Matthew J. Prince

Person

Portland, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
Techniques and configurations to reduce transistor gate short defects
- Patent number 12,094,780
- Issue date Sep 17, 2024
- Intel Corporation
- Sridhar Govindaraju
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Techniques and configurations to reduce transistor gate short defects
- Patent number 11,756,833
- Issue date Sep 12, 2023
- Intel Corporation
- Sridhar Govindaraju
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Techniques and configurations to reduce transistor gate short defects
- Patent number 11,380,592
- Issue date Jul 5, 2022
- Intel Corporation
- Sridhar Govindaraju
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Techniques and configurations to reduce transistor gate short defects
- Patent number 10,847,423
- Issue date Nov 24, 2020
- Intel Corporation
- Sridhar Govindaraju
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Techniques and configurations to reduce transistor gate short defects
- Patent number 10,468,305
- Issue date Nov 5, 2019
- Intel Corporation
- Sridhar Govindaraju
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Techniques and configurations to reduce transistor gate short defects
- Patent number 9,761,497
- Issue date Sep 12, 2017
- Intel Corporation
- Sridhar Govindaraju
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Techniques and configurations to reduce transistor gate short defects
- Patent number 9,281,401
- Issue date Mar 8, 2016
- Intel Corporation
- Sridhar Govindaraju
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Facilitating removal of sacrificial layers via implantation to form...
- Patent number 7,422,936
- Issue date Sep 9, 2008
- Intel Corporation
- Chris E. Barns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch stop and hard mask film property matching to enable improved r...
- Patent number 7,271,045
- Issue date Sep 18, 2007
- Intel Corporation
- Matthew J. Prince
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Poly open polish process
- Patent number 7,166,506
- Issue date Jan 23, 2007
- Intel Corporation
- Matthew J. Prince
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-platen multi-slurry chemical mechanical polishing process
- Patent number 7,125,321
- Issue date Oct 24, 2006
- Intel Corporation
- Matthew J Prince
- B24 - GRINDING POLISHING
Information Patent Grant
Polish pad with non-uniform groove depth to improve wafer polish ra...
- Patent number 6,951,506
- Issue date Oct 4, 2005
- Intel Corporation
- Ebrahim Andideh
- B24 - GRINDING POLISHING
Information Patent Grant
Polish pad with non-uniform groove depth to improve wafer polish ra...
- Patent number 6,093,651
- Issue date Jul 25, 2000
- Intel Corporation
- Ebrahim Andideh
- B24 - GRINDING POLISHING
Information Patent Grant
Sacrificial erosion control features for chemical-mechanical polish...
- Patent number 6,087,733
- Issue date Jul 11, 2000
- Intel Corporation
- Michael A. Maxim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for chemical mechanical polishing
- Patent number 6,083,089
- Issue date Jul 4, 2000
- Intel Corporation
- Joseph R. Breivogel
- B24 - GRINDING POLISHING
Information Patent Grant
Method and apparatus for chemical-mechanical polishing using pneuma...
- Patent number 5,635,083
- Issue date Jun 3, 1997
- Intel Corporation
- Joseph R. Breivogel
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad conditioning apparatus for wafer planarization process
- Patent number 5,216,843
- Issue date Jun 8, 1993
- Intel Corporation
- Joseph R. Breivogel
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
TECHNIQUES AND CONFIGURATIONS TO REDUCE TRANSISTOR GATE SHORT DEFECTS
- Publication number 20240413016
- Publication date Dec 12, 2024
- Intel Corporation
- Sridhar GOVINDARAJU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MODULATION OF CHIP PERFORMANCE BY CONTROLLING TRANSISTOR GATE PROFILE
- Publication number 20240332088
- Publication date Oct 3, 2024
- Intel Corporation
- Reza Bayati
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRANSISTOR WITH CHANNEL-SYMMETRIC GATE
- Publication number 20240332290
- Publication date Oct 3, 2024
- Intel Corporation
- Shao-Ming Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL GATE CUT WITH HYBRID MATERIAL FILL
- Publication number 20240213100
- Publication date Jun 27, 2024
- Intel Corporation
- Swapnadip Ghosh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL MECHANICAL POLISHING OF METAL GATE CUTS FORMED AFTER SOURC...
- Publication number 20240213026
- Publication date Jun 27, 2024
- Intel Corporation
- Matthew J. Prince
- B24 - GRINDING POLISHING
Information Patent Application
SELF-ALIGNED BACKBONE FOR FORKSHEET TRANSISTORS
- Publication number 20240213250
- Publication date Jun 27, 2024
- Intel Corporation
