Masahiko SHIMADA

Person

Osaka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Carboxylate, resist composition and method for producing resist pat...
- Patent number 12,124,167
- Issue date Oct 22, 2024
- Sumitomo Chemical Company, Limited
- Masahiko Shimada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Salt, acid generator, resist composition and method for producing r...
- Patent number 12,013,636
- Issue date Jun 18, 2024
- Sumitomo Chemical Company, Limited
- Masahiko Shimada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound, resin, photoresist composition and process for producing...
- Patent number 11,640,114
- Issue date May 2, 2023
- Sumitomo Chemical Company, Limited
- Masahiko Shimada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition and process for producing photoresist pattern
- Patent number 11,327,399
- Issue date May 10, 2022
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Compound, resin, photoresist composition and process for producing...
- Patent number 10,747,111
- Issue date Aug 18, 2020
- Sumitomo Chemical Company, Limited
- Masahiko Shimada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resin, resist composition and method for producing resist pattern
- Patent number 9,983,478
- Issue date May 29, 2018
- Sumitomo Chemical Company, Limited
- Masahiko Shimada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound, resin, resist composition and method for producing resist...
- Patent number 9,758,466
- Issue date Sep 12, 2017
- Sumitomo Chemical Company, Limited
- Mitsuyoshi Ochiai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin, resist composition and method for producing resist pattern
- Patent number 9,671,691
- Issue date Jun 6, 2017
- Sumitomo Chemical Company, Limited
- Masahiko Shimada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin, photoresist composition, and method for producing photoresis...
- Patent number 9,547,240
- Issue date Jan 17, 2017
- Sumitomo Chemical Company, Limited
- Mitsuyoshi Ochiai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin, resist composition and method for producing resist pattern
- Patent number 9,519,218
- Issue date Dec 13, 2016
- Sumitomo Chemical Company, Limited
- Masahiko Shimada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin and photoresist composition comprising the same
- Patent number 9,507,258
- Issue date Nov 29, 2016
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin, resist composition and method for producing resist pattern
- Patent number 9,405,191
- Issue date Aug 2, 2016
- Sumitomo Chemical Company, Limited
- Masahiko Shimada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resin and photoresist composition comprising the same
- Patent number 9,360,754
- Issue date Jun 7, 2016
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salt and photoresist composition containing the same
- Patent number 9,221,785
- Issue date Dec 29, 2015
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resin, resist composition and method for producing resist pattern
- Patent number 8,614,048
- Issue date Dec 24, 2013
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist composition
- Patent number 8,304,164
- Issue date Nov 6, 2012
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified positive resist composition
- Patent number 8,003,296
- Issue date Aug 23, 2011
- Sumitomo Chemical Company, Limited
- Masahiko Shimada
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Chemically amplified positive resist composition
- Patent number 7,998,656
- Issue date Aug 16, 2011
- Sumitomo Chemical Company, Limited
- Masahiko Shimada
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST...
- Publication number 20240255846
- Publication date Aug 1, 2024
- Sumitomo Chemical Company, Limited
- Masahiko Shimada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST...
- Publication number 20240248402
- Publication date Jul 25, 2024
- Sumitomo Chemical Company, Limited
- Masahiko Shimada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION A...
- Publication number 20230314938
- Publication date Oct 5, 2023
- Sumitomo Chemical Company, Limited
- Masahiko SHIMADA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION A...
- Publication number 20230314941
- Publication date Oct 5, 2023
- Sumitomo Chemical Company, Limited
- Masahiko Shimada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION A...
- Publication number 20230314939
- Publication date Oct 5, 2023
- Sumitomo Chemical Company, Limited
- Masahiko SHIMADA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PROD...
- Publication number 20230305391
- Publication date Sep 28, 2023
- Sumitomo Chemical Company, Limited
- Masahiko SHIMADA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PROD...
- Publication number 20230305392
- Publication date Sep 28, 2023
- Sumitomo Chemical Company, Limited
- Masahiko Shimada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PROD...
- Publication number 20230305395
- Publication date Sep 28, 2023
- Sumitomo Chemical Company, Limited
- Masahiko Shimada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION A...
- Publication number 20230161250
- Publication date May 25, 2023
- Sumitomo Chemical Company, Limited
- Masahiko SHIMADA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PROD...
- Publication number 20230161243
- Publication date May 25, 2023
- Sumitomo Chemical Company, Limited
- Masahiko SHIMADA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PROD...
- Publication number 20230161256
- Publication date May 25, 2023
- Sumitomo Chemical Company, Limited
- Masahiko Shimada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION A...
- Publication number 20230161244
- Publication date May 25, 2023
- Sumitomo Chemical Company, Limited
- Masahiko SHIMADA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION A...
- Publication number 20230152693
- Publication date May 18, 2023
- Sumitomo Chemical Company, Limited
- Masahiko Shimada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PROD...
- Publication number 20230146890
- Publication date May 11, 2023
- Sumitomo Chemical Company, Limited
- Masahiko SHIMADA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CARBOXYLATE, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PAT...
- Publication number 20220146935
- Publication date May 12, 2022
- Sumitomo Chemical Company, Limited
- Masahiko Shimada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING R...
- Publication number 20220146931
- Publication date May 12, 2022
- Sumitomo Chemical Company, Limited
- Masahiko SHIMADA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING R...
- Publication number 20220146930
- Publication date May 12, 2022
- Sumitomo Chemical Company, Limited
- Masahiko SHIMADA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOUND, RESIN, PHOTORESIST COMPOSITION AND PROCESS FOR PRODUCING...
- Publication number 20200326625
- Publication date Oct 15, 2020
- Sumitomo Chemical Company, Limited
- Masahiko SHIMADA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTORESIST COMPOSITION AND PROCESS FOR PRODUCING PHOTORESIST PATTERN
- Publication number 20180348632
- Publication date Dec 6, 2018
- Sumitomo Chemical Company, Limited
- Tatsuro MASUYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOUND, RESIN, PHOTORESIST COMPOSITION AND PROCESS FOR PRODUCING...
- Publication number 20180258061
- Publication date Sep 13, 2018
- Sumitomo Chemical Company, Limited
- Masahiko SHIMADA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20160077430
- Publication date Mar 17, 2016
- Sumitomo Chemical Company, Limited
- Masahiko SHIMADA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20160075806
- Publication date Mar 17, 2016
- Sumitomo Chemical Company, Limited
- Masahiko SHIMADA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20160077433
- Publication date Mar 17, 2016
- Sumitomo Chemical Company, Limited
- Masahiko SHIMADA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20160077432
- Publication date Mar 17, 2016
- Sumitomo Chemical Company, Limited
- Masahiko SHIMADA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIS...
- Publication number 20160052859
- Publication date Feb 25, 2016
- Sumitomo Chemical Company, Limited
- Mitsuyoshi OCHIAI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIN, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIS...
- Publication number 20150147695
- Publication date May 28, 2015
- Sumitomo Chemical Company, Limited
- Mitsuyoshi OCHIAI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTORESIST COMPOSITION
- Publication number 20130095425
- Publication date Apr 18, 2013
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIN AND PHOTORESIST COMPOSITION COMPRISING THE SAME
- Publication number 20120122034
- Publication date May 17, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIN AND PHOTORESIST COMPOSITION COMPRISING THE SAME
- Publication number 20120115082
- Publication date May 10, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20120070778
- Publication date Mar 22, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Masahiko SHIMADA

