Michael D. Armacost

Person

Walkill, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Anomaly detection from aggregate statistics using neural networks
- Patent number 11,657,122
- Issue date May 23, 2023
- Applied Materials, Inc.
- Jimmy Iskandar
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System and method for monitoring sensor linearity as part of a prod...
- Patent number 11,378,426
- Issue date Jul 5, 2022
- Applied Materials, Inc.
- Bradley D. Schulze
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device search and classification
- Patent number 10,901,407
- Issue date Jan 26, 2021
- Applied Materials, Inc.
- Jimmy Iskandar
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Process kit erosion and service life prediction
- Patent number 10,770,321
- Issue date Sep 8, 2020
- Applied Materials, Inc.
- Kang-Lie Chiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for balancing the electrostatic chucking force on...
- Patent number 10,541,169
- Issue date Jan 21, 2020
- Applied Materials, Inc.
- Chong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Topography prediction using system state information
- Patent number 10,303,812
- Issue date May 28, 2019
- Applied Materials, Inc.
- Jimmy Iskandar
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Process kit erosion and service life prediction
- Patent number 10,177,018
- Issue date Jan 8, 2019
- Applied Materials, Inc.
- Kang-Lie Chiang
- G01 - MEASURING TESTING
Information Patent Grant
Method for fabricating interconnect structures for semiconductor de...
- Patent number 8,143,138
- Issue date Mar 27, 2012
- Applied Materials, Inc.
- Ryan James Patz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma for resist removal and facet control of underlying features
- Patent number 7,758,763
- Issue date Jul 20, 2010
- Applied Materials, Inc.
- Yifeng Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch depth control for dual damascene fabrication process
- Patent number 7,572,734
- Issue date Aug 11, 2009
- Applied Materials, Inc.
- Mehul Naik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a dual damascene structure utilizing a three laye...
- Patent number 7,226,853
- Issue date Jun 5, 2007
- Applied Materials, Inc.
- Nikolaos Bekiaris
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dielectric materials to prevent photoresist poisoning
- Patent number 7,115,534
- Issue date Oct 3, 2006
- Applied Materials, Inc.
- Son Van Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Monitoring dimensions of features at different locations in the pro...
- Patent number 6,829,056
- Issue date Dec 7, 2004
- Michael Barnes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Airgap for semiconductor devices
- Patent number 6,780,753
- Issue date Aug 24, 2004
- Applied Materials Inc.
- Ian S. Latchford
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal-insulator-metal capacitor in copper
- Patent number 6,750,113
- Issue date Jun 15, 2004
- International Business Machines Corporation
- Michael D. Armacost
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fine-pitch device lithography using a sacrificial hardmask
- Patent number 6,734,096
- Issue date May 11, 2004
- International Business Machines Corporation
- Timothy J. Dalton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective nitride: oxide anisotropic etch process
- Patent number 6,656,375
- Issue date Dec 2, 2003
- International Business Machines Corporation
- Michael D. Armacost
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming dual damascene structure
- Patent number 6,521,542
- Issue date Feb 18, 2003
- International Business Machines Corp.
- Mike Armacost
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High performance, low power vertical integrated CMOS devices
- Patent number 6,518,112
- Issue date Feb 11, 2003
- International Business Machines Corporation
- Michael D. Armacost
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of making silicon article having columns
- Patent number 6,489,005
- Issue date Dec 3, 2002
- International Business Machines Corporation
- Michael D. Armacost
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated circuit having air gaps between dielectric and conductin...
