Lin Xu

Person

Katy, TX, US

People

Patents Grantslast 30 patents

Information Patent Grant
Single crystal metal oxide plasma chamber component
- Patent number 12,249,490
- Issue date Mar 11, 2025
- Lam Research Corporation
- Lin Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Laminated aerosol deposition coating for aluminum components for pl...
- Patent number 12,198,902
- Issue date Jan 14, 2025
- Lam Research Corporation
- Lin Xu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for conditioning semiconductor processing chamber components
- Patent number 12,129,569
- Issue date Oct 29, 2024
- Lam Research Corporation
- Lin Xu
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Conditioning chamber component
- Patent number 12,064,795
- Issue date Aug 20, 2024
- Lam Research Corporation
- Amir A. Yasseri
- B08 - CLEANING
Information Patent Grant
Event-level data privacy for streaming post analytics data
- Patent number 11,968,236
- Issue date Apr 23, 2024
- Microsoft Technology Licensing, LLC
- Ryan M. Rogers
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Systems and methods to form airgaps
- Patent number 11,335,565
- Issue date May 17, 2022
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Quartz component with protective coating
- Patent number 11,087,961
- Issue date Aug 10, 2021
- Lam Research Corporation
- Lin Xu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Conditioning chamber component
- Patent number 10,967,407
- Issue date Apr 6, 2021
- Lam Research Corporation
- Amir A. Yasseri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods to form airgaps
- Patent number 10,615,047
- Issue date Apr 7, 2020
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Water-free etching methods
- Patent number 10,497,579
- Issue date Dec 3, 2019
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Water-free etching methods
- Patent number 10,468,267
- Issue date Nov 5, 2019
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Oxide etch selectivity systems and methods
- Patent number 10,424,463
- Issue date Sep 24, 2019
- Applied Materials, Inc.
- Lin Xu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Oxide etch selectivity systems and methods
- Patent number 10,424,464
- Issue date Sep 24, 2019
- Applied Materials, Inc.
- Lin Xu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Flow distribution plate for surface fluorine reduction
- Patent number 10,204,795
- Issue date Feb 12, 2019
- Applied Materials, Inc.
- Jiayin Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Removal methods for high aspect ratio structures
- Patent number 10,186,428
- Issue date Jan 22, 2019
- Applied Materials, Inc.
- Lin Xu
- B08 - CLEANING
Information Patent Grant
Method for conditioning silicon part
- Patent number 9,947,558
- Issue date Apr 17, 2018
- Lam Research Corporation
- Lin Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coating system and method for coating interior fluid wetted surface...
- Patent number 9,873,940
- Issue date Jan 23, 2018
- Lam Research Corporation
- Lin Xu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Removal methods for high aspect ratio structures
- Patent number 9,768,034
- Issue date Sep 19, 2017
- Applied Materials, Inc.
- Lin Xu
- B08 - CLEANING
Information Patent Grant
Selective etch for metal-containing materials
- Patent number 9,711,366
- Issue date Jul 18, 2017
- Applied Materials, Inc.
- Nitin K. Ingle
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dense oxide coated component of a plasma processing chamber and met...
- Patent number 9,546,432
- Issue date Jan 17, 2017
- Lam Research Corporation
- Hong Shih
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma-free metal etch
- Patent number 9,472,417
- Issue date Oct 18, 2016
- Applied Materials, Inc.
- Nitin K. Ingle
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Oxide etch selectivity systems and methods
- Patent number 9,349,605
- Issue date May 24, 2016
- Applied Materials, Inc.
- Lin Xu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Corrosion resistant aluminum coating on plasma chamber components
- Patent number 9,337,002
- Issue date May 10, 2016
- Lam Research Corporation
- John Daugherty
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Selective etch for metal-containing materials
- Patent number 9,299,582
- Issue date Mar 29, 2016
- Applied Materials, Inc.
- Nitin K. Ingle
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Titanium oxide etch
- Patent number 9,287,134
- Issue date Mar 15, 2016
- Applied Materials, Inc.
- Xikun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dense oxide coated component of a plasma processing chamber and met...
- Patent number 9,123,651
- Issue date Sep 1, 2015
- Lam Research Corporation
- Hong Shih
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SPARK PLASMA SINTERED COMPONENT FOR CRYO-PLASMA PROCESSING
- Publication number 20250191893
- Publication date Jun 12, 2025
- LAM RESEARCH CORPORATION
- Lin XU
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Application
YTTRIA COATING FOR PLASMA PROCESSING CHAMBER COMPONENTS
- Publication number 20250140528
- Publication date May 1, 2025
- LAM RESEARCH CORPORATION
- Jeremiah Michael DEDERICK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONDITIONING CHAMBER COMPONENT
- Publication number 20240383017
- Publication date Nov 21, 2024
- LAM RESEARCH CORPORATION
- Amir A. YASSERI
- B08 - CLEANING
