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Masashi Kimura

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  • Tokyo, JP
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Patents Grantslast 30 patents

  • Information Patent Grant

    Polyamide
    • Patent number 7,563,557
    • Issue date Jul 21, 2009
    • Asahi Kasei EMD Corporation
    • Masashi Kimura
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Grant

    Highly heat-resistant, negative-type photosensitive resin composition
    • Patent number 7,282,323
    • Issue date Oct 16, 2007
    • Asahi Kasei EMD Corporation
    • Ryuichiro Kanatani
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Positive resist composition
    • Patent number 6,376,151
    • Issue date Apr 23, 2002
    • Asahi Kasei Kabushiki Kaisha
    • Hideaki Takahashi
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Grant

    Automatic titration analysis apparatus
    • Patent number 4,749,552
    • Issue date Jun 7, 1988
    • Ebara Densan Ltd.
    • Hitoshi Sakisako
    • G01 - MEASURING TESTING

Patents Applicationslast 30 patents

  • Information Patent Application

    PHOTOSENSITIVE ALKALI-SOLUBLE SILICONE RESIN COMPOSITION
    • Publication number 20140193632
    • Publication date Jul 10, 2014
    • ASAHI KASEI E-MATERIALS CORPORATION
    • Yamato Saito
    • C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
  • Information Patent Application

    POLYORGANOSILOXANE COMPOSITION
    • Publication number 20100019399
    • Publication date Jan 28, 2010
    • Masashi Kimura
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    PHOTOSENSITIVE RESIN COMPOSITION
    • Publication number 20090029287
    • Publication date Jan 29, 2009
    • ASAHI KASEI EMD CORPORATION
    • Takaaki Kobayashi
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    Polyamide
    • Publication number 20070248910
    • Publication date Oct 25, 2007
    • ASAHI KASEI EMD CORPORATION
    • Masashi Kimura
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    Highly heat-resistant, negative-type photosensitive resin composition
    • Publication number 20050244739
    • Publication date Nov 3, 2005
    • Ryuichiro Kanatani
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY