Masafumi Kubota

Person

Osaka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method for fabricating semiconductor device and plasma doping appar...
- Patent number 8,574,972
- Issue date Nov 5, 2013
- Panasonic Corporation
- Yuichiro Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma doping method
- Patent number 8,216,922
- Issue date Jul 10, 2012
- Panasonic Corporation
- Shigenori Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for fabricating the same
- Patent number 7,800,181
- Issue date Sep 21, 2010
- Panasonic Corporation
- Yasutoshi Okuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for fabricating the same
- Patent number 7,144,761
- Issue date Dec 5, 2006
- Matsushita Electric Industrial Co., Ltd.
- Hideo Nakagwa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating semiconductor device
- Patent number 7,094,639
- Issue date Aug 22, 2006
- Matsushita Electric Industrial Co., Ltd.
- Masafumi Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacture thereof
- Patent number 6,812,101
- Issue date Nov 2, 2004
- Matsushita Electric Industrial Co., Ltd.
- Masaru Moriwaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aggregate of semiconductor micro-needles and method of manufacturin...
- Patent number 6,734,451
- Issue date May 11, 2004
- Matsushita Electric Industrial Co., Ltd.
- Koji Eriguchi
- G10 - MUSICAL INSTRUMENTS ACOUSTICS
Information Patent Grant
Wet-etching method and method for manufacturing semiconductor device
- Patent number 6,667,246
- Issue date Dec 23, 2003
- Matsushita Electric Industrial Co., Ltd.
- Riichiro Mitsuhashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aggregate of semiconductor micro-needles and method of manufacturin...
- Patent number 6,489,629
- Issue date Dec 3, 2002
- Matsushita Electric Industrial Co., Ltd.
- Koji Eriguchi
- G11 - INFORMATION STORAGE
Information Patent Grant
Etching method and etching apparatus
- Patent number 6,210,593
- Issue date Apr 3, 2001
- Matsushita Electric Industrial Co., Ltd.
- Mitsuhiro Ohkuni
- G01 - MEASURING TESTING
Information Patent Grant
Method of making aggregate of semiconductor micro-needles
- Patent number 6,177,291
- Issue date Jan 23, 2001
- Matsushita Electric Industrial Co., Ltd.
- Koji Eriguchi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Aggregate of semiconductor micro-needles and method of manufacturin...
- Patent number 6,087,197
- Issue date Jul 11, 2000
- Matsushita Electric Industrial Co., Ltd.
- Koji Eriguchi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of manufacturing aggregate of semiconductor micro-needles
- Patent number 6,033,928
- Issue date Mar 7, 2000
- Matsushita Electric Industrial Co., Ltd.
- Koji Eriguchi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Plasma treatment method and plasma treatment system
- Patent number 5,928,528
- Issue date Jul 27, 1999
- Matsushita Electric Industrial Co., Ltd.
- Masafumi Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generating and processing method and apparatus thereof
- Patent number 5,869,402
- Issue date Feb 9, 1999
- Matsushita Electric Industrial Co., Ltd.
- Kenji Harafuji
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma source for etching
- Patent number 5,753,066
- Issue date May 19, 1998
- Matsushita Electric Industrial Co., Ltd.
- Masafumi Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma source for etching
- Patent number 5,593,539
- Issue date Jan 14, 1997
- Matsushita Electric Industrial Co., Ltd.
- Masafumi Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generating method and apparatus for generating rotating elec...
- Patent number 5,436,424
- Issue date Jul 25, 1995
- Matsushita Electric Industrial Co., Ltd.
- Ichiro Nakayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generating method and apparatus
- Patent number 5,424,905
- Issue date Jun 13, 1995
- Matsushita Electric Company, Ltd.
- Noboru Nomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generating apparatus
- Patent number 5,404,079
- Issue date Apr 4, 1995
- Matsushita Electric Industrial Co., Ltd.
- Mitsuhiro Ohkuni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for generating highly dense uniform plasma in...
- Patent number 5,345,145
- Issue date Sep 6, 1994
- Matsushita Electric Industrial Co., Ltd.
- Kenji Harafuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for generating highly dense uniform plasma by...
- Patent number 5,332,880
- Issue date Jul 26, 1994
- Matsushita Electric Industrial Co., Ltd.
- Masafumi Kubota
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma source for etching
- Patent number 5,330,606
- Issue date Jul 19, 1994
- Matsushita Electric Industrial Co., Ltd.
- Masafumi Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching method and dry etching apparatus
- Patent number 5,324,388
- Issue date Jun 28, 1994
- Matsushita Electric Industrial Co., Ltd.
- Atsuhiro Yamano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of preventing the corrosion of metallic wirings
- Patent number 5,312,776
- Issue date May 17, 1994
- Matsushita Electric Industrial Co., Ltd.
- Tomoyasu Murakami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Drying etching method
- Patent number 5,259,922
- Issue date Nov 9, 1993
- Matsushita Electric Industrial Co., Ltd.
- Atsuhiro Yamano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and apparatus for use in carrying out the...
- Patent number 5,170,098
- Issue date Dec 8, 1992
- Matsushita Electric Industrial Co., Ltd.
- Robert W. Dutton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating a semiconductor device having buried insulati...
- Patent number 4,997,786
- Issue date Mar 5, 1991
- Matsushita Electric Industrial Co., Ltd.
- Masafumi Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma doping method
- Patent number 4,912,065
- Issue date Mar 27, 1990
- Matsushita Electric Industrial Co., Ltd.
- Bunji Mizuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating semiconductor device
- Patent number 4,845,048
- Issue date Jul 4, 1989
- Matsushita Electric Industrial Co., Ltd.
- Tokuhiko Tamaki
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR FABRICATING SEMICONDUCTOR DEVICE AND PLASMA DOPING APPAR...
- Publication number 20120034750
- Publication date Feb 9, 2012
- Yuichiro Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA DOPING APPARATUS
- Publication number 20110303146
- Publication date Dec 15, 2011
- Osamu Nishijima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA DOPING METHOD
- Publication number 20110230038
- Publication date Sep 22, 2011
- Shigenori Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method for fabricating the same
- Publication number 20070093047
- Publication date Apr 26, 2007
- Yasutoshi Okuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for fabricating semiconductor device
- Publication number 20060205131
- Publication date Sep 14, 2006
- Matsushita Electric Industrial Co., Ltd.
- Masafumi Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method for fabricating the same
- Publication number 20050059231
- Publication date Mar 17, 2005
- Matsushita Electric Industrial Co., Ltd.
- Hideo Nakagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for fabricating semiconductor device
- Publication number 20040087124
- Publication date May 6, 2004
- MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- Masafumi Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method for manufacture thereof
- Publication number 20030173586
- Publication date Sep 18, 2003
- Masaru Moriwaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wet-etching method and method for manufacturing semiconductor device
- Publication number 20030104706
- Publication date Jun 5, 2003
- MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- Riichiro Mitsuhashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Aggregate of Semicnductor micro-needles and method of manufacturing...
- Publication number 20030057451
- Publication date Mar 27, 2003
- Matsushita Electric Industrial Co., Ltd.
- Koji Eriguchi
- B82 - NANO-TECHNOLOGY
Information Patent Application
Semiconductor device and method for fabricating the same
- Publication number 20020050651
- Publication date May 2, 2002
- Hideo Nakagawa
- H01 - BASIC ELECTRIC ELEMENTS

