assembly with azimuthal and radial distrib...

Electrostatic chuck with concentric cooling base

Tunable gas delivery assembly with internal diffuser and angular in...

Multiple zone coil antenna with plural radial lobes

Coil antenna with plural radial lobes

Substrate support with advanced edge control provisions

Integrated method and system for manufacturing monolithic panels of...

Patents Applicationslast 30 patents

3 PILLAR BOAT IN A LOAD LOCK CHAMBER AND METHODS OF MAKING PILLAR B...

Integrated Inspection for Enhanced Hybrid Bonding Yield in Advanced...

IMAGE-BASED IN-SITU PROCESS MONITORING

GAS HUB FOR PLASMA REACTOR

PARTICLE DETECTION FOR SUBSTRATE PROCESSING

REAL-TIME DETECTION OF PARTICULATE MATTER DURING DEPOSITION CHAMBER...

NOZZLE FOR MULTI-ZONE GAS INJECTION ASSEMBLY

Plasma Reactor with Highly Symmetrical Four-Fold Gas Injection

METROLOGY SYSTEM FOR SUBSTRATE DEFORMATION MEASUREMENT

PARTICLE DETECTION FOR SUBSTRATE PROCESSING

METROLOGY SYSTEMS FOR SUBSTRATE STRESS AND DEFORMATION MEASUREMENT

Multi-Zone Gas Injection Assembly with Azimuthal and Radial Distrib...

TUNABLE GAS DELIVERY ASSEMBLY WITH INTERNAL DIFFUSER AND ANGULAR IN...

PLASMA REACTOR WITH HIGHLY SYMMETRICAL FOUR-FOLD GAS INJECTION

MULTI-ZONE GAS INJECTION ASSEMBLY WITH AZIMUTHAL AND RADIAL DISTRIB...

MULTI-ZONE HEATED ESC WITH INDEPENDENT EDGE ZONES

EXTREME EDGE AND SKEW CONTROL IN ICP PLASMA REACTOR

COIL ANTENNA WITH PLURAL RADIAL LOBES

MULTIPLE ZONE COIL ANTENNA WITH PLURAL RADIAL LOBES

POWER DEPOSITION CONTROL IN INDUCTIVELY COUPLED PLASMA (ICP) REACTORS

SUBSTRATE SUPPORT WITH ADVANCED EDGE CONTROL PROVISIONS

TUNABLE GAS DELIVERY ASSEMBLY WITH INTERNAL DIFFUSER AND ANGULAR IN...

ELECTROSTATIC CHUCK WITH CONCENTRIC COOLING BASE

ESC WITH COOLING BASE

HIGH EFFICIENCY TRIPLE-COIL INDUCTIVELY COUPLED PLASMA SOURCE WITH...