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Patents Grants
last 30 patents
Information
Patent Grant
Photosensitive resin composition, patterning process, method for fo...
Patent number
11,892,773
Issue date
Feb 6, 2024
Shin-Etsu Chemical Co., Ltd.
Hiroyuki Urano
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Polymer having a structure of polyamide, polyamide-imide, or polyim...
Patent number
11,768,434
Issue date
Sep 26, 2023
Shin-Etsu Chemical Co., Ltd.
Katsuya Takemura
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Compound, polyimide resin and method of producing the same, photose...
Patent number
11,572,442
Issue date
Feb 7, 2023
International Business Machines Corporation
Dmitry Zubarev
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Polymer, photosensitive resin composition, patterning method, metho...
Patent number
11,333,975
Issue date
May 17, 2022
International Business Machines Corporation
Dmitry Zubarev
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Polymer of polyimide precursor, positive type photosensitive resin...
Patent number
11,150,556
Issue date
Oct 19, 2021
Shin-Etsu Chemical Co., Ltd.
Katsuya Takemura
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Grant
Tetracarboxylic dianhydride, polyimide resin and method for produci...
Patent number
10,919,918
Issue date
Feb 16, 2021
Shin-Etsu Chemical Co., Ltd.
Hiroyuki Urano
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Grant
Tetracarboxylic acid diester compound, polymer of polyimide precurs...
Patent number
10,816,900
Issue date
Oct 27, 2020
Shin-Etsu Chemical Co., Ltd.
Hiroyuki Urano
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Tetracarboxylic acid diester compound, polyimide precursor polymer...
Patent number
10,457,779
Issue date
Oct 29, 2019
Shin-Etsu Chemical Co., Ltd.
Katsuya Takemura
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Grant
Tetracarboxylic acid diester compound, polyimide precursor polymer...
Patent number
10,216,085
Issue date
Feb 26, 2019
Shin-Etsu Chemical Co., Ltd.
Katsuya Takemura
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Tetracarboxylic acid diester compound, polymer of polyimide precurs...
Patent number
10,203,601
Issue date
Feb 12, 2019
Shin-Etsu Chemical Co., Ltd.
Hiroyuki Urano
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Positive photosensitive resin composition, photo-curable dry film a...
Patent number
10,197,914
Issue date
Feb 5, 2019
Shin-Etsu Chemical Co., Ltd.
Katsuya Takemura
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Grant
Silicone skeleton-containing polymer compound and method for produc...
Patent number
10,114,287
Issue date
Oct 30, 2018
Shin-Etsu Chemical Co., Ltd.
Hiroyuki Urano
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Silicone skeleton-containing polymer compound, chemically amplified...
Patent number
10,087,288
Issue date
Oct 2, 2018
Shin-Etsu Chemical Co., Ltd.
Hiroyuki Urano
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Grant
Positive photosensitive resin composition, photo-curable dry film a...
Patent number
9,557,645
Issue date
Jan 31, 2017
Shin-Etsu Chemical Co., Ltd.
Katsuya Takemura
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Polymer compound, chemically amplified negative resist composition,...
Patent number
9,400,428
Issue date
Jul 26, 2016
Shin-Etsu Chemical Co., Ltd.
Hiroyuki Urano
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Silicone structure-bearing polymer, negative resist composition, ph...
Patent number
9,377,689
Issue date
Jun 28, 2016
Shin-Etsu Chemical Co., Ltd.
Katsuya Takemura
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Negative resist composition and patterning process using same
Patent number
9,310,681
Issue date
Apr 12, 2016
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Methods for manufacturing resin structure and micro-structure
Patent number
9,017,928
Issue date
Apr 28, 2015
Shin-Etsu Chemical Co., Ltd.
Yoshinori Hirano
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Chemically amplified positive resist composition and pattern formin...
Patent number
9,017,905
Issue date
Apr 28, 2015
Shin-Etsu Chemical Co., Ltd.
Masashi Iio
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Methods for manufacturing resin structure and micro-structure
Patent number
8,951,717
Issue date
Feb 10, 2015
Shin-Etsu Chemical Co., Ltd.
Yoshinori Hirano
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Patterning process
Patent number
8,703,404
Issue date
Apr 22, 2014
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Pattern forming process, chemically amplified positive resist compo...
Patent number
8,658,346
Issue date
Feb 25, 2014
Shin-Etsu Chemical Co., Ltd.
Takeru Watanabe
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist-modifying composition and pattern forming process
Patent number
8,426,105
Issue date
Apr 23, 2013
Shin-Etsu Chemical Co., Ltd.
Takeru Watanabe
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Pattern forming process and resist-modifying composition
Patent number
8,367,310
Issue date
Feb 5, 2013
Shin-Etsu Chemical Co., Ltd.
Takeru Watanabe
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist-modifying composition and pattern forming process
Patent number
8,329,384
Issue date
Dec 11, 2012
Shin-Etsu Chemical Co., Ltd.
Takeru Watanabe
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Positive resist composition and patterning process
Patent number
7,985,528
Issue date
Jul 26, 2011
Shin-Etsu Chemical Co., Ltd.
Tsunehiro Nishi
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Patents Applications
last 30 patents
Information
Patent Application
Negative Photosensitive Resin Composition, Patterning Process, Inte...
Publication number
20230350294
Publication date
Nov 2, 2023
Shin-Etsu Chemical Co., Ltd.
Katsuya TAKEMURA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METH...
Publication number
20220317570
Publication date
Oct 6, 2022
Shin-Etsu Chemical Co., Ltd.
Masashi IIO
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, POSITIVE PHOTOSENSITIVE...
Publication number
20220315676
Publication date
Oct 6, 2022
Shin-Etsu Chemical Co., Ltd.
Masashi IIO
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
POLYIMIDE-BASED POLYMER, POSITIVE PHOTOSENSITIVE RESIN COMPOSITION,...
Publication number
20220289911
Publication date
Sep 15, 2022
Shin-Etsu Chemical Co., Ltd.
Hiroyuki URANO
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FO...
Publication number
20220091509
Publication date
Mar 24, 2022
Shin-Etsu Chemical Co., Ltd.
Hiroyuki URANO
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, POSITIVE PHOTOSENSITIVE...
Publication number
20220043351
Publication date
Feb 10, 2022
Shin-Etsu Chemical Co., Ltd.
Masashi IIO
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METH...
Publication number
20220043348
Publication date
Feb 10, 2022
Shin-Etsu Chemical Co., Ltd.
Masashi IIO
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD, METHO...
Publication number
20210317268
Publication date
Oct 14, 2021
International Business Machines Corporation
Dmitry Zubarev
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
NOVEL COMPOUND, POLYIMIDE RESIN AND METHOD OF PRODUCING THE SAME, P...
Publication number
20210317270
Publication date
Oct 14, 2021
International Business Machines Corporation
Dmitry Zubarev
C07 - ORGANIC CHEMISTRY
Information
Patent Application
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METH...
Publication number
20200326624
Publication date
Oct 15, 2020
Shin-Etsu Chemical Co., Ltd.
Hiroyuki URANO
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
POLYMER HAVING A STRUCTURE OF POLYAMIDE, POLYAMIDE-IMIDE, OR POLYIM...
Publication number
20200041903
Publication date
Feb 6, 2020
Shin-Etsu Chemical Co., Ltd.
Katsuya TAKEMURA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
NOVEL TETRACARBOXYLIC DIANHYDRIDE, POLYIMIDE RESIN AND METHOD FOR P...
Publication number
20190169211
Publication date
Jun 6, 2019
Shin-Etsu Chemical Co., Ltd.
Hiroyuki URANO
C07 - ORGANIC CHEMISTRY
Information
Patent Application
TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYMER OF POLYIMIDE PRECURS...
Publication number
20190018320
Publication date
Jan 17, 2019
Shin-Etsu Chemical Co., Ltd.
