Masayuki SAWATAISHI

Person

Kofu-city, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Etching method and plasma processing apparatus
- Patent number 12,154,790
- Issue date Nov 26, 2024
- Tokyo Electron Limited
- Seiichi Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and substrate processing apparatus
- Patent number 11,688,650
- Issue date Jun 27, 2023
- Tokyo Electron Limited
- Gaku Shimoda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method and plasma processing device
- Patent number 11,062,881
- Issue date Jul 13, 2021
- Tokyo Electron Limited
- Masayuki Sawataishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 9,428,838
- Issue date Aug 30, 2016
- Tokyo Electron Limited
- Masayuki Sawataishi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for etching metal nitride with high selectivity to other mat...
- Patent number 8,282,844
- Issue date Oct 9, 2012
- Tokyo Electron Limited
- Akiteru Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and computer storage medium storing program for cont...
- Patent number 7,256,135
- Issue date Aug 14, 2007
- Tokyo Electron Limited
- Masato Kushibiki
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20220262601
- Publication date Aug 18, 2022
- TOKYO ELECTRON LIMITED
- Seiichi WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD AND PLASMA PROCESSING DEVICE
- Publication number 20210005427
- Publication date Jan 7, 2021
- TOKYO ELECTRON LIMITED
- Masayuki SAWATAISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20210005519
- Publication date Jan 7, 2021
- TOKYO ELECTRON LIMITED
- Gaku SHIMODA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20190051500
- Publication date Feb 14, 2019
- TOKYO ELECTRON LIMITED
- Takanori Eto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING METHOD OF PLASMA PROCESSING APPARATUS AND PLASMA PROCESSIN...
- Publication number 20170186591
- Publication date Jun 29, 2017
- TOKYO ELECTRON LIMITED
- Kyosuke Hayashi
- B08 - CLEANING
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20140299571
- Publication date Oct 9, 2014
- TOKYO ELECTRON LIMITED
- Masayuki SAWATAISHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for etching metal nitride with high selectivity to other mat...
- Publication number 20100206841
- Publication date Aug 19, 2010
- Tokyo Electron Limited
- Akiteru KO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for etching metal nitride with high selectivity to other mat...
- Publication number 20090032495
- Publication date Feb 5, 2009
- TOKYO ELECTRON LIMITED
- Akiteru KO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE ATTRACTING METHOD, AND ST...
- Publication number 20070211402
- Publication date Sep 13, 2007
- TOKYO ELECTRON LIMITED
- Masayuki Sawataishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etching method and computer storage medium storing program for cont...
- Publication number 20050070111
- Publication date Mar 31, 2005
- TOKYO ELECTRON LIMITED
- Masato Kushibiki
- H01 - BASIC ELECTRIC ELEMENTS

Masayuki SAWATAISHI

Person

Patents Grantslast 30 patents

Etching method and plasma processing apparatus

Etching method and substrate processing apparatus

Plasma etching method and plasma processing device

Plasma processing method and plasma processing apparatus

Method for etching metal nitride with high selectivity to other mat...

Etching method and computer storage medium storing program for cont...

Patents Applicationslast 30 patents

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA ETCHING METHOD AND PLASMA PROCESSING DEVICE

ETCHING METHOD AND SUBSTRATE PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

CLEANING METHOD OF PLASMA PROCESSING APPARATUS AND PLASMA PROCESSIN...

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

Method for etching metal nitride with high selectivity to other mat...

Method for etching metal nitride with high selectivity to other mat...

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE ATTRACTING METHOD, AND ST...

Etching method and computer storage medium storing program for cont...