- Shao Ming KOH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIELECTRIC LAYER STACK FOR WIDE GATE CUT STRUCTURES
- Publication number 20240203739
- Publication date Jun 20, 2024
- Intel Corporation
- Swapnadip Ghosh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL MECHANICAL POLISHING OF CARBON HARD MASK
- Publication number 20240194732
- Publication date Jun 13, 2024
- Intel Corporation
- Matthew J. Prince
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL GATE CUT FORMED AFTER SOURCE AND DRAIN CONTACTS
- Publication number 20240112916
- Publication date Apr 4, 2024
- Intel Corporation
- Swapnadip Ghosh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMING METAL GATE CUTS USING MULTIPLE PASSES FOR DEPTH CONTROL
- Publication number 20240113105
- Publication date Apr 4, 2024
- Intel Corporation
- Alison V. Davis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-STAGE MASK ETCH PROCESS
- Publication number 20240105800
- Publication date Mar 28, 2024
- Intel Corporation
- Reza Bayati
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE CUTS WITH SELF-FORMING POLYMER LAYER
- Publication number 20240105452
- Publication date Mar 28, 2024
- Intel Corporation
- Reza Bayati
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH ASPECT RATIO METAL GATE CUTS
- Publication number 20240105453
- Publication date Mar 28, 2024
- Intel Corporation
- Reza Bayati
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE CUTS IN A GRATING PATTERN ACROSS AN INTEGRATED CIRCUIT
- Publication number 20240088218
- Publication date Mar 14, 2024
- Intel Corporation
- Shao-Ming Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES AND CONFIGURATIONS TO REDUCE TRANSISTOR GATE SHORT DEFECTS
- Publication number 20230360973
- Publication date Nov 9, 2023
- Intel Corporation
- Sridhar Govindaraju
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES AND CONFIGURATIONS TO REDUCE TRANSISTOR GATE SHORT DEFECTS
- Publication number 20220262684
- Publication date Aug 18, 2022
- Intel Corporation
- Sridhar Govindaraju
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES AND CONFIGURATIONS TO REDUCE TRANSISTOR GATE SHORT DEFECTS
- Publication number 20210028066
- Publication date Jan 28, 2021
- Intel Corporation
- Sridhar Govindaraju
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES AND CONFIGURATIONS TO REDUCE TRANSISTOR GATE SHORT DEFECTS
- Publication number 20190363022
- Publication date Nov 28, 2019
- Intel Corporation
- Sridhar Govindaraju
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES AND CONFIGURATIONS TO REDUCE TRANSISTOR GATE SHORT DEFECTS
- Publication number 20170133276
- Publication date May 11, 2017
- Intel Corporation
- Sridhar Govindaraju
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES AND CONFIGURATIONS TO REDUCE TRANSISTOR GATE SHORT DEFECTS
- Publication number 20160141212
- Publication date May 19, 2016
- Intel Corporation
- Sridhar Govindaraju
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES AND CONFIGURATIONS TO REDUCE TRANSISTOR GATE SHORT DEFECTS
- Publication number 20150179785
- Publication date Jun 25, 2015
- Sridhar Govindaraju
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM TO CONTROL POLISH RATE VARIATION INTRODUCED BY DE...
- Publication number 20150179469
- Publication date Jun 25, 2015
- Sridhar Govindaraju
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etch stop and hard mask film property matching to enable improved r...
- Publication number 20070077765
- Publication date Apr 5, 2007
- Matthew J. Prince
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-platen multi-slurry chemical mechanical polishing process
- Publication number 20060135046
- Publication date Jun 22, 2006
- Matthew J. Prince
- B24 - GRINDING POLISHING
Information Patent Application
Poly open polish process
- Publication number 20060134916
- Publication date Jun 22, 2006
- Matthew J. Prince
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Facilitating removal of sacrificial layers to form replacement meta...
- Publication number 20060046523
- Publication date Mar 2, 2006
- Jack Kavalieros
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Facilitating removal of sacrificial layers via implantation to form...
- Publication number 20060046448
- Publication date Mar 2, 2006
- Chris E. Barns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Polish pad to change polish rate on wafer by adjusting groove width...
- Publication number 20050170750
- Publication date Aug 4, 2005
- Ebrahim Andideh
- B24 - GRINDING POLISHING
Information Patent Application
Reducing wafer defects from chemical mechanical polishing
- Publication number 20050164609
- Publication date Jul 28, 2005
- Matthew Prince
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISH PAD WITH NON-UNIFORM GROOVE DEPTH TO IMPROVE WAFER POLISH RA...
- Publication number 20010044263
- Publication date Nov 22, 2001
- EBRAHIM ANDIDEH
- B24 - GRINDING POLISHING

Matthew J. Prince

Person

Patents Grantslast 30 patents

Techniques and configurations to reduce transistor gate short defects

Techniques and configurations to reduce transistor gate short defects

Techniques and configurations to reduce transistor gate short defects

Techniques and configurations to reduce transistor gate short defects

Techniques and configurations to reduce transistor gate short defects

Techniques and configurations to reduce transistor gate short defects

Techniques and configurations to reduce transistor gate short defects

Facilitating removal of sacrificial layers via implantation to form...

Etch stop and hard mask film property matching to enable improved r...

Poly open polish process

Multi-platen multi-slurry chemical mechanical polishing process

Polish pad with non-uniform groove depth to improve wafer polish ra...

Polish pad with non-uniform groove depth to improve wafer polish ra...

Sacrificial erosion control features for chemical-mechanical polish...

Method and apparatus for chemical mechanical polishing

Method and apparatus for chemical-mechanical polishing using pneuma...

Polishing pad conditioning apparatus for wafer planarization process

Patents Applicationslast 30 patents

TECHNIQUES AND CONFIGURATIONS TO REDUCE TRANSISTOR GATE SHORT DEFECTS

MODULATION OF CHIP PERFORMANCE BY CONTROLLING TRANSISTOR GATE PROFILE

TRANSISTOR WITH CHANNEL-SYMMETRIC GATE

METAL GATE CUT WITH HYBRID MATERIAL FILL

CHEMICAL MECHANICAL POLISHING OF METAL GATE CUTS FORMED AFTER SOURC...

SELF-ALIGNED BACKBONE FOR FORKSHEET TRANSISTORS

DIELECTRIC LAYER STACK FOR WIDE GATE CUT STRUCTURES

CHEMICAL MECHANICAL POLISHING OF CARBON HARD MASK

METAL GATE CUT FORMED AFTER SOURCE AND DRAIN CONTACTS

FORMING METAL GATE CUTS USING MULTIPLE PASSES FOR DEPTH CONTROL

MULTI-STAGE MASK ETCH PROCESS

GATE CUTS WITH SELF-FORMING POLYMER LAYER

HIGH ASPECT RATIO METAL GATE CUTS

GATE CUTS IN A GRATING PATTERN ACROSS AN INTEGRATED CIRCUIT

TECHNIQUES AND CONFIGURATIONS TO REDUCE TRANSISTOR GATE SHORT DEFECTS

TECHNIQUES AND CONFIGURATIONS TO REDUCE TRANSISTOR GATE SHORT DEFECTS

TECHNIQUES AND CONFIGURATIONS TO REDUCE TRANSISTOR GATE SHORT DEFECTS

TECHNIQUES AND CONFIGURATIONS TO REDUCE TRANSISTOR GATE SHORT DEFECTS

TECHNIQUES AND CONFIGURATIONS TO REDUCE TRANSISTOR GATE SHORT DEFECTS

TECHNIQUES AND CONFIGURATIONS TO REDUCE TRANSISTOR GATE SHORT DEFECTS

TECHNIQUES AND CONFIGURATIONS TO REDUCE TRANSISTOR GATE SHORT DEFECTS

METHOD AND SYSTEM TO CONTROL POLISH RATE VARIATION INTRODUCED BY DE...

Etch stop and hard mask film property matching to enable improved r...

Multi-platen multi-slurry chemical mechanical polishing process

Poly open polish process

Facilitating removal of sacrificial layers to form replacement meta...

Facilitating removal of sacrificial layers via implantation to form...

Polish pad to change polish rate on wafer by adjusting groove width...

Reducing wafer defects from chemical mechanical polishing

POLISH PAD WITH NON-UNIFORM GROOVE DEPTH TO IMPROVE WAFER POLISH RA...