- Patent number 6,342,722
- Issue date Jan 29, 2002
- International Business Machines Corporation
- Michael Armacost
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High performance, low power vertical integrated CMOS devices
- Patent number 6,297,531
- Issue date Oct 2, 2001
- International Business Machines Corporation
- Michael D. Armacost
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of eliminating a critical mask using a blockout mask and a r...
- Patent number 6,232,222
- Issue date May 15, 2001
- International Business Machines Corporation
- Michael Armacost
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-density plasma, organic anti-reflective coating etch system co...
- Patent number 6,228,279
- Issue date May 8, 2001
- International Business Machines Corporation
- Michael Armacost
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist formulation which minimizes blistering during etching
- Patent number 6,207,353
- Issue date Mar 27, 2001
- International Business Machines Corporation
- Michael D. Armacost
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silicon article having columns and method of making
- Patent number 6,187,412
- Issue date Feb 13, 2001
- International Business Machines Corporation
- Michael D. Armacost
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Selective removal of vertical portions of a film
- Patent number 6,139,647
- Issue date Oct 31, 2000
- International Business Machines Corporation
- Michael David Armacost
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for fabricating a semiconductor structure having a self-ali...
- Patent number 6,090,722
- Issue date Jul 18, 2000
- International Business Machines Corporation
- Michael Armacost
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Anisotropic and selective nitride etch process for high aspect rati...
- Patent number 6,051,504
- Issue date Apr 18, 2000
- International Business Machines Corporation
- Michael David Armacost
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of chemically mechanically polishing an electronic component...
- Patent number 5,885,899
- Issue date Mar 23, 1999
- International Business Machines Corporation
- Michael David Armacost
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHODS AND MECHANISMS TO IMPROVE MONITORING CAPABILITIES USING RAT...
- Publication number 20250035680
- Publication date Jan 30, 2025
- Applied Materials, Inc.
- Suketu Parikh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED HYBRID PREDICTIVE MONITORING OF MANUFACTURING SYSTEMS
- Publication number 20240427324
- Publication date Dec 26, 2024
- Applied Materials, Inc.
- Jimmy Iskandar
- G05 - CONTROLLING REGULATING
Information Patent Application
METHODS AND MECHANISMS FOR SECURE DATA SHARING
- Publication number 20240419813
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Fei Li
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHODS AND MECHANISMS FOR AUTOMATIC SENSOR GROUPING TO IMPROVE ANO...
- Publication number 20240184858
- Publication date Jun 6, 2024
- Applied Materials, Inc.
- Peter J. Lindner
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
EQUIPMENT PARAMETER MANAGEMENT AT A MANUFACTURING SYSTEM USING MACH...
- Publication number 20240062097
- Publication date Feb 22, 2024
- Applied Materials, Inc.
- Tsung-Liang Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ANOMALY DETECTION FROM AGGREGATE STATISTICS USING NEURAL NETWORKS
- Publication number 20230259585
- Publication date Aug 17, 2023
- Applied Materials, Inc.
- Jimmy Iskandar
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ANOMALY DETECTION FROM AGGREGATE STATISTICS USING NEURAL NETWORKS
- Publication number 20220019863
- Publication date Jan 20, 2022
- Applied Materials, Inc.
- Jimmy Iskandar
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PROCESS KIT EROSION AND SERVICE LIFE PREDICTION
- Publication number 20190148194
- Publication date May 16, 2019
- Applied Materials, Inc.
- Kang-Lie CHIANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR BALANCING THE ELECTROSTATIC CHUCKING FORCE ON...
- Publication number 20180330977
- Publication date Nov 15, 2018
- Applied Materials, Inc.
- Chong JIANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS KIT EROSION AND SERVICE LIFE PREDICTION
- Publication number 20180047599
- Publication date Feb 15, 2018
- Applied Materials, Inc.
- Kang-Lie CHIANG
- G01 - MEASURING TESTING
Information Patent Application
SEMICONDUCTOR DEVICE SEARCH AND CLASSIFICATION
- Publication number 20170343999
- Publication date Nov 30, 2017
- Applied Materials, Inc.
- Jimmy ISKANDAR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TOPOGRAPHY PREDICTION USING SYSTEM STATE INFORMATION
- Publication number 20170045573
- Publication date Feb 16, 2017
- Applied Materials, Inc.
- Jimmy ISKANDAR
- G01 - MEASURING TESTING
Information Patent Application
SYSTEM AND METHOD FOR MONITORING SENSOR LINEARITY AS PART OF A PROD...
- Publication number 20150369640
- Publication date Dec 24, 2015
- Applied Materials, Inc.
- BRADLEY D. SCHULZE
- G01 - MEASURING TESTING
Information Patent Application
ROTATIONAL ABSORPTION SPECTRA FOR SEMICONDUCTOR MANUFACTURING PROCE...
- Publication number 20130309785
- Publication date Nov 21, 2013
- Applied Materials, Inc.
- ZHIFENG SUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR ETCHING SILICON-BASED ANTIREFLECTIVE LAYERS
- Publication number 20110253670
- Publication date Oct 20, 2011
- Applied Materials, Inc.
- YIFENG ZHOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR LOW-K DIELECTRIC REPAIR
- Publication number 20110151590
- Publication date Jun 23, 2011
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING INTERCONNECT STRUCTURES FOR SEMICONDUCTOR DE...
- Publication number 20100078825
- Publication date Apr 1, 2010
- Ryan James Patz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PHOTORESIST REMOVAL IN THE PRESENCE OF A LOW-K DIELECTRIC...
- Publication number 20100043821
- Publication date Feb 25, 2010
- Siyi Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PLASMA ETCHING POROUS LOW-K DIELECTRIC LAYERS
- Publication number 20100022091
- Publication date Jan 28, 2010
- SIYI LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARTUS TO PREVENT CONTAMINATION OF A PHOTORESIST LAYE...
- Publication number 20090317628
- Publication date Dec 24, 2009
- Applied Materials, Inc.
- Mehul Naik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CRITICAL DIMENSION SHRINK USING CONFORMAL PECVD FILMS
- Publication number 20090286402
- Publication date Nov 19, 2009
- Applied Materials, Inc.
- Li-Qun Xia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR INTEGRATING POROUS LOW-K DIELECTRIC LAYERS
- Publication number 20090140418
- Publication date Jun 4, 2009
- SIYI LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR SELECTIVELY ETCHING A BARRIER LAYER IN DUAL DAMASCENE A...
- Publication number 20090117745
- Publication date May 7, 2009
- SIYI LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCH DEPTH CONTROL FOR DUAL DAMASCENE FABRICATION PROCESS
- Publication number 20080102638
- Publication date May 1, 2008
- APPLIED MATERIALS, INC.
- MEHUL NAIK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA FOR RESIST REMOVAL AND FACET CONTROL OF UNDERLYING FEATURES
- Publication number 20080102645
- Publication date May 1, 2008
- APPLIED MATERIALS, INC.
- Yifeng Zhou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Integrated equipment set for forming a low K dielectric interconnec...
- Publication number 20060246683
- Publication date Nov 2, 2006
- APPLIED MATERIALS, INC.
- Judon Tony Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dielectric materials to prevent photoresist poisoning
- Publication number 20050014361
- Publication date Jan 20, 2005
- Son Van Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Integrated equipment set for forming a low K dielectric interconnec...
- Publication number 20040206621
- Publication date Oct 21, 2004
- Hongwen Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Integrated equipment set for forming a low K dielectric interconnec...
- Publication number 20040007325
- Publication date Jan 15, 2004
- APPLIED MATERIALS, INC.
- Judon Tony Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AIRGAP FOR SEMICONDUCTOR DEVICES
- Publication number 20030224591
- Publication date Dec 4, 2003
- APPLIED MATERIALS, INC.
- Ian S. Latchford
- H01 - BASIC ELECTRIC ELEMENTS

