Melvin W. Montgomery

Person

Camas, WA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method of reducing critical dimension bias during fabrication of a...
- Patent number 7,737,040
- Issue date Jun 15, 2010
- Applied Materials, Inc.
- Christopher Dennis Bencher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of reducing the average process bias during production of a...
- Patent number 7,468,227
- Issue date Dec 23, 2008
- Applied Materials, Inc.
- Melvin Warren Montgomery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle fabrication using a removable hard mask
- Patent number 7,365,014
- Issue date Apr 29, 2008
- Applied Materials, Inc.
- Christopher Dennis Bencher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus used in reshaping a surface of a photoresist
- Patent number 7,244,334
- Issue date Jul 17, 2007
- Applied Materials, Inc.
- Alex Buxbaum
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of producing a patterned photoresist used to prepare high pe...
- Patent number 7,208,249
- Issue date Apr 24, 2007
- Applied Materials, Inc.
- Melvin Warren Montgomery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of increasing the shelf life of a photomask substrate
- Patent number 7,135,256
- Issue date Nov 14, 2006
- Applied Materials, Inc.
- Melvin Warren Montgomery
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Sensitized chemically amplified photoresist for use in photomask fa...
- Patent number 7,067,227
- Issue date Jun 27, 2006
- Applied Materials, Inc.
- Melvin W. Montgomery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of increasing the shelf life of a blank photomask substrate
- Patent number 6,998,206
- Issue date Feb 14, 2006
- Applied Materials, Inc.
- Scott Fuller
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of extending the stability of a photoresist during direct wr...
- Patent number 6,969,569
- Issue date Nov 29, 2005
- Applied Materials, Inc.
- Melvin Warren Montgomery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for reshaping a patterned organic photoresist surface
- Patent number 6,931,619
- Issue date Aug 16, 2005
- Applied Materials, Inc.
- Alex Buxbaum
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of extending the stability of a photoresist during direct wr...
- Patent number 6,727,047
- Issue date Apr 27, 2004
- Applied Materials, Inc.
- Melvin Warren Montgomery
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of preparing optically imaged high performance photomasks
- Patent number 6,703,169
- Issue date Mar 9, 2004
- Applied Materials, Inc.
- Scott Fuller
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Organic bottom antireflective coating for high performance mask mak...
- Patent number 6,605,394
- Issue date Aug 12, 2003
- Applied Materials, Inc.
- Melvin W. Montgomery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of reshaping a patterned organic photoresist surface
- Patent number 6,582,861
- Issue date Jun 24, 2003
- Applied Materials, Inc.
- Alex Buxbaum
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Top surface imaging technique using a topcoat delivery system
- Patent number 6,258,514
- Issue date Jul 10, 2001
- LSI Logic Corporation
- Melvin W. Montgomery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR REDUCING CHARGE IN CRITICAL DIMENSION-SCANNING ELECTRON...
- Publication number 20170040228
- Publication date Feb 9, 2017
- The Research Foundation for the State University of New York
- Melvin W. Montgomery
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR REDUCING CHARGE IN CRITICAL DIMENSION-SCANNING ELECTRON...
- Publication number 20140206112
- Publication date Jul 24, 2014
- SEMATECH, INC.
- MELVIN WARREN MONTGOMERY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of reducing critical dimension bias during fabrication of a...
- Publication number 20080096138
- Publication date Apr 24, 2008
- APPLIED MATERIALS, INC.
- Christopher Dennis Bencher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of reducing the average process bias during production of a...
- Publication number 20060105248
- Publication date May 18, 2006
- APPLIED MATERIALS, INC.
- Melvin Warren Montgomery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Apparatus used in reshaping a surface of a photoresist
- Publication number 20050250023
- Publication date Nov 10, 2005
- Alex Buxbaum
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of increasing the shelf life of a photomask substrate
- Publication number 20050191562
- Publication date Sep 1, 2005
- Melvin Warren Montgomery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reticle fabrication using a removable hard mask
- Publication number 20050170655
- Publication date Aug 4, 2005
- Christopher Dennis Bencher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of extending the stability of a photoresist during direct wr...
- Publication number 20040265706
- Publication date Dec 30, 2004
- APPLIED MATERIALS, INC.
- Melvin Warren Montgomery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of increasing the shelf life of a blank photomask substrate
- Publication number 20040146790
- Publication date Jul 29, 2004
- Scott Fuller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of producing a patterned photoresist used to prepare high pe...
- Publication number 20040063003
- Publication date Apr 1, 2004
- APPLIED MATERIALS, INC.
- Melvin Warren Montgomery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Sensitized chemically amplified photoresist for use in photomask fa...
- Publication number 20030219675
- Publication date Nov 27, 2003
- APPLIED MATERIALS, INC.
- Melvin W. Montgomery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Apparatus for reshaping a patterned organic photoresist surface
- Publication number 20030180634
- Publication date Sep 25, 2003
- Alex Buxbaum
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of preparing optically imaged high performance photomasks
- Publication number 20030027083
- Publication date Feb 6, 2003
- APPLIED MATERIALS, INC.
- Scott Fuller
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Organic bottom antireflective coating for high performance mask mak...
- Publication number 20020182514
- Publication date Dec 5, 2002
- APPLIED MATERIALS, INC.
- Melvin W. Montgomery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of reshaping a patterned organic photoresist surface
- Publication number 20020160274
- Publication date Oct 31, 2002
- APPLIED MATERIALS, INC.
- Alex Buxbaum
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of extending the stability of a photoresist during direct wr...
- Publication number 20020076626
- Publication date Jun 20, 2002
- APPLIED MATERIALS, INC.
- Melvin Warren Montgomery
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Photoresist topcoat for deep ultraviolet (DUV) direct write laser m...
- Publication number 20020071995
- Publication date Jun 13, 2002
- Melvin Warren Montgomery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Melvin W. Montgomery

