Mandyam Sriram

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Enhancing gapfill performance of dram word line
- Patent number 12,114,488
- Issue date Oct 8, 2024
- Applied Materials, Inc.
- Yong Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Fluorine-free tungsten ALD for dielectric selectivity improvement
- Patent number 12,062,545
- Issue date Aug 13, 2024
- Applied Materials, Inc.
- Ilanit Fisher
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
PMOS high-k metal gates
- Patent number 12,051,734
- Issue date Jul 30, 2024
- Applied Materials, Inc.
- Srinivas Gandikota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Paired dynamic parallel plate capacitively coupled plasmas
- Patent number 11,923,172
- Issue date Mar 5, 2024
- Applied Materials, Inc.
- Hari Ponnekanti
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Single wafer processing environments with spatial separation
- Patent number 11,894,257
- Issue date Feb 6, 2024
- Applied Materials, Inc.
- Michael Rice
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Enhanced spatial ALD of metals through controlled precursor mixing
- Patent number 11,887,856
- Issue date Jan 30, 2024
- Applied Materials, Inc.
- Kelvin Chan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of tuning film properties of metal nitride using plasma
- Patent number 11,646,226
- Issue date May 9, 2023
- Applied Materials, Inc.
- Wenyi Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Susceptor wafer chucks for bowed wafers
- Patent number 11,581,213
- Issue date Feb 14, 2023
- Applied Materials, Inc.
- Abhishek Chowdhury
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
PMOS high-K metal gates
- Patent number 11,552,177
- Issue date Jan 10, 2023
- Applied Materials, Inc.
- Srinivas Gandikota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Injector for batch processing and methods of use
- Patent number 11,530,480
- Issue date Dec 20, 2022
- Applied Materials, Inc.
- Joseph Yudovsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
In-situ film annealing with spatial atomic layer deposition
- Patent number 11,515,144
- Issue date Nov 29, 2022
- Applied Materials, Inc.
- Keiichi Tanaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Paired dynamic parallel plate capacitively coupled plasmas
- Patent number 11,282,676
- Issue date Mar 22, 2022
- Applied Materials, Inc.
- Hari Ponnekanti
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Injector for batch processing and methods of use
- Patent number 11,261,525
- Issue date Mar 1, 2022
- Applied Materials, Inc.
- Joseph Yudovsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wafer out of pocket detection
- Patent number 11,133,205
- Issue date Sep 28, 2021
- Applied Materials, Inc.
- Sanggyum Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced spatial ALD of metals through controlled precursor mixing
- Patent number 11,043,386
- Issue date Jun 22, 2021
- Applied Materials, Inc.
- Kelvin Chan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Bottom-up gap-fill by surface poisoning treatment
- Patent number 11,028,477
- Issue date Jun 8, 2021
- Applied Materials, Inc.
- Mark Saly
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
In-situ tungsten deposition without barrier layer
- Patent number 10,991,586
- Issue date Apr 27, 2021
- Applied Materials, Inc.
- Yong Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Top lamp module for carousel deposition chamber
- Patent number 10,273,578
- Issue date Apr 30, 2019
- Applied Materials, Inc.
- Joseph Yudovsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing system containing an isolation region separating a depos...
- Patent number 10,236,197
- Issue date Mar 19, 2019
- Applied Materials, Inc.
- Karthik Janakiraman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
PECVD apparatus for in-situ deposition of film stacks
- Patent number 10,214,816
- Issue date Feb 26, 2019
- Novellus Systems, Inc.
- Jason Dirk Haverkamp
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma activated conformal dielectric film deposition
- Patent number 10,043,655
- Issue date Aug 7, 2018
- Novellus Systems, Inc.
- Shankar Swaminathan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma activated conformal dielectric film deposition
- Patent number 9,611,544
- Issue date Apr 4, 2017
- Novellus Systems, Inc.
- Adrien LaVoie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma activated conformal dielectric film deposition
- Patent number 9,570,274
- Issue date Feb 14, 2017
- Novellus Systems, Inc.
- Shankar Swaminathan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Precise critical dimension control using bilayer ALD
- Patent number 9,443,716
- Issue date Sep 13, 2016
- Applied Materials, Inc.
- Kenji Takeshita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma activated conformal film deposition
- Patent number 9,230,800
- Issue date Jan 5, 2016
- Novellus Systems, Inc.
- Adrien LaVoie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
PECVD deposition of smooth silicon films
- Patent number 9,117,668
- Issue date Aug 25, 2015
- Novellus Systems, Inc.
- Alice Hollister
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ deposition of film stacks
- Patent number 9,028,924
- Issue date May 12, 2015
- Novellus Systems, Inc.
- Jason Haverkamp
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Carbon deposition-etch-ash gap fill process
- Patent number 9,023,731
- Issue date May 5, 2015
- Novellus Systems, Inc.
- Chunhai Ji
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma activated conformal dielectric film deposition
- Patent number 8,999,859
- Issue date Apr 7, 2015
- Novellus Systems, Inc.
- Shankar Swaminathan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Conformal doping via plasma activated atomic layer deposition and c...
- Patent number 8,956,983
- Issue date Feb 17, 2015
- Novellus Systems, Inc.
- Shankar Swaminathan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
PLASMA-ENHANCED MOLYBDENUM DEPOSITION
- Publication number 20240218502
- Publication date Jul 4, 2024
- Applied Materials, Inc.
- TUERXUN AILIHUMAER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BATCH PROCESSING CHAMBERS FOR PLASMA-ENHANCED DEPOSITION
- Publication number 20240170254
- Publication date May 23, 2024
- Applied Materials, Inc.
- Jianming Fu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR MANUFACTURING SUSCEPTOR POCKET EDGE FOR PROCESS IMPRO...
- Publication number 20240141492
- Publication date May 2, 2024
- Applied Materials, Inc.
- Prasanth Narayanan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA-ENHANCED MOLYBDENUM DEPOSITION
- Publication number 20240102157
- Publication date Mar 28, 2024
- Applied Materials, Inc.
- TUERXUN AILIHUMAER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SINGLE WAFER PROCESSING ENVIRONMENTS WITH SPATIAL SEPARATION
- Publication number 20240096688
- Publication date Mar 21, 2024
- Applied Materials, Inc.
- Michael Robert Rice
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PECVD APPARATUS FOR IN-SITU DEPOSITION OF FILM STACKS
- Publication number 20230366094
- Publication date Nov 16, 2023
- Novellus Systems, Inc.
- Jason Dirk Haverkamp
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS OF PREVENTING METAL CONTAMINATION BY CERAMIC HEATER
- Publication number 20230313378
- Publication date Oct 5, 2023
- Applied Materials, Inc.
- Yongjing Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ENHANCED CHAMBER CLEAN AND RECOVERY WITH DUAL FLOW PATH
- Publication number 20230307216
- Publication date Sep 28, 2023
- Applied Materials, Inc.
- Prasanth Narayanan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF GROWING METAL-CONTAINING FILMS
- Publication number 20230295803
- Publication date Sep 21, 2023
- Applied Materials, Inc.
- Haoming Yan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF TUNING FILM PROPERTIES OF METAL NITRIDE USING PLASMA
- Publication number 20230245925
- Publication date Aug 3, 2023
- Applied Materials, Inc.
- Wenyi LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR FINE PLANAR NON-UNIFORMITY IMPROVEMENT
- Publication number 20230146837
- Publication date May 11, 2023
- Applied Materials, Inc.
- Muhannad Mustafa
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Application
METHODS FOR SEAMLESS GAP FILLING USING GRADIENT OXIDATION
- Publication number 20230113514
- Publication date Apr 13, 2023
- Applied Materials, Inc.
- Shih Chung Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PMOS HIGH-K METAL GATES
- Publication number 20230097400
- Publication date Mar 30, 2023
- Applied Materials, Inc.
- Srinivas Gandikota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEATER PEDESTAL WITH IMPROVED UNIFORMITY
- Publication number 20220367236
- Publication date Nov 17, 2022
- Applied Materials, Inc.
- Muhannad Mustafa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ENHANCING GAPFILL PERFORMANCE OF DRAM WORD LINE
- Publication number 20220359532
- Publication date Nov 10, 2022
- Applied Materials, Inc.
- Yong Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MOSFET GATE ENGINEERINNG WITH DIPOLE FILMS
- Publication number 20220254900
- Publication date Aug 11, 2022
- Applied Materials, Inc.
- Yong Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Injector For Batch Processing And Methods Of Use
- Publication number 20220162748
- Publication date May 26, 2022
- Applied Materials, Inc.
- Joseph Yudovsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PAIRED DYNAMIC PARALLEL PLATE CAPACITIVELY COUPLED PLASMAS
- Publication number 20220165540
- Publication date May 26, 2022
- Applied Materials, Inc.
- Hari Ponnekanti
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method Of Reducing Titanium Nitride Etching During Tungsten Film Fo...
- Publication number 20220098731
- Publication date Mar 31, 2022
- Applied Materials, Inc.
- Kedi Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUSCEPTOR WAFER CHUCKS FOR BOWED WAFERS
- Publication number 20220093443
- Publication date Mar 24, 2022
- Applied Materials, Inc.
- Abhishek Chowdhury
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PMOS HIGH-K METAL GATES
- Publication number 20220077298
- Publication date Mar 10, 2022
- Applied Material, Inc.
- SRINIVAS GANDIKOTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLUORINE-FREE TUNGSTEN ALD FOR DIELECTRIC SELECTIVITY IMPROVEMENT
- Publication number 20210384036
- Publication date Dec 9, 2021
- Applied Materials, Inc.
- Ilanit Fisher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fluorine-Free Tungsten ALD And Tungsten Selective CVD For Dielectrics
- Publication number 20210384035
- Publication date Dec 9, 2021
- Applied Materials, Inc.
- Ilanit Fisher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF TUNING FILM PROPERTIES OF METAL NITRIDE USING PLASMA
- Publication number 20210351071
- Publication date Nov 11, 2021
- Applied Materials, Inc.
- Wenyi LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENHANCED SPATIAL ALD OF METALS THROUGH CONTROLLED PRECURSOR MIXING
- Publication number 20210305052
- Publication date Sep 30, 2021
- Applied Materials, Inc.
- Kelvin Chan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEQUENTIAL PULSE AND PURGE FOR ALD PROCESSES
- Publication number 20210262092
- Publication date Aug 26, 2021
- Applied Materials, Inc.
- Muhammad M. Rasheed
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Wafer Out Of Pocket Detection
- Publication number 20200373178
- Publication date Nov 26, 2020
- Applied Materials, Inc.
- Sanggyum Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU TUNGSTEN DEPOSITION WITHOUT BARRIER LAYER
- Publication number 20200243341
- Publication date Jul 30, 2020
- Applied Materials, Inc.
- Yong Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Paired Dynamic Parallel Plate Capacitively Coupled Plasmas
- Publication number 20190385819
- Publication date Dec 19, 2019
- Applied Materials, Inc.
- Hari Ponnekanti
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PECVD APPARATUS FOR IN-SITU DEPOSITION OF FILM STACKS
- Publication number 20190376186
- Publication date Dec 12, 2019
- Novellus Systems, Inc.
- Jason Dirk Haverkamp
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Mandyam Sriram

Person

Patents Grantslast 30 patents

Enhancing gapfill performance of dram word line

Fluorine-free tungsten ALD for dielectric selectivity improvement

PMOS high-k metal gates

Paired dynamic parallel plate capacitively coupled plasmas

Single wafer processing environments with spatial separation

Enhanced spatial ALD of metals through controlled precursor mixing

Method of tuning film properties of metal nitride using plasma

Susceptor wafer chucks for bowed wafers

PMOS high-K metal gates

Injector for batch processing and methods of use

In-situ film annealing with spatial atomic layer deposition

Paired dynamic parallel plate capacitively coupled plasmas

Injector for batch processing and methods of use

Wafer out of pocket detection

Enhanced spatial ALD of metals through controlled precursor mixing

Bottom-up gap-fill by surface poisoning treatment

In-situ tungsten deposition without barrier layer

Top lamp module for carousel deposition chamber

Processing system containing an isolation region separating a depos...

PECVD apparatus for in-situ deposition of film stacks

Plasma activated conformal dielectric film deposition

Plasma activated conformal dielectric film deposition

Plasma activated conformal dielectric film deposition

Precise critical dimension control using bilayer ALD

Plasma activated conformal film deposition

PECVD deposition of smooth silicon films

In-situ deposition of film stacks

Carbon deposition-etch-ash gap fill process

Plasma activated conformal dielectric film deposition

Conformal doping via plasma activated atomic layer deposition and c...

Patents Applicationslast 30 patents

PLASMA-ENHANCED MOLYBDENUM DEPOSITION

BATCH PROCESSING CHAMBERS FOR PLASMA-ENHANCED DEPOSITION

SEMICONDUCTOR MANUFACTURING SUSCEPTOR POCKET EDGE FOR PROCESS IMPRO...

PLASMA-ENHANCED MOLYBDENUM DEPOSITION

SINGLE WAFER PROCESSING ENVIRONMENTS WITH SPATIAL SEPARATION

PECVD APPARATUS FOR IN-SITU DEPOSITION OF FILM STACKS

METHODS OF PREVENTING METAL CONTAMINATION BY CERAMIC HEATER

ENHANCED CHAMBER CLEAN AND RECOVERY WITH DUAL FLOW PATH

METHODS OF GROWING METAL-CONTAINING FILMS

METHOD OF TUNING FILM PROPERTIES OF METAL NITRIDE USING PLASMA

APPARATUS AND METHODS FOR FINE PLANAR NON-UNIFORMITY IMPROVEMENT

METHODS FOR SEAMLESS GAP FILLING USING GRADIENT OXIDATION

PMOS HIGH-K METAL GATES

HEATER PEDESTAL WITH IMPROVED UNIFORMITY

ENHANCING GAPFILL PERFORMANCE OF DRAM WORD LINE

MOSFET GATE ENGINEERINNG WITH DIPOLE FILMS

Injector For Batch Processing And Methods Of Use

PAIRED DYNAMIC PARALLEL PLATE CAPACITIVELY COUPLED PLASMAS

Method Of Reducing Titanium Nitride Etching During Tungsten Film Fo...

SUSCEPTOR WAFER CHUCKS FOR BOWED WAFERS

PMOS HIGH-K METAL GATES

FLUORINE-FREE TUNGSTEN ALD FOR DIELECTRIC SELECTIVITY IMPROVEMENT

Fluorine-Free Tungsten ALD And Tungsten Selective CVD For Dielectrics

METHOD OF TUNING FILM PROPERTIES OF METAL NITRIDE USING PLASMA

ENHANCED SPATIAL ALD OF METALS THROUGH CONTROLLED PRECURSOR MIXING

SEQUENTIAL PULSE AND PURGE FOR ALD PROCESSES

Wafer Out Of Pocket Detection

IN-SITU TUNGSTEN DEPOSITION WITHOUT BARRIER LAYER

Paired Dynamic Parallel Plate Capacitively Coupled Plasmas

PECVD APPARATUS FOR IN-SITU DEPOSITION OF FILM STACKS