Michael A. Graf

Person

Cambridge, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Compensated location specific processing apparatus and method
- Patent number 10,861,674
- Issue date Dec 8, 2020
- TEL Epion Inc.
- Matthew C. Gwinn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compensated location specific processing apparatus and method
- Patent number 10,497,540
- Issue date Dec 3, 2019
- TEL Epion Inc.
- Matthew C. Gwinn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process gas enhancement for beam treatment of a substrate
- Patent number 9,735,019
- Issue date Aug 15, 2017
- TEL Epion Inc.
- Michael Graf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for growing a thin film using a gas cluster ion beam
- Patent number 9,103,031
- Issue date Aug 11, 2015
- TEL Epion Inc.
- John J. Hautala
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multiple nozzle gas cluster ion beam system
- Patent number 8,981,322
- Issue date Mar 17, 2015
- TEL Epion Inc.
- Martin D. Tabat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for beam current modulation by ion source parameter modulation
- Patent number 8,803,110
- Issue date Aug 12, 2014
- Axcelis Technologies, Inc.
- Michael A. Graf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas cluster ion beam etch profile control using beam divergence
- Patent number 8,691,700
- Issue date Apr 8, 2014
- TEL Epion Inc.
- John J. Hautala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas cluster ion beam system with rapid gas switching apparatus
- Patent number 8,338,806
- Issue date Dec 25, 2012
- TEL Epion Inc.
- Michael Graf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of irradiating substrate with gas cluster ion beam formed fr...
- Patent number 8,304,033
- Issue date Nov 6, 2012
- TEL Epion Inc.
- Martin D. Tabat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hybrid ion source/multimode ion source
- Patent number 8,193,513
- Issue date Jun 5, 2012
- Axcelis Technologies, Inc.
- William F. DiVergilio
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas cluster ion beam system with cleaning apparatus
- Patent number 8,173,980
- Issue date May 8, 2012
- TEL Epion Inc.
- Michael Graf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple nozzle gas cluster ion beam processing system and method o...
- Patent number 8,097,860
- Issue date Jan 17, 2012
- TEL Epion Inc.
- Martin D. Tabat
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion source with adjustable aperture
- Patent number 8,089,052
- Issue date Jan 3, 2012
- Axcelis Technologies, Inc.
- Daniel Tieger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for two-dimensional beam scan across a workpiece...
- Patent number 7,750,320
- Issue date Jul 6, 2010
- Axcelis Technologies, Inc.
- Joseph Ferrara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for ion beam profiling
- Patent number 7,701,230
- Issue date Apr 20, 2010
- Axcelis Technologies, Inc.
- John Zheng Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for trapping ion beam particles and focusing an...
- Patent number 7,598,495
- Issue date Oct 6, 2009
- Axcelis Technologies, Inc.
- Peter L. Kellerman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for rapidly switching off an ion beam
- Patent number 7,589,333
- Issue date Sep 15, 2009
- Axcelis Technologies, Inc.
- Michael A. Graf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Closed loop dose control for ion implantation
- Patent number 7,557,363
- Issue date Jul 7, 2009
- Axcelis Technologies, Inc.
- Yongzhang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam monitoring in an ion implanter using an imaging device
- Patent number 7,423,277
- Issue date Sep 9, 2008
- Axcelis Technologies, Inc.
- Alexander S. Perel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ribbon beam ion implanter cluster tool
- Patent number 7,375,355
- Issue date May 20, 2008
- Axcelis Technologies, Inc.
- Joseph Ferrara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanter with contaminant collecting surface
- Patent number 7,358,508
- Issue date Apr 15, 2008
- Axcelis Technologies, Inc.
- Philip J. Ring
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning systems and methods for providing ions from an ion beam to...
- Patent number 6,992,310
- Issue date Jan 31, 2006
- Axcelis Technologies, Inc.
- Joseph Ferrara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modulating ion beam current
- Patent number 6,992,308
- Issue date Jan 31, 2006
- Axcelis Technologies, Inc.
- Michael A. Graf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam utilization during scanned ion implantation
- Patent number 6,953,942
- Issue date Oct 11, 2005
- Axcelis Technologies, Inc.
- Michael A. Graf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam incident angle detector for ion implant systems
- Patent number 6,828,572
- Issue date Dec 7, 2004
- Axcelis Technologies, Inc.
- Ronald N. Reece
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mechanism for prevention of neutron radiation in ion implanter beam...
- Patent number 6,608,315
- Issue date Aug 19, 2003
- Kourosh Saadatmand
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Electrostatic trap for particles entrained in an ion beam
- Patent number 6,534,775
- Issue date Mar 18, 2003
- Axcelis Technologies, Inc.
- Eric R. Harrington
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for removing contaminant particles relative to an...
- Patent number 6,476,399
- Issue date Nov 5, 2002
- Axcelis Technologies, Inc.
- Eric R. Harrington
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for in-process cleaning of an ion source
- Patent number 6,135,128
- Issue date Oct 24, 2000
- Eaton Corporation
- Michael A. Graf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation control using charge collection, optical emission...
- Patent number 6,101,971
- Issue date Aug 15, 2000
- Axcelis Technologies, Inc.
- A. Stuart Denholm
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Compensated Location Specific Processing Apparatus And Method
- Publication number 20200066485
- Publication date Feb 27, 2020
- TEL Epion Inc.
- Matthew C. Gwinn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPENSATED LOCATION SPECIFIC PROCESSING APPARATUS AND METHOD
- Publication number 20180197715
- Publication date Jul 12, 2018
- TEL Epion Inc.
- Matthew C. Gwinn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS GAS ENHANCEMENT FOR BEAM TREATMENT OF A SUBSTRATE
- Publication number 20160071734
- Publication date Mar 10, 2016
- TEL Epion Inc.
- Michael Graf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS CLUSTER ION BEAM ETCH PROFILE CONTROL USING BEAM DIVERGENCE
- Publication number 20130059449
- Publication date Mar 7, 2013
- TEL Epion Inc.
- John J. HAUTALA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS CLUSTER ION BEAM SYSTEM WITH RAPID GAS SWITCHING APPARATUS
- Publication number 20110272594
- Publication date Nov 10, 2011
- TEL Epion Inc.
- Michael Graf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS CLUSTER ION BEAM SYSTEM WITH CLEANING APPARATUS
- Publication number 20110272593
- Publication date Nov 10, 2011
- TEL Epion Inc.
- Michael Graf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-SEQUENCE FILM DEPOSITION AND GROWTH USING GAS CLUSTER ION BEA...
- Publication number 20100200774
- Publication date Aug 12, 2010
- TEL Epion Inc.
- Edmund Burke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING TRENCH ISOLATION USING A MULTIPLE NOZZLE GAS CLUS...
- Publication number 20100193708
- Publication date Aug 5, 2010
- TEL Epion Inc.
- Martin D. Tabat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE NOZZLE GAS CLUSTER ION BEAM PROCESSING SYSTEM AND METHOD O...
- Publication number 20100193472
- Publication date Aug 5, 2010
- TEL Epion Inc.
- Martin D. Tabat
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTIPLE NOZZLE GAS CLUSTER ION BEAM SYSTEM
- Publication number 20100193701
- Publication date Aug 5, 2010
- TEL Epion Inc.
- Martin D. Tabat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADJUSTABLE DEFLECTION OPTICS FOR ION IMPLANTATION
- Publication number 20100065761
- Publication date Mar 18, 2010
- Axcelis Technologies, Inc.
- Michael A. Graf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR GROWING A THIN FILM USING A GAS CLUSTER ION BEAM
- Publication number 20090317564
- Publication date Dec 24, 2009
- TEL Epion Inc.
- John J. Hautala
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ION SOURCE WITH ADJUSTABLE APERTURE
- Publication number 20090266997
- Publication date Oct 29, 2009
- Axcelis Technologies, Inc.
- Daniel Tieger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYBRID ION SOURCE/MULTIMODE ION SOURCE
- Publication number 20090032728
- Publication date Feb 5, 2009
- Axcebs Technologies, Inc.
- William F. DiVergilio
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR ION BEAM PROFILING
- Publication number 20080265866
- Publication date Oct 30, 2008
- John Zheng Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and method for two-dimensional beam scan across a workpiece...
- Publication number 20080149857
- Publication date Jun 26, 2008
- Axcelis Technologies, Inc.
- Joseph Ferrara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for beam current modulation by ion source parameter modulation
- Publication number 20080078957
- Publication date Apr 3, 2008
- Axcelis Technologies, Inc.
- Michael A. Graf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for rapidly switching off an ion beam
- Publication number 20080078955
- Publication date Apr 3, 2008
- Axcelis Technologies, Inc.
- Michael A. Graf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion beam monitoring in an ion implanter using an imaging device
- Publication number 20080061250
- Publication date Mar 13, 2008
- Axcelis Technologies, Inc.
- Alexander S. Perel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF REDUCING TRANSIENT WAFER TEMPERATURE DURING IMPLANTATION
- Publication number 20080023654
- Publication date Jan 31, 2008
- Michael Graf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND SYSTEMS FOR TRAPPING ION BEAM PARTICLES AND FOCUSING AN...
- Publication number 20070295901
- Publication date Dec 27, 2007
- Peter L. Kellerman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Closed loop dose control for ion implantation
- Publication number 20070278427
- Publication date Dec 6, 2007
- Axcelis Technologies, Inc.
- Yongzhang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ribbon beam ion implanter cluster tool
- Publication number 20070262271
- Publication date Nov 15, 2007
- Axcelis Technologies, Inc.
- Joseph Ferrara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion implanter with contaminant collecting surface
- Publication number 20070102652
- Publication date May 10, 2007
- Axcelis Technologies, Inc.
- Philip J. Ring
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Optimization of a utilization of an ion beam in a two-dimensional m...
- Publication number 20060243920
- Publication date Nov 2, 2006
- Andrew M. Ray
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Optimization of beam utilization
- Publication number 20060113489
- Publication date Jun 1, 2006
- Axcelis Technologies, Inc.
- Andrew M. Ray
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dose uniformity during scanned ion implantation
- Publication number 20060097196
- Publication date May 11, 2006
- Axcelis Technologies Inc.
- Michael A. Graf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SCANNING SYSTEMS AND METHODS FOR PROVIDING IONS FROM AN ION BEAM TO...
- Publication number 20060033046
- Publication date Feb 16, 2006
- Joseph Ferrara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Modulating ion beam current
- Publication number 20050189500
- Publication date Sep 1, 2005
- Michael A. Graf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM INCIDENT ANGLE DETECTOR FOR ION IMPLANT SYSTEMS
- Publication number 20040195528
- Publication date Oct 7, 2004
- Ronald N. Reece
- H01 - BASIC ELECTRIC ELEMENTS

Michael A. Graf

Person

Patents Grantslast 30 patents

Compensated location specific processing apparatus and method

Compensated location specific processing apparatus and method

Process gas enhancement for beam treatment of a substrate

Method and system for growing a thin film using a gas cluster ion beam

Multiple nozzle gas cluster ion beam system

Methods for beam current modulation by ion source parameter modulation

Gas cluster ion beam etch profile control using beam divergence

Gas cluster ion beam system with rapid gas switching apparatus

Method of irradiating substrate with gas cluster ion beam formed fr...

Hybrid ion source/multimode ion source

Gas cluster ion beam system with cleaning apparatus

Multiple nozzle gas cluster ion beam processing system and method o...

Ion source with adjustable aperture

System and method for two-dimensional beam scan across a workpiece...

Method and system for ion beam profiling

Methods and systems for trapping ion beam particles and focusing an...

Methods for rapidly switching off an ion beam

Closed loop dose control for ion implantation

Ion beam monitoring in an ion implanter using an imaging device

Ribbon beam ion implanter cluster tool

Ion implanter with contaminant collecting surface

Scanning systems and methods for providing ions from an ion beam to...

Modulating ion beam current

Ion beam utilization during scanned ion implantation

Ion beam incident angle detector for ion implant systems

Mechanism for prevention of neutron radiation in ion implanter beam...

Electrostatic trap for particles entrained in an ion beam

System and method for removing contaminant particles relative to an...

Method for in-process cleaning of an ion source

Ion implantation control using charge collection, optical emission...

Patents Applicationslast 30 patents

Compensated Location Specific Processing Apparatus And Method

COMPENSATED LOCATION SPECIFIC PROCESSING APPARATUS AND METHOD

PROCESS GAS ENHANCEMENT FOR BEAM TREATMENT OF A SUBSTRATE

GAS CLUSTER ION BEAM ETCH PROFILE CONTROL USING BEAM DIVERGENCE

GAS CLUSTER ION BEAM SYSTEM WITH RAPID GAS SWITCHING APPARATUS

GAS CLUSTER ION BEAM SYSTEM WITH CLEANING APPARATUS

MULTI-SEQUENCE FILM DEPOSITION AND GROWTH USING GAS CLUSTER ION BEA...

METHOD OF FORMING TRENCH ISOLATION USING A MULTIPLE NOZZLE GAS CLUS...

MULTIPLE NOZZLE GAS CLUSTER ION BEAM PROCESSING SYSTEM AND METHOD O...

MULTIPLE NOZZLE GAS CLUSTER ION BEAM SYSTEM

ADJUSTABLE DEFLECTION OPTICS FOR ION IMPLANTATION

METHOD AND SYSTEM FOR GROWING A THIN FILM USING A GAS CLUSTER ION BEAM

ION SOURCE WITH ADJUSTABLE APERTURE

HYBRID ION SOURCE/MULTIMODE ION SOURCE

METHOD AND SYSTEM FOR ION BEAM PROFILING

System and method for two-dimensional beam scan across a workpiece...

Methods for beam current modulation by ion source parameter modulation

Methods for rapidly switching off an ion beam

Ion beam monitoring in an ion implanter using an imaging device

METHOD OF REDUCING TRANSIENT WAFER TEMPERATURE DURING IMPLANTATION

METHODS AND SYSTEMS FOR TRAPPING ION BEAM PARTICLES AND FOCUSING AN...

Closed loop dose control for ion implantation

Ribbon beam ion implanter cluster tool

Ion implanter with contaminant collecting surface

Optimization of a utilization of an ion beam in a two-dimensional m...

Optimization of beam utilization

Dose uniformity during scanned ion implantation

SCANNING SYSTEMS AND METHODS FOR PROVIDING IONS FROM AN ION BEAM TO...

Modulating ion beam current

ION BEAM INCIDENT ANGLE DETECTOR FOR ION IMPLANT SYSTEMS