Hiroyuki URANO
C07 - ORGANIC CHEMISTRY
Information
Patent Application
POLYMER OF POLYIMIDE PRECURSOR, POSITIVE TYPE PHOTOSENSITIVE RESIN...
Publication number
20180275513
Publication date
Sep 27, 2018
Shin-Etsu Chemical Co., Ltd.
Katsuya TAKEMURA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYMER OF POLYIMIDE PRECURS...
Publication number
20180120702
Publication date
May 3, 2018
Shin-Etsu Chemical Co., Ltd.
Hiroyuki URANO
C07 - ORGANIC CHEMISTRY
Information
Patent Application
TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYIMIDE PRECURSOR POLYMER...
Publication number
20180024434
Publication date
Jan 25, 2018
Shin-Etsu Chemical Co., Ltd.
Katsuya TAKEMURA
C07 - ORGANIC CHEMISTRY
Information
Patent Application
TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYIMIDE PRECURSOR POLYMER...
Publication number
20170298186
Publication date
Oct 19, 2017
Shin-Etsu Chemical Co., Ltd.
Katsuya TAKEMURA
C07 - ORGANIC CHEMISTRY
Information
Patent Application
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PHOTO-CURABLE DRY FILM A...
Publication number
20170255097
Publication date
Sep 7, 2017
Shin-Etsu Chemical Co., Ltd.
Katsuya TAKEMURA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
SILICONE SKELETON-CONTAINING POLYMER COMPOUND, CHEMICALLY AMPLIFIED...
Publication number
20160200877
Publication date
Jul 14, 2016
Shin-Etsu Chemical Co., Ltd.
Hiroyuki URANO
B32 - LAYERED PRODUCTS
Information
Patent Application
SILICONE SKELETON-CONTAINING POLYMER COMPOUND AND METHOD FOR PRODUC...
Publication number
20160097973
Publication date
Apr 7, 2016
Shin-Etsu Chemical Co., Ltd.
Hiroyuki URANO
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
SILICONE STRUCTURE-BEARING POLYMER, NEGATIVE RESIST COMPOSITION, PH...
Publication number
20160033865
Publication date
Feb 4, 2016
Shin-Etsu Chemical Co., Ltd.
Katsuya Takemura
C07 - ORGANIC CHEMISTRY
Information
Patent Application
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PHOTO-CURABLE DRY FILM A...
Publication number
20150370166
Publication date
Dec 24, 2015
Shin-Etsu Chemical Co., Ltd.
Katsuya TAKEMURA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME
Publication number
20150198883
Publication date
Jul 16, 2015
Shin-Etsu Chemical Co., Ltd.
Jun HATAKEYAMA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
POLYMER COMPOUND, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION,...
Publication number
20150056545
Publication date
Feb 26, 2015
Shin-Etsu Chemical Co., Ltd.
Hiroyuki URANO
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
METHODS FOR MANUFACTURING RESIN STRUCTURE AND MICRO-STRUCTURE
Publication number
20140220497
Publication date
Aug 7, 2014
Shin-Etsu Chemical Co., Ltd.
Yoshinori Hirano
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERN FORMIN...
Publication number
20140087294
Publication date
Mar 27, 2014
Shin-Etsu Chemical Co., Ltd.
Masashi Iio
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHODS FOR MANUFACTURING RESIN STRUCTURE AND MICRO-STRUCTURE
Publication number
20140072914
Publication date
Mar 13, 2014
Shin-Etsu Chemical Co., Ltd.
Yoshinori Hirano
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PATTERNING PROCESS AND RESIST COMPOSITION
Publication number
20130065183
Publication date
Mar 14, 2013
Shin-Etsu Chemical Co., Ltd.
Tomohiro Kobayashi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
POLYMERIZABLE ESTER COMPOUND, POLYMER, RESIST COMPOSITION, AND PATT...
Publication number
20130017484
Publication date
Jan 17, 2013
Koji HASEGAWA
C07 - ORGANIC CHEMISTRY
Information
Patent Application
PATTERNING PROCESS
Publication number
20120202158
Publication date
Aug 9, 2012
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY