Leon H. Kaplan

Person

Yorktown Heights, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Laser ablation mask and method of fabrication
- Patent number 5,573,875
- Issue date Nov 12, 1996
- International Business Machines Corporation
- Leon H. Kaplan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fabrication of laser ablation masks by wet etching
- Patent number 5,254,202
- Issue date Oct 19, 1993
- International Business Machines Corporation
- Leon H. Kaplan
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Dry-developed, negative working electron resist system
- Patent number 4,497,891
- Issue date Feb 5, 1985
- International Business Machines Corporation
- Leon H. Kaplan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resolution in optical lithography
- Patent number 4,414,314
- Issue date Nov 8, 1983
- International Business Machines Corporation
- Leon H. Kaplan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Plasma develoment of resists
- Patent number 4,307,178
- Issue date Dec 22, 1981
- International Business Machines Corporation
- Leon H. Kaplan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist O-quinone diazide containing composition and resist mas...
- Patent number 4,259,430
- Issue date Mar 31, 1981
- International Business Machines Corporation
- Leon H. Kaplan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for removing layers of organic material
- Patent number T973008
- Issue date Aug 1, 1978
- International Business Machines Corporation
- Leon H. Kaplan
- 134 - Cleaning and liquid contact with solids
Information Patent Grant
Photoresist process and photosensitive O-quinone diazide article wi...
- Patent number 4,036,644
- Issue date Jul 19, 1977
- International Business Machines Corporation
- Leon H. Kaplan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Modified processing of positive photoresists
- Patent number 4,007,047
- Issue date Feb 8, 1977
- International Business Machines Corporation
- Leon H. Kaplan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Leon H. Kaplan

Person

Patents Grantslast 30 patents

Laser ablation mask and method of fabrication

Fabrication of laser ablation masks by wet etching

Dry-developed, negative working electron resist system

Resolution in optical lithography

Plasma develoment of resists

Photoresist O-quinone diazide containing composition and resist mas...

Method for removing layers of organic material

Photoresist process and photosensitive O-quinone diazide article wi...

Modified processing of positive photoresists