Martin Antoni

Person

Aalen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Illumination system particularly for microlithography
- Patent number 7,977,651
- Issue date Jul 12, 2011
- Carl Zeiss SMT GmbH
- Hans-Juergen Mann
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Illumination system particularly for microlithography
- Patent number RE42065
- Issue date Jan 25, 2011
- Carl Zeiss SMT AG
- Martin Antoni
- 355 - Photocopying
Information Patent Grant
Focusing-device for the radiation from a light source
- Patent number 7,871,171
- Issue date Jan 18, 2011
- Carl Zeiss SMT AG
- Martin Antoni
- G02 - OPTICS
Information Patent Grant
Illumination system particularly for microlithography
- Patent number RE41667
- Issue date Sep 14, 2010
- Carl Zeiss SMT AG
- Martin Antoni
- 250 - Radiant energy
Information Patent Grant
Illumination system particularly for microlithography
- Patent number 7,592,598
- Issue date Sep 22, 2009
- Carl Zeiss SMT AG
- Hans-Juergen Mann
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Multi mirror system for an illumination system
- Patent number 7,583,433
- Issue date Sep 1, 2009
- Carl Zeiss SMT AG
- Martin Antoni
- G02 - OPTICS
Information Patent Grant
Illumination system for a wavelength of ≦ 193 nm, with sensors for...
- Patent number 7,473,907
- Issue date Jan 6, 2009
- Carl Zeiss SMT AG
- Wolfgang Singer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system particularly for microlithography
- Patent number 7,456,408
- Issue date Nov 25, 2008
- Carl Zeiss SMT AG
- Hans-Juergen Mann
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Illumination system particularly for microlithography
- Patent number 7,443,948
- Issue date Oct 28, 2008
- Carl Zeiss SMT AG
- Jörg Schultz
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Focusing-device for the radiation from a light source
- Patent number 7,410,265
- Issue date Aug 12, 2008
- Carl Zeiss SMT AG
- Martin Antoni
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Illumination system with raster elements of different sizes
- Patent number 7,400,699
- Issue date Jul 15, 2008
- Carl Zeiss SMT AG
- Wolfgang Singer
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Illumination system particularly for microlithography
- Patent number 7,348,565
- Issue date Mar 25, 2008
- Carl Zeiss SMT AG
- Hans-Juergen Mann
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
EUV illumination system having a plurality of light sources for ill...
- Patent number 7,329,886
- Issue date Feb 12, 2008
- Carl Zeiss SMT AG
- Wolfgang Singer
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Collector with fastening devices for fastening mirror shells
- Patent number 7,321,126
- Issue date Jan 22, 2008
- Carl Zeiss SMT AG
- Wolfgang Singer
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Illumination system particularly for microlithography
- Patent number 7,186,983
- Issue date Mar 6, 2007
- Carl Zeiss SMT AG
- Hans-Juergen Mann
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Illumination system particularly for microlithography
- Patent number 7,142,285
- Issue date Nov 28, 2006
- Carl Zeiss SMT AG
- Martin Antoni
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Illumination system particularly for microlithography
- Patent number 7,109,497
- Issue date Sep 19, 2006
- Carl Zeiss SMT AG
- Martin Antoni
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Collector with fastening devices for fastening mirror shells
- Patent number 7,091,505
- Issue date Aug 15, 2006
- Carl Zeiss SMT AG
- Wolfgang Singer
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Illumination system particularly for microlithography
- Patent number 7,006,595
- Issue date Feb 28, 2006
- Carl Zeiss Semiconductor Manufacturing Technologies AG
- Wolfgang Singer
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Illumination system particularly for microlithography
- Patent number 6,947,120
- Issue date Sep 20, 2005
- Carl Zeiss SMT AG
- Martin Antoni
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Illumination system particularly for microlithography
- Patent number 6,947,124
- Issue date Sep 20, 2005
- Carl Zeiss SMT AG
- Martin Antoni
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Illumination system that suppresses debris from a light source
- Patent number 6,927,403
- Issue date Aug 9, 2005
- Carl Zeiss SMT AG
- Wolfgang Singer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Illumination system particularly for microlithography
- Patent number 6,859,328
- Issue date Feb 22, 2005
- Carl Zeiss Semiconductor
- Jörg Schultz
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Illumination system particularly for microlithography
- Patent number 6,858,853
- Issue date Feb 22, 2005
- Carl Zeiss SMT AG
- Martin Antoni
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Multi mirror system for an illumination system
- Patent number 6,840,640
- Issue date Jan 11, 2005
- Carl Zeiss SMT AG
- Martin Antoni
- G02 - OPTICS
Information Patent Grant
Focusing-device for the radiation from a light source
- Patent number 6,655,808
- Issue date Dec 2, 2003
- Carl Zeiss SMT AG
- Martin Antoni
- G02 - OPTICS
Information Patent Grant
Projection exposure device
- Patent number 6,636,367
- Issue date Oct 21, 2003
- Carl-Zeiss-Stiftung
- Ulrich Drodofsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system with reduced heat load
- Patent number 6,611,574
- Issue date Aug 26, 2003
- Carl Zeiss Semiconductor Manufacturing Technologies AG
- Wolfgang Singer
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Projection exposure device
- Patent number 6,535,274
- Issue date Mar 18, 2003
- Carl-Zeiss-Stiftung
- Martin Antoni
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system particularly for microlithography
- Patent number 6,438,199
- Issue date Aug 20, 2002
- Carl-Zeiss-Stiftung
- Jörg Schultz
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
ILLUMINATION SYSTEM PARTICULARLY FOR MICROLITHOGRAPHY
- Publication number 20090316128
- Publication date Dec 24, 2009
