Makoto Takahashi

Person

Sendai, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Electronic device and method of manufacturing the same
- Patent number 10,177,328
- Issue date Jan 8, 2019
- Fujitsu Limited
- Shintaro Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 8,383,516
- Issue date Feb 26, 2013
- Fujitsu Semiconductor Limited
- Makoto Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device suitable for a ferroelectric memory and manufa...
- Patent number 8,367,541
- Issue date Feb 5, 2013
- Fujitsu Semiconductor Limited
- Kouichi Nagai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing the same having i...
- Patent number 8,338,249
- Issue date Dec 25, 2012
- Fujitsu Semiconductor Limited
- Makoto Takahashi
- G11 - INFORMATION STORAGE
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 8,076,212
- Issue date Dec 13, 2011
- Fujitsu Semiconductor Limited
- Makoto Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 8,030,732
- Issue date Oct 4, 2011
- Fujitsu Semiconductor Limited
- Makoto Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of fabricating the same
- Patent number 7,982,254
- Issue date Jul 19, 2011
- Fujitsu Semiconductor Limited
- Kouichi Nagai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 7,750,485
- Issue date Jul 6, 2010
- Fujitsu Semiconductor Limited
- Makoto Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radiation sensitive material and method for forming pattern
- Patent number 7,465,529
- Issue date Dec 16, 2008
- Fujitsu Limited
- Satoshi Takechi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation sensitive material and method for forming pattern
- Patent number 7,179,580
- Issue date Feb 20, 2007
- Fujitsu Limited
- Satoshi Takechi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation sensitive material and method for forming pattern
- Patent number 6,790,589
- Issue date Sep 14, 2004
- Fujitsu Limited
- Satoshi Takechi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for the formation of resist patterns
- Patent number 6,699,645
- Issue date Mar 2, 2004
- Fujitsu Limited
- Makoto Takahashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation sensitive material and method for forming pattern
- Patent number 6,344,304
- Issue date Feb 5, 2002
- Fujitsu Limited
- Satoshi Takechi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Chemically amplified resist compositions and process for the format...
- Patent number 6,329,125
- Issue date Dec 11, 2001
- Fujitsu Limited
- Satoshi Takechi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified resist compositions and process for the format...
- Patent number 6,200,725
- Issue date Mar 13, 2001
- Fujitsu Limited
- Satoshi Takechi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified resist compositions and process for the format...
- Patent number 6,013,416
- Issue date Jan 11, 2000
- Fujitsu Limited
- Koji Nozaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation sensitive material and method for forming pattern
- Patent number 6,004,720
- Issue date Dec 21, 1999
- Fujitsu Limited
- Satoshi Takechi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Chemically amplified resist compositions and process for the format...
- Patent number 5,968,713
- Issue date Oct 19, 1999
- Fujitsu Limited
- Koji Nozaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming resist patterns by using an ammonium or morpholi...
- Patent number 5,879,851
- Issue date Mar 9, 1999
- Fujitsu Limited
- Makoto Takahashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern formation material and pattern formation method
- Patent number 5,443,690
- Issue date Aug 22, 1995
- Fujitsu Limited
- Satoshi Takechi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radio transmitting system having back-up radio receiver operable in...
- Patent number 5,437,059
- Issue date Jul 25, 1995
- Fujitsu Ltd.
- Hirokazu Murakami
- H04 - ELECTRIC COMMUNICATION TECHNIQUE

Patents Applicationslast 30 patents

Information Patent Application
ELECTRONIC DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20160104852
- Publication date Apr 14, 2016
- FUJITSU LIMITED
- Shintaro SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20130140614
- Publication date Jun 6, 2013
- FUJITSU SEMICONDUCTOR LIMITED
- Makoto TAKAHASHI
- G11 - INFORMATION STORAGE
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20110312154
- Publication date Dec 22, 2011
- FUJITSU SEMICONDUCTOR LIMITED
- Makoto Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20100267214
- Publication date Oct 21, 2010
- FUJITSU SEMICONDUCTOR LIMITED
- Makoto TAKAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20100207178
- Publication date Aug 19, 2010
- Fujitsu Limited
- Makoto TAKAHASHI
- G11 - INFORMATION STORAGE
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20090230452
- Publication date Sep 17, 2009
- Fujitsu Microelectronics Limited
- Makoto TAKAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20080142864
- Publication date Jun 19, 2008
- Fujitsu Limited
- Makoto TAKAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME
- Publication number 20080099855
- Publication date May 1, 2008
- Fujitsu Limited
- Kouichi NAGAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING FERROELECTRIC CAPACITOR AND METHOD FOR FABRICATI...
- Publication number 20080057598
- Publication date Mar 6, 2008
- Fujitsu Limited
- Kenkichi Suezawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Forming method of ferroelectric capacitor and manufacturing method...
- Publication number 20070122917
- Publication date May 31, 2007
- FUJITSU LIMITED
- Mitsushi Fujiki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Radiation sensitive material and method for forming pattern
- Publication number 20070037090
- Publication date Feb 15, 2007
- FUJITSU LIMITED
- Satoshi Takechi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Semiconductor device and manufacturing method of the same
- Publication number 20060220081
- Publication date Oct 5, 2006
- FUJITSU LIMITED
- Kouichi Nagai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Radiation sensitive material and method for forming pattern
- Publication number 20040202961
- Publication date Oct 14, 2004
- FUJITSU LIMITED
- Satoshi Takechi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Radiation sensitive material and method for forming pattern
- Publication number 20020076645
- Publication date Jun 20, 2002
- FUJITSU LIMITED
- Satoshi Takechi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Chemically amplified resist compositions and process for the format...
- Publication number 20010003640
- Publication date Jun 14, 2001
- FUJITSU LIMITED
- Satoshi Takechi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR THE FORMATION OF RESIST PATTERNS
- Publication number 20010001703
- Publication date May 24, 2001
- Makoto Takahashi
- MAKOTO TAKAHASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Makoto Takahashi

Person

Patents Grantslast 30 patents

Electronic device and method of manufacturing the same

Semiconductor device and method for manufacturing the same

Semiconductor device suitable for a ferroelectric memory and manufa...

Semiconductor device and method for manufacturing the same having i...

Semiconductor device and method for manufacturing the same

Semiconductor device and method for manufacturing the same

Semiconductor device and method of fabricating the same

Semiconductor device and method for manufacturing the same

Radiation sensitive material and method for forming pattern

Radiation sensitive material and method for forming pattern

Radiation sensitive material and method for forming pattern

Method for the formation of resist patterns

Radiation sensitive material and method for forming pattern

Chemically amplified resist compositions and process for the format...

Chemically amplified resist compositions and process for the format...

Chemically amplified resist compositions and process for the format...

Radiation sensitive material and method for forming pattern

Chemically amplified resist compositions and process for the format...

Method for forming resist patterns by using an ammonium or morpholi...

Pattern formation material and pattern formation method

Radio transmitting system having back-up radio receiver operable in...

Patents Applicationslast 30 patents

ELECTRONIC DEVICE AND METHOD OF MANUFACTURING THE SAME

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME

METHOD FOR FORMING FERROELECTRIC CAPACITOR AND METHOD FOR FABRICATI...

Forming method of ferroelectric capacitor and manufacturing method...

Radiation sensitive material and method for forming pattern

Semiconductor device and manufacturing method of the same

Radiation sensitive material and method for forming pattern

Radiation sensitive material and method for forming pattern

Chemically amplified resist compositions and process for the format...

METHOD FOR THE FORMATION OF RESIST PATTERNS