Makoto Fukushima

Person

Yokohama, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Polishing apparatus
- Patent number 12,128,523
- Issue date Oct 29, 2024
- Ebara Corporation
- Makoto Fukushima
- B24 - GRINDING POLISHING
Information Patent Grant
Elastic membrane, substrate holding device, and polishing apparatus
- Patent number 12,068,189
- Issue date Aug 20, 2024
- Ebara Corporation
- Satoru Yamaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 11,969,858
- Issue date Apr 30, 2024
- Ebara Corporation
- Keisuke Namiki
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Polishing apparatus and method of controlling inclination of statio...
- Patent number 11,745,306
- Issue date Sep 5, 2023
- Ebara Corporation
- Tomoko Owada
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing apparatus and polishing method
- Patent number 11,731,235
- Issue date Aug 22, 2023
- Ebara Corporation
- Shingo Togashi
- B24 - GRINDING POLISHING
Information Patent Grant
Method and apparatus for polishing a substrate
- Patent number 11,548,113
- Issue date Jan 10, 2023
- Ebara Corporation
- Makoto Fukushima
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate holding device, substrate polishing apparatus, and method...
- Patent number 11,478,895
- Issue date Oct 25, 2022
- Ebara Corporation
- Shingo Togashi
- B24 - GRINDING POLISHING
Information Patent Grant
Elastic membrane and substrate holding apparatus
- Patent number 11,472,001
- Issue date Oct 18, 2022
- Ebara Corporation
- Cheng Cheng
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate adsorption method, substrate holding apparatus, substrate...
- Patent number 11,472,000
- Issue date Oct 18, 2022
- Ebara Corporation
- Hiroyuki Shinozaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing apparatus
- Patent number 11,224,956
- Issue date Jan 18, 2022
- Ebara Corporation
- Osamu Nabeya
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate holding apparatus, elastic membrane, polishing apparatus,...
- Patent number 11,179,823
- Issue date Nov 23, 2021
- Ebara Corporation
- Osamu Nabeya
- B24 - GRINDING POLISHING
Information Patent Grant
Elastic membrane, substrate holding device, and polishing apparatus
- Patent number 11,088,011
- Issue date Aug 10, 2021
- Ebara Corporation
- Satoru Yamaki
- B24 - GRINDING POLISHING
Information Patent Grant
Elastic membrane
- Patent number D918161
- Issue date May 4, 2021
- Ebara Corporation
- Shingo Togashi
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Substrate holding apparatus, substrate suction determination method...
- Patent number 10,991,613
- Issue date Apr 27, 2021
- Ebara Corporation
- Osamu Nabeya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Elastic membrane for semiconductor wafer polishing
- Patent number D913977
- Issue date Mar 23, 2021
- Ebara Corporation
- Satoru Yamaki
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Polishing apparatus
- Patent number 10,702,972
- Issue date Jul 7, 2020
- Ebara Corporation
- Makoto Fukushima
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate adsorption method, substrate holding apparatus, substrate...
- Patent number 10,537,975
- Issue date Jan 21, 2020
- Ebara Corporation
- Hiroyuki Shinozaki
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate holding device, and substrate polishing apparatus
- Patent number 10,486,284
- Issue date Nov 26, 2019
- Ebara Corporation
- Shingo Togashi
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate polishing method, top ring, and substrate polishing appar...
- Patent number 10,464,185
- Issue date Nov 5, 2019
- Ebara Corporation
- Shintaro Isono
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate holding apparatus and polishing apparatus
- Patent number 10,442,056
- Issue date Oct 15, 2019
- Ebara Corporation
- Keisuke Namiki
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing apparatus and polishing method
- Patent number 10,414,015
- Issue date Sep 17, 2019
- Ebara Corporation
- Makoto Fukushima
- B24 - GRINDING POLISHING
Information Patent Grant
Elastic membrane for semiconductor wafer polishing
- Patent number D859332
- Issue date Sep 10, 2019
- Ebara Corporation
- Satoru Yamaki
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Polishing apparatus, control method and recording medium
- Patent number 10,391,603
- Issue date Aug 27, 2019
- Ebara Corporation
- Satoru Yamaki
- B24 - GRINDING POLISHING
Information Patent Grant
Method and apparatus for polishing a substrate
- Patent number 10,307,882
- Issue date Jun 4, 2019
- Ebara Corporation
- Makoto Fukushima
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing apparatus
- Patent number 10,293,455
- Issue date May 21, 2019
- Ebara Corporation
- Osamu Nabeya
- B24 - GRINDING POLISHING
Information Patent Grant
Elastic membrane, substrate holding apparatus, and polishing apparatus
- Patent number 10,213,896
- Issue date Feb 26, 2019
- Ebara Corporation
- Makoto Fukushima
- B24 - GRINDING POLISHING
Information Patent Grant
Elastic membrane for semiconductor wafer polishing
- Patent number D839224
- Issue date Jan 29, 2019
- Ebara Corporation
- Satoru Yamaki
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Polishing apparatus, polishing head, and retainer ring
- Patent number 10,092,992
- Issue date Oct 9, 2018
- Ebara Corporation
- Hozumi Yasuda
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing apparatus
- Patent number 10,040,166
- Issue date Aug 7, 2018
- Ebara Corporation
- Osamu Nabeya
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing apparatus, polishing head, and retainer ring
- Patent number 10,035,239
- Issue date Jul 31, 2018
- Ebara Corporation
- Hozumi Yasuda
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
PROCESSING SYSTEM, PAD TRANSPORTING APPARATUS, LIQUID-RECEIVING APP...
- Publication number 20240082982
- Publication date Mar 14, 2024
- EBARA CORPORATION
- Toshiki MIYAKAWA
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING RECIPE DETERMINATION DEVICE
- Publication number 20220168864
- Publication date Jun 2, 2022
- EBARA CORPORATION
- Yoshikazu Kato
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
INFORMATION PROCESSING SYSTEM, INFORMATION PROCESSING METHOD, PROGR...
- Publication number 20220093409
- Publication date Mar 24, 2022
- EBARA CORPORATION
- Keisuke Namiki
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SUBSTRATE HOLDING APPARATUS, ELASTIC MEMBRANE, POLISHING APPARATUS,...
- Publication number 20220048157
- Publication date Feb 17, 2022
- EBARA CORPORATION
- Osamu NABEYA
- B24 - GRINDING POLISHING
Information Patent Application
ELASTIC MEMBRANE, SUBSTRATE HOLDING DEVICE, AND POLISHING APPARATUS
- Publication number 20210335650
- Publication date Oct 28, 2021
- EBARA CORPORATION
- Satoru YAMAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE HOLDING APPARATUS, SUBSTRATE SUCTION DETERMINATION METHOD...
- Publication number 20210217647
- Publication date Jul 15, 2021
- EBARA CORPORATION
- Osamu Nabeya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE HOLDING APPARATUS AND METHOD OF MANUFACTURING A DRIVE RING
- Publication number 20210138606
- Publication date May 13, 2021
- EBARA CORPORATION
- Keisuke NAMIKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELASTIC MEMBRANE AND SUBSTRATE HOLDING APPARATUS
- Publication number 20210060725
- Publication date Mar 4, 2021
- EBARA CORPORATION
- Cheng Cheng
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING APPARATUS AND POLISHING METHOD
- Publication number 20200368874
- Publication date Nov 26, 2020
- EBARA CORPORATION
- Yoshikazu KATO
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING APPARATUS
- Publication number 20200361056
- Publication date Nov 19, 2020
- EBARA CORPORATION
- Makoto Fukushima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING APPARATUS AND POLISHING METHOD
- Publication number 20200206867
- Publication date Jul 2, 2020
- EBARA CORPORATION
- Shingo Togashi
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING APPARATUS AND METHOD OF CONTROLLING INCLINATION OF STATIO...
- Publication number 20200206868
- Publication date Jul 2, 2020
- EBARA CORPORATION
- Tomoko Owada
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE ADSORPTION METHOD, SUBSTRATE HOLDING APPARATUS, SUBSTRATE...
- Publication number 20200094372
- Publication date Mar 26, 2020
- EBARA CORPORATION
- Hiroyuki SHINOZAKI
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE HOLDING DEVICE, SUBSTRATE POLISHING APPARATUS, AND METHOD...
- Publication number 20200047308
- Publication date Feb 13, 2020
- EBARA CORPORATION
- Shingo TOGASHI
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE HOLDING APPARATUS, SUBSTRATE SUCTION DETERMINATION METHOD...
- Publication number 20200043773
- Publication date Feb 6, 2020
- EBARA CORPORATION
- Osamu Nabeya
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20200023487
- Publication date Jan 23, 2020
- EBARA CORPORATION
- Keisuke Namiki
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHOD AND APPARATUS FOR POLISHING A SUBSTRATE
- Publication number 20190240801
- Publication date Aug 8, 2019
- EBARA CORPORATION
- Makoto FUKUSHIMA
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING APPARATUS
- Publication number 20190224808
- Publication date Jul 25, 2019
- EBARA CORPORATION
- Osamu Nabeya
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20190126427
- Publication date May 2, 2019
- EBARA CORPORATION
- Yoshikazu Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELASTIC MEMBRANE, SUBSTRATE HOLDING DEVICE, AND POLISHING APPARATUS
- Publication number 20180301367
- Publication date Oct 18, 2018
- EBARA CORPORATION
- Satoru YAMAKI
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE HOLDING APPARATUS, ELASTIC MEMBRANE, POLISHING APPARATUS,...
- Publication number 20180117730
- Publication date May 3, 2018
- EBARA CORPORATION
- Osamu NABEYA
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE POLISHING METHOD, TOP RING, AND SUBSTRATE POLISHING APPAR...
- Publication number 20170266779
- Publication date Sep 21, 2017
- EBARA CORPORATION
- Shintaro Isono
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING APPARATUS, CONTROL METHOD AND RECORDING MEDIUM
- Publication number 20170173756
- Publication date Jun 22, 2017
- EBARA CORPORATION
- Satoru Yamaki
- B24 - GRINDING POLISHING
Information Patent Application
ELASTIC MEMBRANE, SUBSTRATE HOLDING APPARATUS, AND POLISHING APPARATUS
- Publication number 20170144267
- Publication date May 25, 2017
- EBARA CORPORATION
- Makoto Fukushima
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE HOLDING DEVICE, SUBSTRATE POLISHING APPARATUS, AND METHOD...
- Publication number 20170106497
- Publication date Apr 20, 2017
- EBARA CORPORATION
- Shingo TOGASHI
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING APPARATUS AND POLISHING METHOD
- Publication number 20170057049
- Publication date Mar 2, 2017
- EBARA CORPORATION
- Makoto Fukushima
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE ADSORPTION METHOD, SUBSTRATE HOLDING APPARATUS, SUBSTRATE...
- Publication number 20170050289
- Publication date Feb 23, 2017
- EBARA CORPORATION
- Hiroyuki SHINOZAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING APPARATUS, POLISHING HEAD, AND RETAINER RING
- Publication number 20160368115
- Publication date Dec 22, 2016
- EBARA CORPORATION
- Hozumi YASUDA
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING APPARATUS
- Publication number 20160250735
- Publication date Sep 1, 2016
- EBARA CORPORATION
- Osamu Nabeya
- B24 - GRINDING POLISHING
Information Patent Application
RETAINER RING, SUBSTRATE HOLDING APPARATUS, AND POLISHING APPARATUS...
- Publication number 20160243670
- Publication date Aug 25, 2016
- EBARA CORPORATION
- Makoto FUKUSHIMA
- B24 - GRINDING POLISHING

