Li Hou

Person

Cupertino, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Strip process for high aspect ratio structure
- Patent number 10,901,321
- Issue date Jan 26, 2021
- Mattson Technology, Inc.
- Vijay M. Vaniapura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Strip process for high aspect ratio structure
- Patent number 10,599,039
- Issue date Mar 24, 2020
- Mattson Technology, Inc.
- Vijay M. Vaniapura
- B08 - CLEANING
Information Patent Grant
Plasma uniformity control by gas diffuser hole design
- Patent number 10,312,058
- Issue date Jun 4, 2019
- Applied Materials, Inc.
- Soo Young Choi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma uniformity control by gas diffuser hole design
- Patent number 10,262,837
- Issue date Apr 16, 2019
- Applied Materials, Inc.
- Soo Young Choi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma uniformity control by gas diffuser hole design
- Patent number 9,200,368
- Issue date Dec 1, 2015
- Applied Materials, Inc.
- Soo Young Choi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma uniformity control by gas diffuser hole design
- Patent number 8,083,853
- Issue date Dec 27, 2011
- Applied Materials, Inc.
- Soo Young Choi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wafer tilt detection apparatus and method
- Patent number 7,561,258
- Issue date Jul 14, 2009
- Mattson Technology, Inc.
- Songlin Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for reducing arcing during plasma processing
- Patent number 7,501,161
- Issue date Mar 10, 2009
- Applied Materials, Inc.
- Li Hou
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas distribution plate assembly for large area plasma enhanced chem...
- Patent number 6,942,753
- Issue date Sep 13, 2005
- Applied Materials, Inc.
- Soo Young Choi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Strip Process for High Aspect Ratio Structure
- Publication number 20200218158
- Publication date Jul 9, 2020
- Mattson Technology, Inc.
- Vijay M. Vaniapura
- B08 - CLEANING
Information Patent Application
Water Vapor Based Fluorine Containing Plasma For Removal Of Hardmask
- Publication number 20200135554
- Publication date Apr 30, 2020
- Mattson Technology, Inc.
- Li Hou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Strip Process for High Aspect Ratio Structure
- Publication number 20180074409
- Publication date Mar 15, 2018
- Mattson Technology, Inc.
- Vijay M. Vaniapura
- B08 - CLEANING
Information Patent Application
PLASMA UNIFORMITY CONTROL BY GAS DIFFUSER HOLE DESIGN
- Publication number 20180025890
- Publication date Jan 25, 2018
- Applied Materials, Inc.
- Soo Young CHOI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA UNIFORMITY CONTROL BY GAS DIFFUSER HOLE DESIGN
- Publication number 20160056019
- Publication date Feb 25, 2016
- Applied Materials, Inc.
- Soo Young CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Uniformity Control By Gas Diffuser Hole Design
- Publication number 20110290183
- Publication date Dec 1, 2011
- Soo Young Choi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS DISTRIBUTION UNIFORMITY IMPROVEMENT BY BAFFLE PLATE WITH MULTI-...
- Publication number 20080178807
- Publication date Jul 31, 2008
- Qunhua Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
System and method for removal of photoresist and stop layer followi...
- Publication number 20070269975
- Publication date Nov 22, 2007
- Stephen E. Savas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wafer Tilt Detection Apparatus and Method
- Publication number 20070269910
- Publication date Nov 22, 2007
- Songlin Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma uniformity control by gas diffuser hole design
- Publication number 20060236934
- Publication date Oct 26, 2006
- Soo Young Choi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Gas distribution uniformity improvement by baffle plate with multi-...
- Publication number 20060228490
- Publication date Oct 12, 2006
- APPLIED MATERIALS, INC.
- Qunhua Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods and apparatus for reducing arcing during plasma processing
- Publication number 20050266174
- Publication date Dec 1, 2005
- Li Hou
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma uniformity control by gas diffuser hole design
- Publication number 20050251990
- Publication date Nov 17, 2005
- APPLIED MATERIALS, INC.
- Soo Young Choi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Lifting glass substrate without center lift pins
- Publication number 20050255244
- Publication date Nov 17, 2005
- APPLIED MATERIALS, INC.
- Li Hou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus of depositing low temperature inorganic films...
- Publication number 20050238816
- Publication date Oct 27, 2005
- Li Hou
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Full glass substrate deposition in plasma enhanced chemical vapor d...
- Publication number 20050150459
- Publication date Jul 14, 2005
- Quanyuan Shang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Gas distribution plate assembly for large area plasma enhanced chem...
- Publication number 20040206305
- Publication date Oct 21, 2004
- APPLIED MATERIALS, INC.
- Soo Young Choi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Lifting glass substrate without center lift pins
- Publication number 20040096636
- Publication date May 20, 2004
- APPLIED MATERIALS, INC.
- Li Hou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Full glass substrate deposition in plasma enhanced chemical vapor d...
- Publication number 20020083897
- Publication date Jul 4, 2002
- APPLIED MATERIALS, INC.
- Quanyuan Shang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Person

Patents Grantslast 30 patents

Strip process for high aspect ratio structure

Strip process for high aspect ratio structure

Plasma uniformity control by gas diffuser hole design

Plasma uniformity control by gas diffuser hole design

Plasma uniformity control by gas diffuser hole design

Plasma uniformity control by gas diffuser hole design

Wafer tilt detection apparatus and method

Methods and apparatus for reducing arcing during plasma processing

Gas distribution plate assembly for large area plasma enhanced chem...

Patents Applicationslast 30 patents

Strip Process for High Aspect Ratio Structure

Water Vapor Based Fluorine Containing Plasma For Removal Of Hardmask

Strip Process for High Aspect Ratio Structure

PLASMA UNIFORMITY CONTROL BY GAS DIFFUSER HOLE DESIGN

PLASMA UNIFORMITY CONTROL BY GAS DIFFUSER HOLE DESIGN

Plasma Uniformity Control By Gas Diffuser Hole Design

GAS DISTRIBUTION UNIFORMITY IMPROVEMENT BY BAFFLE PLATE WITH MULTI-...

System and method for removal of photoresist and stop layer followi...

Wafer Tilt Detection Apparatus and Method

Plasma uniformity control by gas diffuser hole design

Gas distribution uniformity improvement by baffle plate with multi-...

Methods and apparatus for reducing arcing during plasma processing

Plasma uniformity control by gas diffuser hole design

Lifting glass substrate without center lift pins

Method and apparatus of depositing low temperature inorganic films...

Full glass substrate deposition in plasma enhanced chemical vapor d...

Gas distribution plate assembly for large area plasma enhanced chem...

Lifting glass substrate without center lift pins

Full glass substrate deposition in plasma enhanced chemical vapor d...