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Masato Kobayashi
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Vancouver, WA, US
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last 30 patents
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Patent Grant
Precursor with (methoxy) (methyl) silylolefin ligand to deposit cop...
Patent number
6,090,960
Issue date
Jul 18, 2000
Sharp Laboratories of America, Inc.
Yoshihide Senzaki
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Semiconductor wafer with removed CVD copper
Patent number
6,020,639
Issue date
Feb 1, 2000
Sharp Laboratories of America, Inc.
Bruce Dale Ulrich
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Low temperature system and method for CVD copper removal
Patent number
5,897,379
Issue date
Apr 27, 1999
Sharp Microelectronics Technology, Inc.
Bruce Dale Ulrich
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Precursor with (alkyloxy)(alkyl)-silylolefin ligand to deposit copper
Patent number
5,767,301
Issue date
Jun 16, 1998
Sharp Microelectronics Technology, Inc.
Yoshihide Senzaki
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Method of using water vapor to increase the conductivity of cooper...
Patent number
5,744,192
Issue date
Apr 28, 1998
Sharp Microelectronics Technology, Inc.
Tue Nguyen
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...