Lior Huli

Person

Delmar, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Directed self-assembly
- Patent number 12,216,400
- Issue date Feb 4, 2025
- Tokyo Electron Limited
- Lior Huli
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Fabricating three-dimensional semiconductor structures
- Patent number 12,193,231
- Issue date Jan 7, 2025
- Tokyo Electron Limited
- Soo Doo Chae
Information Patent Grant
Methods for forming self-aligned contacts using spin-on silicon car...
- Patent number 12,080,599
- Issue date Sep 3, 2024
- Tokyo Electron Limited
- Junling Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Point-of-use blending of rinse solutions to mitigate pattern collapse
- Patent number 11,762,297
- Issue date Sep 19, 2023
- Tokyo Electron Limited
- Lior Huli
- B08 - CLEANING
Information Patent Grant
Methods for forming self-aligned contacts using spin-on silicon car...
- Patent number 11,482,454
- Issue date Oct 25, 2022
- Tokyo Electron Limited
- Junling Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Point-of-use dynamic concentration delivery system with high flow a...
- Patent number 11,383,211
- Issue date Jul 12, 2022
- Tokyo Electron Limited
- Ronald W. Nasman
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Plasma treatment method to enhance surface adhesion for lithography
- Patent number 11,243,465
- Issue date Feb 8, 2022
- Tokyo Electron Limited
- Wanjae Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extreme ultra-violet sensitivity reduction using shrink and growth...
- Patent number 10,935,889
- Issue date Mar 2, 2021
- Tokyo Electron Limited
- Lior Huli
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Selective atomic layer deposition (ALD) of protective caps to enhan...
- Patent number 10,770,294
- Issue date Sep 8, 2020
- Tokyo Electron Limited
- David O'Meara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dispense nozzle with a shielding device
- Patent number 10,685,857
- Issue date Jun 16, 2020
- Tokyo Electron Limited
- Ronald Nasman
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
High-purity dispense system
- Patent number 10,403,501
- Issue date Sep 3, 2019
- Tokyo Electron Limited
- Anton J. deVilliers
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
High-precision dispense system with meniscus control
- Patent number 10,354,872
- Issue date Jul 16, 2019
- Tokyo Electron Limited
- Anton J. deVilliers
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Methods of spin-on deposition of metal oxides
- Patent number 10,141,183
- Issue date Nov 27, 2018
- Tokyo Electron Limited
- Nihar Mohanty
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for etch-based planarization of a substrate
- Patent number 9,991,133
- Issue date Jun 5, 2018
- Tokyo Electron Limited
- Cheryl Pereira
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
EUV resist etch durability improvement and pattern collapse mitigation
- Patent number 9,791,779
- Issue date Oct 17, 2017
- Tokyo Electron Limited
- Lior Huli
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate backside texturing
- Patent number 9,711,419
- Issue date Jul 18, 2017
- Tokyo Electron Limited
- Carlos A. Fonseca
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate backside texturing
- Patent number 9,281,251
- Issue date Mar 8, 2016
- Tokyo Electron Limited
- Carlos A Fonseca
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV resist sensitivity reduction
- Patent number 9,086,631
- Issue date Jul 21, 2015
- Tokyo Electron Limited
- Lior Huli
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Track processing to remove organic films in directed self-assembly...
- Patent number 8,975,009
- Issue date Mar 10, 2015
- Tokyo Electron Limited
- Mark H. Somervell
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR AREA SELECTIVE DEPOSITION ON EXTREME ULTRA-VIOLET (EUV)...
- Publication number 20250093778
- Publication date Mar 20, 2025
- TOKYO ELECTRON LIMITED
- Lior Huli
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FABRICATING THREE-DIMENSIONAL SEMICONDUCTOR STRUCTURES
- Publication number 20240147719
- Publication date May 2, 2024
- TOKYO ELECTRON LIMITED
- Soo Doo Chae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POINT-OF-USE BLENDING OF RINSE SOLUTIONS FOR EUV PROCESSING TO MITI...
- Publication number 20230324808
- Publication date Oct 12, 2023
- TOKYO ELECTRON LIMITED
- Lior Huli
- B08 - CLEANING
Information Patent Application
PROVIDING A BARRIER LAYER FOR PHOTORESIST PROCESSING
- Publication number 20230259030
- Publication date Aug 17, 2023
- TOKYO ELECTRON LIMITED
- Michael Carcasi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Hybrid Development of EUV Resists
- Publication number 20230078946
- Publication date Mar 16, 2023
- TOKYO ELECTRON LIMITED
- Steven Grzeskowiak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for Forming Self-Aligned Contacts Using Spin-on Silicon Car...
- Publication number 20230044047
- Publication date Feb 9, 2023
- TOKYO ELECTRON LIMITED
- Junling Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE FILM FORMATION USING A SELF-ASSEMBLED MONOLAYER
- Publication number 20230009688
- Publication date Jan 12, 2023
- TOKYO ELECTRON LIMITED
- Dina H. Triyoso
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Point of Use Solvent Mixing for Film Removal
- Publication number 20220334485
- Publication date Oct 20, 2022
- TOKYO ELECTRON LIMITED
- Lior Huli
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for Forming Self-Aligned Contacts Using Spin-on Silicon Car...
- Publication number 20220262679
- Publication date Aug 18, 2022
- TOKYO ELECTRON LIMITED
- Junling Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIRECTED SELF-ASSEMBLY
- Publication number 20220236639
- Publication date Jul 28, 2022
- TOKYO ELECTRON LIMITED
- Lior Huli
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
FABRICATING THREE-DIMENSIONAL SEMICONDUCTOR STRUCTURES
- Publication number 20220115399
- Publication date Apr 14, 2022
- TOKYO ELECTRON LIMITED
- Soo Doo Chae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POINT-OF-USE DYNAMIC CONCENTRATION DELIVERY SYSTEM WITH HIGH FLOW A...
- Publication number 20200338510
- Publication date Oct 29, 2020
- TOKYO ELECTRON LIMITED
- Ronald W. NASMAN
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
POINT-OF-USE BLENDING OF RINSE SOLUTIONS TO MITIGATE PATTERN COLLAPSE
- Publication number 20200326628
- Publication date Oct 15, 2020
- TOKYO ELECTRON LIMITED
- Lior Huli
- B08 - CLEANING
Information Patent Application
SELECTIVE ATOMIC LAYER DEPOSITION (ALD) OF PROTECTIVE CAPS TO ENHAN...
- Publication number 20190393035
- Publication date Dec 26, 2019
- TOKYO ELECTRON LIMITED
- David O'Meara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Treatment Method To Enhance Surface Adhesion For Lithography
- Publication number 20190187556
- Publication date Jun 20, 2019
- TOKYO ELECTRON LIMITED
- Wanjae Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DISPENSE NOZZLE WITH A SHIELDING DEVICE
- Publication number 20180254202
- Publication date Sep 6, 2018
- TOKYO ELECTRON LIMITED
- Ronald Nasman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ETCH-BASED PLANARIZATION OF A SUBSTRATE
- Publication number 20180047584
- Publication date Feb 15, 2018
- TOKYO ELECTRON LIMITED
- Cheryl Pereira
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High-Precision Dispense System With Meniscus Control
- Publication number 20180047563
- Publication date Feb 15, 2018
- TOKYO ELECTRON LIMITED
- Anton J. deVilliers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High-Purity Dispense System
- Publication number 20180047562
- Publication date Feb 15, 2018
- TOKYO ELECTRON LIMITED
- Anton J. deVilliers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of Spin-on Deposition of Metal Oxides
- Publication number 20170221704
- Publication date Aug 3, 2017
- TOKYO ELECTRON LIMITED
- Nihar Mohanty
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DISPENSE NOZZLE WITH A SHIELDING DEVICE
- Publication number 20170110345
- Publication date Apr 20, 2017
- TOKYO ELECTRON LIMITED
- Ronald Nasman
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
EXTREME ULTRA-VIOLET SENSITIVITY REDUCTION USING SHRINK AND GROWTH...
- Publication number 20160334709
- Publication date Nov 17, 2016
- TOKYO ELECTRON LIMITED
- Lior Huli
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE BACKSIDE TEXTURING
- Publication number 20160141169
- Publication date May 19, 2016
- TOKYO ELECTRON LIMITED
- Carlos A. Fonseca
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EUV RESIST ETCH DURABILITY IMPROVEMENT AND PATTERN COLLAPSE MITIGATION
- Publication number 20160109804
- Publication date Apr 21, 2016
- TOKYO ELECTRON LIMITED
- Lior Huli
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE BACKSIDE TEXTURING
- Publication number 20160043007
- Publication date Feb 11, 2016
- TOKYO ELECTRON LIMITED
- Carlos A. Fonseca
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE BACKSIDE TEXTURING
- Publication number 20150044785
- Publication date Feb 12, 2015
- TOKYO ELECTRON LIMITED
- Carlos A. FONSECA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EUV RESIST SENSITIVITY REDUCTION
- Publication number 20140315135
- Publication date Oct 23, 2014
- LIOR HULI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TRACK PROCESSING TO REMOVE ORGANIC FILMS IN DIRECTED SELF-ASSEMBLY...
- Publication number 20140273472
- Publication date Sep 18, 2014
- TOKYO ELECTRON LIMITED
- Mark H. Somervell
- B82 - NANO-TECHNOLOGY

Person

Patents Grantslast 30 patents

Directed self-assembly

Fabricating three-dimensional semiconductor structures

Methods for forming self-aligned contacts using spin-on silicon car...

Point-of-use blending of rinse solutions to mitigate pattern collapse

Methods for forming self-aligned contacts using spin-on silicon car...

Point-of-use dynamic concentration delivery system with high flow a...

Plasma treatment method to enhance surface adhesion for lithography

Extreme ultra-violet sensitivity reduction using shrink and growth...

Selective atomic layer deposition (ALD) of protective caps to enhan...

Dispense nozzle with a shielding device

High-purity dispense system

High-precision dispense system with meniscus control

Methods of spin-on deposition of metal oxides

Method for etch-based planarization of a substrate

EUV resist etch durability improvement and pattern collapse mitigation

Substrate backside texturing

Substrate backside texturing

EUV resist sensitivity reduction

Track processing to remove organic films in directed self-assembly...

Patents Applicationslast 30 patents

METHOD FOR AREA SELECTIVE DEPOSITION ON EXTREME ULTRA-VIOLET (EUV)...

FABRICATING THREE-DIMENSIONAL SEMICONDUCTOR STRUCTURES

POINT-OF-USE BLENDING OF RINSE SOLUTIONS FOR EUV PROCESSING TO MITI...

PROVIDING A BARRIER LAYER FOR PHOTORESIST PROCESSING

Hybrid Development of EUV Resists

Methods for Forming Self-Aligned Contacts Using Spin-on Silicon Car...

SELECTIVE FILM FORMATION USING A SELF-ASSEMBLED MONOLAYER

Point of Use Solvent Mixing for Film Removal

Methods for Forming Self-Aligned Contacts Using Spin-on Silicon Car...

DIRECTED SELF-ASSEMBLY

FABRICATING THREE-DIMENSIONAL SEMICONDUCTOR STRUCTURES

POINT-OF-USE DYNAMIC CONCENTRATION DELIVERY SYSTEM WITH HIGH FLOW A...

POINT-OF-USE BLENDING OF RINSE SOLUTIONS TO MITIGATE PATTERN COLLAPSE

SELECTIVE ATOMIC LAYER DEPOSITION (ALD) OF PROTECTIVE CAPS TO ENHAN...

Plasma Treatment Method To Enhance Surface Adhesion For Lithography

DISPENSE NOZZLE WITH A SHIELDING DEVICE

METHOD FOR ETCH-BASED PLANARIZATION OF A SUBSTRATE

High-Precision Dispense System With Meniscus Control

High-Purity Dispense System

Methods of Spin-on Deposition of Metal Oxides

DISPENSE NOZZLE WITH A SHIELDING DEVICE

EXTREME ULTRA-VIOLET SENSITIVITY REDUCTION USING SHRINK AND GROWTH...

SUBSTRATE BACKSIDE TEXTURING

EUV RESIST ETCH DURABILITY IMPROVEMENT AND PATTERN COLLAPSE MITIGATION

SUBSTRATE BACKSIDE TEXTURING

SUBSTRATE BACKSIDE TEXTURING

EUV RESIST SENSITIVITY REDUCTION

TRACK PROCESSING TO REMOVE ORGANIC FILMS IN DIRECTED SELF-ASSEMBLY...