Martin Endres

Person

Koenigsbronn, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Pupil facet mirror, optical system and illumination optics for a pr...
- Patent number 11,169,445
- Issue date Nov 9, 2021
- Carl Zeiss SMT GmbH
- Stig Bieling
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination intensity correction device for specifying an illumina...
- Patent number 10,877,379
- Issue date Dec 29, 2020
- Carl Zeiss SMT GmbH
- Ramon Van Gorkom
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for illuminating an object field of a projection exposure sy...
- Patent number 10,409,167
- Issue date Sep 10, 2019
- Carl Zeiss SMT GmbH
- Martin Endres
- G02 - OPTICS
Information Patent Grant
Reflecting coating with optimized thickness
- Patent number 10,146,136
- Issue date Dec 4, 2018
- Carl Zeiss SMT GmbH
- Martin Endres
- G02 - OPTICS
Information Patent Grant
Illumination optical assembly for a projection exposure apparatus
- Patent number 10,133,182
- Issue date Nov 20, 2018
- Carl Zeiss SMT GmbH
- Martin Endres
- G02 - OPTICS
Information Patent Grant
Illumination intensity correction device for predefining an illumin...
- Patent number 10,067,424
- Issue date Sep 4, 2018
- Carl Zeiss SMT GmbH
- Martin Endres
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination optical unit for EUV projection lithography
- Patent number 10,018,917
- Issue date Jul 10, 2018
- Carl Zeiss SMT GmbH
- Stig Bieling
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination optical assembly for projection lithography
- Patent number 9,996,010
- Issue date Jun 12, 2018
- Carl Zeiss SMT GmbH
- Martin Endres
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Facet mirror for use in a projection exposure apparatus for microli...
- Patent number 9,996,012
- Issue date Jun 12, 2018
- Carl Zeiss SMT GmbH
- Udo Dinger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination optical unit for EUV projection lithography
- Patent number 9,983,484
- Issue date May 29, 2018
- Carl Zeiss SMT GmbH
- Martin Endres
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination optical unit for projection lithography
- Patent number 9,977,335
- Issue date May 22, 2018
- Carl Zeiss SMT GmbH
- Martin Endres
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system and illumination optical unit for EUV projectio...
- Patent number 9,921,484
- Issue date Mar 20, 2018
- Carl Zeiss SMT GmbH
- Martin Endres
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination optical assembly for projection lithography
- Patent number 9,915,875
- Issue date Mar 13, 2018
- Carl Zeiss SMT GmbH
- Martin Endres
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination optical unit for projection lithography
- Patent number 9,897,924
- Issue date Feb 20, 2018
- Carl Zeiss SMT GmbH
- Martin Endres
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Micromirror array
- Patent number 9,897,923
- Issue date Feb 20, 2018
- Carl Zeiss SMT GmbH
- Martin Endres
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination optical unit
- Patent number 9,891,530
- Issue date Feb 13, 2018
- Carl Zeiss SMT GmbH
- Martin Endres
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror array
- Patent number 9,874,819
- Issue date Jan 23, 2018
- Carl Zeiss SMT GmbH
- Stig Bieling
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV collector
- Patent number 9,754,695
- Issue date Sep 5, 2017
- Carl Zeiss SMT GmbH
- Martin Endres
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror
- Patent number 9,678,439
- Issue date Jun 13, 2017
- Carl Zeiss SMT GmbH
- Ingo Saenger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system for EUV lithography
- Patent number 9,671,608
- Issue date Jun 6, 2017
- Carl Zeiss SMT GmbH
- Martin Endres
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination optical unit
- Patent number 9,632,422
- Issue date Apr 25, 2017
- Carl Zeiss SMT GmbH
- Martin Endres
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Catoptric illumination system for microlithography tool
- Patent number 9,588,434
- Issue date Mar 7, 2017
- Carl Zeiss SMT GmbH
- Jens Ossmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination optical unit
- Patent number 9,507,268
- Issue date Nov 29, 2016
- Carl Zeiss SMT GmbH
- Martin Endres
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Facet mirror for use in a projection exposure apparatus for microli...
- Patent number 9,411,241
- Issue date Aug 9, 2016
- Carl Zeiss SMT GmbH
- Udo Dinger
- G02 - OPTICS
Information Patent Grant
Deflection mirror and projection exposure apparatus for microlithog...
- Patent number 9,341,958
- Issue date May 17, 2016
- Carl Zeiss SMT GmbH
- Hartmut Enkisch
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Component for setting a scan-integrated illumination energy in an o...
- Patent number 9,310,692
- Issue date Apr 12, 2016
- Carl Zeiss SMT GmbH
- Ralf Stuetzle
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Field facet mirror for an illumination optics of a projection expos...
- Patent number 9,304,406
- Issue date Apr 5, 2016
- Carl Zeiss SMT GmbH
- Adrian Staicu
- G02 - OPTICS
Information Patent Grant
Projection objective for microlithography
- Patent number 9,304,408
- Issue date Apr 5, 2016
- Carl Zeiss SMT GmbH
- Johannes Zellner
- G02 - OPTICS
Information Patent Grant
Illumination system for EUV microlithography
- Patent number 9,304,400
- Issue date Apr 5, 2016
- Carl Zeiss SMT GmbH
- Michael Layh
- G02 - OPTICS
Information Patent Grant
Imaging optical system and illumination optical system
- Patent number 9,182,578
- Issue date Nov 10, 2015
- Carl Zeiss SMT GmbH
- Hans-Juergen Mann
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
MEASURING DEVICE FOR INTERFEROMETRICALLY MEASURING A SURFACE FORM
- Publication number 20240011768
- Publication date Jan 11, 2024
- Carl Zeiss SMT GMBH
- Martin Endres
- G01 - MEASURING TESTING
Information Patent Application
PUPIL FACET MIRROR, OPTICAL SYSTEM AND ILLUMINATION OPTICS FOR A PR...
- Publication number 20200272058
- Publication date Aug 27, 2020
- Carl Zeiss SMT GMBH
- Stig Bieling
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION INTENSITY CORRECTION DEVICE FOR SPECIFYING AN ILLUMINA...
- Publication number 20200272060
- Publication date Aug 27, 2020
- ASML NETHERLANDS B.V.
- Ramon Van Gorkom
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION OPTICAL UNIT FOR EUV PROJECTION LITHOGRAPHY
- Publication number 20170248851
- Publication date Aug 31, 2017
- Carl Zeiss SMT GMBH
- Martin Endres
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION OPTICAL ASSEMBLY FOR A PROJECTION EXPOSURE APPARATUS
- Publication number 20170160643
- Publication date Jun 8, 2017
- Carl Zeiss SMT GMBH
- Martin Endres
- G02 - OPTICS
Information Patent Application
IILLUMINATION OPTICAL UNIT FOR PROJECTION LITHOGRAPHY
- Publication number 20170160641
- Publication date Jun 8, 2017
- Carl Zeiss SMT GMBH
- Martin Endres
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION OPTICAL UNIT FOR EUV PROJECTION LITHOGRAPHY
- Publication number 20170160642
- Publication date Jun 8, 2017
- Carl Zeiss SMT GMBH
- Stig Bieling
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION OPTICAL ASSEMBLY FOR PROJECTION LITHOGRAPHY
- Publication number 20170160640
- Publication date Jun 8, 2017
- Carl Zeiss SMT GMBH
- Martin Endres
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION OPTICAL ASSEMBLY FOR PROJECTION LITHOGRAPHY
- Publication number 20170160644
- Publication date Jun 8, 2017
- Carl Zeiss SMT GMBH
- Martin Endres
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR ILLUMINATING AN OBJECT FIELD OF A PROJECTION EXPOSURE SY...
- Publication number 20160342094
- Publication date Nov 24, 2016
- Carl Zeiss SMT GMBH
- Martin Endres
