Masahiro Fukushima

Person

Joetsu-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Sulfonium salt, chemically amplified resist composition, and patter...
- Patent number 12,216,401
- Issue date Feb 4, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Onium salt, chemically amplified negative resist composition, and p...
- Patent number 12,060,317
- Issue date Aug 13, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polymer, chemically amplified resist composition and patterning pro...
- Patent number 12,032,289
- Issue date Jul 9, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Molecular resist composition and patterning process
- Patent number 11,953,827
- Issue date Apr 9, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Molecular resist composition and patterning process
- Patent number 11,940,728
- Issue date Mar 26, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 11,829,067
- Issue date Nov 28, 2023
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Iodized aromatic carboxylic acid type pendant-containing polymer, r...
- Patent number 11,815,814
- Issue date Nov 14, 2023
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 11,782,343
- Issue date Oct 10, 2023
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Onium salt, chemically amplified negative resist composition, and p...
- Patent number 11,773,059
- Issue date Oct 3, 2023
- Shin-Etsu Chemical Co., Ltd.
- Naoya Inoue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and patterning process
- Patent number 11,774,853
- Issue date Oct 3, 2023
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Onium salt compound, chemically amplified resist composition and pa...
- Patent number 11,762,287
- Issue date Sep 19, 2023
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition and patterning process
- Patent number 11,720,021
- Issue date Aug 8, 2023
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition and pattern forming process
- Patent number 11,709,427
- Issue date Jul 25, 2023
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorocarboxylic acid-containing monomer, fluorocarboxylic acid-con...
- Patent number 11,703,760
- Issue date Jul 18, 2023
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Sulfonium compound, chemically amplified resist composition, and pa...
- Patent number 11,687,000
- Issue date Jun 27, 2023
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Onium salt, chemically amplified resist composition, and patterning...
- Patent number 11,560,355
- Issue date Jan 24, 2023
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salt compound, chemically amplified resist composition, and pattern...
- Patent number 11,435,666
- Issue date Sep 6, 2022
- Shin-Etsu Chemical Co., Ltd.
- Emiko Ono
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Onium salt, chemically amplified resist composition, and patterning...
- Patent number 11,333,974
- Issue date May 17, 2022
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymerizable monomer, polymer compound for conductive polymer, and...
- Patent number 11,286,320
- Issue date Mar 29, 2022
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Monomer, polymer, resist composition, and patterning process
- Patent number 11,009,793
- Issue date May 18, 2021
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and patterning process
- Patent number 10,948,822
- Issue date Mar 16, 2021
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Monomer, polymer, resist composition, and patterning process
- Patent number 10,915,021
- Issue date Feb 9, 2021
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and patterning process
- Patent number 10,871,711
- Issue date Dec 22, 2020
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Monomer, polymer, resist composition, and patterning process
- Patent number 10,591,819
- Issue date Mar 17, 2020
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Monomer, polymer, resist composition, and patterning process
- Patent number 10,527,939
- Issue date Jan 7, 2020
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and patterning process
- Patent number 10,323,113
- Issue date Jun 18, 2019
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Carboxylic acid onium salt, chemically amplified resist composition...
- Patent number 10,120,278
- Issue date Nov 6, 2018
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Silicone skeleton-containing polymer compound and method for produc...
- Patent number 10,114,287
- Issue date Oct 30, 2018
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki Urano
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Monomer, polymer, resist composition, and patterning process
- Patent number 10,023,674
- Issue date Jul 17, 2018
- Shin-Etsu Chemical Co., Ltd.
- Masayoshi Sagehashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and patterning process
- Patent number 10,007,178
- Issue date Jun 26, 2018
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250060669
- Publication date Feb 20, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FO...
- Publication number 20250053087
- Publication date Feb 13, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20250053089
- Publication date Feb 13, 2025
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250044688
- Publication date Feb 6, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250044687
- Publication date Feb 6, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MONOMER, POLYMER, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION,...
- Publication number 20250044689
- Publication date Feb 6, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACETAL MODIFIER, POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMP...
- Publication number 20250028244
- Publication date Jan 23, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250020999
- Publication date Jan 16, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20250013152
- Publication date Jan 9, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20250004371
- Publication date Jan 2, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro FUKUSHIMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MONOMER, POLYMER, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION,...
- Publication number 20240427241
- Publication date Dec 26, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20240402599
- Publication date Dec 5, 2024
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20240385517
- Publication date Nov 21, 2024
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20240377738
- Publication date Nov 14, 2024
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING...
- Publication number 20240377733
- Publication date Nov 14, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20240377741
- Publication date Nov 14, 2024
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ONIUM SALT, RESIST COMPOSITION, AND PATTERN FORMING PROCESS
- Publication number 20240361688
- Publication date Oct 31, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND R...
- Publication number 20240337927
- Publication date Oct 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20240337935
- Publication date Oct 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20240337939
- Publication date Oct 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACETAL MODIFIER, POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMP...
- Publication number 20240329532
- Publication date Oct 3, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro FUKUSHIMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20240329522
- Publication date Oct 3, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ONIUM SALT MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITIO...
- Publication number 20240329527
- Publication date Oct 3, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ONIUM SALT, RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20240310723
- Publication date Sep 19, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND R...
- Publication number 20240280900
- Publication date Aug 22, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20240192596
- Publication date Jun 13, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro FUKUSHIMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Onium Salt, Resist Composition, And Patterning Process
- Publication number 20240184199
- Publication date Jun 6, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Application
AMINE COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERN...
- Publication number 20240184200
- Publication date Jun 6, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tomomi Watanabe
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Onium Salt, Resist Composition, And Patterning Process
- Publication number 20240176237
- Publication date May 30, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING...
- Publication number 20240176236
- Publication date May 30, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY

Masahiro Fukushima

Person

Patents Grantslast 30 patents

Sulfonium salt, chemically amplified resist composition, and patter...

Onium salt, chemically amplified negative resist composition, and p...

Polymer, chemically amplified resist composition and patterning pro...

Molecular resist composition and patterning process

Molecular resist composition and patterning process

Resist composition and patterning process

Iodized aromatic carboxylic acid type pendant-containing polymer, r...

Resist composition and patterning process

Onium salt, chemically amplified negative resist composition, and p...

Resist composition and patterning process

Onium salt compound, chemically amplified resist composition and pa...

Positive resist composition and patterning process

Positive resist composition and pattern forming process

Fluorocarboxylic acid-containing monomer, fluorocarboxylic acid-con...

Sulfonium compound, chemically amplified resist composition, and pa...

Onium salt, chemically amplified resist composition, and patterning...

Salt compound, chemically amplified resist composition, and pattern...

Onium salt, chemically amplified resist composition, and patterning...

Polymerizable monomer, polymer compound for conductive polymer, and...

Monomer, polymer, resist composition, and patterning process

Resist composition and patterning process

Monomer, polymer, resist composition, and patterning process

Resist composition and patterning process

Monomer, polymer, resist composition, and patterning process

Monomer, polymer, resist composition, and patterning process

Resist composition and patterning process

Carboxylic acid onium salt, chemically amplified resist composition...

Silicone skeleton-containing polymer compound and method for produc...

Monomer, polymer, resist composition, and patterning process

Positive resist composition and patterning process

Patents Applicationslast 30 patents

RESIST COMPOSITION AND PATTERN FORMING PROCESS

ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FO...

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

RESIST COMPOSITION AND PATTERN FORMING PROCESS

MONOMER, POLYMER, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION,...

ACETAL MODIFIER, POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMP...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...

MONOMER, POLYMER, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION,...

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...

CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...

ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING...

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...

ONIUM SALT, RESIST COMPOSITION, AND PATTERN FORMING PROCESS

ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND R...

CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...

ACETAL MODIFIER, POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMP...

CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...

ONIUM SALT MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITIO...

ONIUM SALT, RESIST COMPOSITION AND PATTERN FORMING PROCESS

ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND R...

CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS

Onium Salt, Resist Composition, And Patterning Process

AMINE COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERN...

Onium Salt, Resist Composition, And Patterning Process

ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING...