Mark Neisser

Person

Whitehouse Station, NJ, US

People

Patents Grantslast 30 patents

Information Patent Grant
Compositions of neutral layer for directed self assembly block copo...
- Patent number 9,052,598
- Issue date Jun 9, 2015
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Hengpeng Wu
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Methods and materials for removing metals in block copolymers
- Patent number 9,040,659
- Issue date May 26, 2015
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Jian Yin
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Neutral layer polymer composition for directed self assembly and pr...
- Patent number 8,835,581
- Issue date Sep 16, 2014
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Hengpeng Wu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compositions of neutral layer for directed self assembly block copo...
- Patent number 8,691,925
- Issue date Apr 8, 2014
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Hengpeng Wu
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Methods and materials for removing metals in block copolymers
- Patent number 8,686,109
- Issue date Apr 1, 2014
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Jian Yin
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Positive-working photoimageable bottom antireflective coating
- Patent number 8,632,948
- Issue date Jan 21, 2014
- AZ Electronic Materials USA Corp.
- Munirathna Padmanaban
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Underlayer composition and process thereof
- Patent number 8,568,958
- Issue date Oct 29, 2013
- AZ Electronic Materials USA Corp.
- Huirong Yao
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Antireflective composition for photoresists
- Patent number 8,551,686
- Issue date Oct 8, 2013
- AZ Electronic Materials USA Corp.
- Huirong Yao
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Silicon-based antireflective coating compositions
- Patent number 8,524,441
- Issue date Sep 3, 2013
- AZ Electronic Materials USA Corp.
- Ruzhi Zhang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Underlayer coating composition and processes thereof
- Patent number 8,465,902
- Issue date Jun 18, 2013
- AZ Electronic Materials USA Corp.
- Huirong Yao
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Antireflective coating composition and process thereof
- Patent number 8,445,181
- Issue date May 21, 2013
- AZ Electronic Materials USA Corp.
- Huirong Yao
- G02 - OPTICS
Information Patent Grant
Antireflective coating compositions
- Patent number 8,329,387
- Issue date Dec 11, 2012
- AZ Electronic Materials USA Corp.
- Huirong Yao
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Antireflective coating compositions
- Patent number 8,211,621
- Issue date Jul 3, 2012
- AZ Electronic Materials USA Corp.
- David Abdallah
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Bottom antireflective coating compositions
- Patent number 8,088,548
- Issue date Jan 3, 2012
- AZ Electronic Materials USA Corp.
- Francis M. Houlihan
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive-working photoimageable bottom antireflective coating
- Patent number 8,039,202
- Issue date Oct 18, 2011
- AZ Electronic Materials USA Corp.
- Yu Sui
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Silicone coating composition
- Patent number 8,026,040
- Issue date Sep 27, 2011
- AZ Electronic Materials USA Corp.
- Hengpeng Wu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Solvent mixtures for antireflective coating compositions for photor...
- Patent number 7,824,844
- Issue date Nov 2, 2010
- AZ Electronic Materials USA Corp.
- Zhong Xiang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Positive-working photoimageable bottom antireflective coating
- Patent number 7,824,837
- Issue date Nov 2, 2010
- AZ Electronic Materials USA Corp.
- Hengpeng Wu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Process of imaging a photoresist with multiple antireflective coatings
- Patent number 7,816,071
- Issue date Oct 19, 2010
- AZ Electronic Materials USA Corp.
- David J. Abdallah
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Antireflective coating compositions
- Patent number 7,759,046
- Issue date Jul 20, 2010
- AZ Electronic Materials USA Corp.
- David Abdallah
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Antireflective coating compositions
- Patent number 7,666,575
- Issue date Feb 23, 2010
- AZ Electronic Materials USA Corp.
- Woo-Kyu Kim
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Anti-reflective coatings
- Patent number 7,553,905
- Issue date Jun 30, 2009
- AZ Electronic Materials USA Corp.
- David J. Abdallah
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Nanocomposite photoresist composition for imaging thick films
- Patent number 7,524,606
- Issue date Apr 28, 2009
- AZ Electronic Materials USA Corp.
- Chunwei Chen
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Antireflective compositions for photoresists
- Patent number 7,264,913
- Issue date Sep 4, 2007
- AZ Electronic Materials USA Corp.
- Hengpeng Wu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Nanocomposite photosensitive composition and use thereof
- Patent number 7,247,419
- Issue date Jul 24, 2007
- AZ Electronic Materials USA Corp.
- Chunwei Chen
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Process for making polyesters
- Patent number 7,081,511
- Issue date Jul 25, 2006
- AZ Electronic Materials USA Corp.
- Hengpeng Wu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Process for producing an image using a first minimum bottom antiref...
- Patent number 7,070,914
- Issue date Jul 4, 2006
- AZ Electronic Materials USA Corp.
- Mark O. Neisser
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive-working photoimageable bottom antireflective coating
- Patent number 6,844,131
- Issue date Jan 18, 2005
- Clariant Finance (BVI) Limited
- Joseph E. Oberlander
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Negative-acting aqueous photoresist composition
- Patent number 6,800,415
- Issue date Oct 5, 2004
- Clariant Finance (BVI) Ltd
- Ping-Hung Lu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
BOTTOM ANTIREFLECTIVE MATERIALS AND COMPOSITIONS
- Publication number 20150227043
- Publication date Aug 13, 2015
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Huirong YAO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITIONS OF NEUTRAL LAYER FOR DIRECTED SELF ASSEMBLY BLOCK COPO...
- Publication number 20140193754
- Publication date Jul 10, 2014
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Hengpeng WU
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHODS AND MATERIALS FOR REMOVING METALS IN BLOCK COPOLYMERS
- Publication number 20140151330
- Publication date Jun 5, 2014
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Jian YIN
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
NEUTRAL LAYER POLYMER COMPOSITION FOR DIRECTED SELF ASSEMBLY AND PR...
- Publication number 20130330668
- Publication date Dec 12, 2013
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Hengpeng WU
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHODS AND MATERIALS FOR REMOVING METALS IN BLOCK COPOLYMERS
- Publication number 20130233827
- Publication date Sep 12, 2013
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Jian YIN
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
COMPOSITIONS OF NEUTRAL LAYER FOR DIRECTED SELF ASSEMBLY BLOCK COPO...
- Publication number 20130078576
- Publication date Mar 28, 2013
- AZ Electronic Materials USA Corp.
- Hengpeng WU
- B82 - NANO-TECHNOLOGY
Information Patent Application
UNDERLAYER COMPOSITION AND PROCESS THEREOF
- Publication number 20120328990
- Publication date Dec 27, 2012
- AZ Electronic Materials USA Corp.
- Huirong YAO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
UNDERLAYER COATING COMPOSITION AND PROCESSES THEREOF
- Publication number 20120202155
- Publication date Aug 9, 2012
- Huirong Yao
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Edge Bead Remover For Coatings
- Publication number 20120108067
- Publication date May 3, 2012
- Mark O. Neisser
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Antireflective Coating Composition and Process Thereof
- Publication number 20110300488
- Publication date Dec 8, 2011
- Huirong Yao
- G02 - OPTICS
Information Patent Application
BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS
- Publication number 20110250544
- Publication date Oct 13, 2011
- AZ Electronic Materials USA Corp.
- Weihong Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Antireflective Composition for Photoresists
- Publication number 20110104613
- Publication date May 5, 2011
- Huirong Yao
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Positive-Working Photoimageable Bottom Antireflective Coating
- Publication number 20110076626
- Publication date Mar 31, 2011
- Munirathna Padmanaban
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Spin On Organic Antireflective Coating Composition Comprising Polym...
- Publication number 20100316949
- Publication date Dec 16, 2010
- M. Dalil Rahman
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Antireflective Coating Compositons
- Publication number 20100248137
- Publication date Sep 30, 2010
- David Abdallah
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Bottom Antireflective Coating Compositions
- Publication number 20100092894
- Publication date Apr 15, 2010
- Weihong Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process for making siloxane polymers
- Publication number 20100093969
- Publication date Apr 15, 2010
- Ruzhi Zhang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Hardmask Process for Forming a Reverse Tone Image
- Publication number 20100040838
- Publication date Feb 18, 2010
- David J. Abdallah
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DUAL DAMASCENE VIA FILLING COMPOSITION
- Publication number 20100015550
- Publication date Jan 21, 2010
- Weihong Liu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Antireflective Coating Compositions
- Publication number 20100009297
- Publication date Jan 14, 2010
- Huirong Yao
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Bottom Antireflective Coating Compositions
- Publication number 20090104559
- Publication date Apr 23, 2009
- Francis M. Houlihan
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Underlayer Coating Composition Based on a Crosslinkable Polymer
- Publication number 20090035704
- Publication date Feb 5, 2009
- Hong Zhuang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SILICONE COATING COMPOSITION
- Publication number 20080196626
- Publication date Aug 21, 2008
- Hengpeng Wu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Solvent Mixtures for Antireflective Coating Compositions for Photor...
- Publication number 20080176165
- Publication date Jul 24, 2008
- Zhong Xiang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Antireflective Coating Compositions
- Publication number 20080153035
- Publication date Jun 26, 2008
- David Abdallah
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Antireflective Coating Compositions
- Publication number 20080096125
- Publication date Apr 24, 2008
- Woo-Kyu Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive -Working Photoimageable Bottom Antireflective Coating
- Publication number 20080090184
- Publication date Apr 17, 2008
- Yu Sui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive-Working Photoimageable Bottom Antireflective Coating
- Publication number 20080038666
- Publication date Feb 14, 2008
- Hengpeng Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Antireflective Coating Compositions Comprising Siloxane Polymer
- Publication number 20070298349
- Publication date Dec 27, 2007
- Ruzhi Zhang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
NANOCOMPOSITE PHOTOSENSITIVE COMPOSITION AND USE THEREOF
- Publication number 20070141510
- Publication date Jun 21, 2007
- Chunwei Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Mark Neisser

