Malcolm J. Bevan

Person

Dallas, TX, US

People

Patents Grantslast 30 patents

Information Patent Grant
Edge ring
- Patent number D1034491
- Issue date Jul 9, 2024
- Applied Materials, Inc.
- Kin Pong Lo
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Methods for calibrating an optical emission spectrometer
- Patent number 11,927,482
- Issue date Mar 12, 2024
- Applied Materials, Inc.
- Kin Pong Lo
- G01 - MEASURING TESTING
Information Patent Grant
Gate all around I/O engineering
- Patent number 11,923,441
- Issue date Mar 5, 2024
- Applied Materials, Inc.
- Steven C. H. Hung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for selective nitridation process
- Patent number 11,581,408
- Issue date Feb 14, 2023
- Applied Materials, Inc.
- Matthew Scott Rogers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate interface engineering with doped layer
- Patent number 11,456,178
- Issue date Sep 27, 2022
- Applied Materials, Inc.
- Steven C. H. Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate all around I/O engineering
- Patent number 11,450,759
- Issue date Sep 20, 2022
- Applied Materials, Inc.
- Steven C. H. Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film thickness uniformity improvement using edge ring and bias elec...
- Patent number 11,380,575
- Issue date Jul 5, 2022
- Applied Materials, Inc.
- Kin Pong Lo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cap oxidation for FinFET formation
- Patent number 11,271,097
- Issue date Mar 8, 2022
- Applied Materials, Inc.
- Steven C. Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thin film treatment process
- Patent number 10,971,357
- Issue date Apr 6, 2021
- Applied Materials, Inc.
- Wei Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for selective nitridation process
- Patent number 10,950,698
- Issue date Mar 16, 2021
- Applied Materials, Inc.
- Matthew Scott Rogers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Treatments to enhance material structures
- Patent number 10,872,763
- Issue date Dec 22, 2020
- Applied Materials, Inc.
- David Chu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treating a process chamber
- Patent number 10,290,504
- Issue date May 14, 2019
- Applied Materials, Inc.
- Wei Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for mitigating oxide growth in a gate dielectric
- Patent number 10,068,771
- Issue date Sep 4, 2018
- Texas Instruments Incorporated
- Malcolm J. Bevan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for selective nitridation process
- Patent number 10,049,881
- Issue date Aug 14, 2018
- Applied Materials, Inc.
- Matthew S. Rogers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for mitigating oxide growth in a gate dielectric
- Patent number 9,892,927
- Issue date Feb 13, 2018
- Texas Instruments Incorporated
- Malcolm J. Bevan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma treating a process chamber
- Patent number 9,831,091
- Issue date Nov 28, 2017
- Applied Materials, Inc.
- Wei Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for mitigating oxide growth in a gate dielectric
- Patent number 9,779,946
- Issue date Oct 3, 2017
- Texas Instruments Incorporated
- Malcolm J. Bevan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for mitigating oxide growth in a gate dielectric
- Patent number 9,576,804
- Issue date Feb 21, 2017
- Texas Instruments Incorporated
- Malcolm J. Bevan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for mitigating oxide growth in a gate dielectric
- Patent number 9,396,951
- Issue date Jul 19, 2016
- Texas Instruments Incorporated
- Malcolm J. Bevan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for mitigating oxide growth in a gate dielectric
- Patent number 9,368,355
- Issue date Jun 14, 2016
- Texas Instruments Incorporated
- Malcolm J. Bevan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for mitigating oxide growth in a gate dielectric
- Patent number 9,337,046
- Issue date May 10, 2016
- Texas Instruments Incorporated
- Malcolm J. Bevan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for mitigating oxide growth in a gate dielectric
- Patent number 9,337,044
- Issue date May 10, 2016
- Texas Instruments Incorporated
- Malcolm J. Bevan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for mitigating oxide growth in a gate dielectric
- Patent number 9,177,806
- Issue date Nov 3, 2015
- Texas Instruments Incorporated
- Malcolm J. Bevan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
NH3 containing plasma nitridation of a layer on a substrate
- Patent number 9,054,048
- Issue date Jun 9, 2015
- Applied Materials, Inc.
- Wei Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for single step selective nitridation
- Patent number 9,023,700
- Issue date May 5, 2015
- Applied Materials, Inc.
- Udayan Ganguly
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In situ vapor phase surface activation of SiO2
- Patent number 8,778,816
- Issue date Jul 15, 2014
- Applied Materials, Inc.
- Tatsuya E. Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for single step selective nitridation
- Patent number 8,748,259
- Issue date Jun 10, 2014
- Applied Materials, Inc.
- Udayan Ganguly
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for forming nitrogen-containing layers
- Patent number 8,546,273
- Issue date Oct 1, 2013
- Applied Materials, Inc.
- Malcolm J. Bevan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for forming nitrogen-containing layers
- Patent number 8,481,433
- Issue date Jul 9, 2013
- Applied Materials, Inc.
- Malcolm J. Bevan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System and method for mitigating oxide growth in a gate dielectric
- Patent number 7,906,441
- Issue date Mar 15, 2011
- Texas Instruments Incorporated
- Malcolm J. Bevan
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
TREATMENTS TO ENHANCE MATERIAL STRUCTURES
- Publication number 20240379349
- Publication date Nov 14, 2024
- Applied Materials, Inc.
- Steven C. H. HUNG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR CALIBRATING AN OPTICAL EMISSION SPECTROMETER
- Publication number 20240192055
- Publication date Jun 13, 2024
- Applied Materials, Inc.
- Kin Pong LO
- G01 - MEASURING TESTING
Information Patent Application
PROCESS CHAMBER PROCESS KIT WITH PROTECTIVE COATING
- Publication number 20230245863
- Publication date Aug 3, 2023
- Applied Materials, Inc.
- Jian WU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SCALED LINER LAYER FOR ISOLATION STRUCTURE
- Publication number 20230178419
- Publication date Jun 8, 2023
- Applied Materials, Inc.
- Benjamin COLOMBEAU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED WET CLEAN FOR GATE STACK DEVELOPMENT
- Publication number 20230010499
- Publication date Jan 12, 2023
- Applied Materials, Inc.
- Brian K. Kirkpatrick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gate All Around I/O Engineering
- Publication number 20220399457
- Publication date Dec 15, 2022
- Applied Materials, Inc.
- Steven C.H. Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM THICKNESS UNIFORMITY IMPROVEMENT USING EDGE RING AND BIAS ELEC...
- Publication number 20220301920
- Publication date Sep 22, 2022
- Applied Materials, Inc.
- Kin Pong LO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR CALIBRATING AN OPTICAL EMISSION SPECTROMETER
- Publication number 20220178747
- Publication date Jun 9, 2022
- Applied Materials, Inc.
- Kin Pong LO
- G01 - MEASURING TESTING
Information Patent Application
FILM THICKNESS UNIFORMITY IMPROVEMENT USING EDGE RING AND BIAS ELEC...
- Publication number 20220028656
- Publication date Jan 27, 2022
- Applied Materials, Inc.
- Kin Pong LO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS KIT WITH PROTECTIVE CERAMIC COATINGS FOR HYDROGEN AND NH3 P...
- Publication number 20220013336
- Publication date Jan 13, 2022
- Applied Materials, Inc.
- Jian WU
- B08 - CLEANING
Information Patent Application
GATE INTERFACE ENGINEERING WITH DOPED LAYER
- Publication number 20210398814
- Publication date Dec 23, 2021
- Applied Materials, Inc.
- Steven C. H. Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR SELECTIVE NITRIDATION PROCESS
- Publication number 20210202702
- Publication date Jul 1, 2021
- Applied Materials, Inc.
- Matthew Scott ROGERS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CAP OXIDATION FOR FINFET FORMATION
- Publication number 20210134986
- Publication date May 6, 2021
- Applied Materials, Inc.
- Steven C. Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gate All Around I/O Engineering
- Publication number 20210104617
- Publication date Apr 8, 2021
- Applied Materials, Inc.
- Steven C.H. Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and Apparatus for Selective Deposition of Dielectric Films
- Publication number 20210043448
- Publication date Feb 11, 2021
- Applied Materials, Inc.
- Ning Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TREATMENTS TO ENHANCE MATERIAL STRUCTURES
- Publication number 20200350157
- Publication date Nov 5, 2020
- Applied Materials, Inc.
- David Chu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SCALED LINER LAYER FOR ISOLATION STRUCTURE
- Publication number 20200161171
- Publication date May 21, 2020
- Applied Materials, Inc.
- Benjamin COLOMBEAU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR SILICON-GERMANIUM PRE-CLEAN
- Publication number 20200144397
- Publication date May 7, 2020
- Applied Materials, Inc.
- Abhishek DUBE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THIN FILM TREATMENT PROCESS
- Publication number 20200111659
- Publication date Apr 9, 2020
- Applied Materials, Inc.
- Wei LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS CHAMBER PROCESS KIT WITH PROTECTIVE COATING
- Publication number 20190385825
- Publication date Dec 19, 2019
- Applied Materials, Inc.
- Jian WU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR SELECTIVE NITRIDATION PROCESS
- Publication number 20190088485
- Publication date Mar 21, 2019
- Applied Materials, Inc.
- Matthew Scott ROGERS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method And Apparatus For Selective Deposition Of Dielectric Films
- Publication number 20180211833
- Publication date Jul 26, 2018
- Applied Materials, Inc.
- Ning Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM AND METHOD FOR MITIGATING OXIDE GROWTH IN A GATE DIELECTRIC
- Publication number 20180130662
- Publication date May 10, 2018
- TEXAS INSTRUMENTS INCORPORATED
- Malcolm J. Bevan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA TREATING A PROCESS CHAMBER
- Publication number 20180082847
- Publication date Mar 22, 2018
- Applied Materials, Inc.
- Wei LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR MITIGATING OXIDE GROWTH IN A GATE DIELECTRIC
- Publication number 20170170022
- Publication date Jun 15, 2017
- TEXAS INSTRUMENTS INCORPORATED
- Malcolm J. Bevan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM AND METHOD FOR MITIGATING OXIDE GROWTH IN A GATE DIELECTRIC
- Publication number 20170133228
- Publication date May 11, 2017
- TEXAS INSTRUMENTS INCORPORATED
- Malcolm J. Bevan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS CHAMBER
- Publication number 20160358781
- Publication date Dec 8, 2016
- Applied Materials, Inc.
- Wei LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR MITIGATING OXIDE GROWTH IN A GATE DIELECTRIC
- Publication number 20160300722
- Publication date Oct 13, 2016
- TEXAS INSTRUMENTS INCORPORATED
- Malcolm J. Bevan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method for Mitigating Oxide Growth in a Gate Dielectric
- Publication number 20160155641
- Publication date Jun 2, 2016
- TEXAS INSTRUMENTS INCORPORATED
- Malcolm J. Bevan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method for Mitigating Oxide Growth in a Gate Dielectric
- Publication number 20160013061
- Publication date Jan 14, 2016
- TEXAS INSTRUMENTS INCORPORATED
- Malcolm J. Bevan
- H01 - BASIC ELECTRIC ELEMENTS

Malcolm J. Bevan

Person

Patents Grantslast 30 patents

Edge ring

Methods for calibrating an optical emission spectrometer

Gate all around I/O engineering

Method and apparatus for selective nitridation process

Gate interface engineering with doped layer

Gate all around I/O engineering

Film thickness uniformity improvement using edge ring and bias elec...

Cap oxidation for FinFET formation

Thin film treatment process

Method and apparatus for selective nitridation process

Treatments to enhance material structures

Plasma treating a process chamber

System and method for mitigating oxide growth in a gate dielectric

Method and apparatus for selective nitridation process

System and method for mitigating oxide growth in a gate dielectric

Plasma treating a process chamber

System and method for mitigating oxide growth in a gate dielectric

System and method for mitigating oxide growth in a gate dielectric

System and method for mitigating oxide growth in a gate dielectric

System and method for mitigating oxide growth in a gate dielectric

System and method for mitigating oxide growth in a gate dielectric

System and method for mitigating oxide growth in a gate dielectric

System and method for mitigating oxide growth in a gate dielectric

NH3 containing plasma nitridation of a layer on a substrate

Method and apparatus for single step selective nitridation

In situ vapor phase surface activation of SiO2

Method and apparatus for single step selective nitridation

Methods and apparatus for forming nitrogen-containing layers

Methods and apparatus for forming nitrogen-containing layers

System and method for mitigating oxide growth in a gate dielectric

Patents Applicationslast 30 patents

TREATMENTS TO ENHANCE MATERIAL STRUCTURES

METHODS FOR CALIBRATING AN OPTICAL EMISSION SPECTROMETER

PROCESS CHAMBER PROCESS KIT WITH PROTECTIVE COATING

SCALED LINER LAYER FOR ISOLATION STRUCTURE

INTEGRATED WET CLEAN FOR GATE STACK DEVELOPMENT

Gate All Around I/O Engineering

FILM THICKNESS UNIFORMITY IMPROVEMENT USING EDGE RING AND BIAS ELEC...

METHODS FOR CALIBRATING AN OPTICAL EMISSION SPECTROMETER

FILM THICKNESS UNIFORMITY IMPROVEMENT USING EDGE RING AND BIAS ELEC...

PROCESS KIT WITH PROTECTIVE CERAMIC COATINGS FOR HYDROGEN AND NH3 P...

GATE INTERFACE ENGINEERING WITH DOPED LAYER

METHOD AND APPARATUS FOR SELECTIVE NITRIDATION PROCESS

CAP OXIDATION FOR FINFET FORMATION

Gate All Around I/O Engineering

Method and Apparatus for Selective Deposition of Dielectric Films

TREATMENTS TO ENHANCE MATERIAL STRUCTURES

SCALED LINER LAYER FOR ISOLATION STRUCTURE

METHODS AND APPARATUS FOR SILICON-GERMANIUM PRE-CLEAN

THIN FILM TREATMENT PROCESS

PROCESS CHAMBER PROCESS KIT WITH PROTECTIVE COATING

METHOD AND APPARATUS FOR SELECTIVE NITRIDATION PROCESS

Method And Apparatus For Selective Deposition Of Dielectric Films

SYSTEM AND METHOD FOR MITIGATING OXIDE GROWTH IN A GATE DIELECTRIC

PLASMA TREATING A PROCESS CHAMBER

SYSTEM AND METHOD FOR MITIGATING OXIDE GROWTH IN A GATE DIELECTRIC

SYSTEM AND METHOD FOR MITIGATING OXIDE GROWTH IN A GATE DIELECTRIC

PROCESS CHAMBER

SYSTEM AND METHOD FOR MITIGATING OXIDE GROWTH IN A GATE DIELECTRIC

System and Method for Mitigating Oxide Growth in a Gate Dielectric

System and Method for Mitigating Oxide Growth in a Gate Dielectric