Markus Koch

Person

Neu-Ulm, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Method for reproducing a target wavefront of an imaging optical pro...
- Patent number 12,158,703
- Issue date Dec 3, 2024
- Carl Zeiss SMT GmbH
- Lukas Fischer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and device for characterizing a mask for microlithography
- Patent number 11,188,000
- Issue date Nov 30, 2021
- Carl Zeiss SMT GmbH
- Michael Kamp-Froese
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for detecting a structure of a lithography mask and device f...
- Patent number 11,079,338
- Issue date Aug 3, 2021
- Carl Zeiss SMT GmbH
- Ulrich Matejka
- G01 - MEASURING TESTING
Information Patent Grant
Method for determining a structure-independent contribution of a li...
- Patent number 11,061,331
- Issue date Jul 13, 2021
- Carl Zeiss SMT GmbH
- Markus Koch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for examining photolithographic masks and mask metrology app...
- Patent number 10,775,691
- Issue date Sep 15, 2020
- Carl Zeiss SMT GmbH
- Dirk Hellweg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining a focus position of a lithography mask and m...
- Patent number 10,564,551
- Issue date Feb 18, 2020
- Carl Zeiss SMT GmbH
- Markus Koch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining an imaging aberration contribution of an ima...
- Patent number 10,481,505
- Issue date Nov 19, 2019
- Carl Zeiss SMT GmbH
- Markus Koch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR SIMULATING ILLUMINATION AND IMAGING PROPERTIES OF AN OPT...
- Publication number 20240402613
- Publication date Dec 5, 2024
- Carl Zeiss SMT GMBH
- Alexander Winkler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM FOR A METROLOGY SYSTEM AND METROLOGY SYSTEM WITH SUC...
- Publication number 20240369946
- Publication date Nov 7, 2024
- Carl Zeiss SMT GMBH
- Matthias Wald
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM FOR A METROLOGY SYSTEM AND METROLOGY SYSTEM WITH SUC...
- Publication number 20240369945
- Publication date Nov 7, 2024
- Carl Zeiss SMT GMBH
- Arne Schob
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR SIMULATING ILLUMINATION AND IMAGING PROPERTIES OF AN OPT...
- Publication number 20240361704
- Publication date Oct 31, 2024
- Carl Zeiss SMT GMBH
- Klaus Gwosch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR QUALIFYING A MASK FOR USE IN LITHOGRAPHY
- Publication number 20240085779
- Publication date Mar 14, 2024
- Carl Zeiss SMT GMBH
- Renzo Capelli
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR REPRODUCING A TARGET WAVEFRONT OF AN IMAGING OPTICAL PRO...
- Publication number 20230130187
- Publication date Apr 27, 2023
- Carl Zeiss SMT GMBH
- Lukas Fischer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING AN IMAGING QUALITY OF AN OPTICAL SYSTEM WHEN...
- Publication number 20220390320
- Publication date Dec 8, 2022
- Carl Zeiss SMT GMBH
- Markus Koch
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR DETERMINING AN IMAGING QUALITY OF AN OPTICAL SYSTEM WHEN...
- Publication number 20220381643
- Publication date Dec 1, 2022
- Carl Zeiss SMT GMBH
- Klaus Gwosch
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR MEASURING A REFLECTIVITY OF AN OBJECT FOR MEASUREMENT LI...
- Publication number 20220236648
- Publication date Jul 28, 2022
- Carl Zeiss SMT GMBH
- Renzo Capelli
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR APPROXIMATING IMAGING PROPERTIES OF AN OPTICAL PRODUCTIO...
- Publication number 20220057709
- Publication date Feb 24, 2022
- Carl Zeiss SMT GMBH
- Markus Koch
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND DEVICE FOR CHARACTERIZING A MASK FOR MICROLITHOGRAPHY
- Publication number 20200363737
- Publication date Nov 19, 2020
- Carl Zeiss SMT GMBH
- Michael Kamp-Froese
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETECTING A STRUCTURE OF A LITHOGRAPHY MASK AND DEVICE F...
- Publication number 20190391087
- Publication date Dec 26, 2019
- Carl Zeiss SMT GMBH
- Ulrich Matejka
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR DETERMINING AN IMAGING ABERRATION CONTRIBUTION OF AN IMA...
- Publication number 20190258170
- Publication date Aug 22, 2019
- Carl Zeiss SMT GMBH
- Markus Koch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING A STRUCTURE-INDEPENDENT CONTRIBUTION OF A LI...
- Publication number 20190258176
- Publication date Aug 22, 2019
- Carl Zeiss SMT GMBH
- Markus Koch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING A FOCUS POSITION OF A LITHOGRAPHY MASK AND M...
- Publication number 20190258180
- Publication date Aug 22, 2019
- Carl Zeiss SMT GMBH
- Markus Koch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR EXAMINING PHOTOLITHOGRAPHIC MASKS AND MASK METROLOGY APP...
- Publication number 20190079381
- Publication date Mar 14, 2019
- Carl Zeiss SMT GMBH
- Dirk Hellweg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Markus Koch

Person

Patents Grantslast 30 patents

Method for reproducing a target wavefront of an imaging optical pro...

Method and device for characterizing a mask for microlithography

Method for detecting a structure of a lithography mask and device f...

Method for determining a structure-independent contribution of a li...

Method for examining photolithographic masks and mask metrology app...

Method for determining a focus position of a lithography mask and m...

Method for determining an imaging aberration contribution of an ima...

Patents Applicationslast 30 patents

METHOD FOR SIMULATING ILLUMINATION AND IMAGING PROPERTIES OF AN OPT...

OPTICAL SYSTEM FOR A METROLOGY SYSTEM AND METROLOGY SYSTEM WITH SUC...

OPTICAL SYSTEM FOR A METROLOGY SYSTEM AND METROLOGY SYSTEM WITH SUC...

METHOD FOR SIMULATING ILLUMINATION AND IMAGING PROPERTIES OF AN OPT...

METHOD AND APPARATUS FOR QUALIFYING A MASK FOR USE IN LITHOGRAPHY

METHOD FOR REPRODUCING A TARGET WAVEFRONT OF AN IMAGING OPTICAL PRO...

METHOD FOR DETERMINING AN IMAGING QUALITY OF AN OPTICAL SYSTEM WHEN...

METHOD FOR DETERMINING AN IMAGING QUALITY OF AN OPTICAL SYSTEM WHEN...

METHOD FOR MEASURING A REFLECTIVITY OF AN OBJECT FOR MEASUREMENT LI...

METHOD FOR APPROXIMATING IMAGING PROPERTIES OF AN OPTICAL PRODUCTIO...

METHOD AND DEVICE FOR CHARACTERIZING A MASK FOR MICROLITHOGRAPHY

METHOD FOR DETECTING A STRUCTURE OF A LITHOGRAPHY MASK AND DEVICE F...

METHOD FOR DETERMINING AN IMAGING ABERRATION CONTRIBUTION OF AN IMA...

METHOD FOR DETERMINING A STRUCTURE-INDEPENDENT CONTRIBUTION OF A LI...

METHOD FOR DETERMINING A FOCUS POSITION OF A LITHOGRAPHY MASK AND M...

METHOD FOR EXAMINING PHOTOLITHOGRAPHIC MASKS AND MASK METROLOGY APP...