Masaru Tanaka

Person

Niihama, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Impurity-doped layer formation apparatus and electrostatic chuck pr...
- Patent number 9,312,163
- Issue date Apr 12, 2016
- Sumitomo Heavy Industries, Ltd.
- Masaru Tanaka
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 9,105,451
- Issue date Aug 11, 2015
- Sumitomo Heavy Industries, Ltd.
- Hiroyuki Makino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 8,366,833
- Issue date Feb 5, 2013
- Sumitomo Heavy Industries
- Hiroyuki Makino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum film growth apparatus
- Patent number 6,394,025
- Issue date May 28, 2002
- Sumitomo Heavy Industries, Ltd.
- Toshiyuki Sakemi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film growth method and film growth apparatus capable of forming mag...
- Patent number 6,245,394
- Issue date Jun 12, 2001
- Sumitomo Heavy Industries, Inc.
- Toshiyuki Sakemi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film deposition method for forming copper film
- Patent number 6,220,204
- Issue date Apr 24, 2001
- Sumitomo Heavy Industries, Ltd.
- Hiroyuki Makino
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion plating apparatus
- Patent number 6,160,350
- Issue date Dec 12, 2000
- Sumitomo Heavy Industries, Ltd.
- Toshiyuki Sakemi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion plating apparatus that prevents wasteful consumption of evapora...
- Patent number 6,021,737
- Issue date Feb 8, 2000
- Sumitomo Heavy Industries, Ltd.
- Toshiyuki Sakemi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electron flow accelerating method and apparatus which can generate...
- Patent number 5,677,597
- Issue date Oct 14, 1997
- Sumitomo Heavy Industries, Ltd.
- Masaru Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 5,677,012
- Issue date Oct 14, 1997
- Sumitomo Heavy Industries, Ltd.
- Toshiyuki Sakemi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma beam generating method and apparatus which can generate a hi...
- Patent number 5,557,172
- Issue date Sep 17, 1996
- Sumitomo Heavy Industries, Ltd.
- Masaru Tanaka
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
IMPURITY-DOPED LAYER FORMATION APPARATUS AND ELECTROSTATIC CHUCK PR...
- Publication number 20130019797
- Publication date Jan 24, 2013
- SEN Corporation
- Masaru Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20120181252
- Publication date Jul 19, 2012
- Sumitomo Heavy Industries, Ltd.
- Hiroyuki MAKINO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA DOPING APPARATUS AND PLASMA DOPING METHOD
- Publication number 20120015507
- Publication date Jan 19, 2012
- SEN Corporation
- Masaru Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20110097516
- Publication date Apr 28, 2011
- Sumitomo Heavy Industries, Ltd.
- Hiroyuki MAKINO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20110097510
- Publication date Apr 28, 2011
- Sumitomo Heavy Industries, Ltd.
- Hiroyuki MAKINO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-layer circuit board and method for manufacturing same
- Publication number 20040148766
- Publication date Aug 5, 2004
- Jinichi Noguchi
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Masaru Tanaka

Person

Patents Grantslast 30 patents

Impurity-doped layer formation apparatus and electrostatic chuck pr...

Plasma processing method and plasma processing apparatus

Plasma processing apparatus and plasma processing method

Vacuum film growth apparatus

Film growth method and film growth apparatus capable of forming mag...

Film deposition method for forming copper film

Ion plating apparatus

Ion plating apparatus that prevents wasteful consumption of evapora...

Electron flow accelerating method and apparatus which can generate...

Plasma processing method and plasma processing apparatus

Plasma beam generating method and apparatus which can generate a hi...

Patents Applicationslast 30 patents

IMPURITY-DOPED LAYER FORMATION APPARATUS AND ELECTROSTATIC CHUCK PR...

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA DOPING APPARATUS AND PLASMA DOPING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

Multi-layer circuit board and method for manufacturing same