Marcus Adrianus Van De Kerkhof

Person

Helmond, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Lithographic apparatus and method with improved contaminant particl...
- Patent number 12,158,706
- Issue date Dec 3, 2024
- ASML Netherlands B.V.
- Marcus Adrianus Van de Kerkhof
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus
- Patent number 12,117,736
- Issue date Oct 15, 2024
- ASML Netherlands B.V.
- Marcus Adrianus Van De Kerkhof
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a membrane assembly
- Patent number 12,072,620
- Issue date Aug 27, 2024
- ASML Netherlands B.V.
- Pieter-Jan Van Zwol
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle and pellicle assembly
- Patent number 12,066,758
- Issue date Aug 20, 2024
- ASML Netherlands B.V.
- David Ferdinand Vles
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Component for use in a lithographic apparatus, method of protecting...
- Patent number 12,001,149
- Issue date Jun 4, 2024
- ASML Netherlands B.V.
- Marcus Adrianus Van De Kerkhof
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluid transfer system in a charged particle system
- Patent number 11,996,262
- Issue date May 28, 2024
- ASML Netherlands B.V.
- Marcus Adrianus Van De Kerkhof
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Apparatus and method for determining a condition associated with a...
- Patent number 11,906,907
- Issue date Feb 20, 2024
- ASML Netherlands B.V.
- Derk Servatius Gertruda Brouns
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Membrane for EUV lithography
- Patent number 11,762,281
- Issue date Sep 19, 2023
- ASML Netherlands B.V.
- Maxim Aleksandrovich Nasalevich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Membrane cleaning apparatus
- Patent number 11,673,169
- Issue date Jun 13, 2023
- ASML Netherlands B.V.
- Andrey Nikipelov
- B08 - CLEANING
Information Patent Grant
Pellicle and pellicle assembly
- Patent number 11,347,142
- Issue date May 31, 2022
- ASML Netherlands B.V.
- David Ferdinand Vles
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Membrane for EUV lithography
- Patent number 11,320,731
- Issue date May 3, 2022
- ASML Netherlands B.V.
- Pieter-Jan Van Zwol
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus
- Patent number 11,294,291
- Issue date Apr 5, 2022
- ASML Netherlands B.V.
- Marcus Adrianus Van De Kerkhof
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cleaning apparatus and methods of cleaning
- Patent number 11,287,753
- Issue date Mar 29, 2022
- ASML Netherlands B.V.
- Marcus Adrianus Van De Kerkhof
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Heating system for an optical component of a lithographic apparatus
- Patent number 11,163,240
- Issue date Nov 2, 2021
- ASML Netherlands B.V.
- Franciscus Johannes Joseph Janssen
- G02 - OPTICS
Information Patent Grant
Projection system and mirror and radiation source for a lithographi...
- Patent number 11,150,560
- Issue date Oct 19, 2021
- ASML Netherlands B.V.
- Marcus Adrianus Van De Kerkhof
- G02 - OPTICS
Information Patent Grant
Component for use in a patterning device environment
- Patent number 11,048,180
- Issue date Jun 29, 2021
- ASML Netherlands B.V.
- Andrey Nikipelov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 11,003,096
- Issue date May 11, 2021
- ASML Netherlands B.V.
- Timotheus Franciscus Sengers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle and pellicle assembly
- Patent number 10,983,431
- Issue date Apr 20, 2021
- ASML Netherlands B.V.
- David Ferdinand Vles
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation analysis system
- Patent number 10,935,673
- Issue date Mar 2, 2021
- ASML Netherlands B.V.
- Marcus Adrianus Van De Kerkhof
- G01 - MEASURING TESTING
Information Patent Grant
Patterning device
- Patent number 10,928,735
- Issue date Feb 23, 2021
- ASML Netherlands B.V.
- Marcus Adrianus Van De Kerkhof
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Membrane for EUV lithography
- Patent number 10,908,496
