Lawrence Chung-Lai Lei

Person

Milpitas, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods and systems of transferring, docking and processing substrates
- Patent number 8,268,734
- Issue date Sep 18, 2012
- Archers Inc.
- Lawrence Chung-Lai Lei
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Methods and systems of transferring a substrate to minimize heat loss
- Patent number 8,110,511
- Issue date Feb 7, 2012
- Archers Inc.
- Lawrence Chung-Lai Lei
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Atomic layer deposition apparatus
- Patent number 8,027,746
- Issue date Sep 27, 2011
- Applied Materials, Inc.
- Barry L. Chin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and systems of transferring, docking and processing substrates
- Patent number 7,897,525
- Issue date Mar 1, 2011
- Archers Inc.
- Lawrence Chung-Lai Lei
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Atomic layer deposition apparatus
- Patent number 7,860,597
- Issue date Dec 28, 2010
- Applied Materials, Inc.
- Barry L. Chin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming tungsten materials during vapor deposition proce...
- Patent number 7,846,840
- Issue date Dec 7, 2010
- Applied Materials, Inc.
- Moris Kori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas baffle and distributor for semiconductor processing chamber
- Patent number 7,722,719
- Issue date May 25, 2010
- Applied Materials, Inc.
- Lawrence Chung-Lai Lei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support having brazed plates and resistance heater
- Patent number 7,705,275
- Issue date Apr 27, 2010
- Applied Materials, Inc.
- Salvador P. Umotoy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming tungsten materials during vapor deposition proce...
- Patent number 7,674,715
- Issue date Mar 9, 2010
- Applied Materials, Inc.
- Moris Kori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Atomic layer deposition apparatus
- Patent number 7,660,644
- Issue date Feb 9, 2010
- Applied Materials, Inc.
- Barry L. Chin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming tungsten materials during vapor deposition proce...
- Patent number 7,465,666
- Issue date Dec 16, 2008
- Applied Materials, Inc.
- Moris Kori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming tungsten materials during vapor deposition proce...
- Patent number 7,235,486
- Issue date Jun 26, 2007
- Applied Materials, Inc.
- Moris Kori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for controlling the presence of fluorine in refra...
- Patent number 7,115,494
- Issue date Oct 3, 2006
- Applied Materials, Inc.
- Ashok Sinha
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Atomic layer deposition apparatus
- Patent number 7,085,616
- Issue date Aug 1, 2006
- Applied Materials, Inc.
- Barry L. Chin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for controlling the presence of fluorine in refra...
- Patent number 7,033,922
- Issue date Apr 25, 2006
- Applied Materials Inc.
- Moris Kori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for controlling the presence of fluorine in refra...
- Patent number 6,855,368
- Issue date Feb 15, 2005
- Applied Materials, Inc.
- Moris Kori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
ATOMIC LAYER DEPOSITION APPARATUS
- Publication number 20120006265
- Publication date Jan 12, 2012
- Barry L. Chin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods and Systems of Transferring, Docking and Processing Substrates
- Publication number 20110217469
- Publication date Sep 8, 2011
- Lawrence Chung-Lai Lei
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods and Systems of Transferring, Docking and Processing Substrates
- Publication number 20110151119
- Publication date Jun 23, 2011
- Lawrence Chung-Lai Lei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER DEPOSITION APPARATUS
- Publication number 20110111603
- Publication date May 12, 2011
- Barry L. Chin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods and systems of transferring a substrate to minimize heat loss
- Publication number 20100173439
- Publication date Jul 8, 2010
- Lawrence Chung-Lai Lei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Integrated facility and process chamber for substrate processing
- Publication number 20100162954
- Publication date Jul 1, 2010
- Lawrence Chung-Lai Lei
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Systems and methods for substrate processing
- Publication number 20100162955
- Publication date Jul 1, 2010
- Lawrence Chung-Lai Lei
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods and systems of transferring, docking and processing substrates
- Publication number 20100167503
- Publication date Jul 1, 2010
- Lawrence Chung-Lai Lei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER DEPOSITION APPARATUS
- Publication number 20100099270
- Publication date Apr 22, 2010
- Barry L. Chin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FORMING TUNGSTEN MATERIALS DURING VAPOR DEPOSITION PROCE...
- Publication number 20100093170
- Publication date Apr 15, 2010
- APPLIED MATERIALS, INC.
- Moris Kori
- C30 - CRYSTAL GROWTH
Information Patent Application
METHOD FOR FORMING TUNGSTEN MATERIALS DURING VAPOR DEPOSITION PROCE...
- Publication number 20090156004
- Publication date Jun 18, 2009
- MORIS KORI
- C30 - CRYSTAL GROWTH
Information Patent Application
Uniformly Compressed Process Chamber Gate Seal for Semiconductor Pr...
- Publication number 20090113684
- Publication date May 7, 2009
- Applied Materials, Inc.
- Won B. Bang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual gas faceplate for a showerhead in a semiconductor wafer proces...
- Publication number 20060021703
- Publication date Feb 2, 2006
- APPLIED MATERIALS, INC.
- Salvador P. Umotoy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus and method for low pressure CVD deposition of tungsten an...
- Publication number 20030140857
- Publication date Jul 31, 2003
- Applied Materials, Inc.
- Salvador P. Umotoy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH TEMPERATURE CHEMICAL VAPOR DEPOSITION CHAMBER
- Publication number 20010054381
- Publication date Dec 27, 2001
- SALVADOR P UMOTOY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Lawrence Chung-Lai Lei

Person

Patents Grantslast 30 patents

Methods and systems of transferring, docking and processing substrates

Methods and systems of transferring a substrate to minimize heat loss

Atomic layer deposition apparatus

Methods and systems of transferring, docking and processing substrates

Atomic layer deposition apparatus

Method for forming tungsten materials during vapor deposition proce...

Gas baffle and distributor for semiconductor processing chamber

Substrate support having brazed plates and resistance heater

Method for forming tungsten materials during vapor deposition proce...

Atomic layer deposition apparatus

Method for forming tungsten materials during vapor deposition proce...

Method for forming tungsten materials during vapor deposition proce...

Method and system for controlling the presence of fluorine in refra...

Atomic layer deposition apparatus

Method and system for controlling the presence of fluorine in refra...

Method and system for controlling the presence of fluorine in refra...

Patents Applicationslast 30 patents

ATOMIC LAYER DEPOSITION APPARATUS

Methods and Systems of Transferring, Docking and Processing Substrates

Methods and Systems of Transferring, Docking and Processing Substrates

ATOMIC LAYER DEPOSITION APPARATUS

Methods and systems of transferring a substrate to minimize heat loss

Integrated facility and process chamber for substrate processing

Systems and methods for substrate processing

Methods and systems of transferring, docking and processing substrates

ATOMIC LAYER DEPOSITION APPARATUS

METHOD FOR FORMING TUNGSTEN MATERIALS DURING VAPOR DEPOSITION PROCE...

METHOD FOR FORMING TUNGSTEN MATERIALS DURING VAPOR DEPOSITION PROCE...

Uniformly Compressed Process Chamber Gate Seal for Semiconductor Pr...

Dual gas faceplate for a showerhead in a semiconductor wafer proces...

Apparatus and method for low pressure CVD deposition of tungsten an...

HIGH TEMPERATURE CHEMICAL VAPOR DEPOSITION CHAMBER