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Patents Grants
last 30 patents
Information
Patent Grant
Onium salt, chemically amplified negative resist composition, and p...
Patent number
12,060,317
Issue date
Aug 13, 2024
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Polymer, chemically amplified resist composition and patterning pro...
Patent number
12,032,289
Issue date
Jul 9, 2024
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Molecular resist composition and patterning process
Patent number
11,953,827
Issue date
Apr 9, 2024
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Molecular resist composition and patterning process
Patent number
11,940,728
Issue date
Mar 26, 2024
Shin-Etsu Chemical Co., Ltd.
Masaki Ohashi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition and patterning process
Patent number
11,829,067
Issue date
Nov 28, 2023
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Iodized aromatic carboxylic acid type pendant-containing polymer, r...
Patent number
11,815,814
Issue date
Nov 14, 2023
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition and patterning process
Patent number
11,782,343
Issue date
Oct 10, 2023
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Onium salt, chemically amplified negative resist composition, and p...
Patent number
11,773,059
Issue date
Oct 3, 2023
Shin-Etsu Chemical Co., Ltd.
Naoya Inoue
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Resist composition and patterning process
Patent number
11,774,853
Issue date
Oct 3, 2023
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Onium salt compound, chemically amplified resist composition and pa...
Patent number
11,762,287
Issue date
Sep 19, 2023
Shin-Etsu Chemical Co., Ltd.
Takayuki Fujiwara
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Positive resist composition and patterning process
Patent number
11,720,021
Issue date
Aug 8, 2023
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Positive resist composition and pattern forming process
Patent number
11,709,427
Issue date
Jul 25, 2023
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Fluorocarboxylic acid-containing monomer, fluorocarboxylic acid-con...
Patent number
11,703,760
Issue date
Jul 18, 2023
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Sulfonium compound, chemically amplified resist composition, and pa...
Patent number
11,687,000
Issue date
Jun 27, 2023
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Onium salt, chemically amplified resist composition, and patterning...
Patent number
11,560,355
Issue date
Jan 24, 2023
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Salt compound, chemically amplified resist composition, and pattern...
Patent number
11,435,666
Issue date
Sep 6, 2022
Shin-Etsu Chemical Co., Ltd.
Emiko Ono
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Onium salt, chemically amplified resist composition, and patterning...
Patent number
11,333,974
Issue date
May 17, 2022
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Polymerizable monomer, polymer compound for conductive polymer, and...
Patent number
11,286,320
Issue date
Mar 29, 2022
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Monomer, polymer, resist composition, and patterning process
Patent number
11,009,793
Issue date
May 18, 2021
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Resist composition and patterning process
Patent number
10,948,822
Issue date
Mar 16, 2021
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Grant
Monomer, polymer, resist composition, and patterning process
Patent number
10,915,021
Issue date
Feb 9, 2021
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Resist composition and patterning process
Patent number
10,871,711
Issue date
Dec 22, 2020
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Monomer, polymer, resist composition, and patterning process
Patent number
10,591,819
Issue date
Mar 17, 2020
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Monomer, polymer, resist composition, and patterning process
Patent number
10,527,939
Issue date
Jan 7, 2020
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Resist composition and patterning process
Patent number
10,323,113
Issue date
Jun 18, 2019
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Carboxylic acid onium salt, chemically amplified resist composition...
Patent number
10,120,278
Issue date
Nov 6, 2018
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Silicone skeleton-containing polymer compound and method for produc...
Patent number
10,114,287
Issue date
Oct 30, 2018
Shin-Etsu Chemical Co., Ltd.
Hiroyuki Urano
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Monomer, polymer, resist composition, and patterning process
Patent number
10,023,674
Issue date
Jul 17, 2018
Shin-Etsu Chemical Co., Ltd.
Masayoshi Sagehashi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Positive resist composition and patterning process
Patent number
10,007,178
Issue date
Jun 26, 2018
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Onium salt compound, resist composition, and pattern forming process
Patent number
9,989,847
Issue date
Jun 5, 2018
Shin-Etsu Chemical Co., Ltd.
Masaki Ohashi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Patents Applications
last 30 patents
Information
Patent Application
ONIUM SALT, RESIST COMPOSITION AND PATTERN FORMING PROCESS
Publication number
20240310723
Publication date
Sep 19, 2024
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND R...
Publication number
20240280900
Publication date
Aug 22, 2024
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS
Publication number
20240192596
Publication date
Jun 13, 2024
Shin-Etsu Chemical Co., Ltd.
Masahiro FUKUSHIMA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Onium Salt, Resist Composition, And Patterning Process
Publication number
20240184199
Publication date
Jun 6, 2024
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
C07 - ORGANIC CHEMISTRY
Information
Patent Application
AMINE COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERN...
Publication number
20240184200
Publication date
Jun 6, 2024
Shin-Etsu Chemical Co., Ltd.
Tomomi Watanabe
C07 - ORGANIC CHEMISTRY
Information
Patent Application
Onium Salt, Resist Composition, And Patterning Process
Publication number
20240176237
Publication date
May 30, 2024
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING...
Publication number
20240176236
Publication date
May 30, 2024
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
C07 - ORGANIC CHEMISTRY
Information
Patent Application
Polymer, Chemically Amplified Positive Resist Composition, Resist P...
Publication number
20240134280
Publication date
Apr 25, 2024
Shin-Etsu Chemical Co., Ltd.
Masahiro FUKUSHIMA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ONIUM SALT TYPE MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPO...
Publication number
20240126168
Publication date
Apr 18, 2024
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Polymer, Resist Composition, And Patterning Process
Publication number
20240118617
Publication date
Apr 11, 2024
Shin-Etsu Chemical Co., Ltd.
Masahiro FUKUSHIMA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
Publication number
20240118613
Publication date
Apr 11, 2024
Shin-Etsu Chemical Co., Ltd.
Keiichi Masunaga
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Onium Salt, Acid Diffusion Inhibitor, Resist Composition, And Patte...
Publication number
20240103367
Publication date
Mar 28, 2024
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING...
Publication number
20240103364
Publication date
Mar 28, 2024
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
Publication number
20240094635
Publication date
Mar 21, 2024
Shin-Etsu Chemical Co., Ltd.
Keiichi Masunaga
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Onium Salt, Resist Composition, And Patterning Process
Publication number
20240036466
Publication date
Feb 1, 2024
Shin-Etsu Chemical Co., Ltd.
Masahiro FUKUSHIMA
C07 - ORGANIC CHEMISTRY
Information
Patent Application
CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS
Publication number
20240027902
Publication date
Jan 25, 2024
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Resist Material And Patterning Process
Publication number
20240027903
Publication date
Jan 25, 2024
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS
Publication number
20230418157
Publication date
Dec 28, 2023
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Novel Sulfonium Salt, Resist Composition, And Patterning Process
Publication number
20230418158
Publication date
Dec 28, 2023
Shin-Etsu Chemical Co., Ltd.
Masahiro FUKUSHIMA
C07 - ORGANIC CHEMISTRY
Information
Patent Application
Polymerizable Monomer, Polymer Compound, Resist Composition, And Pa...
Publication number
20230408921
Publication date
Dec 21, 2023
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ONIUM SALT, RESIST COMPOSITION AND PATTERN FORMING PROCESS
Publication number
20230400766
Publication date
Dec 14, 2023
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
Publication number
20230393461
Publication date
Dec 7, 2023
Shin-Etsu Chemical Co., Ltd.
Keiichi Masunaga
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
Publication number
20230393465
Publication date
Dec 7, 2023
Shin-Etsu Chemical Co., Ltd.
Keiichi Masunaga
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...
Publication number
20230393466
Publication date
Dec 7, 2023
Shin-Etsu Chemical Co., Ltd.
Keiichi Masunaga
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...
Publication number
20230393470
Publication date
Dec 7, 2023
Shin-Etsu Chemical Co., Ltd.
Keiichi Masunaga
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Sulfonium-Salt-Type Polymerizable Monomer, Polymer Photoacid Genera...
Publication number
20230375928
Publication date
Nov 23, 2023
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
MASK BLANK, RESIST PATTERN FORMING PROCESS AND CHEMICALLY AMPLIFIED...
Publication number
20230367213
Publication date
Nov 16, 2023
Shin-Etsu Chemical Co., Ltd.
Keiichi Masunaga
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
Publication number
20230367214
Publication date
Nov 16, 2023
Shin-Etsu Chemical Co., Ltd.
Keiichi Masunaga
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
Publication number
20230341775
Publication date
Oct 26, 2023
Shin-Etsu Chemical Co., Ltd.
Masaaki Kotake
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
Publication number
20230324798
Publication date
Oct 12, 2023
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY