Masahiro Fukushima

Person

Joetsu-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Onium salt, chemically amplified resist composition and patterning...
- Patent number 12,275,693
- Issue date Apr 15, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masayoshi Sagehashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and pattern forming process
- Patent number 12,276,911
- Issue date Apr 15, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sulfonium salt, chemically amplified resist composition, and patter...
- Patent number 12,216,401
- Issue date Feb 4, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Onium salt, chemically amplified negative resist composition, and p...
- Patent number 12,060,317
- Issue date Aug 13, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polymer, chemically amplified resist composition and patterning pro...
- Patent number 12,032,289
- Issue date Jul 9, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Molecular resist composition and patterning process
- Patent number 11,953,827
- Issue date Apr 9, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Molecular resist composition and patterning process
- Patent number 11,940,728
- Issue date Mar 26, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 11,829,067
- Issue date Nov 28, 2023
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Iodized aromatic carboxylic acid type pendant-containing polymer, r...
- Patent number 11,815,814
- Issue date Nov 14, 2023
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 11,782,343
- Issue date Oct 10, 2023
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Onium salt, chemically amplified negative resist composition, and p...
- Patent number 11,773,059
- Issue date Oct 3, 2023
- Shin-Etsu Chemical Co., Ltd.
- Naoya Inoue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and patterning process
- Patent number 11,774,853
- Issue date Oct 3, 2023
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Onium salt compound, chemically amplified resist composition and pa...
- Patent number 11,762,287
- Issue date Sep 19, 2023
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition and patterning process
- Patent number 11,720,021
- Issue date Aug 8, 2023
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition and pattern forming process
- Patent number 11,709,427
- Issue date Jul 25, 2023
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorocarboxylic acid-containing monomer, fluorocarboxylic acid-con...
- Patent number 11,703,760
- Issue date Jul 18, 2023
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Sulfonium compound, chemically amplified resist composition, and pa...
- Patent number 11,687,000
- Issue date Jun 27, 2023
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Onium salt, chemically amplified resist composition, and patterning...
- Patent number 11,560,355
- Issue date Jan 24, 2023
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salt compound, chemically amplified resist composition, and pattern...
- Patent number 11,435,666
- Issue date Sep 6, 2022
- Shin-Etsu Chemical Co., Ltd.
- Emiko Ono
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Onium salt, chemically amplified resist composition, and patterning...
- Patent number 11,333,974
- Issue date May 17, 2022
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymerizable monomer, polymer compound for conductive polymer, and...
- Patent number 11,286,320
- Issue date Mar 29, 2022
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Monomer, polymer, resist composition, and patterning process
- Patent number 11,009,793
- Issue date May 18, 2021
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and patterning process
- Patent number 10,948,822
- Issue date Mar 16, 2021
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Monomer, polymer, resist composition, and patterning process
- Patent number 10,915,021
- Issue date Feb 9, 2021
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and patterning process
- Patent number 10,871,711
- Issue date Dec 22, 2020
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Monomer, polymer, resist composition, and patterning process
- Patent number 10,591,819
- Issue date Mar 17, 2020
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Monomer, polymer, resist composition, and patterning process
- Patent number 10,527,939
- Issue date Jan 7, 2020
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and patterning process
- Patent number 10,323,113
- Issue date Jun 18, 2019
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Carboxylic acid onium salt, chemically amplified resist composition...
- Patent number 10,120,278
- Issue date Nov 6, 2018
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Silicone skeleton-containing polymer compound and method for produc...
- Patent number 10,114,287
- Issue date Oct 30, 2018
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki Urano
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250172870
- Publication date May 29, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMI...
- Publication number 20250172875
- Publication date May 29, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250138418
- Publication date May 1, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250138423
- Publication date May 1, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250138425
- Publication date May 1, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PREPARATION OF TERTIARY ESTER-CONTAINING AROMATIC VINYL MONOMER
- Publication number 20250136736
- Publication date May 1, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING...
- Publication number 20250122165
- Publication date Apr 17, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ONIUM SALT TYPE MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPO...
- Publication number 20250123566
- Publication date Apr 17, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ONIUM SALT MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITIO...
- Publication number 20250116934
- Publication date Apr 10, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Application
MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATT...
- Publication number 20250110405
- Publication date Apr 3, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND R...
- Publication number 20250110400
- Publication date Apr 3, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20250085630
- Publication date Mar 13, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND R...
- Publication number 20250068067
- Publication date Feb 27, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FO...
- Publication number 20250068069
- Publication date Feb 27, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250060669
- Publication date Feb 20, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FO...
- Publication number 20250053087
- Publication date Feb 13, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20250053089
- Publication date Feb 13, 2025
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250044688
- Publication date Feb 6, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250044687
- Publication date Feb 6, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MONOMER, POLYMER, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION,...
- Publication number 20250044689
- Publication date Feb 6, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACETAL MODIFIER, POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMP...
- Publication number 20250028244
- Publication date Jan 23, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250020999
- Publication date Jan 16, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20250013152
- Publication date Jan 9, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20250004371
- Publication date Jan 2, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro FUKUSHIMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MONOMER, POLYMER, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION,...
- Publication number 20240427241
- Publication date Dec 26, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20240402599
- Publication date Dec 5, 2024
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20240385517
- Publication date Nov 21, 2024
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20240377738
- Publication date Nov 14, 2024
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING...
- Publication number 20240377733
- Publication date Nov 14, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20240377741
- Publication date Nov 14, 2024
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Masahiro Fukushima

Person

Patents Grantslast 30 patents

Onium salt, chemically amplified resist composition and patterning...

Positive resist composition and pattern forming process

Sulfonium salt, chemically amplified resist composition, and patter...

Onium salt, chemically amplified negative resist composition, and p...

Polymer, chemically amplified resist composition and patterning pro...

Molecular resist composition and patterning process

Molecular resist composition and patterning process

Resist composition and patterning process

Iodized aromatic carboxylic acid type pendant-containing polymer, r...

Resist composition and patterning process

Onium salt, chemically amplified negative resist composition, and p...

Resist composition and patterning process

Onium salt compound, chemically amplified resist composition and pa...

Positive resist composition and patterning process

Positive resist composition and pattern forming process

Fluorocarboxylic acid-containing monomer, fluorocarboxylic acid-con...

Sulfonium compound, chemically amplified resist composition, and pa...

Onium salt, chemically amplified resist composition, and patterning...

Salt compound, chemically amplified resist composition, and pattern...

Onium salt, chemically amplified resist composition, and patterning...

Polymerizable monomer, polymer compound for conductive polymer, and...

Monomer, polymer, resist composition, and patterning process

Resist composition and patterning process

Monomer, polymer, resist composition, and patterning process

Resist composition and patterning process

Monomer, polymer, resist composition, and patterning process

Monomer, polymer, resist composition, and patterning process

Resist composition and patterning process

Carboxylic acid onium salt, chemically amplified resist composition...

Silicone skeleton-containing polymer compound and method for produc...

Patents Applicationslast 30 patents

POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS

POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMI...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

RESIST COMPOSITION AND PATTERN FORMING PROCESS

POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS

PREPARATION OF TERTIARY ESTER-CONTAINING AROMATIC VINYL MONOMER

ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING...

ONIUM SALT TYPE MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPO...

ONIUM SALT MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITIO...

MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATT...

ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND R...

CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...

ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND R...

ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FO...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FO...

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

RESIST COMPOSITION AND PATTERN FORMING PROCESS

MONOMER, POLYMER, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION,...

ACETAL MODIFIER, POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMP...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...

MONOMER, POLYMER, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION,...

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...

CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...

ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING...

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...