- Carl Zeiss SMT AG
- Hans-Juergen Mann
- B82 - NANO-TECHNOLOGY
Information Patent Application
ILLUMINATION SYSTEM PARTICULARLY FOR MICROLITHOGRAPHY
- Publication number 20090073410
- Publication date Mar 19, 2009
- Carl Zeiss SMT AG
- Hans-Juergen Mann
- B82 - NANO-TECHNOLOGY
Information Patent Application
ILLUMINATION SYSTEM PARTICULARLY FOR MICROLITHOGRAPHY
- Publication number 20090015812
- Publication date Jan 15, 2009
- Carl Zeiss SMT AG
- Joerg Schultz
- B82 - NANO-TECHNOLOGY
Information Patent Application
Focusing-device for the radiation from a light source
- Publication number 20080297755
- Publication date Dec 4, 2008
- Carl Zeiss SMT AG
- Martin Antoni
- G02 - OPTICS
Information Patent Application
EUV illumination system having a folding geometry
- Publication number 20080225258
- Publication date Sep 18, 2008
- Carl Zeiss SMT AG
- Wolfgang Singer
- B82 - NANO-TECHNOLOGY
Information Patent Application
Illumination system particularly for microlithography
- Publication number 20080130076
- Publication date Jun 5, 2008
- Carl Zeiss SMT AG
- Hans-Juergen Mann
- G02 - OPTICS
Information Patent Application
Collector with fastening devices for fastening mirror shells
- Publication number 20080042079
- Publication date Feb 21, 2008
- Carl Zeiss SMT
- Wolfgang Singer
- G02 - OPTICS
Information Patent Application
Illumination system particularly for microlithography
- Publication number 20070120072
- Publication date May 31, 2007
- Carl Zeiss SMT AG
- Hans-Juergen Mann
- G02 - OPTICS
Information Patent Application
Collector with fastening devices for fastening mirror shells
- Publication number 20060291062
- Publication date Dec 28, 2006
- Carl Zeiss SMT AG
- Wolfgang Singer
- G02 - OPTICS
Information Patent Application
Illumination system particularly for microlithography
- Publication number 20060245540
- Publication date Nov 2, 2006
- CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG
- Jorg Schultz
- G02 - OPTICS
Information Patent Application
ILLUMINATION SYSTEM PARTICULARLY FOR MICROLITHOGRAPHY
- Publication number 20060233300
- Publication date Oct 19, 2006
- Martin Antoni
- B82 - NANO-TECHNOLOGY
Information Patent Application
Optical element for an illumination system
- Publication number 20060132747
- Publication date Jun 22, 2006
- Carl Zeiss SMT AG
- Wolfgang Singer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Illumination system for a wavelength of less than or equal to 193 n...
- Publication number 20050274897
- Publication date Dec 15, 2005
- Carl Zeiss SMT AG and ASML Netherlands
- Wolfgang Singer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical element for forming an arc-shaped illumination field
- Publication number 20050207039
- Publication date Sep 22, 2005
- Carl Zeiss SMT AG
- Wolfgang Singer
- G02 - OPTICS
Information Patent Application
Illumination system particularly for microlithography
- Publication number 20050088760
- Publication date Apr 28, 2005
- Carl Zeiss SMT AG
- Hans-Juergen Mann
- G02 - OPTICS
Information Patent Application
Multi mirror system for an illumination system
- Publication number 20050083503
- Publication date Apr 21, 2005
- Carl Zeiss SMT AG
- Martin Antoni
- G02 - OPTICS
Information Patent Application
EUV illumination system having a folding geometry
- Publication number 20050002090
- Publication date Jan 6, 2005
- Carl Zeiss SMT AG
- Wolfgang Singer
- B82 - NANO-TECHNOLOGY
Information Patent Application
Illumination system with a plurality of light sources
- Publication number 20040256575
- Publication date Dec 23, 2004
- Carl Zeiss SMT AG
- Wolfgang Singer
- B82 - NANO-TECHNOLOGY
Information Patent Application
Collector with fastening devices for fastening mirror shells
- Publication number 20040227103
- Publication date Nov 18, 2004
- Carl Zeiss SMT AG
- Wolfgang Singer
- G02 - OPTICS
Information Patent Application
Focusing-device for the radiation from a light source
- Publication number 20040130809
- Publication date Jul 8, 2004
- Carl Zeiss SMT AG
- Martin Antoni
- G02 - OPTICS
Information Patent Application
Illumination system particularly for microlithography
- Publication number 20040037388
- Publication date Feb 26, 2004
- Martin Antoni
- B82 - NANO-TECHNOLOGY
Information Patent Application
Illumination system particularly for microlithography
- Publication number 20040037387
- Publication date Feb 26, 2004
- Martin Antoni
- G02 - OPTICS
Information Patent Application
Illumination system particularly for microlithography
- Publication number 20040028175
- Publication date Feb 12, 2004
- Martin Antoni
- B82 - NANO-TECHNOLOGY
Information Patent Application
Illumination system particularly for microlithography
- Publication number 20040022353
- Publication date Feb 5, 2004
- Martin Antoni
- B82 - NANO-TECHNOLOGY
Information Patent Application
Illumination system particularly for microlithography
- Publication number 20040017885
- Publication date Jan 29, 2004
- Martin Antoni
- B82 - NANO-TECHNOLOGY
Information Patent Application
Illumination system particularly for microlithography
- Publication number 20030095622
- Publication date May 22, 2003
- CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG
- Jorg Schultz
- G02 - OPTICS
Information Patent Application
Illumination system that suppresses debris from a ligh source
- Publication number 20030095623
- Publication date May 22, 2003
- Wolfgang Singer
- B82 - NANO-TECHNOLOGY
Information Patent Application
Illumination system particularly for microlithography
- Publication number 20030086524
- Publication date May 8, 2003
- CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG
- Jorg Schultz
- G02 - OPTICS
Information Patent Application
Multi mirror system for an illumination system
- Publication number 20030076607
- Publication date Apr 24, 2003
- Martin Antoni
- G02 - OPTICS
Information Patent Application
Illumination system with reduced heat load
- Publication number 20020141071
- Publication date Oct 3, 2002
- Wolfgang Singer
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING

Martin Antoni

Person

Patents Grantslast 30 patents

Illumination system particularly for microlithography

Illumination system particularly for microlithography

Focusing-device for the radiation from a light source

Illumination system particularly for microlithography

Illumination system particularly for microlithography

Multi mirror system for an illumination system

Illumination system for a wavelength of ≦ 193 nm, with sensors for...

Illumination system particularly for microlithography

Illumination system particularly for microlithography

Focusing-device for the radiation from a light source

Illumination system with raster elements of different sizes

Illumination system particularly for microlithography

EUV illumination system having a plurality of light sources for ill...

Collector with fastening devices for fastening mirror shells

Illumination system particularly for microlithography

Illumination system particularly for microlithography

Illumination system particularly for microlithography

Collector with fastening devices for fastening mirror shells

Illumination system particularly for microlithography

Illumination system particularly for microlithography

Illumination system particularly for microlithography

Illumination system that suppresses debris from a light source

Illumination system particularly for microlithography

Illumination system particularly for microlithography

Multi mirror system for an illumination system

Focusing-device for the radiation from a light source

Projection exposure device

Illumination system with reduced heat load

Projection exposure device

Illumination system particularly for microlithography

Patents Applicationslast 30 patents

ILLUMINATION SYSTEM PARTICULARLY FOR MICROLITHOGRAPHY

ILLUMINATION SYSTEM PARTICULARLY FOR MICROLITHOGRAPHY

ILLUMINATION SYSTEM PARTICULARLY FOR MICROLITHOGRAPHY

Focusing-device for the radiation from a light source

EUV illumination system having a folding geometry

Illumination system particularly for microlithography

Collector with fastening devices for fastening mirror shells

Illumination system particularly for microlithography

Collector with fastening devices for fastening mirror shells

Illumination system particularly for microlithography

ILLUMINATION SYSTEM PARTICULARLY FOR MICROLITHOGRAPHY

Optical element for an illumination system

Illumination system for a wavelength of less than or equal to 193 n...

Optical element for forming an arc-shaped illumination field

Illumination system particularly for microlithography

Multi mirror system for an illumination system

EUV illumination system having a folding geometry

Illumination system with a plurality of light sources

Collector with fastening devices for fastening mirror shells

Focusing-device for the radiation from a light source

Illumination system particularly for microlithography

Illumination system particularly for microlithography

Illumination system particularly for microlithography

Illumination system particularly for microlithography

Illumination system particularly for microlithography

Illumination system particularly for microlithography

Illumination system that suppresses debris from a ligh source

Illumination system particularly for microlithography

Multi mirror system for an illumination system

Illumination system with reduced heat load