Lin Hu

Person

Livingston, NJ, US

People

Patents Grantslast 30 patents

Information Patent Grant
Imprint lithography system and method for manufacturing
- Patent number 10,105,883
- Issue date Oct 23, 2018
- Nanonex Corporation
- Hua Tan
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Fast nanoimprinting methods using deformable mold
- Patent number 9,533,445
- Issue date Jan 3, 2017
- Nanonex Corporation
- Wei Zhang
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Fast nanoimprinting apparatus using deformale mold
- Patent number 8,747,092
- Issue date Jun 10, 2014
- Nanonex Corporation
- Wei Zhang
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Imprint lithography with improved substrate/mold separation
- Patent number 8,377,361
- Issue date Feb 19, 2013
- Wei Zhang
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and apparatus to apply surface release coating for imprint mold
- Patent number 8,337,959
- Issue date Dec 25, 2012
- Nanonex Corporation
- Wei Zhang
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Imprint lithography with improved substrate/mold separation
- Patent number 8,087,922
- Issue date Jan 3, 2012
- Wei Zhang
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Die imprint by double side force-balanced press for step-and-repeat...
- Patent number 8,025,829
- Issue date Sep 27, 2011
- Nanonex Corporation
- Wei Zhang
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Apparatus for double-sided imprint lithography
- Patent number 7,717,696
- Issue date May 18, 2010
- Nanonex Corp.
- Stephen Chou
- G11 - INFORMATION STORAGE

Patents Applicationslast 30 patents

Information Patent Application
IMPRINT LITHOGRAPHY SYSTEM AND METHOD FOR MANUFACTURING
- Publication number 20190263032
- Publication date Aug 29, 2019
- NANONEX CORPORATION
- Hua Tan
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
IMPRINT LITHOGRAPHY SYSTEM AND METHOD FOR MANUFACTURING
- Publication number 20160039126
- Publication date Feb 11, 2016
- NANONEX CORPORATION
- Hua Tan
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
SYSTEM AND METHODS OF MOLD/SUBSTRATE SEPARATION FOR IMPRINT LITHOGR...
- Publication number 20160031151
- Publication date Feb 4, 2016
- Nanonex Corporation
- Hua TAN
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
FAST NANOIMPRINTING METHODS USING DEFORMABLE MOLD
- Publication number 20150069672
- Publication date Mar 12, 2015
- NANONEX CORPORATION
- Wei Zhang
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
System and Methods For Nano-Scale Manufacturing
- Publication number 20140239529
- Publication date Aug 28, 2014
- NANONEX CORPORATION
- Hua Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FAST NANOIMPRINTING APPARATUS USING DEFORMALE MOLD
- Publication number 20110180965
- Publication date Jul 28, 2011
- NANONEX CORPORATION
- Wei Zhang
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Method And Apparatus To Apply Surface Release Coating For Imprint Mold
- Publication number 20110155060
- Publication date Jun 30, 2011
- Wei Zhang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Die Imprint By Double Side Force-Balanced Press For Step-And-Repeat...
- Publication number 20100289184
- Publication date Nov 18, 2010
- Wei Zhang
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
IMPRINT LITHOGRAPHY WITH IMPROVED SUBSTRATE/MOLD SEPARATION
- Publication number 20100119641
- Publication date May 13, 2010
- Wei Zhang
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
ALIGN-TRANSFER-IMPRINT SYSTEM FOR IMPRINT LITHOGRPHY
- Publication number 20080213418
- Publication date Sep 4, 2008
- Hua Tan
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD AND APPARATUS TO APPLY SURFACE RELEASE COATING FOR IMPRINT MOLD
- Publication number 20080131623
- Publication date Jun 5, 2008
- Wei Zhang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DIE IMPRINT BY DOUBLE SIDE FORCE-BALANCED PRESS FOR STEP-AND-REPEAT...
- Publication number 20080122138
- Publication date May 29, 2008
- Wei Zhang
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
IMPRINT LITHOGRAPHY WITH IMPROVED SUBSTRATE/MOLD SEPARATION
- Publication number 20080122144
- Publication date May 29, 2008
- Wei Zhang
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Apparatus for double-sided imprint lithography
- Publication number 20050146078
- Publication date Jul 7, 2005
- Stephen Chou
- G11 - INFORMATION STORAGE

Person

Patents Grantslast 30 patents

Imprint lithography system and method for manufacturing

Fast nanoimprinting methods using deformable mold

Fast nanoimprinting apparatus using deformale mold

Imprint lithography with improved substrate/mold separation

Method and apparatus to apply surface release coating for imprint mold

Imprint lithography with improved substrate/mold separation

Die imprint by double side force-balanced press for step-and-repeat...

Apparatus for double-sided imprint lithography

Patents Applicationslast 30 patents

IMPRINT LITHOGRAPHY SYSTEM AND METHOD FOR MANUFACTURING

IMPRINT LITHOGRAPHY SYSTEM AND METHOD FOR MANUFACTURING

SYSTEM AND METHODS OF MOLD/SUBSTRATE SEPARATION FOR IMPRINT LITHOGR...

FAST NANOIMPRINTING METHODS USING DEFORMABLE MOLD

System and Methods For Nano-Scale Manufacturing

FAST NANOIMPRINTING APPARATUS USING DEFORMALE MOLD

Method And Apparatus To Apply Surface Release Coating For Imprint Mold

Die Imprint By Double Side Force-Balanced Press For Step-And-Repeat...

IMPRINT LITHOGRAPHY WITH IMPROVED SUBSTRATE/MOLD SEPARATION

ALIGN-TRANSFER-IMPRINT SYSTEM FOR IMPRINT LITHOGRPHY

METHOD AND APPARATUS TO APPLY SURFACE RELEASE COATING FOR IMPRINT MOLD

DIE IMPRINT BY DOUBLE SIDE FORCE-BALANCED PRESS FOR STEP-AND-REPEAT...

IMPRINT LITHOGRAPHY WITH IMPROVED SUBSTRATE/MOLD SEPARATION

Apparatus for double-sided imprint lithography