Person

Patents Grantslast 30 patents

Carboxylate, resist composition and method for producing resist pat...

Salt, acid generator, resist composition and method for producing r...

Compound, resin, photoresist composition and process for producing...

Photoresist composition and process for producing photoresist pattern

Compound, resin, photoresist composition and process for producing...

Resin, resist composition and method for producing resist pattern

Compound, resin, resist composition and method for producing resist...

Resin, resist composition and method for producing resist pattern

Resin, photoresist composition, and method for producing photoresis...

Resin, resist composition and method for producing resist pattern

Resin and photoresist composition comprising the same

Resin, resist composition and method for producing resist pattern

Resin and photoresist composition comprising the same

Salt and photoresist composition containing the same

Resin, resist composition and method for producing resist pattern

Photoresist composition

Chemically amplified positive resist composition

Chemically amplified positive resist composition

Patents Applicationslast 30 patents

COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST...

COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST...

CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION A...

CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION A...

CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION A...

SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PROD...

SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PROD...

SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PROD...

CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION A...

SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PROD...

SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PROD...

CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION A...

CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION A...

SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PROD...

CARBOXYLATE, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PAT...

SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING R...

SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING R...

COMPOUND, RESIN, PHOTORESIST COMPOSITION AND PROCESS FOR PRODUCING...

PHOTORESIST COMPOSITION AND PROCESS FOR PRODUCING PHOTORESIST PATTERN

COMPOUND, RESIN, PHOTORESIST COMPOSITION AND PROCESS FOR PRODUCING...

RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIS...

RESIN, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIS...

PHOTORESIST COMPOSITION

RESIN AND PHOTORESIST COMPOSITION COMPRISING THE SAME

RESIN AND PHOTORESIST COMPOSITION COMPRISING THE SAME

RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN