Patent Grant
11557455
This application claims priority to International Application No. PCT/JP2018/015632, filed on Apr. 10, 2018, which claims priority to U.S. application Ser. No. 15/484,974, which was filed on Apr. 11, 2017. The contents of these applications are each incorporated herein by reference in their entirety.
The disclosed embodiments relate to a charged particle source module for generating and emitting a charged particle beam. The disclosed embodiments further relate to an exposure system with said charged particle source module, a charged particle source arrangement, a method for manufacturing a semiconductor device and a method for inspecting a target.
Charged particles sources are arranged for generating and emitting a beam of charged particles, which beam of charged particles may be directed towards a surface or a target. A known charged particle source comprises a source cathode and multiple electrodes located downstream of said source cathode.
A charged particle source is known from WO 2015/101538 A1 of the Applicant, where the source is applied in a lithographic exposure system. The charged particle source comprises a cathode arrangement comprising: a thermionic cathode comprising an emission portion provided with an emission surface for emitting electrons, and a reservoir for holding a material, wherein the material, when heated, releases work function lowering particles that diffuse towards the emission portion and emanate at the emission surface at a first evaporation rate; a focusing electrode comprising a focusing surface for focusing the electrons emitted from the emission surface of the cathode; and a heat source configured for heating the material held in the reservoir.
Another charged particle source is known from Proc. of SPIE, Vol. 8680, 868000-1 to −12, see
The known charged particle sources are, apart from use in charged particle exposure systems, such as charged particle lithography systems, also applied in charged particle inspection systems or microscopes. At least in these applications, the individual components of the charged particle source must be accurately aligned with respect to each other. In addition, connecting the individual components of the charged particle source to corresponding power supply arrangements is cumbersome and must be performed with care not to disturb the alignment of the individual components of the charged particle source with respect to each other.
It is an object of the disclosed embodiments to ameliorate or to eliminate one or more disadvantages of the prior art, or to at least provide an alternative charged particle source.
According to a first aspect, the disclosed embodiments provide a charged particle source module for generating and emitting a charged particle beam, comprising:
wherein said charged particle source arrangement is electrically connected to said power connecting assembly via electrical wiring.
According to the first aspect of the disclosed embodiments, said charged particle source arrangement is arranged at said second frame part and is electrically connected to said power connecting assembly via electrical wiring, which power connecting assembly is arranged at said first frame part.
Since said power connecting assembly is arranged at said first frame part, a force applied to said power connecting assembly, for example during connection of an external power supply to said power connecting assembly, can be led into the first frame part. The force led into the first frame part can be transferred from said first frame part to said second frame part via the rigid support members, therewith preventing that said force acts on said charged particle source arrangement or the individual components thereof. Thereby, a strain relieving arrangement is provided. As a result of the strain relieving arrangement, the alignment and the relative positions of the individual components of said charged particle source arrangement with respect to each other is maintained.
The charged particle source arrangement may be arranged for generating an electron beam. The charged particle source arrangement may comprise an emitter arrangement for emitting electrons, from which an electron beam is formed.
Additionally, the use of said charged particle source module according to the disclosed embodiments may provide for a robust arrangement which reduces or in an ideal case eliminates one or more external forces exerted on said charged particle source arrangement for example during transport of said source module, during mounting of said source module into an exposure system, and during connection of an external power supply to said charged particle source module.
Furthermore, the power connecting assembly provides an appropriate substantially single connection terminal at which the charged particle source module can be connected to the required power supply and control leads for controlling the functioning of said charged particle source arrangement.
According to a second aspect, the disclosed embodiments provide a charged particle source module for generating and emitting a charged particle beam, comprising:
wherein said charged particle source arrangement is electrically connected to said power connecting assembly via electrical wiring,
wherein said electrical wiring comprises one or more wires with a service loop.
In the context of the present patent application, a service loop has to be understood as an extra length of electrical wire, preferably provided in a bend or loop, which is included as a strain relieving measure. Such bend may be included for example as a portion of the electrical wire extending with a bend in a direction substantially perpendicular to the direction of the one or more electrical wires. During use, electrical power runs through said one or more electrical wires thereby increasing the temperature of said one or more electrical wires. The increasing temperature of said one or more electrical wires results in thermal expansion of said one or more electrical wires. Thermal expansion of said one or more electrical wires can be absorbed by the service loop of the respective electrical wire. Therewith, it is prevented that a force is applied to said charged particle source arrangement due to thermal expansion of said one or more electrical wires.
Additionally, in case that a (small) part of a force applied to said power connecting assembly is transferred towards said charged particle source arrangement via said power connecting assembly, said force is absorbed by said service loops of said electrical wires. It is therewith prevented that a force is applied to said charged particle source arrangement.
In an embodiment said frame comprises mounting members which are connected to said second frame part by flexure connections, preferably wherein said second frame part comprises a mounting plate and each of said flexure connections comprises a connecting lip provided at the outer circumference of said mounting plate, wherein each connecting lip defines a slit between said mounting plate and said connecting lip. Said mounting members are intended to mount said charged particle source module to an exposure system or to a charged particle optical arrangement of an exposure system. In operation, said charged particle source arrangement generates and emits a charged particle beam which is directed towards said second frame part. It might occur that a part of the charged particle beam or a number of some charged particles impinge(s) on said second frame part directly or indirectly, which results in an increased temperature of said second frame part. Due to the increased temperature, said second frame part may deform in a substantially radial direction with respect to the longitudinal center axis of said charged particle source module. Said flexure connections with said connecting lips as well as said slits enable the second frame part to deform in a substantially radial direction with respect to the longitudinal center axis of said charged particle source module, while said mounting members remain in position and said charged particle source module is kept aligned to the exposure system or with the charged particle optical arrangement, preferably in a direction traverse to the longitudinal axis of said charged particle source module.
Additionally, said mounting members which are connected to said second frame part by flexure connections provide the possibility to mount said charged particle source module to a not perfectly flat surface. Due to the mounting members within the flexure connections a proper abutment of said charged particle source module to for example a charged particle optical arrangement is established.
In an embodiment said first frame part, said second frame part and/or said one or more rigid support members are made of non-ferrous material. Non-ferrous material includes non-magnetic properties, which has to be understood as being not magnetic and being not magnetizable. An advantage of this embodiment is that the charged particles within the charged particle beam generated by the charged particle source arrangement are not influenced by the frame or the components thereof.
In an embodiment said power connecting assembly is rigidly connected to said first frame part, and said charged particle source arrangement is rigidly connected to said second frame part. When said power connecting assembly is rigidly connected to said first frame part, it is prevented that said first frame part and said power connecting assembly move with respect to each other, such as rotating around and/or tilting with respect to the longitudinal axis of said frame, when a force applied to the power connecting assembly is led into said first frame part. Such movement may be detrimental to for example said charged particle source arrangement or said electrical wiring between said charged particle source arrangement and said power connecting assembly. Said charged particle source arrangement is rigidly connected to said second frame part for substantially the same reason.
In an embodiment said power connecting assembly comprises an electrically non-conductive connecting plate which is arranged at said first frame part of said frame, wherein said power connecting assembly comprises one or more connectors. By using a non-conductive connecting plate in combination with connectors, said power connecting assembly enables an external power supply to be connected to said power connecting assembly for providing electrical energy to said charged particle source arrangement, while it is prevented that said electrical energy is applied to said frame.
In an embodiment said one or more connectors extend through said electrically non-conductive connecting plate in a direction substantially parallel to said support members of said frame. As a result of the connectors extending substantially parallel or parallel to said rigid support members, a force applied to said connectors during for example connection of an external power supply to said connectors can be led easily towards and into said support members since the applied force continues in substantially the same direction as in which it is applied. The risk to any force being applied to said charged particle source arrangement is therefore reduced or in the ideal case eliminated.
In an embodiment said first frame part comprises two substantially parallel plates, wherein the power connecting assembly is secured, preferably clamped between said two plates. A movement of said power connecting assembly in a direction parallel to said support members would exert a detrimental force to said charged particle source arrangement or said electrical wiring between said charged particle source arrangement and said power connecting assembly. Such detrimental force distorts the charged particle source arrangement and/or the electrical wiring thereof negatively. By clamping the power connecting assembly between two plates, it is prevented that the power connecting assembly moves along the direction substantially parallel to said support members or rotates about a rotation axis extending through said power connecting assembly in a direction substantially perpendicular to said support members, when a force is exerted onto said power connecting assembly.
