Masaaki MIYAGAWA

Person

Nirasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 10,290,476
- Issue date May 14, 2019
- Tokyo Electron Limited
- Yusuke Hirayama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 10,068,778
- Issue date Sep 4, 2018
- Tokyo Electron Limited
- Yusuke Hirayama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
De-chuck control method and plasma processing apparatus
- Patent number 9,966,291
- Issue date May 8, 2018
- Tokyo Electron Limited
- Junichi Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focusing ring
- Patent number D709536
- Issue date Jul 22, 2014
- Tokyo Electron Limited
- Akihiro Yoshimura
- D15 - Machines not elsewhere specified
Information Patent Grant
Thermally conductive sheet and substrate mounting device including...
- Patent number 8,702,903
- Issue date Apr 22, 2014
- Tokyo Electron Limited
- Masaaki Miyagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heat-transfer structure and substrate processing apparatus
- Patent number 8,524,005
- Issue date Sep 3, 2013
- Tokyo Electron Limited
- Masaaki Miyagawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Substrate processing apparatus and focus ring
- Patent number 8,043,472
- Issue date Oct 25, 2011
- Tokyo Electron Limited
- Masaaki Miyagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focus ring and plasma processing apparatus
- Patent number 7,658,816
- Issue date Feb 9, 2010
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for improving heat transfer of a focus ring to a target subs...
- Patent number 7,655,579
- Issue date Feb 2, 2010
- Tokyo Electron Limited
- Masaaki Miyagawa
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20170316919
- Publication date Nov 2, 2017
- TOKYO ELECTRON LIMITED
- Yusuke HIRAYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20170076956
- Publication date Mar 16, 2017
- TOKYO ELECTRON LIMITED
- Yusuke HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DE-CHUCK CONTROL METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20150194330
- Publication date Jul 9, 2015
- TOKYO ELECTRON LIMITED
- Junichi Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND FOCUS RING
- Publication number 20150162170
- Publication date Jun 11, 2015
- TOKYO ELECTRON LIMITED
- Hiroki KISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUS RING, SUBSTRATE MOUNTING TABLE AND PLASMA PROCESSING APPARATU...
- Publication number 20100012274
- Publication date Jan 21, 2010
- TOKYO ELECTRON LIMITED
- Masaaki Miyagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE MOUNTING STAGE ON WHIC...
- Publication number 20080236746
- Publication date Oct 2, 2008
- TOKYO ELECTRON LIMITED
- Jun OYABU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THERMALLY CONDUCTIVE SHEET AND SUBSTRATE MOUNTING DEVICE INCLUDING...
- Publication number 20080239691
- Publication date Oct 2, 2008
- TOKYO ELECTRON LIMITED
- Masaaki MIYAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND FOCUS RING
- Publication number 20080210379
- Publication date Sep 4, 2008
- TOKYO ELECTRON LIMITED
- Masaaki MIYAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR IMPROVING HEAT TRANSFER OF A FOCUS RING TO A TARGET SUBS...
- Publication number 20080166894
- Publication date Jul 10, 2008
- TOKYO ELECTRON LIMITED
- Masaaki MIYAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEAT-TRANSFER STRUCTURE AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20080006207
- Publication date Jan 10, 2008
- TOKYO ELECTRON LIMITED
- Masaaki Miyagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Focus ring and plasma processing apparatus
- Publication number 20070169891
- Publication date Jul 26, 2007
- TOKYO ELECTRON LIMITED
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS

Masaaki MIYAGAWA

Person

Patents Grantslast 30 patents

Plasma processing method and plasma processing apparatus

Plasma processing method and plasma processing apparatus

De-chuck control method and plasma processing apparatus

Focusing ring

Thermally conductive sheet and substrate mounting device including...

Heat-transfer structure and substrate processing apparatus

Substrate processing apparatus and focus ring

Focus ring and plasma processing apparatus

Method for improving heat transfer of a focus ring to a target subs...

Patents Applicationslast 30 patents

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

DE-CHUCK CONTROL METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND FOCUS RING

FOCUS RING, SUBSTRATE MOUNTING TABLE AND PLASMA PROCESSING APPARATU...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE MOUNTING STAGE ON WHIC...

THERMALLY CONDUCTIVE SHEET AND SUBSTRATE MOUNTING DEVICE INCLUDING...

SUBSTRATE PROCESSING APPARATUS AND FOCUS RING

METHOD FOR IMPROVING HEAT TRANSFER OF A FOCUS RING TO A TARGET SUBS...

HEAT-TRANSFER STRUCTURE AND SUBSTRATE PROCESSING APPARATUS

Focus ring and plasma processing apparatus