Masafumi Kubota

Person

Patents Grantslast 30 patents

Method for fabricating semiconductor device and plasma doping appar...

Plasma doping method

Semiconductor device and method for fabricating the same

Semiconductor device and method for fabricating the same

Method for fabricating semiconductor device

Semiconductor device and method for manufacture thereof

Aggregate of semiconductor micro-needles and method of manufacturin...

Wet-etching method and method for manufacturing semiconductor device

Aggregate of semiconductor micro-needles and method of manufacturin...

Etching method and etching apparatus

Method of making aggregate of semiconductor micro-needles

Aggregate of semiconductor micro-needles and method of manufacturin...

Method of manufacturing aggregate of semiconductor micro-needles

Plasma treatment method and plasma treatment system

Plasma generating and processing method and apparatus thereof

Plasma source for etching

Plasma source for etching

Plasma generating method and apparatus for generating rotating elec...

Plasma generating method and apparatus

Plasma generating apparatus

Method and apparatus for generating highly dense uniform plasma in...

Method and apparatus for generating highly dense uniform plasma by...

Plasma source for etching

Dry etching method and dry etching apparatus

Method of preventing the corrosion of metallic wirings

Drying etching method

Plasma processing method and apparatus for use in carrying out the...

Method of fabricating a semiconductor device having buried insulati...

Plasma doping method

Method of fabricating semiconductor device

Patents Applicationslast 30 patents

METHOD FOR FABRICATING SEMICONDUCTOR DEVICE AND PLASMA DOPING APPAR...

PLASMA DOPING APPARATUS

PLASMA DOPING METHOD

Semiconductor device and method for fabricating the same

Method for fabricating semiconductor device

Semiconductor device and method for fabricating the same

Method for fabricating semiconductor device

Semiconductor device and method for manufacture thereof

Wet-etching method and method for manufacturing semiconductor device

Aggregate of Semicnductor micro-needles and method of manufacturing...

Semiconductor device and method for fabricating the same