Lauren DOYLE

Person

Hillsboro, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
Chemical compositions and methods of patterning microelectronic dev...
- Patent number 12,037,434
- Issue date Jul 16, 2024
- Intel Corporation
- Eungnak Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Directed self-assembly structures and techniques
- Patent number 12,012,473
- Issue date Jun 18, 2024
- Intel Corporation
- James Munro Blackwell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
EUV patterning methods, structures, and materials
- Patent number 11,984,317
- Issue date May 14, 2024
- Intel Corporation
- Marie Krysak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chain scission photoresists and methods for forming chain scission...
- Patent number 11,846,883
- Issue date Dec 19, 2023
- Intel Corporation
- Robert Bristol
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chain scission resist compositions for EUV lithography applications
- Patent number 11,262,654
- Issue date Mar 1, 2022
- Intel Corporation
- Lauren Doyle
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
CHEMICAL COMPOSITIONS & METHODS OF PATTERNING MICROELECTRONIC DEVIC...
- Publication number 20240360264
- Publication date Oct 31, 2024
- Intel Corporation
- Eungnak Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TIN CARBOXYLATE PRECURSORS FOR METAL OXIDE RESIST LAYERS AND RELATE...
- Publication number 20240272547
- Publication date Aug 15, 2024
- Intel Corporation
- Charles Cameron Mokhtarzadeh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PRECURSORS AND METHODS FOR PRODUCING BISMUTH-OXY-CARBIDE-BASED PHOT...
- Publication number 20240210821
- Publication date Jun 27, 2024
- Intel Corporation
- Charles Cameron Mokhtarzadeh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PRECURSORS AND METHODS FOR PRODUCING TIN-BASED PHOTORESIST
- Publication number 20240201586
- Publication date Jun 20, 2024
- Intel Corporation
- James Blackwell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV PATTERNING METHODS, STRUCTURES, AND MATERIALS
- Publication number 20210375616
- Publication date Dec 2, 2021
- Intel Corporation
- Marie Krysak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL COMPOSITIONS & METHODS OF PATTERNING MICROELECTRONIC DEVIC...
- Publication number 20210371566
- Publication date Dec 2, 2021
- Intel Corporation
- Eungnak Han
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
DIRECTED SELF-ASSEMBLY STRUCTURES AND TECHNIQUES
- Publication number 20210375745
- Publication date Dec 2, 2021
- Intel Corporation, Santa Clara, CA
- James Munro Blackwell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHAIN SCISSION RESIST COMPOSITIONS FOR EUV LITHOGRAPHY APPLICATIONS
- Publication number 20210200085
- Publication date Jul 1, 2021
- Intel Corporation
- Lauren Doyle
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CHAIN SCISSION PHOTORESISTS AND METHODS FOR FORMING CHAIN SCISSION...
- Publication number 20200103754
- Publication date Apr 2, 2020
- Intel Corporation
- Robert BRISTOL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Lauren DOYLE

Person

Patents Grantslast 30 patents

Chemical compositions and methods of patterning microelectronic dev...

Directed self-assembly structures and techniques

EUV patterning methods, structures, and materials

Chain scission photoresists and methods for forming chain scission...

Chain scission resist compositions for EUV lithography applications

Patents Applicationslast 30 patents

CHEMICAL COMPOSITIONS & METHODS OF PATTERNING MICROELECTRONIC DEVIC...

TIN CARBOXYLATE PRECURSORS FOR METAL OXIDE RESIST LAYERS AND RELATE...

PRECURSORS AND METHODS FOR PRODUCING BISMUTH-OXY-CARBIDE-BASED PHOT...

PRECURSORS AND METHODS FOR PRODUCING TIN-BASED PHOTORESIST

EUV PATTERNING METHODS, STRUCTURES, AND MATERIALS

CHEMICAL COMPOSITIONS & METHODS OF PATTERNING MICROELECTRONIC DEVIC...

DIRECTED SELF-ASSEMBLY STRUCTURES AND TECHNIQUES

CHAIN SCISSION RESIST COMPOSITIONS FOR EUV LITHOGRAPHY APPLICATIONS

CHAIN SCISSION PHOTORESISTS AND METHODS FOR FORMING CHAIN SCISSION...