Article Entitled Chemical Vapor Deposition of Copper from (hfac)CuL(L = LTMS and 2-Butyne) in the Presence of Water, Methanol, and Dimethyl Ether printed in Chem. Mater. 1996, vol. 8,No. 5, pp. 1119-1127 Jain, A et al. |
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Article entitled "CHemical Addiives for Improved Copper CVD Processing Using (hfac) Cu(TMVS)" 1995 Material Research Society, Conference Proceedings ULSI-X, 1995, pp. 79-86 Hochberg, Arthur et al. |