Masaru HORI

Person

Nagoya-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Etching method
- Patent number 12,237,174
- Issue date Feb 25, 2025
- HITACHI HIGH-TECH CORPORATION
- Kazunori Shinoda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for filling a gap and related systems and devices
- Patent number 12,027,365
- Issue date Jul 2, 2024
- ASM IP Holding B.V.
- Zecheng Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Carbon hard mask, film forming apparatus, and film forming method
- Patent number 11,993,849
- Issue date May 28, 2024
- Tokyo Electron Limited
- Masaru Hori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Carbon nanostructured materials and methods for forming carbon nano...
- Patent number 11,673,807
- Issue date Jun 13, 2023
- NATIONAL UNIVERSITY CORPORATION TOKAI NATIONAL HIGHER EDUCATION AND RESEARCH...
- Rok Zaplotnik
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for manufacturing semiconductor substrate having group-III n...
- Patent number 11,339,242
- Issue date May 24, 2022
- NISSAN CHEMICAL CORPORATION
- Keisuke Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Carbon nanosheet and manufacturing method therefor
- Patent number 11,261,091
- Issue date Mar 1, 2022
- National University Corporation Nagoya University
- Masaru Hori
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Selective cyclic dry etching process of dielectric materials using...
- Patent number 10,720,334
- Issue date Jul 21, 2020
- ASM IP Holding B.V.
- Rene Henricus Jozef Vervuurt
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Pre-cleaning for etching of dielectric materials
- Patent number 10,720,337
- Issue date Jul 21, 2020
- ASM IP Holding B.V.
- Rene Henricus Jozef Vervuurt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radical generator and molecular beam epitaxy apparatus
- Patent number 10,577,719
- Issue date Mar 3, 2020
- National University Corporation Nagoya University
- Masaru Hori
- C30 - CRYSTAL GROWTH
Information Patent Grant
Method of atomic layer etching using hydrogen plasma
- Patent number 10,504,742
- Issue date Dec 10, 2019
- ASM IP Holding B.V.
- Masaru Zaitsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and etching apparatus
- Patent number 10,418,254
- Issue date Sep 17, 2019
- Hitachi High-Technologies Corporation
- Kazunori Shinoda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and etching apparatus
- Patent number 10,325,781
- Issue date Jun 18, 2019
- Hitachi High-Technologies Corporation
- Kazunori Shinoda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radical generator and molecular beam epitaxy apparatus
- Patent number 10,312,054
- Issue date Jun 4, 2019
- National University Corporation Nagoya University
- Masaru Hori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of reforming insulating film deposited on substrate with rec...
- Patent number 10,283,353
- Issue date May 7, 2019
- ASM IP Holding B.V.
- Akiko Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave supply apparatus, plasma processing apparatus, and plasma...
- Patent number 9,852,892
- Issue date Dec 26, 2017
- Tokyo Electron Limited
- Hitoshi Itoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of cyclic dry etching using etchant film
- Patent number 9,793,135
- Issue date Oct 17, 2017
- ASM IP Holding B.V.
- Masaru Zaitsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for producing group III nitride semiconductor...
- Patent number 9,773,667
- Issue date Sep 26, 2017
- National University Corporation Nagoya University
- Masaru Hori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Reactive-species supply device and surface treatment apparatus
- Patent number 9,713,241
- Issue date Jul 18, 2017
- Fuji Machine Mfg. Co., Ltd.
- Masaru Hori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reactive-species supply device and surface treatment apparatus
- Patent number 9,452,481
- Issue date Sep 27, 2016
- Fuji Machine Mfg. Co., Ltd.
- Masaru Hori
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Radical generator and molecular beam epitaxy apparatus
- Patent number 9,447,518
- Issue date Sep 20, 2016
- National University Corporation Nagoya University
- Masaru Hori
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method for manufacturing printed wiring board
- Patent number 9,420,697
- Issue date Aug 16, 2016
- Ibiden Co., Ltd.
- Yoshiyuki Iwata
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Microwave waveguide apparatus, plasma processing apparatus and plas...
- Patent number 9,252,000
- Issue date Feb 2, 2016
- National University Corporation Nagoya University
- Hitoshi Itoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Interference measurement device and measurement method
- Patent number 9,041,937
- Issue date May 26, 2015
- National University Corporation Nagoya University
- Masaru Hori
- G01 - MEASURING TESTING
Information Patent Grant
Plasma generator
- Patent number 8,961,888
- Issue date Feb 24, 2015
- NU Eco Engineering Co., Ltd.
- Masaru Hori
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Apparatus and method of removing coating of line-shaped body using...
- Patent number 8,758,637
- Issue date Jun 24, 2014
- The Furukawa Electric Co., Ltd.
- Takeshi Hirayama
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Multi-micro hollow cathode light source and atomic absorption sepct...
- Patent number 8,638,034
- Issue date Jan 28, 2014
- National University Corporation Nagoya University
- Masaru Hori
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma generating apparatus, plasma processing apparatus and plasma...
- Patent number 8,610,353
- Issue date Dec 17, 2013
- Tokyo Electron Limited
- Hitoshi Itoh
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Sample substrate for laser desorption ionization-mass spectrometry,...
- Patent number 8,558,169
- Issue date Oct 15, 2013
- Masaru Hori
- G01 - MEASURING TESTING
Information Patent Grant
Negative electrode for lithium secondary battery, method for prepar...
- Patent number 8,551,657
- Issue date Oct 8, 2013
- Toyota Jidosha Kabushiki Kaisha
- Satoshi Yoshida
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Method for producing graphene
- Patent number 8,349,142
- Issue date Jan 8, 2013
- NU Eco Engineering Co., Ltd.
- Masaru Hori
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
GALLIUM OXIDE FILM, AND MANUFACTURING DEVICE AND MANUFACTURING METH...
- Publication number 20250034752
- Publication date Jan 30, 2025
- NATIONAL UNIVERSITY CORPORATION TOKAI NATIONAL HIGHER EDUCATION AND RESEARCH...
- Masaru HORI
- C30 - CRYSTAL GROWTH
Information Patent Application
ETCHING METHOD
- Publication number 20250022719
- Publication date Jan 16, 2025
- Hitachi High-Tech Corporation
- Thi-Thuy-Nga NGUYEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE WITH ß-GALLIUM OXIDE FILM AND PRODUCTION METHOD THEREFOR
- Publication number 20250015144
- Publication date Jan 9, 2025
- NATIONAL UNIVERSITY CORPORATION TOKAI NATIONAL HIGHER EDUCATION AND RESEARCH...
- Masaru HORI
- C30 - CRYSTAL GROWTH
Information Patent Application
METHODS AND ASSEMBLIES FOR DEPOSITING MATERIAL IN A GAP
- Publication number 20250006489
- Publication date Jan 2, 2025
- ASM IP HOLDING B.V.
- Ranjit Borude
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCHING METHOD
- Publication number 20240297046
- Publication date Sep 5, 2024
- Hitachi High-Tech Corporation
- Kazunori SHINODA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING GROUP III-NITRIDE SEMICONDUCTOR
- Publication number 20240266168
- Publication date Aug 8, 2024
- SCREEN Holdings Co., Ltd.
- Masaki INABA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CARBON HARD MASK, FILM FORMING APPARATUS, AND FILM FORMING METHOD
- Publication number 20240240324
- Publication date Jul 18, 2024
- TOKYO ELECTRON LIMITED
- Masaru HORI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REFLECTION TYPE MASK BLANK AND METHOD FOR MANUFACTURING SAME
- Publication number 20240231215
- Publication date Jul 11, 2024
- AGC Inc.
- Wataru NISHIDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ETCHING METHOD AND ETCHING APPARATUS
- Publication number 20240222138
- Publication date Jul 4, 2024
- HITACHI HIGH-TECH CORPORATION
- Thi-Thuy-Nga NGUYEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR PRODUCING GROUP III NITRIDE SEMICONDUCTOR
- Publication number 20240153765
- Publication date May 9, 2024
- SCREEN Holdings Co., Ltd.
