Liran Yerushalmi

Person

Yaacob, IL

People

Patents Grantslast 30 patents

Information Patent Grant
Systems and methods for improved metrology for semiconductor device...
- Patent number 12,131,959
- Issue date Oct 29, 2024
- KLA Corporation
- Liran Yerushalmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reducing device overlay errors
- Patent number 11,971,664
- Issue date Apr 30, 2024
- KLA-Tencor Corporation
- Liran Yerushalmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-calibrating overlay metrology
- Patent number 11,880,142
- Issue date Jan 23, 2024
- KLA Corporation
- Stilian Pandev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measurement of overlay error using device inspection system
- Patent number 11,784,097
- Issue date Oct 10, 2023
- KLA-Tencor Corporation
- Choon Hoong Hoo
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Device-like metrology targets
- Patent number 11,709,433
- Issue date Jul 25, 2023
- KLA-Tencor Corporation
- Vladimir Levinski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measurement of properties of patterned photoresist
- Patent number 11,644,419
- Issue date May 9, 2023
- KLA Corporation
- Roie Volkovich
- G01 - MEASURING TESTING
Information Patent Grant
Systems and methods for feedforward process control in the manufact...
- Patent number 11,635,682
- Issue date Apr 25, 2023
- KLA Corporation
- Roie Volkovich
- G01 - MEASURING TESTING
Information Patent Grant
Self-calibrated overlay metrology using a skew training sample
- Patent number 11,604,063
- Issue date Mar 14, 2023
- KLA Corporation
- Stilian Pandev
- G01 - MEASURING TESTING
Information Patent Grant
Self-calibrating overlay metrology
- Patent number 11,604,420
- Issue date Mar 14, 2023
- KLA Corporation
- Stilian Pandev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Misregistration target having device-scaled features useful in meas...
- Patent number 11,532,566
- Issue date Dec 20, 2022
- KLA Corporation
- Roie Volkovich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device-like overlay metrology targets displaying Moiré effects
- Patent number 11,355,375
- Issue date Jun 7, 2022
- KLA Corporation
- Roie Volkovich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for error reduction for metrology measurements
- Patent number 11,353,799
- Issue date Jun 7, 2022
- Roie Volkovich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for measuring and correcting misregistration between layers...
- Patent number 11,302,544
- Issue date Apr 12, 2022
- KLA-Tencor Corporation
- Roie Volkovich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Misregistration measurements using combined optical and electron be...
- Patent number 11,075,126
- Issue date Jul 27, 2021
- KLA-Tencor Corporation
- Roie Volkovich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device metrology targets and methods
- Patent number 11,054,752
- Issue date Jul 6, 2021
- KLA Corporation
- Eran Amit
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measurement of overlay error using device inspection system
- Patent number 10,943,838
- Issue date Mar 9, 2021
- KLA-Tencor Corporation
- Choon Hoong Hoo
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Recipe optimization based zonal analysis
- Patent number 10,763,146
- Issue date Sep 1, 2020
- KLA-Tencor Corporation
- Roie Volkovich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optimizing the utilization of metrology tools
- Patent number 10,725,385
- Issue date Jul 28, 2020
- KLA-Tencor Corporation
- Tsachy Holovinger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device metrology targets and methods
- Patent number 10,571,811
- Issue date Feb 25, 2020
- KLA-Tencor Corporation
- Eran Amit
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology targets with supplementary structures in an intermediate...
- Patent number 10,551,749
- Issue date Feb 4, 2020
- KLA-Tencor Corporation
- Vladimir Levinski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Overlay control with non-zero offset prediction
- Patent number 10,409,171
- Issue date Sep 10, 2019
- KLA-Tencor Corporation
- Michael E. Adel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography systems with integrated metrology tools having enhanced...
- Patent number 10,331,050
- Issue date Jun 25, 2019
- KLA-Tencor Corporation
- Eran Amit
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimizing the utilization of metrology tools
- Patent number 10,095,121
- Issue date Oct 9, 2018
- KLA-Tencor Corporation
- Tsachy Holovinger
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SELF-CALIBRATING OVERLAY METROLOGY
- Publication number 20230221656
- Publication date Jul 13, 2023
- KLA Corporation
- Stilian Pandev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Continuous Machine Learning Model Training for Semiconductor Manufa...
- Publication number 20230128610
- Publication date Apr 27, 2023
- KLA Corporation
- Liran Yerushalmi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SELF-CALIBRATED OVERLAY METROLOGY USING A SKEW TRAINING SAMPLE
- Publication number 20220412734
- Publication date Dec 29, 2022
- Stilian Pandev
- G01 - MEASURING TESTING
Information Patent Application
SELF-CALIBRATING OVERLAY METROLOGY
- Publication number 20220357673
- Publication date Nov 10, 2022
- Stilian Pandev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR IMPROVED METROLOGY FOR SEMICONDUCTOR DEVICE...
- Publication number 20220344218
- Publication date Oct 27, 2022
- KLA Corporation
- Liran Yerushalmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEASUREMENT OF PROPERTIES OF PATTERNED PHOTORESIST
- Publication number 20220236181
- Publication date Jul 28, 2022
- KLA Corporation
- Roie Volkovich
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR MEASURING AND CORRECTING MISREGISTRATION BETWEEN LAYERS...
- Publication number 20220199437
- Publication date Jun 23, 2022
- KLA-Tencor Corporation
- Roie Volkovich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE-LIKE METROLOGY TARGETS
- Publication number 20220197152
- Publication date Jun 23, 2022
- KLA-Tencor Corporation
- Vladimir Levinski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and Method for Error Reduction for Metrology Measurements
- Publication number 20220155693
- Publication date May 19, 2022
- KLA Corporation
- Roie Volkovich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTER-STEP FEEDFORWARD PROCESS CONTROL IN THE MANUFACTURE OF SEMICO...
- Publication number 20220026798
- Publication date Jan 27, 2022
- KLA Corporation
- ROIE VOLKOVICH
- G05 - CONTROLLING REGULATING
Information Patent Application
DEVICE-LIKE OVERLAY METROLOGY TARGETS DISPLAYING MOIRÉ EFFECTS
- Publication number 20220020625
- Publication date Jan 20, 2022
- KLA Corporation
- Roie Volkovich
- G01 - MEASURING TESTING
Information Patent Application
Misregistration Target Having Device-Scaled Features Useful in Meas...
- Publication number 20220013468
- Publication date Jan 13, 2022
- KLA Corporation
- Roie Volkovich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR FEEDFORWARD PROCESS CONTROL IN THE MANUFACT...
- Publication number 20220004096
- Publication date Jan 6, 2022
- KLA Corporation
- Roie VOLKOVICH
- G01 - MEASURING TESTING
Information Patent Application
Measurement of Overlay Error Using Device Inspection System
- Publication number 20210159128
- Publication date May 27, 2021
- KLA-Tencor Corporation
- Choon Hoong Hoo
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR MEASURING AND CORRECTING MISREGISTRATION BETWEEN LAYERS...
- Publication number 20200312687
- Publication date Oct 1, 2020
- KLA-Tencor Corporation
- Roie Volkovich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Misregistration Measurements Using Combined Optical and Electron Be...
- Publication number 20200266112
- Publication date Aug 20, 2020
- KLA-Tencor Corporation
- Roie Volkovich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE-LIKE METROLOGY TARGETS
- Publication number 20200124981
- Publication date Apr 23, 2020
- KLA-Tencor Corporation
- Vladimir Levinski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reducing Device Overlay Errors
- Publication number 20200033737
- Publication date Jan 30, 2020
- KLA-Tencor Corporation
- Liran Yerushalmi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Measurement of Overlay Error Using Device Inspection System
- Publication number 20190252270
- Publication date Aug 15, 2019
- KLA-Tencor Corporation
- Choon Hoong Hoo
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Recipe Optimization Based Zonal Analysis
- Publication number 20190088514
- Publication date Mar 21, 2019
- KLA-Tencor Corporation
- Roie VOLKOVICH
- G01 - MEASURING TESTING
Information Patent Application
DEVICE METROLOGY TARGETS AND METHODS
- Publication number 20190004438
- Publication date Jan 3, 2019
- KLA-Tencor Corporation
- Eran Amit
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTIMIZING THE UTILIZATION OF METROLOGY TOOLS
- Publication number 20180348649
- Publication date Dec 6, 2018
- KLA-Tencor Corporation
- Tsachy Holovinger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Lithography Systems with Integrated Metrology Tools Having Enhanced...
- Publication number 20180299791
- Publication date Oct 18, 2018
- KLA-Tencor Corporation
- Eran Amit
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Overlay Control with Non-Zero Offset Prediction
- Publication number 20180253017
- Publication date Sep 6, 2018
- KLA-Tencor Corporation
- Michael E. Adel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Device-Like Metrology Targets
- Publication number 20180188663
- Publication date Jul 5, 2018
- KLA-Tencor Corporation
- Vladimir Levinski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVICE METROLOGY TARGETS AND METHODS
- Publication number 20160266505
- Publication date Sep 15, 2016
- KLA-Tencor Corporation
- Eran Amit
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTIMIZING THE UTILIZATION OF METROLOGY TOOLS
- Publication number 20160131983
- Publication date May 12, 2016
- KLA-Tencor Corporation
- Tsachy Holovinger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Liran Yerushalmi

