Lars-Ake Ragnarsson

Person

Leuven, BE

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor processing systems with in-situ electrical bias
- Patent number 11,894,240
- Issue date Feb 6, 2024
- Tokyo Electron Limited
- David Hurley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing system with in-situ electrical bias and me...
- Patent number 11,837,652
- Issue date Dec 5, 2023
- Tokyo Electron Limited
- David Hurley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices and methods of forming the same
- Patent number 11,367,662
- Issue date Jun 21, 2022
- IM EC vzw
- Eugenio Dentoni Litta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing system with in-situ electrical bias and me...
- Patent number 11,335,792
- Issue date May 17, 2022
- Tokyo Electron Limited
- David Hurley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming gate of semiconductor device and semiconductor de...
- Patent number 10,607,896
- Issue date Mar 31, 2020
- Imec VZW
- Lars-Ake Ragnarsson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing a dual work function semiconductor device...
- Patent number 10,424,517
- Issue date Sep 24, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd
- Joshua Tseng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for tuning the effective work function of a metal
- Patent number 9,892,923
- Issue date Feb 13, 2018
- Imec VZW
- Hendrik F. W. Dekkers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing a semiconductor device comprising transist...
- Patent number 9,287,273
- Issue date Mar 15, 2016
- Imec VZW
- Lars-Ake Ragnarsson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing a dual work function semiconductor device
- Patent number 9,245,759
- Issue date Jan 26, 2016
- IMEC
- Tom Schram
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating a high-K dielectric layer
- Patent number 8,211,812
- Issue date Jul 3, 2012
- IMEC
- Lars-Ake Ragnarsson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
MOSFET devices and methods for making them
- Patent number 7,812,413
- Issue date Oct 12, 2010
- IMEC
- Shih-Hsun Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer deposition method for depositing a layer
- Patent number 7,579,285
- Issue date Aug 25, 2009
- IMEC
- Paul Zimmerman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Semiconductor Processing System with In-Situ Electrical Bias and Me...
- Publication number 20220262921
- Publication date Aug 18, 2022
- TOKYO ELECTRON LIMITED
- David Hurley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING SYSTEMS WITH IN-SITU ELECTRICAL BIAS
- Publication number 20210313189
- Publication date Oct 7, 2021
- TOKYO ELECTRON LIMITED
- David Hurley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING SYSTEM WITH IN-SITU ELECTRICAL BIAS AND ME...
- Publication number 20210313444
- Publication date Oct 7, 2021
- TOKYO ELECTRON LIMITED
- David Hurley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES AND METHODS OF FORMING THE SAME
- Publication number 20210028068
- Publication date Jan 28, 2021
- IMEC vzw
- Eugenio Dentoni Litta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING GATE OF SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DE...
- Publication number 20170330801
- Publication date Nov 16, 2017
- IMEC vzw
- Lars-Ake Ragnarsson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Manufacturing A Dual Work Function Semiconductor Device...
- Publication number 20160365289
- Publication date Dec 15, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Joshua Tseng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for tuning the effective work function of a metal
- Publication number 20160196976
- Publication date Jul 7, 2016
- IMEC vzw
- Hendrik F.W. DEKKERS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE COMPRISING TRANSIST...
- Publication number 20150357244
- Publication date Dec 10, 2015
- IMEC vzw
- Lars-Ake Ragnarsson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING A DUAL WORK FUNCTION SEMICONDUCTOR DEVICE
- Publication number 20140106556
- Publication date Apr 17, 2014
- IMEC
- Tom Schram
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING A DUAL WORK FUNCTION SEMICONDUCTOR DEVICE...
- Publication number 20100219481
- Publication date Sep 2, 2010
- IMEC
- Joshua Tseng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MOSFET DEVICES AND METHODS FOR MAKING THEM
- Publication number 20090090971
- Publication date Apr 9, 2009
- Interuniversitair Microelektronica Centrum vzw (IMEC)
- Shih-Hsun Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Controlled Formation of a Gate Dielectric Stack
- Publication number 20080308881
- Publication date Dec 18, 2008
- Interuniversitair Microelektronica Centrum (IMEC)
- Stefan De Gendt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING A HIGH-K DIELECTRIC LAYER
- Publication number 20080265380
- Publication date Oct 30, 2008
- Interuniversitair Microelektronica Centrum vzw (IMEC)
- Lars-Ake Ragnarsson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF REDUCING THE INTERFACIAL OXIDE THICKNESS
- Publication number 20080254605
- Publication date Oct 16, 2008
- Interuniversitair Microelektronica Centrum (IMEC)
- David Brunco
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Atomic layer deposition method for depositing a layer
- Publication number 20070049045
- Publication date Mar 1, 2007
- Paul Zimmerman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Lars-Ake Ragnarsson

Person

Patents Grantslast 30 patents

Semiconductor processing systems with in-situ electrical bias

Semiconductor processing system with in-situ electrical bias and me...

Semiconductor devices and methods of forming the same

Semiconductor processing system with in-situ electrical bias and me...

Method of forming gate of semiconductor device and semiconductor de...

Method for manufacturing a dual work function semiconductor device...

Method for tuning the effective work function of a metal

Method for manufacturing a semiconductor device comprising transist...

Method for manufacturing a dual work function semiconductor device

Method for fabricating a high-K dielectric layer

MOSFET devices and methods for making them

Atomic layer deposition method for depositing a layer

Patents Applicationslast 30 patents

Semiconductor Processing System with In-Situ Electrical Bias and Me...

SEMICONDUCTOR PROCESSING SYSTEMS WITH IN-SITU ELECTRICAL BIAS

SEMICONDUCTOR PROCESSING SYSTEM WITH IN-SITU ELECTRICAL BIAS AND ME...

SEMICONDUCTOR DEVICES AND METHODS OF FORMING THE SAME

METHOD OF FORMING GATE OF SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DE...

Method for Manufacturing A Dual Work Function Semiconductor Device...

Method for tuning the effective work function of a metal

METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE COMPRISING TRANSIST...

METHOD FOR MANUFACTURING A DUAL WORK FUNCTION SEMICONDUCTOR DEVICE

METHOD FOR MANUFACTURING A DUAL WORK FUNCTION SEMICONDUCTOR DEVICE...

MOSFET DEVICES AND METHODS FOR MAKING THEM

Method for Controlled Formation of a Gate Dielectric Stack

METHOD FOR FABRICATING A HIGH-K DIELECTRIC LAYER

METHOD OF REDUCING THE INTERFACIAL OXIDE THICKNESS

Atomic layer deposition method for depositing a layer