- Issue date Feb 2, 2021
- ASML Netherlands B.V.
- Maxim Aleksandrovich Nasalevich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection system and mirror and radiation source for a lithographi...
- Patent number 10,732,511
- Issue date Aug 4, 2020
- ASML Netherlands B.V.
- Marcus Adrianus Van De Kerkhof
- G02 - OPTICS
Information Patent Grant
Patterning device
- Patent number 10,732,498
- Issue date Aug 4, 2020
- ASML Netherlands B.V.
- Pieter Cristiaan De Groot
- G02 - OPTICS
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 10,678,139
- Issue date Jun 9, 2020
- ASML Netherlands B.V.
- Joeri Lof
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 10,514,618
- Issue date Dec 24, 2019
- ASML Netherlands B.V.
- Timotheus Franciscus Sengers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle and pellicle assembly
- Patent number 10,466,585
- Issue date Nov 5, 2019
- ASML Netherlands B.V.
- David Ferdinand Vles
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning device
- Patent number 10,401,723
- Issue date Sep 3, 2019
- ASML Netherlands B.V.
- Pieter Cristiaan De Groot
- G02 - OPTICS
Information Patent Grant
Projection system and minor and radiation source for a lithographic...
- Patent number 10,216,093
- Issue date Feb 26, 2019
- ASML Netherlands B.V.
- Marcus Adrianus Van De Kerkhof
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 10,180,629
- Issue date Jan 15, 2019
- ASML Netherlands B.V.
- Joeri Lof
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 10,088,755
- Issue date Oct 2, 2018
- ASML Netherlands B.V.
- Marcus Adrianus Van De Kerkhof
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PATTERNING DEVICE FOR A LITHOGRAPHIC APPARATUS AND METHOD
- Publication number 20240369919
- Publication date Nov 7, 2024
- ASML NETHERLANDS B.V.
- Marcus Adrianus Van De Kerkhof
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING A MEMBRANE ASSEMBLY
- Publication number 20240369920
- Publication date Nov 7, 2024
- ASML NETHERLANDS B.V.
- Pieter-Jan VAN ZWOL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMAGING SYSTEM
- Publication number 20240361698
- Publication date Oct 31, 2024
- ASML NETHERLANDS B.V.
- Albertus HARTGERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A POSITION MEASUREMENT SYSTEM, A POSITIONING SYSTEM, A LITHOGRAPHIC...
- Publication number 20240361706
- Publication date Oct 31, 2024
- ASML NETHERLANDS B.V.
- Marcus Adrianus Van De Kerkhof
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHOD FOR PREPARING AND CLEANING A COMPONENT
- Publication number 20240337956
- Publication date Oct 10, 2024
- ASML NETHERLANDS B.V.
- Lucas Christiaan Johan HEIJMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY SYSTEM, SUBSTRATE SAG COMPENSATOR, AND METHOD
- Publication number 20240329546
- Publication date Oct 3, 2024
- ASML NETHERLANDS B.V.
- Marcus Adrianus Van De Kerkhof
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A CONTAMINATION REDUCTION SYSTEM
- Publication number 20240310742
- Publication date Sep 19, 2024
- ASML NETHERLANDS B.V.
- Vladimir KVON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COOLING HOOD FOR RETICLE
- Publication number 20240288783
- Publication date Aug 29, 2024
- ASML NETHERLANDS B.V.
- Marcus Adrianus VAN DE KERKHOF
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLUID TRANSFER SYSTEM IN A CHARGED PARTICLE SYSTEM
- Publication number 20240274400
- Publication date Aug 15, 2024
- ASML NETHERLANDS B.V.
- Marcus Adrianus VAN DE KERKHOF
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
SUBSTRATE HOLDER AND METHOD
- Publication number 20240264540
- Publication date Aug 8, 2024
- ASML NETHERLANDS B.V.
- Marcus Adrianus Van de Kerkhof
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR DETERMINING A CONDITION ASSOCIATED WITH A...
- Publication number 20240103386
- Publication date Mar 28, 2024
- ASML NETHERLANDS B.V.
- Derk Servatius Gertruda BROUNS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING DEVICE CONDITIONING SYSTEM AND METHOD
