Martin L. Zucker

Person

Orinda, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
End effectors for moving workpieces and replaceable parts within a...
- Patent number 11,515,127
- Issue date Nov 29, 2022
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Martin L. Zucker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focus ring adjustment assembly of a system for processing workpiece...
- Patent number 11,508,560
- Issue date Nov 22, 2022
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Martin L. Zucker
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Grant
Plasma processing apparatus having a focus ring adjustment assembly
- Patent number 11,348,767
- Issue date May 31, 2022
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Martin L. Zucker
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Grant
Material deposition prevention on a workpiece in a process chamber
- Patent number 11,251,026
- Issue date Feb 15, 2022
- Mattson Technology, Inc.
- Jeffrey Cue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pedestal assembly for plasma processing apparatus
- Patent number 11,195,704
- Issue date Dec 7, 2021
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Martin L. Zucker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for protection of vacuum seals in plasma processi...
- Patent number 10,049,858
- Issue date Aug 14, 2018
- Mattson Technology, Inc.
- Vladimir Nagorny
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Advanced multi-workpiece processing chamber
- Patent number 9,184,072
- Issue date Nov 10, 2015
- Mattson Technology, Inc.
- Daniel J. Devine
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Low cost high throughput processing platform
- Patent number 8,668,422
- Issue date Mar 11, 2014
- Mattson Technology, Inc.
- Leszek Niewmierzycki
- B65 - CONVEYING PACKING STORING HANDLING THIN OR FILAMENTARY MATERIAL
Information Patent Grant
Electrostatic chuck system and process for radially tuning the temp...
- Patent number 8,405,005
- Issue date Mar 26, 2013
- Mattson Technology, Inc.
- Martin L. Zucker
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Workpiece support with fluid zones for temperature control
- Patent number 7,972,444
- Issue date Jul 5, 2011
- Mattson Technology, Inc.
- Martin L. Zucker
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Advanced low cost high throughput processing platform
- Patent number 7,658,586
- Issue date Feb 9, 2010
- Mattson Technology, Inc.
- Leszek Niewmierzycki
- B65 - CONVEYING PACKING STORING HANDLING THIN OR FILAMENTARY MATERIAL
Information Patent Grant
Low cost high throughput processing platform
- Patent number 7,563,068
- Issue date Jul 21, 2009
- Mattson Technology, Inc.
- Leszek Niewmierzycki
- B65 - CONVEYING PACKING STORING HANDLING THIN OR FILAMENTARY MATERIAL
Information Patent Grant
Systems and methods for remote plasma clean
- Patent number 6,835,278
- Issue date Dec 28, 2004
- Mattson Technology Inc.
- Steven C. Selbrede
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Transfer Position for Workpieces and Replaceable Parts in a Vacuum...
- Publication number 20230091035
- Publication date Mar 23, 2023
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Martin L. Zucker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Workpiece Processing Apparatus with Thermal Processing Systems
- Publication number 20220187021
- Publication date Jun 16, 2022
- Mattson Technology, Inc.
- Manuel Sohn
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Application
PLASMA PROCESSING APPARATUS HAVING A FOCUS RING ADJUSTMENT ASSEMBLY
- Publication number 20200365377
- Publication date Nov 19, 2020
- Mattson Technology, Inc.
- Martin L. Zucker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
END EFFECTORS FOR MOVING WORKPIECES AND REPLACEABLE PARTS WITHIN A...
- Publication number 20200361094
- Publication date Nov 19, 2020
- Mattson Technology, Inc.
- Martin L. Zucker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUS RING ADJUSTMENT ASSEMBLY OF A SYSTEM FOR PROCESSING WORKPIECE...
- Publication number 20200365405
- Publication date Nov 19, 2020
- Mattson Technology, Inc.
- Martin L. Zucker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Systems And Methods For Transportation Of Replaceable Parts In a Va...
- Publication number 20200365381
- Publication date Nov 19, 2020
- Mattson Technology, Inc.
- Martin L. Zucker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Post Plasma Gas Injection In A Separation Grid
- Publication number 20200243305
- Publication date Jul 30, 2020
- Mattson Technology, Inc.
- Weimin Zeng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Cooled Focus Ring for Plasma Processing Apparatus
- Publication number 20190088512
- Publication date Mar 21, 2019
- Mattson Technology, Inc.
- Martin L. Zucker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pedestal Assembly for Plasma Processing Apparatus
- Publication number 20180286639
- Publication date Oct 4, 2018
- Mattson Technology, Inc.
- Martin L. Zucker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Material Deposition Prevention on a Workpiece in a Process Chamber
- Publication number 20180286640
- Publication date Oct 4, 2018
- Mattson Technology, Inc.
- Jeffrey Cue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method for Protection of Vacuum Seals in Plasma Processi...
- Publication number 20160013025
- Publication date Jan 14, 2016
- Mattson Technology, Inc.
- Vladimir Nagorny
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK SYSTEM AND PROCESS FOR RADIALLY TUNING THE TEMP...
- Publication number 20100193501
- Publication date Aug 5, 2010
- Mattson Technology, Inc.
- Martin L. Zucker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System for Depositing a Film Onto a Substrate Using a Low Vapor Pre...
- Publication number 20100190331
- Publication date Jul 29, 2010
- Steven C. Selbrede
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Workpiece Support With Fluid Zones For Temperature Control
- Publication number 20090114158
- Publication date May 7, 2009
- Mattson Technology, Inc.
- Martin L. Zucker
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ADVANCED MULTI-WORKPIECE PROCESSING CHAMBER
- Publication number 20090028761
- Publication date Jan 29, 2009
- Daniel J. Devine
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Low Cost High Throughput Processing Platform
- Publication number 20070175864
- Publication date Aug 2, 2007
- Leszek Niewmierzycki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Seal arrangement with corrosion barrier and method
- Publication number 20070012251
- Publication date Jan 18, 2007
- Martin Zucker
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Low cost high throughput processing platform
- Publication number 20060045664
- Publication date Mar 2, 2006
- Leszek Niewmierzycki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Advanced low cost high throughput processing platform
- Publication number 20060039781
- Publication date Feb 23, 2006
- Leszek Niewmierzycki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Effluent pressure control for use in a processing system
- Publication number 20040247787
- Publication date Dec 9, 2004
- Neil M. Mackie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
System for depositing a film onto a substrate using a low pressure...
- Publication number 20040025787
- Publication date Feb 12, 2004
- Steven C. Selbrede
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Systems and methods for remote plasma clean
- Publication number 20020020429
- Publication date Feb 21, 2002
- Steven C. Selbrede
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Martin L. Zucker