Makoto Fukushima

Person

Patents Grantslast 30 patents

Polishing apparatus

Elastic membrane, substrate holding device, and polishing apparatus

Substrate processing apparatus

Polishing apparatus and method of controlling inclination of statio...

Polishing apparatus and polishing method

Method and apparatus for polishing a substrate

Substrate holding device, substrate polishing apparatus, and method...

Elastic membrane and substrate holding apparatus

Substrate adsorption method, substrate holding apparatus, substrate...

Polishing apparatus

Substrate holding apparatus, elastic membrane, polishing apparatus,...

Elastic membrane, substrate holding device, and polishing apparatus

Elastic membrane

Substrate holding apparatus, substrate suction determination method...

Elastic membrane for semiconductor wafer polishing

Polishing apparatus

Substrate adsorption method, substrate holding apparatus, substrate...

Substrate holding device, and substrate polishing apparatus

Substrate polishing method, top ring, and substrate polishing appar...

Substrate holding apparatus and polishing apparatus

Polishing apparatus and polishing method

Elastic membrane for semiconductor wafer polishing

Polishing apparatus, control method and recording medium

Method and apparatus for polishing a substrate

Polishing apparatus

Elastic membrane, substrate holding apparatus, and polishing apparatus

Elastic membrane for semiconductor wafer polishing

Polishing apparatus, polishing head, and retainer ring

Polishing apparatus

Polishing apparatus, polishing head, and retainer ring

Patents Applicationslast 30 patents

PROCESSING SYSTEM, PAD TRANSPORTING APPARATUS, LIQUID-RECEIVING APP...

POLISHING RECIPE DETERMINATION DEVICE

INFORMATION PROCESSING SYSTEM, INFORMATION PROCESSING METHOD, PROGR...

SUBSTRATE HOLDING APPARATUS, ELASTIC MEMBRANE, POLISHING APPARATUS,...

ELASTIC MEMBRANE, SUBSTRATE HOLDING DEVICE, AND POLISHING APPARATUS

SUBSTRATE HOLDING APPARATUS, SUBSTRATE SUCTION DETERMINATION METHOD...

SUBSTRATE HOLDING APPARATUS AND METHOD OF MANUFACTURING A DRIVE RING

ELASTIC MEMBRANE AND SUBSTRATE HOLDING APPARATUS

POLISHING APPARATUS AND POLISHING METHOD

POLISHING APPARATUS

POLISHING APPARATUS AND POLISHING METHOD

POLISHING APPARATUS AND METHOD OF CONTROLLING INCLINATION OF STATIO...

SUBSTRATE ADSORPTION METHOD, SUBSTRATE HOLDING APPARATUS, SUBSTRATE...

SUBSTRATE HOLDING DEVICE, SUBSTRATE POLISHING APPARATUS, AND METHOD...

SUBSTRATE HOLDING APPARATUS, SUBSTRATE SUCTION DETERMINATION METHOD...

SUBSTRATE PROCESSING APPARATUS

METHOD AND APPARATUS FOR POLISHING A SUBSTRATE

POLISHING APPARATUS

SUBSTRATE PROCESSING APPARATUS

ELASTIC MEMBRANE, SUBSTRATE HOLDING DEVICE, AND POLISHING APPARATUS

SUBSTRATE HOLDING APPARATUS, ELASTIC MEMBRANE, POLISHING APPARATUS,...

SUBSTRATE POLISHING METHOD, TOP RING, AND SUBSTRATE POLISHING APPAR...

POLISHING APPARATUS, CONTROL METHOD AND RECORDING MEDIUM

ELASTIC MEMBRANE, SUBSTRATE HOLDING APPARATUS, AND POLISHING APPARATUS

SUBSTRATE HOLDING DEVICE, SUBSTRATE POLISHING APPARATUS, AND METHOD...

POLISHING APPARATUS AND POLISHING METHOD

SUBSTRATE ADSORPTION METHOD, SUBSTRATE HOLDING APPARATUS, SUBSTRATE...

POLISHING APPARATUS, POLISHING HEAD, AND RETAINER RING

POLISHING APPARATUS

RETAINER RING, SUBSTRATE HOLDING APPARATUS, AND POLISHING APPARATUS...