Linus Jang

Person

Delmar, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Sidewall image transfer process for multiple gate width patterning
- Patent number 10,297,510
- Issue date May 21, 2019
- Internationel Business Machines Corporation
- Soon-Cheon Seo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dummy gate used as interconnection and method of making the same
- Patent number 10,283,505
- Issue date May 7, 2019
- GLOBALFOUNDRIES Inc.
- Wenhui Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Devices with chamfer-less vias multi-patterning and methods for for...
- Patent number 10,181,420
- Issue date Jan 15, 2019
- GLOBALFOUNDRIES Inc.
- Jason Eugene Stephens
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Removal of semiconductor growth defects
- Patent number 9,842,741
- Issue date Dec 12, 2017
- GLOBALFOUNDRIES Inc.
- Soon-cheon Seo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Replacement metal gate including dielectric gate material
- Patent number 9,653,573
- Issue date May 16, 2017
- International Business Machines Corporation
- Linus Jang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Freestanding spacer having sub-lithographic lateral dimension and m...
- Patent number 9,653,571
- Issue date May 16, 2017
- International Business Machines Corporation
- Hsueh-Chung Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dummy gate used as interconnection and method of making the same
- Patent number 9,595,478
- Issue date Mar 14, 2017
- GLOBALFOUNDRIES Inc.
- Wenhui Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Removal of semiconductor growth defects
- Patent number 9,496,257
- Issue date Nov 15, 2016
- International Business Machines Corporation
- Soon-cheon Seo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of patterning features having differing widths
- Patent number 9,466,505
- Issue date Oct 11, 2016
- GLOBALFOUNDRIES Inc.
- Linus Jang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming features having differing pitch spacing and crit...
- Patent number 9,449,835
- Issue date Sep 20, 2016
- GLOBALFOUNDRIES Inc.
- Linus Jang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming integrated circuits and multiple critical dimens...
- Patent number 9,431,264
- Issue date Aug 30, 2016
- GLOBALFOUNDRIES, INC.
- Linus Jang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of patterning features having differing widths
- Patent number 9,214,360
- Issue date Dec 15, 2015
- GLOBALFOUNDRIES Inc.
- Linus Jang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for fabricating integrated circuits including selectively f...
- Patent number 9,209,037
- Issue date Dec 8, 2015
- GLOBALFOUNDRIES, INC.
- Jason Richard Cantone
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for fabricating integrated circuits using self-aligned quad...
- Patent number 9,209,038
- Issue date Dec 8, 2015
- GLOBALFOUNDRIES, INC.
- Jason Richard Cantone
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming gate structures for semiconductor devices using...
- Patent number 9,184,263
- Issue date Nov 10, 2015
- GLOBALFOUNDRIES Inc.
- Xiuyu Cai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming trench/hole type features in a layer of material...
- Patent number 8,871,649
- Issue date Oct 28, 2014
- GLOBALFOUNDRIES Inc.
- Linus Jang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
FinFET formation using double patterning memorization
- Patent number 8,716,094
- Issue date May 6, 2014
- Global Foundries Inc.
- Chang Seo Park
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
DEVICES WITH CHAMFER-LESS VIAS MULTI-PATTERNING AND METHODS FOR FOR...
- Publication number 20180226294
- Publication date Aug 9, 2018
- GLOBALFOUNDRIES INC.
- Jason Eugene STEPHENS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUMMY GATE USED AS INTERCONNECTION AND METHOD OF MAKING THE SAME
- Publication number 20170141110
- Publication date May 18, 2017
- GLOBALFOUNDRIES INC.
- Wenhui WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REMOVAL OF SEMICONDUCTOR GROWTH DEFECTS
- Publication number 20170076954
- Publication date Mar 16, 2017
- International Business Machines Corporation
- Soon-cheon Seo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUMMY GATE USED AS INTERCONNECTION AND METHOD OF MAKING THE SAME
- Publication number 20160365288
- Publication date Dec 15, 2016
- GLOBALFOUNDRIES INC.
- Wenhui WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FREESTANDING SPACER HAVING SUB-LITHOGRAPHIC LATERAL DIMENSION AND M...
- Publication number 20160365425
- Publication date Dec 15, 2016
- International Business Machines Corporation
- Hsueh-Chung Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHY STACK AND METHOD
- Publication number 20160336172
- Publication date Nov 17, 2016
- GLOBALFOUNDRIES INC.
- Linus JANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REPLACEMENT METAL GATE INCLUDING DIELECTRIC GATE MATERIAL
- Publication number 20160172467
- Publication date Jun 16, 2016
- International Business Machines Corporation
- Linus Jang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FORMING FEATURES HAVING DIFFERING PITCH SPACING AND CRIT...
- Publication number 20160163555
- Publication date Jun 9, 2016
- GLOBALFOUNDRIES INC.
- Linus Jang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF PATTERNING FEATURES HAVING DIFFERING WIDTHS
- Publication number 20160064236
- Publication date Mar 3, 2016
- GLOBALFOUNDRIES INC.
- Linus Jang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REMOVAL OF SEMICONDUCTOR GROWTH DEFECTS
- Publication number 20150380405
- Publication date Dec 31, 2015
- GLOBALFOUNDRIES INC.
- Soon-cheon Seo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REPLACEMENT METAL GATE INCLUDING DIELECTRIC GATE MATERIAL
- Publication number 20150357434
- Publication date Dec 10, 2015
- International Business Machines Corporation
- Linus Jang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FABRICATING INTEGRATED CIRCUITS USING SELF-ALIGNED QUAD...
- Publication number 20150318181
- Publication date Nov 5, 2015
- GLOBALFOUNDRIES, Inc.
- Jason Richard Cantone
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FABRICATING INTEGRATED CIRCUITS INCLUDING SELECTIVELY F...
- Publication number 20150255299
- Publication date Sep 10, 2015
- GLOBALFOUNDRIES, Inc.
- Jason Richard Cantone
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REPLACEMENT METAL GATE INCLUDING DIELECTRIC GATE MATERIAL
- Publication number 20150214331
- Publication date Jul 30, 2015
- GLOBALFOUNDRIES INC.
- Linus Jang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FORMING GATE STRUCTURES FOR SEMICONDUCTOR DEVICES USING...
- Publication number 20150187905
- Publication date Jul 2, 2015
- GLOBALFOUNDRIES INC.
- Xiuyu Cai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FORMING INTEGRATED CIRCUITS AND MULTIPLE CRITICAL DIMENS...
- Publication number 20150064912
- Publication date Mar 5, 2015
- GLOBALFOUNDRIES, Inc.
- Linus Jang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF PATTERNING FEATURES HAVING DIFFERING WIDTHS
- Publication number 20140329388
- Publication date Nov 6, 2014
- International Business Machines Corporation
- Linus Jang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FORMING TRENCH/HOLE TYPE FEATURES IN A LAYER OF MATERIAL...
- Publication number 20140273443
- Publication date Sep 18, 2014
- GLOBALFOUNDRIES INC.
- Linus Jang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FINFET FORMATION USING DOUBLE PATTERNING MEMORIZATION
- Publication number 20140141605
- Publication date May 22, 2014
- GLOBALFOUNDRIES INC.
- Chang Seo PARK
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Sidewall image transfer process for multiple gate width patterning

Dummy gate used as interconnection and method of making the same

Devices with chamfer-less vias multi-patterning and methods for for...

Removal of semiconductor growth defects

Replacement metal gate including dielectric gate material

Freestanding spacer having sub-lithographic lateral dimension and m...

Dummy gate used as interconnection and method of making the same

Removal of semiconductor growth defects

Methods of patterning features having differing widths

Methods of forming features having differing pitch spacing and crit...

Methods of forming integrated circuits and multiple critical dimens...

Methods of patterning features having differing widths

Methods for fabricating integrated circuits including selectively f...

Methods for fabricating integrated circuits using self-aligned quad...

Methods of forming gate structures for semiconductor devices using...

Methods of forming trench/hole type features in a layer of material...

FinFET formation using double patterning memorization

Patents Applicationslast 30 patents

DEVICES WITH CHAMFER-LESS VIAS MULTI-PATTERNING AND METHODS FOR FOR...

DUMMY GATE USED AS INTERCONNECTION AND METHOD OF MAKING THE SAME

REMOVAL OF SEMICONDUCTOR GROWTH DEFECTS

DUMMY GATE USED AS INTERCONNECTION AND METHOD OF MAKING THE SAME

FREESTANDING SPACER HAVING SUB-LITHOGRAPHIC LATERAL DIMENSION AND M...

LITHOGRAPHY STACK AND METHOD

REPLACEMENT METAL GATE INCLUDING DIELECTRIC GATE MATERIAL

METHODS OF FORMING FEATURES HAVING DIFFERING PITCH SPACING AND CRIT...

METHODS OF PATTERNING FEATURES HAVING DIFFERING WIDTHS

REMOVAL OF SEMICONDUCTOR GROWTH DEFECTS

REPLACEMENT METAL GATE INCLUDING DIELECTRIC GATE MATERIAL

METHODS FOR FABRICATING INTEGRATED CIRCUITS USING SELF-ALIGNED QUAD...

METHODS FOR FABRICATING INTEGRATED CIRCUITS INCLUDING SELECTIVELY F...

REPLACEMENT METAL GATE INCLUDING DIELECTRIC GATE MATERIAL

METHODS OF FORMING GATE STRUCTURES FOR SEMICONDUCTOR DEVICES USING...

METHODS OF FORMING INTEGRATED CIRCUITS AND MULTIPLE CRITICAL DIMENS...

METHODS OF PATTERNING FEATURES HAVING DIFFERING WIDTHS

METHODS OF FORMING TRENCH/HOLE TYPE FEATURES IN A LAYER OF MATERIAL...

FINFET FORMATION USING DOUBLE PATTERNING MEMORIZATION