- Publication number 20240094647
- Publication date Mar 21, 2024
- ASML NETHERLANDS B.V.
- Marcus Adrianus VAN DE KERKHOF
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPONENT FOR USE IN A LITHOGRAPHIC APPARATUS, METHOD OF PROTECTING...
- Publication number 20240027925
- Publication date Jan 25, 2024
- ASML NETHERLANDS B.V.
- Marcus Adrianus VAN DE KERKHOF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEMBRANE FOR EUV LITHOGRAPHY
- Publication number 20240004283
- Publication date Jan 4, 2024
- ASML NETHERLANDS B.V.
- Maxim Aleksandrovich Nasalevich
- G02 - OPTICS
Information Patent Application
MEMBRANE CLEANING APPARATUS
- Publication number 20230311173
- Publication date Oct 5, 2023
- ASML NETHERLANDS B.V.
- Andrey NIKIPELOV
- B08 - CLEANING
Information Patent Application
APPARATUS AND METHOD FOR PROCESSING A RETICLE AND PELLICLE ASSEMBLY
- Publication number 20230314930
- Publication date Oct 5, 2023
- ASML NETHERLANDS B.V.
- Vadim Yevgenyevich BANINE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND METHODS FOR MULTI-EXPOSURE OF A SUBSTRATE
- Publication number 20230296986
- Publication date Sep 21, 2023
- ASML Holding N.V.
- Timothy Allan BRUNNER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OBJECT HOLDER, ELECTROSTATIC SHEET AND METHOD FOR MAKING AN ELECTRO...
- Publication number 20230236518
- Publication date Jul 27, 2023
- ASML NETHERLANDS B.V.
- Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC SYSTEM PROVIDED WITH A DEFLECTION APPARATUS FOR CHANGI...
- Publication number 20230063156
- Publication date Mar 2, 2023
- ASML Holding N.V.
- Ronald Peter ALBRIGHT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY APPARATUS WITH IMPROVED STABILITY
- Publication number 20230024490
- Publication date Jan 26, 2023
- ASML NETHERLANDS B.V.
- Paulus Albertus VAN HAL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND ELECTROSTATIC CLAMP DESIGNS
- Publication number 20230008474
- Publication date Jan 12, 2023
- ASML Holding N.V.
- Victor Antonio PEREZ-FALCON
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
SUBSTRATE HANDLING SYSTEM OF A LITHOGRAPHY APPARATUS AND METHOD THE...
- Publication number 20220342322
- Publication date Oct 27, 2022
- ASML NETHERLANDS B.V.
- Marcus Adrianus Van De Kerkhof
- B65 - CONVEYING PACKING STORING HANDLING THIN OR FILAMENTARY MATERIAL
Information Patent Application
A LITHOGRAPHIC APPARATUS
- Publication number 20220342315
- Publication date Oct 27, 2022
- ASML NETHERLANDS B.V.
- Marcus Adrianus Van De Kerkhof
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHIC APPARATUS AND METHOD WITH IMPROVED CONTAMINANT PARTICL...
- Publication number 20220276573
- Publication date Sep 1, 2022
- ASML NETHERLANDS B.V.
- Marcus Adrianus VAN DE KERKHOF
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE MEMBRANE FOR A LITHOGRAPHIC APPARATUS
- Publication number 20220276553
- Publication date Sep 1, 2022
- ASML NETHERLANDS B.V.
- Andrey NIKIPELOV
- B82 - NANO-TECHNOLOGY
Information Patent Application
OXYGEN-LOSS RESISTANT TOP COATING FOR OPTICAL ELEMENTS
- Publication number 20220260756
- Publication date Aug 18, 2022
- ASML NETHERLANDS B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE AND PELLICLE ASSEMBLY
- Publication number 20220252974
- Publication date Aug 11, 2022
- ASML NETHERLANDS B.V.
- David Ferdinand VLES
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV COLLECTOR MIRROR
- Publication number 20220236461
- Publication date Jul 28, 2022
- Carl Zeiss SMT GMBH
- Marcus VAN DE KERKHOF
- G02 - OPTICS
Information Patent Application
Component for Use in a Lithographic Apparatus, Method of Protecting...
- Publication number 20220075279
- Publication date Mar 10, 2022
- ASML NETHERLANDS B.V.
- Marcus Adrianus VAN DE KERKHOF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A MEMBRANE ASSEMBLY
- Publication number 20220035239
- Publication date Feb 3, 2022
- ASML NETHERLANDS B.V.
- Pieter-Jan VAN ZWOL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Marcus Adrianus Van De Kerkhof

Person

Patents Grantslast 30 patents

Lithographic apparatus and method with improved contaminant particl...

Lithographic apparatus

Method of manufacturing a membrane assembly

Pellicle and pellicle assembly

Component for use in a lithographic apparatus, method of protecting...

Fluid transfer system in a charged particle system

Apparatus and method for determining a condition associated with a...

Membrane for EUV lithography

Membrane cleaning apparatus

Pellicle and pellicle assembly

Membrane for EUV lithography

Lithographic apparatus

Cleaning apparatus and methods of cleaning

Heating system for an optical component of a lithographic apparatus

Projection system and mirror and radiation source for a lithographi...

Component for use in a patterning device environment

Lithographic apparatus and device manufacturing method

Pellicle and pellicle assembly

Radiation analysis system

Patterning device

Membrane for EUV lithography

Projection system and mirror and radiation source for a lithographi...

Patterning device

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Pellicle and pellicle assembly

Patterning device

Projection system and minor and radiation source for a lithographic...

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Patents Applicationslast 30 patents

PATTERNING DEVICE FOR A LITHOGRAPHIC APPARATUS AND METHOD

METHOD OF MANUFACTURING A MEMBRANE ASSEMBLY

IMAGING SYSTEM

A POSITION MEASUREMENT SYSTEM, A POSITIONING SYSTEM, A LITHOGRAPHIC...

APPARATUS AND METHOD FOR PREPARING AND CLEANING A COMPONENT

LITHOGRAPHY SYSTEM, SUBSTRATE SAG COMPENSATOR, AND METHOD

A CONTAMINATION REDUCTION SYSTEM

COOLING HOOD FOR RETICLE

FLUID TRANSFER SYSTEM IN A CHARGED PARTICLE SYSTEM

SUBSTRATE HOLDER AND METHOD

APPARATUS AND METHOD FOR DETERMINING A CONDITION ASSOCIATED WITH A...

PATTERNING DEVICE CONDITIONING SYSTEM AND METHOD

COMPONENT FOR USE IN A LITHOGRAPHIC APPARATUS, METHOD OF PROTECTING...

MEMBRANE FOR EUV LITHOGRAPHY

MEMBRANE CLEANING APPARATUS

APPARATUS AND METHOD FOR PROCESSING A RETICLE AND PELLICLE ASSEMBLY

LITHOGRAPHIC APPARATUS AND METHODS FOR MULTI-EXPOSURE OF A SUBSTRATE

OBJECT HOLDER, ELECTROSTATIC SHEET AND METHOD FOR MAKING AN ELECTRO...

LITHOGRAPHIC SYSTEM PROVIDED WITH A DEFLECTION APPARATUS FOR CHANGI...

LITHOGRAPHY APPARATUS WITH IMPROVED STABILITY

LITHOGRAPHIC APPARATUS AND ELECTROSTATIC CLAMP DESIGNS

SUBSTRATE HANDLING SYSTEM OF A LITHOGRAPHY APPARATUS AND METHOD THE...

A LITHOGRAPHIC APPARATUS

LITHOGRAPHIC APPARATUS AND METHOD WITH IMPROVED CONTAMINANT PARTICL...

PELLICLE MEMBRANE FOR A LITHOGRAPHIC APPARATUS

OXYGEN-LOSS RESISTANT TOP COATING FOR OPTICAL ELEMENTS

PELLICLE AND PELLICLE ASSEMBLY

EUV COLLECTOR MIRROR

Component for Use in a Lithographic Apparatus, Method of Protecting...

METHOD OF MANUFACTURING A MEMBRANE ASSEMBLY