Laura DINU-GÜRTLER

Person

DELFT, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Charged particle source module
- Patent number 12,288,663
- Issue date Apr 29, 2025
- ASML Netherlands B.V.
- Laura Dinu-Gurtler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle source module
- Patent number 11,557,455
- Issue date Jan 17, 2023
- ASML Netherlands B.V.
- Laura Dinu-Gurtler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focusing electrode for cathode arrangement, electron gun, and litho...
- Patent number 10,622,188
- Issue date Apr 14, 2020
- ASML Netherlands B.V.
- Laura Dinu-Gürtler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cathode arrangement, electron gun, and lithography system comprisin...
- Patent number 9,466,453
- Issue date Oct 11, 2016
- Mapper Lithography IP B.V.
- Laura Dinu-Gürtler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cathode arrangement, electron gun, and lithography system comprisin...
- Patent number 9,455,112
- Issue date Sep 27, 2016
- Mapper Lithography IP B.V.
- Laura Dinu-Gürtler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged particle lithography system with intermediate chamber
- Patent number 8,916,837
- Issue date Dec 23, 2014
- Mapper Lithography IP B.V.
- Laura Dinu-Gürtler
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle lithography system with intermediate chamber
- Patent number 8,586,949
- Issue date Nov 19, 2013
- Mapper Lithography IP B.V.
- Laura Dinu-Gürtler
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
CHARGED PARTICLE SOURCE MODULE
- Publication number 20230154719
- Publication date May 18, 2023
- ASML NETHERLANDS B.V.
- Laura DINU-GURTLER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANIPULATOR, MANIPULATOR ARRAY, CHARGED PARTICLE TOOL, MULTI-BEAM C...
- Publication number 20230109236
- Publication date Apr 6, 2023
- ASML NETHERLANDS B.V.
- Laura DINU GURTLER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STACK ALIGNMENT TECHNIQUES
- Publication number 20230020745
- Publication date Jan 19, 2023
- ASML NETHERLANDS B.V.
- Arjen Benjamin STORM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLOOD COLUMN, CHARGED PARTICLE TOOL AND METHOD FOR CHARGED PARTICLE...
- Publication number 20230017894
- Publication date Jan 19, 2023
- ASML NETHERLANDS B.V.
- Jurgen VAN SOEST
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE SOURCE MODULE
- Publication number 20200043693
- Publication date Feb 6, 2020
- ASML NETHERLANDS B.V.
- Laura DINU-GURTLER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Focusing electrode for cathode arrangement, electron gun, and litho...
- Publication number 20160314935
- Publication date Oct 27, 2016
- MAPPER LITHOGRAPHY IP BV
- Laura DINU-GÜRTLER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Cathode arrangement, electron gun, and lithography system comprisin...
- Publication number 20150187533
- Publication date Jul 2, 2015
- MAPPER LITHOGRAPHY IP BV
- Laura DINU-GÜRTLER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Cathode arrangement, electron gun, and lithography system comprisin...
- Publication number 20150187541
- Publication date Jul 2, 2015
- MAPPER LITHOGRAPHY IP BV
- Laura DINU-GÜRTLER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE LITHOGRAPHY SYSTEM WITH INTERMEDIATE CHAMBER
- Publication number 20140061497
- Publication date Mar 6, 2014
- MAPPER LITHOGRAPHY IP BV
- Laura DINU-GÜRTLER
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED PARTICLE LITHOGRAPHY SYSTEM WITH INTERMEDIATE CHAMBER
- Publication number 20120293780
- Publication date Nov 22, 2012
- MAPPER LITHOGRAPHY IP BV
- Laura DINU-GÜRTLER
- B82 - NANO-TECHNOLOGY

Laura DINU-GÜRTLER

Person

Patents Grantslast 30 patents

Charged particle source module

Charged particle source module

Focusing electrode for cathode arrangement, electron gun, and litho...

Cathode arrangement, electron gun, and lithography system comprisin...

Cathode arrangement, electron gun, and lithography system comprisin...

Charged particle lithography system with intermediate chamber

Charged particle lithography system with intermediate chamber

Patents Applicationslast 30 patents

CHARGED PARTICLE SOURCE MODULE

MANIPULATOR, MANIPULATOR ARRAY, CHARGED PARTICLE TOOL, MULTI-BEAM C...

STACK ALIGNMENT TECHNIQUES

FLOOD COLUMN, CHARGED PARTICLE TOOL AND METHOD FOR CHARGED PARTICLE...

CHARGED PARTICLE SOURCE MODULE

Focusing electrode for cathode arrangement, electron gun, and litho...

Cathode arrangement, electron gun, and lithography system comprisin...

Cathode arrangement, electron gun, and lithography system comprisin...

CHARGED PARTICLE LITHOGRAPHY SYSTEM WITH INTERMEDIATE CHAMBER

CHARGED PARTICLE LITHOGRAPHY SYSTEM WITH INTERMEDIATE CHAMBER