Makoto SEKINE

Person

Nagoya-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Carbon hard mask, film forming apparatus, and film forming method
- Patent number 11,993,849
- Issue date May 28, 2024
- Tokyo Electron Limited
- Masaru Hori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for manufacturing semiconductor substrate having group-III n...
- Patent number 11,339,242
- Issue date May 24, 2022
- NISSAN CHEMICAL CORPORATION
- Keisuke Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microwave supply apparatus, plasma processing apparatus, and plasma...
- Patent number 9,852,892
- Issue date Dec 26, 2017
- Tokyo Electron Limited
- Hitoshi Itoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generating apparatus, plasma processing apparatus and plasma...
- Patent number 8,610,353
- Issue date Dec 17, 2013
- Tokyo Electron Limited
- Hitoshi Itoh
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method of producing semiconductor device
- Patent number 7,202,168
- Issue date Apr 10, 2007
- Kabushiki Kaisha Toshiba
- Hiroshi Ikenoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method of the same
- Patent number 7,169,697
- Issue date Jan 30, 2007
- Kabushiki Kaisha Toshiba
- Shoji Seta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photomask repair method and apparatus
- Patent number 6,991,878
- Issue date Jan 31, 2006
- Kabushiki Kaisha Toshiba
- Shingo Kanamitsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method of the same
- Patent number 6,849,923
- Issue date Feb 1, 2005
- Kabushiki Kaisha Toshiba
- Shoji Seta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 6,831,367
- Issue date Dec 14, 2004
- Kabushiki Kaisha Toshiba
- Makoto Sekine
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 6,642,149
- Issue date Nov 4, 2003
- Tokyo Electron Limited
- Tomoki Suemasa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of semiconductor devices by using dry etching...
- Patent number 6,605,542
- Issue date Aug 12, 2003
- Kabushiki Kaisha Toshiba
- Shoji Seta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of semiconductor devices by using dry etching...
- Patent number 6,352,931
- Issue date Mar 5, 2002
- Kabushiki Kaisha Toshiba
- Shoji Seta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing system and method of using the same
- Patent number 6,334,928
- Issue date Jan 1, 2002
- Kabushiki Kaisha Toshiba
- Makoto Sekine
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma generating apparatus
- Patent number 5,897,713
- Issue date Apr 27, 1999
- Kabushiki Kaisha Toshiba
- Kazuhiro Tomioka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming a film on a substrate by activating a reactive gas
- Patent number 5,776,557
- Issue date Jul 7, 1998
- Kabushiki Kaisha Toshiba
- Haruo Okano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma process apparatus
- Patent number 5,717,294
- Issue date Feb 10, 1998
- Kabushiki Kaisha Toshiba
- Itsuko Sakai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generating apparatus and surface processing apparatus
- Patent number 5,660,744
- Issue date Aug 26, 1997
- Kabushiki Kaisha Toshiba
- Makoto Sekine
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming a film on a substrate by activating a reactive gas
- Patent number 5,591,486
- Issue date Jan 7, 1997
- Kabushiki Kaisha Toshiba
- Haruo Okano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Charged particle detection device and charged particle radiation ap...
- Patent number 5,491,339
- Issue date Feb 13, 1996
- Kabushiki Kaisha Toshiba
- Tadashi Mitsui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generating device and surface processing device and method f...
- Patent number 5,444,207
- Issue date Aug 22, 1995
- Kabushiki Kaisha Toshiba
- Makoto Sekine
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method for forming a film on a substrate by activating a reactive gas
- Patent number 5,385,763
- Issue date Jan 31, 1995
- Kabushiki Kaisha Toshiba
- Haruo Okano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrostatic chucking method
- Patent number 5,221,450
- Issue date Jun 22, 1993
- Kabushiki Kaisha Toshiba
- Kei Hattori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming a film on a substrate by activating a reactive gas
- Patent number 5,156,881
- Issue date Oct 20, 1992
- Kabushiki Kaisha Toshiba
- Haruo Okano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Phototreating method and apparatus therefor
- Patent number 5,112,645
- Issue date May 12, 1992
- Kabushiki Kaisha Toshiba
- Makoto Sekine
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of dry etching and apparatus for use in such method
- Patent number 4,878,995
- Issue date Nov 7, 1989
- Kabushiki Kaisha Toshiba
- Tsunetoshi Arikado
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Phototreating method and apparatus therefor
- Patent number 4,844,774
- Issue date Jul 4, 1989
- Kabushiki Kaisha Toshiba
- Makoto Sekine
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dry etching apparatus
- Patent number 4,838,978
- Issue date Jun 13, 1989
- Kabushiki Kaisha Toshiba
- Makoto Sekine
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching process
- Patent number 4,786,361
- Issue date Nov 22, 1988
- Kabushiki Kaisha Toshiba
- Makoto Sekine
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry-etching method and apparatus therefor
- Patent number 4,668,337
- Issue date May 26, 1987
- Kabushiki Kaisha Toshiba
- Makoto Sekine
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Phototreating apparatus
- Patent number 4,642,171
- Issue date Feb 10, 1987
- Kabushiki Kaisha Toshiba
- Makoto Sekine
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
CARBON HARD MASK, FILM FORMING APPARATUS, AND FILM FORMING METHOD
- Publication number 20240240324
- Publication date Jul 18, 2024
- TOKYO ELECTRON LIMITED
- Masaru HORI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CARBON HARD MASK, FILM FORMING APPARATUS, AND FILM FORMING METHOD
- Publication number 20220042173
- Publication date Feb 10, 2022
- TOKYO ELECTRON LIMITED
- Masaru HORI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE HAVING GROUP-III N...
- Publication number 20190225731
- Publication date Jul 25, 2019
- NISSAN CHEMICAL CORPORATION
- Keisuke HASHIMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROWAVE SUPPLY APPARATUS, PLASMA PROCESSING APPARATUS, AND PLASMA...
- Publication number 20170365446
- Publication date Dec 21, 2017
- TOKYO ELECTRON LIMITED
- Hitoshi ITOH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING CONDUCTIVE FILM
- Publication number 20150056381
- Publication date Feb 26, 2015
- NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITY
- Masaru Hori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA GENERATION DEVICE, PLASMA PROCESSING APPARATUS AND PLASMA PR...
- Publication number 20140008326
- Publication date Jan 9, 2014
- National University Corporation Nagoya University
- Hirotaka TOYODA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PLASMA GENERATING APPARATUS, PLASMA PROCESSING APPARATUS AND PLASMA...
- Publication number 20120068603
- Publication date Mar 22, 2012
- National University Corporation Nagoya University
- Hitoshi ITOH
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Method of producing semiconductor device
- Publication number 20060024952
- Publication date Feb 2, 2006
- Hiroshi Ikenoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and manufacturing method of the same
- Publication number 20060017162
- Publication date Jan 26, 2006
- Shoji Seta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and manufacturing method of the same
- Publication number 20050082674
- Publication date Apr 21, 2005
- Kabushiki Kaisha Toshiba
- Shoji Seta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method of manufacturing the same
- Publication number 20040061238
- Publication date Apr 1, 2004
- Kabushiki Kaisha Toshiba
- Makoto Sekine
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Manufacturing method of semiconductor devices by using dry etching...
- Publication number 20030224611
- Publication date Dec 4, 2003
- Kabushiki Kaisha Toshiba
- Shoji Seta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Photomask repair method and apparatus
- Publication number 20030215722
- Publication date Nov 20, 2003
- Shingo Kanamitsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Plasma processing method
- Publication number 20030054647
- Publication date Mar 20, 2003
- Tomoki Suemasa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and manufacturing method of the same
- Publication number 20020102843
- Publication date Aug 1, 2002
- Kabushiki Kaisha Toshiba
- Shoji Seta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Manufacturing method of semiconductor devices by using dry etching...
- Publication number 20020059899
- Publication date May 23, 2002
- Kabushiki Kaisha Toshida, of Japan.
- Shoji Seta
- H01 - BASIC ELECTRIC ELEMENTS

Makoto SEKINE

Person

Patents Grantslast 30 patents

Carbon hard mask, film forming apparatus, and film forming method

Method for manufacturing semiconductor substrate having group-III n...

Microwave supply apparatus, plasma processing apparatus, and plasma...

Plasma generating apparatus, plasma processing apparatus and plasma...

Method of producing semiconductor device

Semiconductor device and manufacturing method of the same

Photomask repair method and apparatus

Semiconductor device and manufacturing method of the same

Semiconductor device and method of manufacturing the same

Plasma processing method

Manufacturing method of semiconductor devices by using dry etching...

Manufacturing method of semiconductor devices by using dry etching...

Semiconductor processing system and method of using the same

Plasma generating apparatus

Method for forming a film on a substrate by activating a reactive gas

Plasma process apparatus

Plasma generating apparatus and surface processing apparatus

Method for forming a film on a substrate by activating a reactive gas

Charged particle detection device and charged particle radiation ap...

Plasma generating device and surface processing device and method f...

Method for forming a film on a substrate by activating a reactive gas

Electrostatic chucking method

Method for forming a film on a substrate by activating a reactive gas

Phototreating method and apparatus therefor

Method of dry etching and apparatus for use in such method

Phototreating method and apparatus therefor

Dry etching apparatus

Dry etching process

Dry-etching method and apparatus therefor

Phototreating apparatus

Patents Applicationslast 30 patents

CARBON HARD MASK, FILM FORMING APPARATUS, AND FILM FORMING METHOD

CARBON HARD MASK, FILM FORMING APPARATUS, AND FILM FORMING METHOD

METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE HAVING GROUP-III N...

MICROWAVE SUPPLY APPARATUS, PLASMA PROCESSING APPARATUS, AND PLASMA...

METHOD FOR FORMING CONDUCTIVE FILM

PLASMA GENERATION DEVICE, PLASMA PROCESSING APPARATUS AND PLASMA PR...

PLASMA GENERATING APPARATUS, PLASMA PROCESSING APPARATUS AND PLASMA...

Method of producing semiconductor device

Semiconductor device and manufacturing method of the same

Semiconductor device and manufacturing method of the same

Semiconductor device and method of manufacturing the same

Manufacturing method of semiconductor devices by using dry etching...

Photomask repair method and apparatus

Plasma processing method

Semiconductor device and manufacturing method of the same

Manufacturing method of semiconductor devices by using dry etching...