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MIRROR ARRAY
- Publication number 20160342095
- Publication date Nov 24, 2016
- Carl Zeiss SMT GMBH
- Stig Bieling
- G02 - OPTICS
Information Patent Application
ILLUMINATION OPTICAL UNIT FOR PROJECTION LITHOGRAPHY
- Publication number 20160327868
- Publication date Nov 10, 2016
- Carl Zeiss SMT GMBH
- Martin Endres
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FACET MIRROR FOR USE IN A PROJECTION EXPOSURE APPARATUS FOR MICROLI...
- Publication number 20160313646
- Publication date Oct 27, 2016
- Carl Zeiss SMT GMBH
- Udo Dinger
- G02 - OPTICS
Information Patent Application
ILLUMINATION SYSTEM AND ILLUMINATION OPTICAL UNIT FOR EUV PROJECTIO...
- Publication number 20160195816
- Publication date Jul 7, 2016
- Carl Zeiss SMT GMBH
- Martin Endres
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROMIRROR ARRAY
- Publication number 20160154318
- Publication date Jun 2, 2016
- Carl Zeiss SMT GMBH
- Martin Endres
- G02 - OPTICS
Information Patent Application
REFLECTING COATING WITH OPTIMIZED THICKNESS
- Publication number 20160048083
- Publication date Feb 18, 2016
- Carl Zeiss SMT GMBH
- Martin ENDRES
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV COLLECTOR
- Publication number 20150194230
- Publication date Jul 9, 2015
- Carl Zeiss SMT GMBH
- Martin Endres
- G02 - OPTICS
Information Patent Application
MIRROR
- Publication number 20150160561
- Publication date Jun 11, 2015
- Carl Zeiss SMT GMBH
- Ingo Saenger
- G02 - OPTICS
Information Patent Application
ILLUMINATION OPTICAL UNIT
- Publication number 20150092174
- Publication date Apr 2, 2015
- Carl Zeiss SMT GMBH
- Martin Endres
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
ILLUMINATION INTENSITY CORRECTION DEVICE FOR PREDEFINING AN ILLUMIN...
- Publication number 20150015865
- Publication date Jan 15, 2015
- Carl Zeiss SMT GMBH
- Martin Endres
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION SYSTEM FOR EUV LITHOGRAPHY
- Publication number 20150002925
- Publication date Jan 1, 2015
- Carl Zeiss SMT GMBH
- Martin Endres
- G02 - OPTICS
Information Patent Application
FIELD FACET MIRROR FOR AN ILLUMINATION OPTICS OF A PROJECTION EXPOS...
- Publication number 20140218709
- Publication date Aug 7, 2014
- Carl Zeiss SMT GmbH
- Adrian Staicu
- G02 - OPTICS
Information Patent Application
PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY
- Publication number 20140104588
- Publication date Apr 17, 2014
- Carl Zeiss SMT GMBH
- Johannes Zellner
- G02 - OPTICS
Information Patent Application
ILLUMINATION OPTICAL UNIT
- Publication number 20140036247
- Publication date Feb 6, 2014
- Martin Endres
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Deflection Mirror and Projection Exposure Apparatus for Microlithog...
- Publication number 20140022525
- Publication date Jan 23, 2014
- Carl Zeiss SMT GMBH
- Hartmut ENKISCH
- B82 - NANO-TECHNOLOGY
Information Patent Application
ILLUMINATION OPTICAL SYSTEM FOR PROJECTION LITHOGRAPHY
- Publication number 20130250262
- Publication date Sep 26, 2013
- Jens Ossmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CATOPTRIC ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY TOOL
- Publication number 20120300185
- Publication date Nov 29, 2012
- Carl Zeiss SMT GMBH
- Jens Ossmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ELEMENT HAVING A PLURALITY OF REFLECTIVE FACET ELEMENTS
- Publication number 20120293785
- Publication date Nov 22, 2012
- Carl Zeiss SMT GMBH
- Marc Kirch
- G02 - OPTICS
Information Patent Application
IMAGING OPTICS
- Publication number 20120274917
- Publication date Nov 1, 2012
- Carl Zeiss SMT GMBH
- Hans-Juergen Mann
- G02 - OPTICS
Information Patent Application
IMAGING OPTICAL SYSTEM AND ILLUMINATION OPTICAL SYSTEM
- Publication number 20120147347
- Publication date Jun 14, 2012
- Carl Zeiss SMT GMBH
- Hans-Juergen Mann
- G02 - OPTICS

