Mahalingam VENKATESAN

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Patterning of magnetic thin film using energized ions
- Patent number 9,263,078
- Issue date Feb 16, 2016
- Applied Materials, Inc.
- Steven Verhaverbeke
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Patterning of magnetic thin film using energized ions and thermal e...
- Patent number 8,551,578
- Issue date Oct 8, 2013
- Applied Materials, Inc.
- Omkaram Nalamasu
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Patterning of magnetic thin film using energized ions
- Patent number 8,535,766
- Issue date Sep 17, 2013
- Applied Materials, Inc.
- Steven Verhaverbeke
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas inlets for wafer processing chamber
- Patent number 6,500,734
- Issue date Dec 31, 2002
- Applied Materials, Inc.
- Roger N. Anderson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Depositing polysilicon films having improved uniformity and apparat...
- Patent number 6,402,850
- Issue date Jun 11, 2002
- Applied Materials, Inc.
- Israel Beinglass
- C30 - CRYSTAL GROWTH
Information Patent Grant
Integrated tungsten-silicide processes
- Patent number 6,284,650
- Issue date Sep 4, 2001
- Applied Materials, Inc.
- Cory M. Czarnik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Susceptor for deposition apparatus
- Patent number 6,146,464
- Issue date Nov 14, 2000
- Applied Materials, Inc.
- Israel Beinglass
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for processing the upper and lower faces of a...
- Patent number 6,113,703
- Issue date Sep 5, 2000
- Applied Materials, Inc.
- Roger N. Anderson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition of silicon nitride thin films
- Patent number 5,932,286
- Issue date Aug 3, 1999
- Applied Materials, Inc.
- Israel Beinglass
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas inlets for wafer processing chamber
- Patent number 5,916,369
- Issue date Jun 29, 1999
- Applied Materials, Inc.
- Roger N. Anderson
- C30 - CRYSTAL GROWTH
Information Patent Grant
Method of forming doped silicon in high aspect ratio openings
- Patent number 5,863,598
- Issue date Jan 26, 1999
- Applied Materials, Inc.
- Mahalingam Venkatesan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process of depositing a layer of material on a wafer with susceptor...
- Patent number 5,834,059
- Issue date Nov 10, 1998
- Applied Materials, Inc.
- Roger N. Anderson
- C30 - CRYSTAL GROWTH
Information Patent Grant
Semiconductor wafer process chamber with susceptor back coating
- Patent number 5,725,673
- Issue date Mar 10, 1998
- Applied Materials Inc.
- Roger N. Anderson
- C30 - CRYSTAL GROWTH
Information Patent Grant
Method of enhancing step coverage of polysilicon deposits
- Patent number 5,695,819
- Issue date Dec 9, 1997
- Applied Materials, Inc.
- Israel Beinglass
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Susceptor for deposition apparatus
- Patent number 5,645,646
- Issue date Jul 8, 1997
- Applied Materials, Inc.
- Israel Beinglass
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor wafer process chamber with suspector back coating
- Patent number 5,599,397
- Issue date Feb 4, 1997
- Applied Materials Inc.
- Roger N. Anderson
- C30 - CRYSTAL GROWTH
Information Patent Grant
Depositing polysilicon films having improved uniformity and apparat...
- Patent number 5,576,059
- Issue date Nov 19, 1996
- Applied Materials, Inc.
- Israel Beinglass
- C30 - CRYSTAL GROWTH
Information Patent Grant
Semiconductor wafer process chamber with susceptor back coating
- Patent number 5,551,982
- Issue date Sep 3, 1996
- Applied Materials, Inc.
- Roger N. Anderson
- C30 - CRYSTAL GROWTH

Patents Applicationslast 30 patents

Information Patent Application
PATTERNING OF MAGNETIC THIN FILM USING ENERGIZED IONS AND THERMAL E...
- Publication number 20140083363
- Publication date Mar 27, 2014
- Applied Materials, Inc.
- Omkaram NALAMASU
- B82 - NANO-TECHNOLOGY
Information Patent Application
PATTERNING OF MAGNETIC THIN FILM USING ENERGIZED IONS
- Publication number 20140017518
- Publication date Jan 16, 2014
- Applied Materials, Inc.
- Steven VERHAVERBEKE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PATTERNING OF MAGNETIC THIN FILM USING ENERGIZED IONS
- Publication number 20100098873
- Publication date Apr 22, 2010
- APPLIED MATERIALS, INC.
- STEVEN VERHAVERBEKE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PATTERNING OF MAGNETIC THIN FILM USING ENERGIZED IONS AND THERMAL E...
- Publication number 20100096256
- Publication date Apr 22, 2010
- OMKARAM NALAMASU
- G11 - INFORMATION STORAGE
Information Patent Application
METHOD INCLUDING MAGNETIC DOMAIN PATTERNING USING PLASMA ION IMPLAN...
- Publication number 20090201722
- Publication date Aug 13, 2009
- Kamesh Giridhar
- G11 - INFORMATION STORAGE
Information Patent Application
MAGNETIC DOMAIN PATTERNING USING PLASMA ION IMPLANTATION
- Publication number 20090199768
- Publication date Aug 13, 2009
- Steven Verhaverbeke
- G11 - INFORMATION STORAGE
Information Patent Application
Gas inlets for wafer processing chamber
- Publication number 20030092266
- Publication date May 15, 2003
- Roger N. Anderson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Mahalingam VENKATESAN

Person

Patents Grantslast 30 patents

Patterning of magnetic thin film using energized ions

Patterning of magnetic thin film using energized ions and thermal e...

Patterning of magnetic thin film using energized ions

Gas inlets for wafer processing chamber

Depositing polysilicon films having improved uniformity and apparat...

Integrated tungsten-silicide processes

Susceptor for deposition apparatus

Method and apparatus for processing the upper and lower faces of a...

Deposition of silicon nitride thin films

Gas inlets for wafer processing chamber

Method of forming doped silicon in high aspect ratio openings

Process of depositing a layer of material on a wafer with susceptor...

Semiconductor wafer process chamber with susceptor back coating

Method of enhancing step coverage of polysilicon deposits

Susceptor for deposition apparatus

Semiconductor wafer process chamber with suspector back coating

Depositing polysilicon films having improved uniformity and apparat...

Semiconductor wafer process chamber with susceptor back coating

Patents Applicationslast 30 patents

PATTERNING OF MAGNETIC THIN FILM USING ENERGIZED IONS AND THERMAL E...

PATTERNING OF MAGNETIC THIN FILM USING ENERGIZED IONS

PATTERNING OF MAGNETIC THIN FILM USING ENERGIZED IONS

PATTERNING OF MAGNETIC THIN FILM USING ENERGIZED IONS AND THERMAL E...

METHOD INCLUDING MAGNETIC DOMAIN PATTERNING USING PLASMA ION IMPLAN...

MAGNETIC DOMAIN PATTERNING USING PLASMA ION IMPLANTATION

Gas inlets for wafer processing chamber