Kyohei Sakita

Person

Haibara-gun, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Actinic-ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 12,044,967
- Issue date Jul 23, 2024
- FUJIFILM Corporation
- Daisuke Asakawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 11,656,548
- Issue date May 23, 2023
- FUJIFILM Corporation
- Tomotaka Tsuchimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, act...
- Patent number 11,584,810
- Issue date Feb 21, 2023
- FUJIFILM Corporation
- Akira Takada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 11,156,917
- Issue date Oct 26, 2021
- FUJIFILM Corporation
- Kyohei Sakita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Actinic ray-sensitive or radiation sensitive resin composition, act...
- Patent number 11,073,762
- Issue date Jul 27, 2021
- FUJIFILM Corporation
- Daisuke Asakawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 11,067,890
- Issue date Jul 20, 2021
- FUJIFILM Corporation
- Akiyoshi Goto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20230221640
- Publication date Jul 13, 2023
- FUJIFILM CORPORATION
- Tsutomu YOSHIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING RESIST COMPOSITION AND PATTERN FORMING METHOD
- Publication number 20230045851
- Publication date Feb 16, 2023
- FUJIFILM CORPORATION
- Naohiro TANGO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20230004086
- Publication date Jan 5, 2023
- FUJIFILM CORPORATION
- Tsutomu Yoshimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE COMPOSITION FOR EUV LIGHT, PATTERN FORMING METHOD, A...
- Publication number 20210405530
- Publication date Dec 30, 2021
- FUJIFILM CORPORATION
- Kyohei SAKITA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD OF FORMING REVERSED PATTERN AND METHOD OF MANUFACTURING ELE...
- Publication number 20210173309
- Publication date Jun 10, 2021
- FUJIFILM CORPORATION
- Kyohei SAKITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESI...
- Publication number 20200401045
- Publication date Dec 24, 2020
- FUJIFILM CORPORATION
- Daisuke ASAKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20200319551
- Publication date Oct 8, 2020
- FUJIFILM CORPORATION
- Tomotaka Tsuchimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20200012189
- Publication date Jan 9, 2020
- FUJIFILM CORPORATION
- Akiyoshi GOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20190377261
- Publication date Dec 12, 2019
- FUJIFILM CORPORATION
- Kyohei Sakita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20190294042
- Publication date Sep 26, 2019
- FUJIFILM CORPORATION
- Keita KATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20190294043
- Publication date Sep 26, 2019
- FUJIFILM CORPORATION
- Daisuke Asakawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, PATTERN FORMING METHOD, AND METHOD OF MANUFACTU...
- Publication number 20190219922
- Publication date Jul 18, 2019
- FUJIFILM CORPORATION
- Akihiro KANEKO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20190171104
- Publication date Jun 6, 2019
- FUJIFILM CORPORATION
- Akira Takada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Kyohei Sakita

Person

Patents Grantslast 30 patents

Actinic-ray-sensitive or radiation-sensitive resin composition, res...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Actinic ray-sensitive or radiation-sensitive resin composition, act...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Actinic ray-sensitive or radiation sensitive resin composition, act...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Patents Applicationslast 30 patents

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

METHOD FOR PRODUCING RESIST COMPOSITION AND PATTERN FORMING METHOD

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

PHOTOSENSITIVE COMPOSITION FOR EUV LIGHT, PATTERN FORMING METHOD, A...

METHOD OF FORMING REVERSED PATTERN AND METHOD OF MANUFACTURING ELE...

ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESI...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

ACTINIC RAY-SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACT...

RESIST COMPOSITION, PATTERN FORMING METHOD, AND METHOD OF MANUFACTU...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...