Number | Date | Country | Kind |
---|---|---|---|
61-47709 | Mar 1986 | JPX | |
61-68666 | Mar 1986 | JPX | |
61-201559 | Aug 1986 | JPX |
Number | Name | Date | Kind |
---|---|---|---|
4222838 | Bhagat et al. | Sep 1980 | |
4331486 | Chenevas-Paule et al. | May 1982 | |
4399014 | Engle | Aug 1983 | |
4464223 | Gorin | Aug 1984 | |
4522844 | Khanna et al. | Jun 1985 | |
4600492 | Ooshio et al. | Jul 1986 | |
4631106 | Nakazato et al. | Dec 1986 | |
4632718 | Chow et al. | Dec 1986 | |
4654118 | Staples | Mar 1987 | |
4668337 | Sekine et al. | May 1987 | |
4668338 | Maydan et al. | May 1987 | |
4668365 | Foster et al. | May 1987 |
Number | Date | Country |
---|---|---|
0130530 | Aug 1983 | JPX |
2060867 | Mar 1987 | JPX |
2070569 | Apr 1987 | JPX |
2072121 | Apr 1987 | JPX |
Entry |
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J. Vac. Sci. Technol. B3, 16, 1985; Pattern profile control of polysilicon plasma etching; M. Kimizuka and K. Hirata |
Proceedings of the Symposium on Dry Process, Tokyo; Oct. 1982, Characteristics of SiO.sub.2 Reactive Sputter Etching Using Magnetic Field; Kado Hirobe et al. |