Person

Patents Grantslast 30 patents

Compositions of neutral layer for directed self assembly block copo...

Methods and materials for removing metals in block copolymers

Neutral layer polymer composition for directed self assembly and pr...

Compositions of neutral layer for directed self assembly block copo...

Methods and materials for removing metals in block copolymers

Positive-working photoimageable bottom antireflective coating

Underlayer composition and process thereof

Antireflective composition for photoresists

Silicon-based antireflective coating compositions

Underlayer coating composition and processes thereof

Antireflective coating composition and process thereof

Antireflective coating compositions

Antireflective coating compositions

Bottom antireflective coating compositions

Positive-working photoimageable bottom antireflective coating

Silicone coating composition

Solvent mixtures for antireflective coating compositions for photor...

Positive-working photoimageable bottom antireflective coating

Process of imaging a photoresist with multiple antireflective coatings

Antireflective coating compositions

Antireflective coating compositions

Anti-reflective coatings

Nanocomposite photoresist composition for imaging thick films

Antireflective compositions for photoresists

Nanocomposite photosensitive composition and use thereof

Process for making polyesters

Process for producing an image using a first minimum bottom antiref...

Positive-working photoimageable bottom antireflective coating

Negative-acting aqueous photoresist composition

Patents Applicationslast 30 patents

BOTTOM ANTIREFLECTIVE MATERIALS AND COMPOSITIONS

COMPOSITIONS OF NEUTRAL LAYER FOR DIRECTED SELF ASSEMBLY BLOCK COPO...

METHODS AND MATERIALS FOR REMOVING METALS IN BLOCK COPOLYMERS

NEUTRAL LAYER POLYMER COMPOSITION FOR DIRECTED SELF ASSEMBLY AND PR...

METHODS AND MATERIALS FOR REMOVING METALS IN BLOCK COPOLYMERS

COMPOSITIONS OF NEUTRAL LAYER FOR DIRECTED SELF ASSEMBLY BLOCK COPO...

UNDERLAYER COMPOSITION AND PROCESS THEREOF

UNDERLAYER COATING COMPOSITION AND PROCESSES THEREOF

Edge Bead Remover For Coatings

Antireflective Coating Composition and Process Thereof

BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS

Antireflective Composition for Photoresists

Positive-Working Photoimageable Bottom Antireflective Coating

Spin On Organic Antireflective Coating Composition Comprising Polym...

Antireflective Coating Compositons

Bottom Antireflective Coating Compositions

Process for making siloxane polymers

Hardmask Process for Forming a Reverse Tone Image

DUAL DAMASCENE VIA FILLING COMPOSITION

Antireflective Coating Compositions

Bottom Antireflective Coating Compositions

Underlayer Coating Composition Based on a Crosslinkable Polymer

SILICONE COATING COMPOSITION

Solvent Mixtures for Antireflective Coating Compositions for Photor...

Antireflective Coating Compositions

Antireflective Coating Compositions

Positive -Working Photoimageable Bottom Antireflective Coating

Positive-Working Photoimageable Bottom Antireflective Coating

Antireflective Coating Compositions Comprising Siloxane Polymer

NANOCOMPOSITE PHOTOSENSITIVE COMPOSITION AND USE THEREOF