Masaru Sasaki

Person

Hyogo-Ken, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and high-frequency power application me...
- Patent number 12,027,347
- Issue date Jul 2, 2024
- Tokyo Electron Limited
- Naoki Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method, method for producing semiconductor device, a...
- Patent number 9,324,572
- Issue date Apr 26, 2016
- Tokyo Electron Limited
- Masaru Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for plasma treatment and method for plasma treatment
- Patent number 9,277,637
- Issue date Mar 1, 2016
- Tokyo Electron Limited
- Toshihisa Nozawa
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Etching method and apparatus
- Patent number 9,263,283
- Issue date Feb 16, 2016
- Tokyo Electron Limited
- Takayuki Sekine
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and device
- Patent number 9,218,983
- Issue date Dec 22, 2015
- Tokyo Electron Limited
- Takashi Dokan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching apparatus, plasma etching method, and semiconductor...
- Patent number 8,969,210
- Issue date Mar 3, 2015
- Tokyo Electron Limited
- Toshihisa Nozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 8,877,004
- Issue date Nov 4, 2014
- Tokyo Electron Limited
- Naoki Matsumoto
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma processing apparatus
- Patent number 8,753,475
- Issue date Jun 17, 2014
- Tokyo Electron Limited
- Naoki Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process chamber cleaning method in substrate processing apparatus,...
- Patent number 8,608,901
- Issue date Dec 17, 2013
- Tokyo Electron Limited
- Shuuichi Ishizuka
- B08 - CLEANING
Information Patent Grant
Semiconductor device, method for fabricating the same and apparatus...
- Patent number 8,497,196
- Issue date Jul 30, 2013
- Tokyo Electron Limited
- Masaru Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device manufacturing method and plasma oxidation trea...
- Patent number 8,105,958
- Issue date Jan 31, 2012
- Tokyo Electron Limited
- Yoshiro Kabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of modifying insulating film
- Patent number 8,021,987
- Issue date Sep 20, 2011
- Tokyo Electron Limited
- Takuya Sugawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 8,006,640
- Issue date Aug 30, 2011
- Tokyo Electron Limited
- Masaru Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor device and plasma oxidation...
- Patent number 7,981,785
- Issue date Jul 19, 2011
- Tokyo Electron Limited
- Masaru Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device manufacturing method and plasma oxidation method
- Patent number 7,906,440
- Issue date Mar 15, 2011
- Tokyo Electron Limited
- Masaru Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 7,897,009
- Issue date Mar 1, 2011
- Tokyo Electron Limited
- Masaru Sasaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for cleaning treatment chamber in substrate treating apparat...
- Patent number 7,887,637
- Issue date Feb 15, 2011
- Tokyo Electron Limited
- Shigenori Ozaki
- B08 - CLEANING
Information Patent Grant
Plasma oxidation method and method for manufacturing semiconductor...
- Patent number 7,825,018
- Issue date Nov 2, 2010
- Tokyo Electron Limited
- Masaru Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective plasma processing method
- Patent number 7,811,945
- Issue date Oct 12, 2010
- Tokyo Electron Limited
- Masaru Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and film forming method
- Patent number 7,771,796
- Issue date Aug 10, 2010
- Tokyo Electron Limited
- Masayuki Kohno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate treating method and production method for semiconductor d...
- Patent number 7,759,598
- Issue date Jul 20, 2010
- Tokyo Electron Limited
- Takuya Sugawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 7,754,995
- Issue date Jul 13, 2010
- Tokyo Electron Limited
- Toshihisa Nozawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of cleaning semiconductor substrate conductive layer surface
- Patent number 7,713,864
- Issue date May 11, 2010
- Tokyo Electron Limited
- Masaru Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for cleaning process chamber of substrate processing apparat...
- Patent number 7,695,763
- Issue date Apr 13, 2010
- Tokyo Electron Limited
- Shuuichi Ishizuka
- B08 - CLEANING
Information Patent Grant
Method for forming insulation film
- Patent number 7,662,236
- Issue date Feb 16, 2010
- Tokyo Electron Limited
- Takuya Sugawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of modifying insulating film
- Patent number 7,655,574
- Issue date Feb 2, 2010
- Tokyo Electron Limited
- Takuya Sugawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fabrication of low dielectric constant insulating film
- Patent number 7,645,481
- Issue date Jan 12, 2010
- Tokyo Electron Limited
- Masaru Sasaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming underlying insulation film
- Patent number 7,622,402
- Issue date Nov 24, 2009
- Tokyo Electron Limited
- Takuya Sugawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Material for electronic device and process for producing the same
- Patent number 7,560,396
- Issue date Jul 14, 2009
- Tokyo Electron Limited
- Takuya Sugawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of semiconductor device, semiconductor manufac...
- Patent number 7,524,774
- Issue date Apr 28, 2009
- Tokyo Electron Limited
- Masaru Sasaki
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS AND HIGH-FREQUENCY POWER APPLICATION ME...
- Publication number 20220076928
- Publication date Mar 10, 2022
- TOKYO ELECTRON LIMITED
- Naoki MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT PEDESTAL AND PLASMA PROCESSING APPARATUS
- Publication number 20210104385
- Publication date Apr 8, 2021
- TOKYO ELECTRON LIMITED
- Ryou SON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND DEVICE
- Publication number 20140308815
- Publication date Oct 16, 2014
- TOKYO ELECTRON LIMITED
- Takashi Dokan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND APPARATUS
- Publication number 20140302684
- Publication date Oct 9, 2014
- TOKYO ELECTRON LIMITED
- Takayuki Sekine
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20140080311
- Publication date Mar 20, 2014
- TOKYO ELECTRON LIMITED
- Naoki Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR PLASMA TREATMENT AND METHOD FOR PLASMA TREATMENT
- Publication number 20130302992
- Publication date Nov 14, 2013
- TOKYO ELECTRON LIMITED
- Toshihisa Nozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, A...
- Publication number 20130029494
- Publication date Jan 31, 2013
- TOKYO ELECTRON LIMITED
- Masaru Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING APPARATUS, PLASMA ETCHING METHOD, AND SEMICONDUCTOR...
- Publication number 20120064726
- Publication date Mar 15, 2012
- TOKYO ELECTRON LIMITED
- Toshihisa Nozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROLENS ARRAY MANUFACTURING METHOD, AND MICROLENS ARRAY
- Publication number 20120026593
- Publication date Feb 2, 2012
- Tokyo Electron Limited
- Shota Yoshimura
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
SEMICONDUCTOR DEVICE, METHOD FOR FABRICATING THE SAME AND APPARATUS...
- Publication number 20110079826
- Publication date Apr 7, 2011
- TOKYO ELECTRON LIMITED
- Masaru SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20110039417
- Publication date Feb 17, 2011
- TOKYO ELECTRON LIMITED
- Naoki Matsumoto
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PROCESS CHAMBER CLEANING METHOD IN SUBSTRATE PROCESSING APPARATUS,...
- Publication number 20100154707
- Publication date Jun 24, 2010
- TOKYO ELECTRON LIMITED
- Shuuichi Ishizuka
- B08 - CLEANING
Information Patent Application
FABRICATION OF LOW DIELECTRIC CONSTANT INSULATING FILM
- Publication number 20100132613
- Publication date Jun 3, 2010
- TOKYO ELECTRON LIMITED
- Masaru SASAKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MODIFYING INSULATING FILM
- Publication number 20100105215
- Publication date Apr 29, 2010
- TOKYO ELECTRON LIMITED
- Takuya Sugawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Forming Insulation Film
- Publication number 20100096707
- Publication date Apr 22, 2010
- TOKYO ELECTRON LIMITED
- Takuya Sugawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD AND PLASMA ETCHING APPARATUS
- Publication number 20090311870
- Publication date Dec 17, 2009
- TOKYO ELECTRON LIMITED
- Masaru SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20090211708
- Publication date Aug 27, 2009
- TOKYO ELECTRON LIMITED
- Naoki Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and plasma processing method
- Publication number 20090215274
- Publication date Aug 27, 2009
- TOKYO ELECTRON LIMITED
- Naoki Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate Treating Method
- Publication number 20090163036
- Publication date Jun 25, 2009
- TOKYO ELECTRON LIMITED
- Takuya Sugawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA OXIDATION METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR...
- Publication number 20090047778
- Publication date Feb 19, 2009
- TOKYO ELECTRON LIMITED
- Masaru Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NITRIDING METHOD OF GATE OXIDE FILM
- Publication number 20090035950
- Publication date Feb 5, 2009
- TOKYO ELECTRON LIMITED
- Seijii Matsuyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Forming Insulation Film
- Publication number 20080274370
- Publication date Nov 6, 2008
- TOKYO ELECTRON LIMITED
- Takuya Sugawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE PLASMA PROCESSING METHOD
- Publication number 20080176413
- Publication date Jul 24, 2008
- TOKYO ELECTRON LIMITED
- Masaru Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus
- Publication number 20080142159
- Publication date Jun 19, 2008
- Tokyo Electron Limited
- Masaru Sasaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor Device Manufacturing Method and Plasma Oxidation Method
- Publication number 20080146041
- Publication date Jun 19, 2008
- TOKYO ELECTRON LIMITED
- Masaru Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device Manufacturing Method and Plasma Oxidation Trea...
- Publication number 20080032511
- Publication date Feb 7, 2008
- TOKYO ELECTRON LIMITED
- Yoshiro Kabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20070286967
- Publication date Dec 13, 2007
- TOKYO ELECTRON LIMITED
- Shinji Ide
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate treating method and production method for semiconductor d...
- Publication number 20070235421
- Publication date Oct 11, 2007
- TOKYO ELECTRON LIMITED
- Takuya Sugawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Manufacturing Semiconductor Device and Plasma Oxidation...
- Publication number 20070224836
- Publication date Sep 27, 2007
- TOKYO ELECTRON LIMITED
- Masaru Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20070221294
- Publication date Sep 27, 2007
- TOKYO ELECTRON LIMITED
- Masaru Sasaki
- H01 - BASIC ELECTRIC ELEMENTS

Masaru Sasaki

Person

Patents Grantslast 30 patents

Plasma processing apparatus and high-frequency power application me...

Plasma etching method, method for producing semiconductor device, a...

Apparatus for plasma treatment and method for plasma treatment

Etching method and apparatus

Etching method and device

Plasma etching apparatus, plasma etching method, and semiconductor...

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Process chamber cleaning method in substrate processing apparatus,...

Semiconductor device, method for fabricating the same and apparatus...

Semiconductor device manufacturing method and plasma oxidation trea...

Method of modifying insulating film

Plasma processing apparatus and plasma processing method

Method for manufacturing semiconductor device and plasma oxidation...

Semiconductor device manufacturing method and plasma oxidation method

Plasma processing apparatus

Method for cleaning treatment chamber in substrate treating apparat...

Plasma oxidation method and method for manufacturing semiconductor...

Selective plasma processing method

Plasma processing method and film forming method

Substrate treating method and production method for semiconductor d...

Plasma processing apparatus and plasma processing method

Method of cleaning semiconductor substrate conductive layer surface

Method for cleaning process chamber of substrate processing apparat...

Method for forming insulation film

Method of modifying insulating film

Fabrication of low dielectric constant insulating film

Method for forming underlying insulation film

Material for electronic device and process for producing the same

Manufacturing method of semiconductor device, semiconductor manufac...

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS AND HIGH-FREQUENCY POWER APPLICATION ME...

SUBSTRATE SUPPORT PEDESTAL AND PLASMA PROCESSING APPARATUS

ETCHING METHOD AND DEVICE

ETCHING METHOD AND APPARATUS

PLASMA PROCESSING METHOD

APPARATUS FOR PLASMA TREATMENT AND METHOD FOR PLASMA TREATMENT

PLASMA ETCHING METHOD, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, A...

PLASMA ETCHING APPARATUS, PLASMA ETCHING METHOD, AND SEMICONDUCTOR...

MICROLENS ARRAY MANUFACTURING METHOD, AND MICROLENS ARRAY

SEMICONDUCTOR DEVICE, METHOD FOR FABRICATING THE SAME AND APPARATUS...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PROCESS CHAMBER CLEANING METHOD IN SUBSTRATE PROCESSING APPARATUS,...

FABRICATION OF LOW DIELECTRIC CONSTANT INSULATING FILM

METHOD OF MODIFYING INSULATING FILM

Method for Forming Insulation Film

PLASMA ETCHING METHOD AND PLASMA ETCHING APPARATUS

PLASMA PROCESSING APPARATUS

Plasma processing apparatus and plasma processing method

Substrate Treating Method

PLASMA OXIDATION METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR...

NITRIDING METHOD OF GATE OXIDE FILM

Method for Forming Insulation Film

SELECTIVE PLASMA PROCESSING METHOD

Plasma Processing Apparatus

Semiconductor Device Manufacturing Method and Plasma Oxidation Method

Semiconductor Device Manufacturing Method and Plasma Oxidation Trea...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

Substrate treating method and production method for semiconductor d...

Method for Manufacturing Semiconductor Device and Plasma Oxidation...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD