Lambert Danner

Person

Wetzlar, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Apparatus for the optical inspection of wafers
- Patent number 8,451,440
- Issue date May 28, 2013
- KLA-Tencor MIE GmbH
- Kurt Hahn
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and method for inspecting micro-structured devices on a s...
- Patent number 8,154,718
- Issue date Apr 10, 2012
- Vistec Semiconductor Systems GmbH
- Uwe Graf
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus for illuminating and inspecting a surface
- Patent number 7,561,263
- Issue date Jul 14, 2009
- Vistec Semiconductor Systems GmbH
- Lambert Danner
- G02 - OPTICS
Information Patent Grant
Measuring instrument and method for operating a measuring instrumen...
- Patent number 7,420,670
- Issue date Sep 2, 2008
- Vistec Semiconductor Systems GmbH
- Klaus Rinn
- G02 - OPTICS
Information Patent Grant
Device and method for inspecting an object
- Patent number 7,271,889
- Issue date Sep 18, 2007
- Leica Microsystems CMS GmbH
- Franz Cemic
- G01 - MEASURING TESTING
Information Patent Grant
Illuminating device
- Patent number 7,268,940
- Issue date Sep 11, 2007
- Vistec Semiconductor Systems GmbH
- Michael Veith
- G02 - OPTICS
Information Patent Grant
Illumination device, and coordinate measuring instrument having an...
- Patent number 7,209,243
- Issue date Apr 24, 2007
- Leica Microsystems Semiconductor GmbH
- Franz Cemic
- G01 - MEASURING TESTING
Information Patent Grant
Illumination device; and coordinate measuring instrument having an...
- Patent number 6,975,409
- Issue date Dec 13, 2005
- Leica Microsystems Semiconductor GmbH
- Franz Cemic
- G01 - MEASURING TESTING
Information Patent Grant
Critical dimension measuring instrument
- Patent number 6,943,901
- Issue date Sep 13, 2005
- Leica Microsystems Semiconductor GmbH
- Franz Cemic
- G01 - MEASURING TESTING
Information Patent Grant
Autofocus module and method for a microscope-based system
- Patent number 6,879,440
- Issue date Apr 12, 2005
- Leica Microsystems Semiconductor GmbH
- Franz Cemic
- G02 - OPTICS
Information Patent Grant
Illumination device for a DUV microscope and DUV microscope
- Patent number 6,624,930
- Issue date Sep 23, 2003
- Leica Microsystems Wetzlar GmbH
- Lambert Danner
- G02 - OPTICS
Information Patent Grant
Optical measurement arrangement, in particular for layer thickness...
- Patent number 6,618,154
- Issue date Sep 9, 2003
- Leica Microsystems Jena GmbH
- Horst Engel
- G01 - MEASURING TESTING
Information Patent Grant
Optical measurement arrangement having an ellipsometer
- Patent number 6,600,560
- Issue date Jul 29, 2003
- Leica Microsystems Jena GmbH
- Hakon Mikkelsen
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
Apparatus for the Optical Inspection of Wafers
- Publication number 20100295938
- Publication date Nov 25, 2010
- KLA-TENCOR MIE GMBH
- Kurt Hahn
- G01 - MEASURING TESTING
Information Patent Application
DEVICE AND METHOD FOR THE INSPECTION OF DEFECTS ON THE EDGE REGION...
- Publication number 20090279080
- Publication date Nov 12, 2009
- Vistec Semiconductor Systems GmbH
- Lambert Danner
- G01 - MEASURING TESTING
Information Patent Application
Apparatus and Method for Inspecting Microstructures in Reflected or...
- Publication number 20070247618
- Publication date Oct 25, 2007
- Vistec Semiconductor Systems GmbH
- Uwe Graf
- G02 - OPTICS
Information Patent Application
Method and device for reducing systematic measuring errors in the e...
- Publication number 20070035850
- Publication date Feb 15, 2007
- Leica Microsystems CMS GmbH
- Lambert Danner
- G02 - OPTICS
Information Patent Application
Device and method for inspecting an object
- Publication number 20050259245
- Publication date Nov 24, 2005
- LECIA MICROSYSTEMS SEMICONDUCTOR GmbH
- Franz Cemic
- G02 - OPTICS
Information Patent Application
Measuring instrument and method for operating a measuring instrumen...
- Publication number 20050254068
- Publication date Nov 17, 2005
- Leica Microsystems Semiconductor GmbH
- Klaus Rinn
- G02 - OPTICS
Information Patent Application
Illumination device, and coordinate measuring instrument having an...
- Publication number 20040160777
- Publication date Aug 19, 2004
- Leica Microsystems Wetzlar GmbH
- Franz Cemic
- G02 - OPTICS
Information Patent Application
Illuminating device
- Publication number 20040136057
- Publication date Jul 15, 2004
- Michael Veith
- G02 - OPTICS
Information Patent Application
Critical dimension measuring instrument
- Publication number 20040070821
- Publication date Apr 15, 2004
- Leica Microsystems Semiconductor GmbH
- Franz Cemic
- G01 - MEASURING TESTING
Information Patent Application
Autofocus module and method for a microscope-based system
- Publication number 20030147134
- Publication date Aug 7, 2003
- Leica Microsystems Semiconductor GmbH
- Franz Cemic
- G02 - OPTICS
Information Patent Application
Optical measurement arrangement having an ellipsometer
- Publication number 20020027657
- Publication date Mar 7, 2002
- Hakon Mikkelsen
- G01 - MEASURING TESTING
Information Patent Application
Spectral ellipsometer having a refractive illuminating optical system
- Publication number 20020024669
- Publication date Feb 28, 2002
- Lambert Danner
- G01 - MEASURING TESTING
Information Patent Application
Optical measurement arrangement, in particular for layer thickness...
- Publication number 20020003217
- Publication date Jan 10, 2002
- Horst Engel
- G01 - MEASURING TESTING
Information Patent Application
Illumination device; and coordinate measuring instrument having an...
- Publication number 20020001090
- Publication date Jan 3, 2002
- Leica Microsystems Wetzlar GmbH.
- Franz Cemic
- G01 - MEASURING TESTING

Lambert Danner

Person

Patents Grantslast 30 patents

Apparatus for the optical inspection of wafers

Apparatus and method for inspecting micro-structured devices on a s...

Apparatus for illuminating and inspecting a surface

Measuring instrument and method for operating a measuring instrumen...

Device and method for inspecting an object

Illuminating device

Illumination device, and coordinate measuring instrument having an...

Illumination device; and coordinate measuring instrument having an...

Critical dimension measuring instrument

Autofocus module and method for a microscope-based system

Illumination device for a DUV microscope and DUV microscope

Optical measurement arrangement, in particular for layer thickness...

Optical measurement arrangement having an ellipsometer

Patents Applicationslast 30 patents

Apparatus for the Optical Inspection of Wafers

DEVICE AND METHOD FOR THE INSPECTION OF DEFECTS ON THE EDGE REGION...

Apparatus and Method for Inspecting Microstructures in Reflected or...

Method and device for reducing systematic measuring errors in the e...

Device and method for inspecting an object

Measuring instrument and method for operating a measuring instrumen...

Illumination device, and coordinate measuring instrument having an...

Illuminating device

Critical dimension measuring instrument

Autofocus module and method for a microscope-based system

Optical measurement arrangement having an ellipsometer

Spectral ellipsometer having a refractive illuminating optical system

Optical measurement arrangement, in particular for layer thickness...

Illumination device; and coordinate measuring instrument having an...