In an embodiment said charged particle source arrangement comprises an emitter arrangement configured for emitting charged particles, and an electrode for forming a charged particle beam from said charged particles emitted by said emitter arrangement, preferably wherein said charged particle source arrangement comprises two or more electrodes for forming a charged particle beam from said charged particles emitted by said emitter arrangement, wherein a most downstream electrode of said two or more electrodes is preferably arranged at said second frame part of said frame, wherein said most downstream electrode and said second frame part are preferably formed as a single part. By using said most downstream electrode both to shape the charged particle beam generated and emitted by said emitter arrangement and to secure said charged particle source arrangement to said second frame part of said frame, the number of parts of said charged particle source module may be kept to a minimum.
In an embodiment said emitter arrangement and said electrode are connected to one or more electrically non-conductive supports oriented substantially parallel to an optical axis defined by said emitter arrangement and said electrode, wherein each of said one or more supports is connected with an outer circumference of said emitter arrangement and with an outer circumference of said electrode, and wherein said one or more supports maintain the orientation and/or the position of said emitter arrangement and said electrode with respect to each other, preferably wherein at least one of said emitter arrangement and said electrode is connected with said one or more supports by means of a flexure connection. Said supports are provided for maintaining the orientation and/or the position of said electrode and said emitter arrangement with respect to each other. During operation, said emitter arrangement generates and emits a charged particle beam which is shaped by means of said electrode. A part of said charged particle beam or a number of individual charged particles from said emitter arrangement may impinge on said electrode, which leads to an increased temperature of said electrode. An increased temperature of said electrode may lead to deformation, in particular expansion of said electrode. Since said electrode is connected to said supports, such deformation leads to bending and/or warping of said electrode when not provided with a flexure connection, therewith distorting an electrical field formed between said electrode and said emitter arrangement. Said flexure connection enables said electrode to deform substantially in a radial direction with respect to the longitudinal center axis of said charged particle source arrangement while said supports maintain the position thereof and warping and/or bending of said electrode is prevented. Moreover, said electrode maintains the (intended) charged particle optical function thereof.
In an embodiment a plurality of said electrodes is provided. By the flexure connection provided at each electrode the mutual orientation and/or position can be maintained. Thereby, the charged particle optical function, for example a lens function, is maintained.
In an embodiment at least one of said emitter arrangement and said electrode is rigidly connected to said one or more supports, preferably wherein said most downstream electrode is rigidly connected to said one or more supports. Said most downstream electrode is arranged at said second frame part and, during operation, may be connected to an exposure system or a charged particle optical arrangement thereof. The thermal energy introduced by the charged particles impinging on and absorbed by said most downstream electrode is led towards said second frame part and/or said exposure system or said charged particle optical arrangement thereof. Optionally, said charged particle optical arrangement is actively cooled. An increase of the temperature of said most downstream electrode due to charged particles impinging onto said most downstream electrode is therefore counteracted.
In an embodiment said emitter arrangement and said electrode comprise a plate-shaped electrode body, wherein said flexure connection comprises a connecting lip provided at the outer circumference of said plate-shaped electrode body, wherein said connecting lip defines a slit between said connecting lip and said plate-shaped electrode body. As explained before, due to charged particles impinging onto said electrode, the temperature of said electrode increases, which can lead to thermal expansion of said electrode radially outwards with respect to the longitudinal center axis of said frame. Such thermal expansion of said electrode is enabled by said flexure connection with said connecting lip and said slit defined by said connecting lip. The inner end of the slit may be provided with a circular inner shape or as a hole having circular shape, the radius of which being larger than the distance between the lip and the electrode formed by the slit. In some embodiments, the slit further comprises a bend. Also this bend may comprise a circular inner shape. The circular inner shapes may contribute to the thermal expansion taking place in radial direction.
In an embodiment, when said power connecting assembly comprises an electrically non-conductive connecting plate which is arranged at said first frame part of said frame, wherein said power connecting assembly comprises one or more connectors, said electrical wiring is peripherally connected to said electrode and is connected to said one or more connectors, and wherein the electrical wiring extends in a direction substantially parallel to said support members of said frame. Thus, the electrical wiring is extending directly, in particular straight, from the periphery of the electrode to a respective connector. As the position of the connectors at the non-conductive connecting plate is substantially determined by the periphery of the underling electrode, the connectors can be placed remote from each other. An advantage of this embodiment is that the connectors can be provided at a safe distance from each other, such that mutual electrical contact between said connectors is prevented.
In an embodiment the electrical wiring is flexible electrical wiring. In the context of the present patent application, the term ‘flexible’ has to be understood as being capable of bending or being bent, but still having a determined degree of rigidity. In the case that said force is applied to the power connecting assembly and a part of said force is transferred into said flexible electrical wiring, said transferred force can be absorbed by the electrical wiring, at least partly, due to the flexibility thereof. Due to the flexible electrical wiring absorbing at least a part of said force, it is prevented that said transferred force acts on the individual components of said charged particle source arrangement. As a result thereof, the alignment and the relative positions of the individual components of said charged particle source arrangement with respect to each other is maintained.
In an embodiment, when said first frame part is a first rigid frame part, said second frame part is a second rigid frame part, and said one or more rigid support members are rigidly connected to said first frame part and said second frame part, said flexible electrical wiring comprises one or more wires with a service loop.
According to a third aspect, the disclosed embodiments provide an exposure system for emitting a charged particle beam towards a surface or a target, comprising:
wherein said second frame part of said frame is arranged at said charged particle optical arrangement.
Since said power connecting assembly is arranged at said first frame part and said second frame part is arranged at said charged particle optical arrangement, a force applied to said power connecting assembly, for example during connecting an external power supply to said power connecting assembly, can be led into the first frame part. The force led into the first frame part can be transferred from said first frame part to said charged particle optical arrangement via the rigid support members and said second frame part and can be absorbed by said charged particle optical arrangement. It is therewith prevented that said force acts on said charged particle source arrangement and a strain relieving arrangement is hereby provided. Said frame with said power connecting assembly provides a force path between said power connecting assembly and said second frame part, in particular between the power connecting assembly and said charged particle optical arrangement of said exposure tool.
In an embodiment said charged particle optical arrangement comprises a collimator, wherein said charged particle source module is arranged at said collimator.
During operation of the exposure tool, charged particles originating from said charged particle source arrangement may deviate from a generated charged particle beam and impinge onto a part of said charged particle source arrangement or said frame. The kinetic energy of such deviated charged particles is absorbed by said part of said charged particle source arrangement or said frame, which eventually leads to an increased temperature thereof. By arranging said second frame part on which said charged particle source arrangement is arranged at said charged particle optical arrangement, thermal energy absorbed by the second frame part or the part of said charged particle source arrangement arranged at said second frame part can be conducted towards and into said charged particle optical arrangement. It is therewith prevented that the temperature of said second frame part or said part of said charged particle source arrangement increases or increases significantly. Optionally, the charged particle optical arrangement or a part thereof on which said charged particle source module is arranged may be actively cooled.
In an embodiment the exposure system is selected from a group comprising a lithography system, an inspection system or a microscopy system.
According to a fourth aspect, the disclosed embodiments provide a charged particle source arrangement for generating a charged particle beam, comprising:
wherein said electrode is connected with said one or more supports by means of a flexure connection,
wherein said electrode and/or or said emitter arrangement comprises one or more electrical wire connections for connection of electrical wiring,
wherein at least one of said one or more electrical wire connections is arranged on said flexure connection.
Said supports are arranged to maintain said emitter arrangement and said electrode between said supports, in order to maintain the orientation and/or the position of said electrode and said emitter arrangement with respect to each other. During operation, said emitter arrangement generates and emits charged particles, such as electrons, which are formed into a charged particle beam by said electrode. A part of said charged particle beam or charged particles from said emitter arrangement may impinge onto said electrode, which leads to an increased temperature of said electrode. An increased temperature of said electrode may lead to deformation, in particular expansion of said electrode. Since said electrode is positioned between said supports, in the absence of said flexure connections, such deformation would lead to bending and/or warping of said electrode, therewith changing the orientation and/or position of said electrode with respect to said emitter arrangement. A changed orientation and/or position distorts an electrical field formed between said emitter arrangement and said electrode. Said flexure connections enable said electrode to deform substantially in a radial direction with respect to the longitudinal center axis of said charged particle source arrangement, while preventing warping and/or bending of said electrode in a direction parallel to the longitudinal direction of said charged particle source arrangement.
Moreover, in practice, electric wires used for connecting the charged particle source arrangement to an external power supply, extend in a direction transverse to the main plane of for example said electrode. If said electric wires expand due to a temperature increase, the expanding force(s) act(s) on the electrodes which can lead to disturbance of the alignment of the electrode with respect to said emitter arrangement. By connecting said electric wires to said flexure connection, the flexure connection can absorb the expanding forces and lead these forces into said supports.
It is noted that said charged particle source arrangement may be arranged for generating an electron beam, wherein said emitter arrangement is adapted for emitting electrons from which an electron beam is formed.
In an embodiment, said one or more electrical wire connections are located at a portion of said flexure connections where a position and/or orientation of said flexure connection with respect to said supports is substantially fixed. In a further embodiment said at least one of said one or more electrical wire connections is arranged on a distal end of said connecting lip, which is the free end of the connecting lip, of said at least one flexure connection. Arranging said electrical wire connections close to/at said supports contributes to maintaining the alignment of said electrode. Furthermore, by arranging said electrical wire connections at said distal end, the risk of any expanding force, which is caused by expansion of said electric wires, acting on said electrode is further reduced or in the ideal case prevented.
In an embodiment said electrode comprises a plate-shaped electrode body with a beam aperture, which beam aperture is centered with respect to said optical axis. In a further embodiment, said flexure connection comprises a connecting lip provided at the outer circumference of said plate-shaped electrode body, wherein said connecting lip defines a slit between said connecting lip and said plate-shaped electrode body. If said electrode is not provided with one or more flexure connections, due to charged particles impinging onto said electrode, a temperature increase of said electrode can lead to thermal expansion of said electrode radially outwards with respect to the longitudinal center axis of said charged particle source arrangement. Such thermal expansion of said electrode is enabled by said one or more flexure connections with said connecting lips and said slits defined by said connecting lips, while the supports remain in position and said electrode is prevented from warping and/or bending. Thereby the (intended) orientation and/or position of said electrode and the charged particle optical function thereof are maintained. The inner end of the slit may be provided with a circular inner shape or as a hole having circular shape, the radius of which being larger than the distance between the lip and the electrode formed by the slit. In some embodiments, the slit further comprises a bend. Also this bend may comprise a circular inner shape. The circular inner shapes may contribute to the thermal expansion taking place in radial direction.
In an embodiment a plurality of said electrodes is provided. By the flexure connection provided at each electrode the mutual orientation and/or position can be maintained. Thereby, the charged particle optical function, for example a lens function, is maintained.
In an embodiment said charged particle source arrangement comprises two or more electrodes for forming a charged particle beam from said charged particles emitted by said emitter arrangement, wherein at least one of said two or more electrodes is rigidly connected to said one or more supports, preferably a most downstream electrode of said two or more electrodes is rigidly connected to said one or more supports. During use of said charged particle source arrangement, said most downstream electrode is most likely arranged on a charged particle optical arrangement of an exposure system. Due to said arrangement, thermal energy absorbed by said most downstream electrode is conducted towards and into said charged particle optical arrangement, therewith minimizing or preventing any temperature increase of said most downstream electrode.
In an embodiment said emitter arrangement comprises a cathode for emitting said charged particles, wherein said cathode is received within a cathode carrying element which is connected to said one or more supports by means of a flexure connection. In a further embodiment said cathode carrying element comprises a plate-shaped carrying body with a cathode aperture for receiving at least a part of said cathode, preferably wherein said flexure connection comprises a connecting lip provided at the outer circumference of said plate-shaped carrying body, wherein said connecting lip defines a slit between said connecting lip and said plate-shaped carrying body. During operation of said charged particle source arrangement, the temperature of said charged particle source arrangement and/or said cathode carrying element may increase, which may lead to deformation, in particular expansion of said plate-shaped carrying element in a radial direction. Said flexure connections prevent said cathode carrying element from bending and/or warping in the longitudinal direction of said charged particle source arrangement as explained above in relation to said electrode.
In an embodiment said charged particle source arrangement comprises a frame including a first frame part, a second frame part, and one or more rigid support members which are arranged between said first frame part and said second frame part, and a power connecting assembly arranged at said first frame part, wherein said charged particle source arrangement is arranged at said second frame part and is electrically connected to said connecting assembly via electrical wiring. During connection of an external power supply to said power connecting assembly, a force is exerted onto said power connecting assembly. Due to the arrangement of said power connecting assembly on said first frame part, this force is lead into said first frame part. The force led into the first frame part can be transferred from said first frame part to said second frame part via the rigid support members, therewith preventing that said force acts on said charged particle source arrangement and providing a strain relieving arrangement.
According to a fifth aspect, the disclosed embodiments provide a charged particle source module according to the first or second aspect of the disclosed embodiments, wherein the charged particle source arrangement is a charged particle source arrangement according to the fourth aspect of the disclosed embodiments.
According to a sixth aspect, the disclosed embodiments provide a method of manufacturing a semiconductor device by means of a charged particle source module according to the first or second aspect of the disclosed embodiments, or by means of a charged particle source arrangement according to the fourth aspect of the disclosed embodiments, the method comprising the steps of:
The subsequent steps of manufacturing a semiconductor device from said processed wafer are known in the technical field of manufacturing semiconductor devices. A number of said subsequent steps are for example described in the United States patent application No. US 2014/0176920 A1 of the Applicant.
According to a seventh aspect, the disclosed embodiments provide a method for inspecting a target by means of a charged particle source module according to the first or second aspect of the disclosed embodiments, or by means of a charged particle source arrangement according to the fourth aspect of the disclosed embodiments, the method comprising the steps of:
The various aspects and features described and shown in the specification can be applied, individually, wherever possible. These individual aspects, in particular the aspects and features described in the attached dependent claims, can be made subject of divisional patent applications.
The disclosed embodiments will be elucidated on the basis of exemplary embodiments as shown in the attached drawings, in which:
For example when said exposure system 100 is a lithography system, said lithography system may further comprise inter alia a collimator for collimating said charged particle beam from the charged particle source module 102, an aperture array for generating individual beamlets, and a deflector array (beam blanker array) with multiple deflectors each arranged for deflecting an individual beamlet. Further, said exposure system 100 may comprise a beam stop array with an array of apertures, one aperture for each individual beamlet and a lens array with an array of lenses for focusing the charged particle beamlets onto the target 109. The arrangement of the parts of said lithography system is known within the relevant technical field. An example of a lithography system is for example shown in international patent application WO 2009/127659 A2 of the Applicant.
For example when said exposure system 100 is an electron microscopy system, the microscopy system may further comprise an optical system arranged to direct a electron beam from said charged particle source module 102 towards several electron lenses which are arranged to focus the electron beam onto the surface of the target 109. Said exposure system 100 may be provided with one or more deflectors for scanning the electron beam over the surface of the target 109. Said exposure system 100 may be provided with sensors which can detect the scattered electrons, secondary electrons and/or generated light from said target 109.
Alternatively, the service loops can be provided as full loops, formed by the electrical wire making a full 360° turn. It is noted that the service loops shaped as U-bends require less energy to deform in comparison with service loops shaped as full loops.
As illustrated in
The emitter arrangement 2 may comprise a single cathode for emitting a charged particle beam, for example a thermionic cathode heated by a filament, or tandem arrangement of a thermionic cathode heated by another cathode. For a detailed description of the construction and working of the emitter arrangement 2 with a tandem arrangement, reference is made to the international patent application WO 2015/101538 A1 of the Applicant, which is fully incorporated herein by reference. It is noted that other kinds of emitter arrangements are possible.
As shown in
The electrodes 11-13 placed upstream of the most downstream electrode 14 and downstream of the emitter arrangement 2 comprises one or two electrical connecting elements 62 for electrically connecting each of the electrodes 11-13 to a non-shown external power supply.
As illustrated in
The most downstream electrode 14 further comprises non-shown connecting elements similar to the connecting elements 70 of the electrodes 11-13. The connecting elements extend radially outwards from the electrode body 60 of the most downstream electrode 14 for rigidly connecting the most downstream electrode 14 to the glass rods 4. As shown in
As shown in
As illustrated in
As schematically shown in
The first frame part 201 comprises two substantially parallel annular plates 220, 221, for example made of a non-ferrous material such as a material comprising titanium, as shown in
The annular plates 220, 221 comprises attachment apertures which are adapted for receiving attachment screws or bolts 227 and/or rejuvenations provided at the upper end of the rigid bars 203, such that the annular plates 220, 221 become connected to each other. As illustrated in
As illustrated in
It is noted that in another embodiment, said most downstream electrode 14 and said annular mounting plate 240 may be formed as a single part.
The annular mounting plate 240 comprises mounting members including securing apertures 245 which are configured for receiving securing screws or bolts 246 for securing the charged particle source module 200 to an exposure system or a charged particle optical system thereof. Each of the securing apertures 245 is arranged within a connecting lip 244 of a flexure connection. Each of the connecting lips 244 is provided near the outer circumference of the annular mounting plate 240 and extends in the circumferential direction thereof. The connecting lips 244 are equally distributed over the outer circumference of the annular mounting plate 240. Each of the connecting lips 244 defines a slit 247 between the connecting lip 244 and the remaining of the annular mounting plate 240. Thereby, tilting of the charged particle source module 200 is prevented upon arranging the charged particle source module 200 to an exposure system or a charged particle optical arrangement thereof.
It is noted that the attachment apertures 224 in the first frame part 201 are provided in line with the securing apertures 245 and the securing bolts or screws 246 received therein, such that the securing bolts or screws 246 are accessibly by a tool via the attachment apertures 224.
It is noted that the rigid bars 203 are rigidly connected to the second frame part 202, in particular the annular mounting plate 240 thereof, for example by means of welding.
The embodiments may further be described using the following clauses:
It is to be understood that the above description is included to illustrate the operation of the preferred embodiments and is not meant to limit the scope of the disclosed embodiments of the invention. From the above discussion, many variations will be apparent to one skilled in the art that would yet be encompassed by the scope of the present invention.
| Number | Name | Date | Kind |
|---|---|---|---|
| 2914692 | Mahn | Nov 1959 | A |
| 3857055 | Shirai et al. | Dec 1974 | A |
| 3878424 | Suganuma | Apr 1975 | A |
| 5483074 | True | Jan 1996 | A |
| 20080067411 | Nishino | Mar 2008 | A1 |
| 20090224650 | Kim | Sep 2009 | A1 |
| 20110042579 | De Boer et al. | Feb 2011 | A1 |
| 20150136995 | Wieland et al. | May 2015 | A1 |
| Number | Date | Country |
|---|---|---|
| 1411047 | Apr 2003 | CN |
| 204230202 | Mar 2015 | CN |
| Y 58-54769 | Dec 1983 | JP |
| 5580849 | Aug 2014 | JP |
| 201239940 | Oct 2012 | TW |
| Entry |
|---|
| Partial Supplementary European search report (R. 164 EPC) issued in related Application No. 18784630.8, dated Jan. 15, 2021 (7 pgs.). |
| PCT International Search Report and PCT Written Opinion issued in corresponding PCT Application No. PCT/JP2018/015632, dated Jul. 3, 2018 (6 pgs.). |
| De Boer, et al.; “MAPPER: progress towards a high-volume manufacturing system”; Proc. of SPIE, Mar. 26, 2013, vol. 8680, #86800 (Abstract p. 1). |
| Partial Supplementary European Search Report issued in related Application No. EP 18 78 4630, dated May 26, 2021 (6 pgs.). |
| Notification of the First Office Action issued by the Patent Office of the People's Republic of China in related Chinese Patent Application No. 2018800313553; dated Jul. 5, 2021 (31 pgs.). |
| Search Repot issued in related Chinese Patent Application No. 2018800313553; dated Jun. 24, 2021 (4 pgs.). |
| Office Action of the Intellectual Property Office issued in related Taiwanese Patent Application No. 107112278; dated Feb. 23, 2022 (17 pgs.). |
| Number | Date | Country | |
|---|---|---|---|
| 20200043693 A1 | Feb 2020 | US |
| Number | Date | Country | |
|---|---|---|---|
| Parent | PCT/JP2018/015632 | Apr 2018 | US |
| Child | 16600364 | US | |
| Parent | 15484974 | Apr 2017 | US |
| Child | PCT/JP2018/015632 | US |