Michael D. Armacost

Person

Patents Grantslast 30 patents

Anomaly detection from aggregate statistics using neural networks

System and method for monitoring sensor linearity as part of a prod...

Semiconductor device search and classification

Process kit erosion and service life prediction

Method and system for balancing the electrostatic chucking force on...

Topography prediction using system state information

Process kit erosion and service life prediction

Method for fabricating interconnect structures for semiconductor de...

Plasma for resist removal and facet control of underlying features

Etch depth control for dual damascene fabrication process

Method of forming a dual damascene structure utilizing a three laye...

Dielectric materials to prevent photoresist poisoning

Monitoring dimensions of features at different locations in the pro...

Airgap for semiconductor devices

Metal-insulator-metal capacitor in copper

Fine-pitch device lithography using a sacrificial hardmask

Selective nitride: oxide anisotropic etch process

Method for forming dual damascene structure

High performance, low power vertical integrated CMOS devices

Method of making silicon article having columns

Integrated circuit having air gaps between dielectric and conductin...

High performance, low power vertical integrated CMOS devices

Method of eliminating a critical mask using a blockout mask and a r...

High-density plasma, organic anti-reflective coating etch system co...

Resist formulation which minimizes blistering during etching

Silicon article having columns and method of making

Selective removal of vertical portions of a film

Process for fabricating a semiconductor structure having a self-ali...

Anisotropic and selective nitride etch process for high aspect rati...

Method of chemically mechanically polishing an electronic component...

Patents Applicationslast 30 patents

METHODS AND MECHANISMS TO IMPROVE MONITORING CAPABILITIES USING RAT...

INTEGRATED HYBRID PREDICTIVE MONITORING OF MANUFACTURING SYSTEMS

METHODS AND MECHANISMS FOR SECURE DATA SHARING

METHODS AND MECHANISMS FOR AUTOMATIC SENSOR GROUPING TO IMPROVE ANO...

EQUIPMENT PARAMETER MANAGEMENT AT A MANUFACTURING SYSTEM USING MACH...

ANOMALY DETECTION FROM AGGREGATE STATISTICS USING NEURAL NETWORKS

ANOMALY DETECTION FROM AGGREGATE STATISTICS USING NEURAL NETWORKS

PROCESS KIT EROSION AND SERVICE LIFE PREDICTION

METHOD AND SYSTEM FOR BALANCING THE ELECTROSTATIC CHUCKING FORCE ON...

PROCESS KIT EROSION AND SERVICE LIFE PREDICTION

SEMICONDUCTOR DEVICE SEARCH AND CLASSIFICATION

TOPOGRAPHY PREDICTION USING SYSTEM STATE INFORMATION

SYSTEM AND METHOD FOR MONITORING SENSOR LINEARITY AS PART OF A PROD...

ROTATIONAL ABSORPTION SPECTRA FOR SEMICONDUCTOR MANUFACTURING PROCE...

METHODS FOR ETCHING SILICON-BASED ANTIREFLECTIVE LAYERS

APPARATUS AND METHOD FOR LOW-K DIELECTRIC REPAIR

METHOD FOR FABRICATING INTERCONNECT STRUCTURES FOR SEMICONDUCTOR DE...

METHOD OF PHOTORESIST REMOVAL IN THE PRESENCE OF A LOW-K DIELECTRIC...

METHOD FOR PLASMA ETCHING POROUS LOW-K DIELECTRIC LAYERS

METHODS AND APPARTUS TO PREVENT CONTAMINATION OF A PHOTORESIST LAYE...

METHOD FOR CRITICAL DIMENSION SHRINK USING CONFORMAL PECVD FILMS

METHOD FOR INTEGRATING POROUS LOW-K DIELECTRIC LAYERS

METHODS FOR SELECTIVELY ETCHING A BARRIER LAYER IN DUAL DAMASCENE A...

ETCH DEPTH CONTROL FOR DUAL DAMASCENE FABRICATION PROCESS

PLASMA FOR RESIST REMOVAL AND FACET CONTROL OF UNDERLYING FEATURES

Integrated equipment set for forming a low K dielectric interconnec...

Dielectric materials to prevent photoresist poisoning

Integrated equipment set for forming a low K dielectric interconnec...

Integrated equipment set for forming a low K dielectric interconnec...

AIRGAP FOR SEMICONDUCTOR DEVICES