Person

Patents Grantslast 30 patents

Method of reducing critical dimension bias during fabrication of a...

Method of reducing the average process bias during production of a...

Reticle fabrication using a removable hard mask

Apparatus used in reshaping a surface of a photoresist

Method of producing a patterned photoresist used to prepare high pe...

Method of increasing the shelf life of a photomask substrate

Sensitized chemically amplified photoresist for use in photomask fa...

Method of increasing the shelf life of a blank photomask substrate

Method of extending the stability of a photoresist during direct wr...

Apparatus for reshaping a patterned organic photoresist surface

Method of extending the stability of a photoresist during direct wr...

Method of preparing optically imaged high performance photomasks

Organic bottom antireflective coating for high performance mask mak...

Method of reshaping a patterned organic photoresist surface

Top surface imaging technique using a topcoat delivery system

Patents Applicationslast 30 patents

METHOD FOR REDUCING CHARGE IN CRITICAL DIMENSION-SCANNING ELECTRON...

METHOD FOR REDUCING CHARGE IN CRITICAL DIMENSION-SCANNING ELECTRON...

Method of reducing critical dimension bias during fabrication of a...

Method of reducing the average process bias during production of a...

Apparatus used in reshaping a surface of a photoresist

Method of increasing the shelf life of a photomask substrate

Reticle fabrication using a removable hard mask

Method of extending the stability of a photoresist during direct wr...

Method of increasing the shelf life of a blank photomask substrate

Method of producing a patterned photoresist used to prepare high pe...

Sensitized chemically amplified photoresist for use in photomask fa...

Apparatus for reshaping a patterned organic photoresist surface

Method of preparing optically imaged high performance photomasks

Organic bottom antireflective coating for high performance mask mak...

Method of reshaping a patterned organic photoresist surface

Method of extending the stability of a photoresist during direct wr...

Photoresist topcoat for deep ultraviolet (DUV) direct write laser m...