Martin Endres

Person

Patents Grantslast 30 patents

Pupil facet mirror, optical system and illumination optics for a pr...

Illumination intensity correction device for specifying an illumina...

Method for illuminating an object field of a projection exposure sy...

Reflecting coating with optimized thickness

Illumination optical assembly for a projection exposure apparatus

Illumination intensity correction device for predefining an illumin...

Illumination optical unit for EUV projection lithography

Illumination optical assembly for projection lithography

Facet mirror for use in a projection exposure apparatus for microli...

Illumination optical unit for EUV projection lithography

Illumination optical unit for projection lithography

Illumination system and illumination optical unit for EUV projectio...

Illumination optical assembly for projection lithography

Illumination optical unit for projection lithography

Micromirror array

Illumination optical unit

Mirror array

EUV collector

Mirror

Illumination system for EUV lithography

Illumination optical unit

Catoptric illumination system for microlithography tool

Illumination optical unit

Facet mirror for use in a projection exposure apparatus for microli...

Deflection mirror and projection exposure apparatus for microlithog...

Component for setting a scan-integrated illumination energy in an o...

Field facet mirror for an illumination optics of a projection expos...

Projection objective for microlithography

Illumination system for EUV microlithography

Imaging optical system and illumination optical system

Patents Applicationslast 30 patents

MEASURING DEVICE FOR INTERFEROMETRICALLY MEASURING A SURFACE FORM

PUPIL FACET MIRROR, OPTICAL SYSTEM AND ILLUMINATION OPTICS FOR A PR...

ILLUMINATION INTENSITY CORRECTION DEVICE FOR SPECIFYING AN ILLUMINA...

ILLUMINATION OPTICAL UNIT FOR EUV PROJECTION LITHOGRAPHY

ILLUMINATION OPTICAL ASSEMBLY FOR A PROJECTION EXPOSURE APPARATUS

IILLUMINATION OPTICAL UNIT FOR PROJECTION LITHOGRAPHY

ILLUMINATION OPTICAL UNIT FOR EUV PROJECTION LITHOGRAPHY

ILLUMINATION OPTICAL ASSEMBLY FOR PROJECTION LITHOGRAPHY

ILLUMINATION OPTICAL ASSEMBLY FOR PROJECTION LITHOGRAPHY

METHOD FOR ILLUMINATING AN OBJECT FIELD OF A PROJECTION EXPOSURE SY...

MIRROR ARRAY

ILLUMINATION OPTICAL UNIT FOR PROJECTION LITHOGRAPHY

FACET MIRROR FOR USE IN A PROJECTION EXPOSURE APPARATUS FOR MICROLI...

ILLUMINATION SYSTEM AND ILLUMINATION OPTICAL UNIT FOR EUV PROJECTIO...

MICROMIRROR ARRAY

REFLECTING COATING WITH OPTIMIZED THICKNESS

EUV COLLECTOR

MIRROR

ILLUMINATION OPTICAL UNIT

ILLUMINATION INTENSITY CORRECTION DEVICE FOR PREDEFINING AN ILLUMIN...

ILLUMINATION SYSTEM FOR EUV LITHOGRAPHY

FIELD FACET MIRROR FOR AN ILLUMINATION OPTICS OF A PROJECTION EXPOS...

PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY

ILLUMINATION OPTICAL UNIT

Deflection Mirror and Projection Exposure Apparatus for Microlithog...

ILLUMINATION OPTICAL SYSTEM FOR PROJECTION LITHOGRAPHY

CATOPTRIC ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY TOOL

OPTICAL ELEMENT HAVING A PLURALITY OF REFLECTIVE FACET ELEMENTS

IMAGING OPTICS

IMAGING OPTICAL SYSTEM AND ILLUMINATION OPTICAL SYSTEM