- Masaki INABA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REFLECTION TYPE MASK BLANK AND METHOD FOR MANUFACTURING SAME
- Publication number 20240134267
- Publication date Apr 25, 2024
- AGC Inc.
- Wataru NISHIDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ETCHING METHOD
- Publication number 20240047222
- Publication date Feb 8, 2024
- Hitachi High-Tech Corporation
- Kazunori Shinoda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING PROCESSES AND PROCESSING ASSEMBLIES
- Publication number 20230386792
- Publication date Nov 30, 2023
- ASM IP HOLDING B.V.
- Bablu Mukherjee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POWER STORAGE DEVICE AND ELECTRODE FOR POWER STORAGE DEVICE
- Publication number 20230163303
- Publication date May 25, 2023
- FUJITUSYOU CO., LTD.
- Masaru HORI
- C01 - INORGANIC CHEMISTRY
Information Patent Application
METHOD AND APPARATUS FOR DEPOSITION OF CARBON NANOSTRUCTURES
- Publication number 20230033329
- Publication date Feb 2, 2023
- Jozef Stefan Institute
- Rok ZAPLOTNIK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND SYSTEMS FOR TOPOGRAPHY-SELECTIVE DEPOSITIONS
- Publication number 20220375744
- Publication date Nov 24, 2022
- ASM IP HOLDING B.V.
- Akiko Kobayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
AREA-SELECTIVE ETCHING
- Publication number 20220359215
- Publication date Nov 10, 2022
- ASM IP HOLDING B.V.
- René Henricus Jozef Vervuurt
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR FILLING A GAP AND RELATED SYSTEMS AND DEVICES
- Publication number 20220165569
- Publication date May 26, 2022
- ASM IP HOLDING B.V.
- Zecheng Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CARBON HARD MASK, FILM FORMING APPARATUS, AND FILM FORMING METHOD
- Publication number 20220042173
- Publication date Feb 10, 2022
- TOKYO ELECTRON LIMITED
- Masaru HORI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CARBON NANOSTRUCTURED MATERIALS AND METHODS FOR FORMING CARBON NANO...
- Publication number 20210253430
- Publication date Aug 19, 2021
- Jozef Stefan Institute
- Rok ZAPLOTNIK
- B82 - NANO-TECHNOLOGY
Information Patent Application
CARBON NANOSHEET AND MANUFACTURING METHOD THEREFOR
- Publication number 20210053830
- Publication date Feb 25, 2021
- National University Corporation Tokai National Higher Education and Research...
- Masaru HORI
- B82 - NANO-TECHNOLOGY
Information Patent Application
SELECTIVE CYCLIC DRY ETCHING PROCESS OF DIELECTRIC MATERIALS USING...
- Publication number 20200027740
- Publication date Jan 23, 2020
- ASM IP HOLDING B.V.
- Rene Henricus Jozef Vervuurt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PRE-CLEANING FOR ETCHING OF DIELECTRIC MATERIALS
- Publication number 20200027746
- Publication date Jan 23, 2020
- ASM IP HOLDING B.V.
- Rene Henricus Jozef Vervuurt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE HAVING GROUP-III N...
- Publication number 20190225731
- Publication date Jul 25, 2019
- NISSAN CHEMICAL CORPORATION
- Keisuke HASHIMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ETCHING METHOD AND ETCHING APPARATUS
- Publication number 20190067032
- Publication date Feb 28, 2019
- Hitachi High-Technologies Corporation
- Kazunori SHINODA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ATOMIC LAYER ETCHING USING HYDROGEN PLASMA
- Publication number 20180350620
- Publication date Dec 6, 2018
- ASM IP HOLDING B.V.
- Masaru Zaitsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CELL-TRAPPING FILTER
- Publication number 20180296988
- Publication date Oct 18, 2018
- Asahi Glass Company, Limited
- Naoto KIHARA
- C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
Information Patent Application
METHOD OF REFORMING INSULATING FILM DEPOSITED ON SUBSTRATE WITH REC...
- Publication number 20180286663
- Publication date Oct 4, 2018
- ASM IP HOLDING B.V.
- Akiko Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND ETCHING APPARATUS
- Publication number 20180076051
- Publication date Mar 15, 2018
- Hitachi High-Technologies Corporation
- Kazunori SHINODA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE SUPPLY APPARATUS, PLASMA PROCESSING APPARATUS, AND PLASMA...
- Publication number 20170365446
- Publication date Dec 21, 2017
- TOKYO ELECTRON LIMITED
- Hitoshi ITOH
- H01 - BASIC ELECTRIC ELEMENTS

Masaru HORI

Person

Patents Grantslast 30 patents

Etching method

Methods for filling a gap and related systems and devices

Carbon hard mask, film forming apparatus, and film forming method

Carbon nanostructured materials and methods for forming carbon nano...

Method for manufacturing semiconductor substrate having group-III n...

Carbon nanosheet and manufacturing method therefor

Selective cyclic dry etching process of dielectric materials using...

Pre-cleaning for etching of dielectric materials

Radical generator and molecular beam epitaxy apparatus

Method of atomic layer etching using hydrogen plasma

Etching method and etching apparatus

Etching method and etching apparatus

Radical generator and molecular beam epitaxy apparatus

Method of reforming insulating film deposited on substrate with rec...

Microwave supply apparatus, plasma processing apparatus, and plasma...

Method of cyclic dry etching using etchant film

Apparatus and method for producing group III nitride semiconductor...

Reactive-species supply device and surface treatment apparatus

Reactive-species supply device and surface treatment apparatus

Radical generator and molecular beam epitaxy apparatus

Method for manufacturing printed wiring board

Microwave waveguide apparatus, plasma processing apparatus and plas...

Interference measurement device and measurement method

Plasma generator

Apparatus and method of removing coating of line-shaped body using...

Multi-micro hollow cathode light source and atomic absorption sepct...

Plasma generating apparatus, plasma processing apparatus and plasma...

Sample substrate for laser desorption ionization-mass spectrometry,...

Negative electrode for lithium secondary battery, method for prepar...

Method for producing graphene

Patents Applicationslast 30 patents

GALLIUM OXIDE FILM, AND MANUFACTURING DEVICE AND MANUFACTURING METH...

ETCHING METHOD

SUBSTRATE WITH ß-GALLIUM OXIDE FILM AND PRODUCTION METHOD THEREFOR

METHODS AND ASSEMBLIES FOR DEPOSITING MATERIAL IN A GAP

ETCHING METHOD

METHOD OF MANUFACTURING GROUP III-NITRIDE SEMICONDUCTOR

CARBON HARD MASK, FILM FORMING APPARATUS, AND FILM FORMING METHOD

REFLECTION TYPE MASK BLANK AND METHOD FOR MANUFACTURING SAME

ETCHING METHOD AND ETCHING APPARATUS

METHOD AND APPARATUS FOR PRODUCING GROUP III NITRIDE SEMICONDUCTOR

REFLECTION TYPE MASK BLANK AND METHOD FOR MANUFACTURING SAME

ETCHING METHOD

ETCHING PROCESSES AND PROCESSING ASSEMBLIES

POWER STORAGE DEVICE AND ELECTRODE FOR POWER STORAGE DEVICE

METHOD AND APPARATUS FOR DEPOSITION OF CARBON NANOSTRUCTURES

METHODS AND SYSTEMS FOR TOPOGRAPHY-SELECTIVE DEPOSITIONS

AREA-SELECTIVE ETCHING

METHODS FOR FILLING A GAP AND RELATED SYSTEMS AND DEVICES

CARBON HARD MASK, FILM FORMING APPARATUS, AND FILM FORMING METHOD

CARBON NANOSTRUCTURED MATERIALS AND METHODS FOR FORMING CARBON NANO...

CARBON NANOSHEET AND MANUFACTURING METHOD THEREFOR

SELECTIVE CYCLIC DRY ETCHING PROCESS OF DIELECTRIC MATERIALS USING...

PRE-CLEANING FOR ETCHING OF DIELECTRIC MATERIALS

METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE HAVING GROUP-III N...

ETCHING METHOD AND ETCHING APPARATUS

METHOD OF ATOMIC LAYER ETCHING USING HYDROGEN PLASMA

CELL-TRAPPING FILTER

METHOD OF REFORMING INSULATING FILM DEPOSITED ON SUBSTRATE WITH REC...

ETCHING METHOD AND ETCHING APPARATUS

MICROWAVE SUPPLY APPARATUS, PLASMA PROCESSING APPARATUS, AND PLASMA...