Person

Patents Grantslast 30 patents

Systems and methods for improved metrology for semiconductor device...

Reducing device overlay errors

Self-calibrating overlay metrology

Measurement of overlay error using device inspection system

Device-like metrology targets

Measurement of properties of patterned photoresist

Systems and methods for feedforward process control in the manufact...

Self-calibrated overlay metrology using a skew training sample

Self-calibrating overlay metrology

Misregistration target having device-scaled features useful in meas...

Device-like overlay metrology targets displaying Moiré effects

System and method for error reduction for metrology measurements

Method for measuring and correcting misregistration between layers...

Misregistration measurements using combined optical and electron be...

Device metrology targets and methods

Measurement of overlay error using device inspection system

Recipe optimization based zonal analysis

Optimizing the utilization of metrology tools

Device metrology targets and methods

Metrology targets with supplementary structures in an intermediate...

Overlay control with non-zero offset prediction

Lithography systems with integrated metrology tools having enhanced...

Optimizing the utilization of metrology tools

Patents Applicationslast 30 patents

SELF-CALIBRATING OVERLAY METROLOGY

Continuous Machine Learning Model Training for Semiconductor Manufa...

SELF-CALIBRATED OVERLAY METROLOGY USING A SKEW TRAINING SAMPLE

SELF-CALIBRATING OVERLAY METROLOGY

SYSTEMS AND METHODS FOR IMPROVED METROLOGY FOR SEMICONDUCTOR DEVICE...

MEASUREMENT OF PROPERTIES OF PATTERNED PHOTORESIST

METHOD FOR MEASURING AND CORRECTING MISREGISTRATION BETWEEN LAYERS...

DEVICE-LIKE METROLOGY TARGETS

System and Method for Error Reduction for Metrology Measurements

INTER-STEP FEEDFORWARD PROCESS CONTROL IN THE MANUFACTURE OF SEMICO...

DEVICE-LIKE OVERLAY METROLOGY TARGETS DISPLAYING MOIRÉ EFFECTS

Misregistration Target Having Device-Scaled Features Useful in Meas...

SYSTEMS AND METHODS FOR FEEDFORWARD PROCESS CONTROL IN THE MANUFACT...

Measurement of Overlay Error Using Device Inspection System

METHOD FOR MEASURING AND CORRECTING MISREGISTRATION BETWEEN LAYERS...

Misregistration Measurements Using Combined Optical and Electron Be...

DEVICE-LIKE METROLOGY TARGETS

Reducing Device Overlay Errors

Measurement of Overlay Error Using Device Inspection System

Recipe Optimization Based Zonal Analysis

DEVICE METROLOGY TARGETS AND METHODS

OPTIMIZING THE UTILIZATION OF METROLOGY TOOLS

Lithography Systems with Integrated Metrology Tools Having Enhanced...

Overlay Control with Non-Zero Offset Prediction

Device-Like Metrology Targets

DEVICE METROLOGY TARGETS AND METHODS

OPTIMIZING THE UTILIZATION OF METROLOGY TOOLS