Information Patent Application
TREATED CERAMIC CHAMBER PARTS
- Publication number 20240308926
- Publication date Sep 19, 2024
- LAM RESEARCH CORPORATION
- Amir A. YASSERI
- B24 - GRINDING POLISHING
Information Patent Application
YTTRIUM ALUMINUM PEROVSKITE (YAP) BASED COATINGS FOR SEMICONDUCTOR...
- Publication number 20240212991
- Publication date Jun 27, 2024
- LAM RESEARCH CORPORATION
- Eric A. PAPE
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
POLYMERIC COATING FOR SEMICONDUCTOR PROCESSING CHAMBER COMPONENTS
- Publication number 20240120180
- Publication date Apr 11, 2024
- LAM RESEARCH CORPORATION
- Yuanping SONG
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
CERAMIC COMPONENT WITH CHANNELS
- Publication number 20230411124
- Publication date Dec 21, 2023
- LAM RESEARCH CORPORATION
- John Michael KERNS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPARK PLASMA SINTERED COMPONENT FOR PLASMA PROCESSING CHAMBER
- Publication number 20230331633
- Publication date Oct 19, 2023
- LAM RESEARCH CORPORATION
- Lin XU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EROSION RESISTANT PLASMA PROCESSING CHAMBER COMPONENTS
- Publication number 20230317424
- Publication date Oct 5, 2023
- LAM RESEARCH CORPORATION
- Harmeet SINGH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EVENT-LEVEL DATA PRIVACY FOR STREAMING POST ANALYTICS DATA
- Publication number 20230319110
- Publication date Oct 5, 2023
- Microsoft Technology Licensing, LLC
- Ryan M. Rogers
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
REMOTE PLASMA SOURCE SHOWERHEAD ASSEMBLY WITH ALUMINUM FLUORIDE PLA...
- Publication number 20230282450
- Publication date Sep 7, 2023
- LAM RESEARCH CORPORATION
- Eric A. PAPE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEALING SURFACES OF COMPONENTS USED IN PLASMA ETCHING TOOLS USING A...
- Publication number 20230215703
- Publication date Jul 6, 2023
- LAM RESEARCH CORPORATION
- Robin KOSHY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR CONDITIONING SEMICONDUCTOR PROCESSING CHAMBER COMPONENTS
- Publication number 20230092570
- Publication date Mar 23, 2023
- LAM RESEARCH CORPORATION
- Lin XU
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
YTTRIUM ALUMINUM COATING FOR PLASMA PROCESSING CHAMBER COMPONENTS
- Publication number 20230088848
- Publication date Mar 23, 2023
- LAM RESEARCH CORPORATION
- Lin XU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOW TEMPERATURE SINTERED COATINGS FOR PLASMA CHAMBERS
- Publication number 20230020387
- Publication date Jan 19, 2023
- LAM RESEARCH CORPORATION
- David Joseph WETZEL
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SINGLE CRYSTAL METAL OXIDE PLASMA CHAMBER COMPONENT
- Publication number 20220392753
- Publication date Dec 8, 2022
- Lin XU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LAMINATED AEROSOL DEPOSITION COATING FOR ALUMINUM COMPONENTS FOR PL...
- Publication number 20220115214
- Publication date Apr 14, 2022
- LAM RESEARCH CORPORATION
- Lin XU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TEXTURED SILICON SEMICONDUCTOR PROCESSING CHAMBER COMPONENTS
- Publication number 20220093370
- Publication date Mar 24, 2022
- LAM RESEARCH CORPORATION
- Lin XU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING CHAMBER
- Publication number 20220002863
- Publication date Jan 6, 2022
- LAM RESEARCH CORPORATION
- Lin XU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
QUARTZ COMPONENT WITH PROTECTIVE COATING
- Publication number 20210343510
- Publication date Nov 4, 2021
- LAM RESEARCH CORPORATION
- Lin Xu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONDITIONING CHAMBER COMPONENT
- Publication number 20210205858
- Publication date Jul 8, 2021
- LAM RESEARCH CORPORATION
- Amir A. YASSERI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS TO FORM AIRGAPS
- Publication number 20200234971
- Publication date Jul 23, 2020
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
QUARTZ COMPONENT WITH PROTECTIVE COATING
- Publication number 20190272981
- Publication date Sep 5, 2019
- LAM RESEARCH CORPORATION
- Lin Xu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEMS AND METHODS TO FORM AIRGAPS
- Publication number 20190267248
- Publication date Aug 29, 2019
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WATER-FREE ETCHING METHODS
- Publication number 20180350619
- Publication date Dec 6, 2018
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WATER-FREE ETCHING METHODS
- Publication number 20180350617
- Publication date Dec 6, 2018
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONDITIONING CHAMBER COMPONENT
- Publication number 20180318890
- Publication date Nov 8, 2018
- LAM RESEARCH CORPORATION
- Amir A. YASSERI
- B08 - CLEANING
Information Patent Application
PLASMA ETCHING DEVICE WITH PLASMA ETCH RESISTANT COATING
- Publication number 20180144909
- Publication date May 24, 2018
- LAM RESEARCH CORPORATION
- Lihua Li HUANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REMOVAL METHODS FOR HIGH ASPECT RATIO STRUCTURES
- Publication number 20180138055
- Publication date May 17, 2018
- Applied Materials, Inc.
- Lin Xu
- B08 - CLEANING
Information Patent Application
COATING SYSTEM AND METHOD FOR COATING INTERIOR FLUID WETTED SURFACE...
- Publication number 20180127868
- Publication date May 10, 2018
- LAM RESEARCH CORPORATION
- Lin XU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Person

Patents Grantslast 30 patents

Single crystal metal oxide plasma chamber component

Laminated aerosol deposition coating for aluminum components for pl...

Method for conditioning semiconductor processing chamber components

Conditioning chamber component

Event-level data privacy for streaming post analytics data

Systems and methods to form airgaps

Quartz component with protective coating

Conditioning chamber component

Systems and methods to form airgaps

Water-free etching methods

Water-free etching methods

Oxide etch selectivity systems and methods

Oxide etch selectivity systems and methods

Flow distribution plate for surface fluorine reduction

Removal methods for high aspect ratio structures

Method for conditioning silicon part

Coating system and method for coating interior fluid wetted surface...

Removal methods for high aspect ratio structures

Selective etch for metal-containing materials

Dense oxide coated component of a plasma processing chamber and met...

Plasma-free metal etch

Oxide etch selectivity systems and methods

Corrosion resistant aluminum coating on plasma chamber components

Selective etch for metal-containing materials

Titanium oxide etch

Dense oxide coated component of a plasma processing chamber and met...

Patents Applicationslast 30 patents

SPARK PLASMA SINTERED COMPONENT FOR CRYO-PLASMA PROCESSING

YTTRIA COATING FOR PLASMA PROCESSING CHAMBER COMPONENTS

CONDITIONING CHAMBER COMPONENT

TREATED CERAMIC CHAMBER PARTS

YTTRIUM ALUMINUM PEROVSKITE (YAP) BASED COATINGS FOR SEMICONDUCTOR...

POLYMERIC COATING FOR SEMICONDUCTOR PROCESSING CHAMBER COMPONENTS

CERAMIC COMPONENT WITH CHANNELS

SPARK PLASMA SINTERED COMPONENT FOR PLASMA PROCESSING CHAMBER

EROSION RESISTANT PLASMA PROCESSING CHAMBER COMPONENTS

EVENT-LEVEL DATA PRIVACY FOR STREAMING POST ANALYTICS DATA

REMOTE PLASMA SOURCE SHOWERHEAD ASSEMBLY WITH ALUMINUM FLUORIDE PLA...

SEALING SURFACES OF COMPONENTS USED IN PLASMA ETCHING TOOLS USING A...

METHOD FOR CONDITIONING SEMICONDUCTOR PROCESSING CHAMBER COMPONENTS

YTTRIUM ALUMINUM COATING FOR PLASMA PROCESSING CHAMBER COMPONENTS

LOW TEMPERATURE SINTERED COATINGS FOR PLASMA CHAMBERS

SINGLE CRYSTAL METAL OXIDE PLASMA CHAMBER COMPONENT

LAMINATED AEROSOL DEPOSITION COATING FOR ALUMINUM COMPONENTS FOR PL...

TEXTURED SILICON SEMICONDUCTOR PROCESSING CHAMBER COMPONENTS

PLASMA PROCESSING CHAMBER

QUARTZ COMPONENT WITH PROTECTIVE COATING

CONDITIONING CHAMBER COMPONENT

SYSTEMS AND METHODS TO FORM AIRGAPS

QUARTZ COMPONENT WITH PROTECTIVE COATING

SYSTEMS AND METHODS TO FORM AIRGAPS

WATER-FREE ETCHING METHODS

WATER-FREE ETCHING METHODS

CONDITIONING CHAMBER COMPONENT

PLASMA ETCHING DEVICE WITH PLASMA ETCH RESISTANT COATING

REMOVAL METHODS FOR HIGH ASPECT RATIO STRUCTURES

COATING SYSTEM AND METHOD FOR COATING INTERIOR FLUID WETTED SURFACE...