Person

Patents Grantslast 30 patents

End effectors for moving workpieces and replaceable parts within a...

Focus ring adjustment assembly of a system for processing workpiece...

Plasma processing apparatus having a focus ring adjustment assembly

Material deposition prevention on a workpiece in a process chamber

Pedestal assembly for plasma processing apparatus

System and method for protection of vacuum seals in plasma processi...

Advanced multi-workpiece processing chamber

Low cost high throughput processing platform

Electrostatic chuck system and process for radially tuning the temp...

Workpiece support with fluid zones for temperature control

Advanced low cost high throughput processing platform

Low cost high throughput processing platform

Systems and methods for remote plasma clean

Patents Applicationslast 30 patents

Transfer Position for Workpieces and Replaceable Parts in a Vacuum...

Workpiece Processing Apparatus with Thermal Processing Systems

PLASMA PROCESSING APPARATUS HAVING A FOCUS RING ADJUSTMENT ASSEMBLY

END EFFECTORS FOR MOVING WORKPIECES AND REPLACEABLE PARTS WITHIN A...

FOCUS RING ADJUSTMENT ASSEMBLY OF A SYSTEM FOR PROCESSING WORKPIECE...

Systems And Methods For Transportation Of Replaceable Parts In a Va...

Post Plasma Gas Injection In A Separation Grid

Cooled Focus Ring for Plasma Processing Apparatus

Pedestal Assembly for Plasma Processing Apparatus

Material Deposition Prevention on a Workpiece in a Process Chamber

System and Method for Protection of Vacuum Seals in Plasma Processi...

ELECTROSTATIC CHUCK SYSTEM AND PROCESS FOR RADIALLY TUNING THE TEMP...

System for Depositing a Film Onto a Substrate Using a Low Vapor Pre...

Workpiece Support With Fluid Zones For Temperature Control

ADVANCED MULTI-WORKPIECE PROCESSING CHAMBER

Low Cost High Throughput Processing Platform

Seal arrangement with corrosion barrier and method

Low cost high throughput processing platform

Advanced low cost high throughput processing platform

Effluent pressure control for use in a processing system

System for depositing a film onto a substrate using a low pressure...

Systems and methods for remote plasma clean