MICHAEL GRIMBERGEN

Person

SANTA CLARA, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Adjustable achromatic collimator assembly for endpoint detection sy...
- Patent number 12,066,639
- Issue date Aug 20, 2024
- Applied Materials, Inc.
- Pengyu Han
- G02 - OPTICS
Information Patent Grant
Etch processing system having reflective endpoint detection
- Patent number 12,007,686
- Issue date Jun 11, 2024
- Applied Materials, Inc.
- Michael N. Grimbergen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adjustable achromatic collimator assembly for endpoint detection sy...
- Patent number 11,719,952
- Issue date Aug 8, 2023
- Applied Materials, Inc.
- Pengyu Han
- G02 - OPTICS
Information Patent Grant
Etch processing system having reflective endpoint detection
- Patent number 11,022,877
- Issue date Jun 1, 2021
- Applied Materials, Inc.
- Michael N. Grimbergen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chamber lid heater ring assembly
- Patent number 10,595,365
- Issue date Mar 17, 2020
- Applied Materials, Inc.
- Alan H. Ouye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual endpoint detection for advanced phase shift and binary photomasks
- Patent number 10,453,696
- Issue date Oct 22, 2019
- Applied Materials, Inc.
- Michael Grimbergen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor having an array of plural individually controlled ga...
- Patent number 10,170,280
- Issue date Jan 1, 2019
- Applied Materials, Inc.
- Madhavi R. Chandrachood
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual endpoint detection for advanced phase shift and binary photomasks
- Patent number 9,805,939
- Issue date Oct 31, 2017
- Applied Materials, Inc.
- Michael N. Grimbergen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inductively coupled plasma reactor having RF phase control and meth...
- Patent number 9,378,930
- Issue date Jun 28, 2016
- Applied Materials, Inc.
- Michael N. Grimbergen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask etch plasma reactor having an array of optical sensors viewing...
- Patent number 9,218,944
- Issue date Dec 22, 2015
- Applied Materials, Inc.
- Madhavi R. Chandrachood
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Etch rate detection for anti-reflective coating layer and absorber...
- Patent number 9,142,467
- Issue date Sep 22, 2015
- Applied Materials, Inc.
- Michael Grimbergen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch rate detection for photomask etching
- Patent number 8,961,804
- Issue date Feb 24, 2015
- Applied Materials, Inc.
- Michael N. Grimbergen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and methods for etching quartz substrate in photomask man...
- Patent number 8,956,809
- Issue date Feb 17, 2015
- Applied Materials, Inc.
- Michael Grimbergen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Etch rate detection for anti-reflective coating layer and absorber...
- Patent number 8,900,469
- Issue date Dec 2, 2014
- Applied Materials, Inc.
- Michael Grimbergen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch rate detection for reflective multi-material layers etching
- Patent number 8,808,559
- Issue date Aug 19, 2014
- Applied Materials, Inc.
- Michael Grimbergen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for reducing photoresist interference when monitoring a tar...
- Patent number 8,778,204
- Issue date Jul 15, 2014
- Applied Materials, Inc.
- Michael N. Grimbergen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Endpoint detection for photomask etching
- Patent number 8,158,526
- Issue date Apr 17, 2012
- Applied Materials, Inc.
- Michael Grimbergen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Endpoint detection for photomask etching
- Patent number 8,092,695
- Issue date Jan 10, 2012
- Applied Materials, Inc.
- Michael Grimbergen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma mask etch method of controlling a reactor tunable element in...
- Patent number 8,017,029
- Issue date Sep 13, 2011
- Applied Materials, Inc.
- Madhavi R. Chandrachood
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for etching a transparent workpiece including backside endp...
- Patent number 8,012,366
- Issue date Sep 6, 2011
- Applied Materials, Inc.
- Richard Lewington
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask etch plasma reactor with cathode providing a uniform distribut...
- Patent number 8,002,946
- Issue date Aug 23, 2011
- Applied Materials, Inc.
- Richard Lewington
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask etch plasma reactor with variable process gas distribution
- Patent number 7,976,671
- Issue date Jul 12, 2011
- Applied Materials, Inc.
- Madhavi R. Chandrachood
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor for processing a workpiece and having a tunable cathode
- Patent number 7,967,930
- Issue date Jun 28, 2011
- Applied Materials, Inc.
- Richard Lewington
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for plasma etching a chromium layer suitable for photomask f...
- Patent number 7,829,243
- Issue date Nov 9, 2010
- Applied Materials, Inc.
- Xiaoyi Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Phase shifting photomask and a method of fabricating thereof
- Patent number 7,635,546
- Issue date Dec 22, 2009
- Applied Materials, Inc.
- Scott Alan Anderson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for monitoring processing of a substrate
- Patent number 7,632,419
- Issue date Dec 15, 2009
- Applied Materials, Inc.
- Michael Grimbergen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing a workpiece in a plasma reactor with dynamic a...
- Patent number 7,520,999
- Issue date Apr 21, 2009
- Applied Materials, Inc.
- Madhavi R. Chandrachood
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing a workpiece in a plasma reactor employing a dy...
- Patent number 7,504,041
- Issue date Mar 17, 2009
- Applied Materials, Inc.
- Madhavi R. Chandrachood
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor with a dynamically adjustable plasma source power ap...
- Patent number 7,431,797
- Issue date Oct 7, 2008
- Applied Materials, Inc.
- Madhavi R. Chandrachood
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor with apparatus for dynamically adjusting the plasma...
- Patent number 7,419,551
- Issue date Sep 2, 2008
- Applied Materials, Inc.
- Madhavi R. Chandrachood
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ADJUSTABLE ACHROMATIC COLLIMATOR ASSEMBLY FOR ENDPOINT DETECTION SY...
- Publication number 20230341699
- Publication date Oct 26, 2023
- Applied Materials, Inc.
- Pengyu Han
- G02 - OPTICS
Information Patent Application
ADJUSTABLE ACHROMATIC COLLIMATOR ASSEMBLY FOR ENDPOINT DETECTION SY...
- Publication number 20220050303
- Publication date Feb 17, 2022
- Applied Materials, Inc.
- Pengyu Han
- G02 - OPTICS
Information Patent Application
ETCH PROCESSING SYSTEM HAVING REFLECTIVE ENDPOINT DETECTION
- Publication number 20210263408
- Publication date Aug 26, 2021
- Applied Materials, Inc.
- Michael N. GRIMBERGEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCH PROCESSING SYSTEM HAVING REFLECTIVE ENDPOINT DETECTION
- Publication number 20180259848
- Publication date Sep 13, 2018
- Applied Materials, Inc.
- Michael N. GRIMBERGEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DUAL ENDPOINT DETECTION FOR ADVANCED PHASE SHIFT AND BINARY PHOTOMASKS
- Publication number 20180047574
- Publication date Feb 15, 2018
- Applied Materials, Inc.
- Michael Grimbergen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUAL ENDPOINT DETECTION FOR ADVANCED PHASE SHIFT AND BINARY PHOTOMASKS
- Publication number 20160351403
- Publication date Dec 1, 2016
- Applied Materials, Inc.
- Michael N. Grimbergen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA REACTOR HAVING AN ARRAY OF PLURAL INDIVIDUALLY CONTROLLED GA...
- Publication number 20160042917
- Publication date Feb 11, 2016
- Applied Materials, Inc.
- Madhavi R. Chandrachood
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCH RATE DETECTION FOR ANTI-REFLECTIVE COATING LAYER AND ABSORBER...
- Publication number 20150111315
- Publication date Apr 23, 2015
- Applied Materials, Inc.
- Michael Grimbergen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR ETCHING QUARTZ SUBSTRATE IN PHOTOMASK MAN...
- Publication number 20140038091
- Publication date Feb 6, 2014
- Michael Grimbergen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ETCH RATE DETECTION FOR ANTI-REFLECTIVE COATING LAYER AND ABSORBER...
- Publication number 20130157388
- Publication date Jun 20, 2013
- APPLIED MATERIALS, INC.
- Michael Grimbergen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCH RATE DETECTION FOR REFLECTIVE MULTI-MATERIAL LAYERS ETCHING
- Publication number 20130130409
- Publication date May 23, 2013
- APPLIED MATERIALS, INC.
- Michael Grimbergen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCH RATE DETECTION FOR PHOTOMASK ETCHING
- Publication number 20130109112
- Publication date May 2, 2013
- Michael N. Grimbergen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ETCHING AN EUV REFLECTIVE MULTI-MATERIAL LAYERS UTILIZED...
- Publication number 20130092655
- Publication date Apr 18, 2013
- Keven Yu
- B44 - DECORATIVE ARTS
Information Patent Application
METHODS FOR IN-SITU CHAMBER DRY CLEAN IN PHOTOMASK PLASMA ETCHING P...
- Publication number 20130048606
- Publication date Feb 28, 2013
- Zhigang Mao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR REDUCING PHOTORESIST INTERFERENCE WHEN MONITORING A TAR...
- Publication number 20120103936
- Publication date May 3, 2012
- Applied Materials, Inc.
- Michael N. Grimbergen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHAMBER LID HEATER RING ASSEMBLY
- Publication number 20120090784
- Publication date Apr 19, 2012
- Applied Materials, Inc.
- Alan H. Ouye
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
INDUCTIVELY COUPLED PLASMA REACTOR HAVING RF PHASE CONTROL AND METH...
- Publication number 20100276391
- Publication date Nov 4, 2010
- Applied Materials, Inc.
- MICHAEL N. GRIMBERGEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INDUCTIVELY COUPLED PLASMA REACTOR HAVING RF PHASE CONTROL AND METH...
- Publication number 20100224321
- Publication date Sep 9, 2010
- Applied Materials, Inc.
- MICHAEL N. GRIMBERGEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR IN-SITU CHAMBER DRY CLEAN DURING PHOTOMAS...
- Publication number 20090325387
- Publication date Dec 31, 2009
- APPLIED MATERIALS, INC.
- Xiaoyi Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ENDPOINT DETECTION FOR PHOTOMASK ETCHING
- Publication number 20090014409
- Publication date Jan 15, 2009
- Michael Grimbergen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Monitoring etching of a substrate in an etch chamber
- Publication number 20080272089
- Publication date Nov 6, 2008
- APPLIED MATERIALS, INC.
- Michael Grimbergen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENDPOINT DETECTION FOR PHOTOMASK ETCHING
- Publication number 20080261335
- Publication date Oct 23, 2008
- Michael Grimbergen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MASK ETCH PROCESS
- Publication number 20080179282
- Publication date Jul 31, 2008
- Madhavi R. Chandrachood
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ENDPOINT DETECTION FOR PHOTOMASK ETCHING
- Publication number 20080176149
- Publication date Jul 24, 2008
- APPLIED MATERIALS, INC.
- Michael Grimbergen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma mask etch method of controlling a reactor tunable element in...
- Publication number 20080099434
- Publication date May 1, 2008
- Madhavi R. Chandrachood
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask etch plasma reactor with variable process gas distribution
- Publication number 20080102202
- Publication date May 1, 2008
- APPLIED MATERIALS, INC.
- Madhavi R. Chandrachood
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Mask etch plasma reactor with backside optical sensors and multiple...
- Publication number 20080099450
- Publication date May 1, 2008
- APPLIED MATERIALS, INC.
- Richard Lewington
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENDPOINT DETECTION FOR PHOTOMASK ETCHING
- Publication number 20080099435
- Publication date May 1, 2008
- Michael Grimbergen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask etch plasma reactor having an array of optical sensors viewing...
- Publication number 20080102001
- Publication date May 1, 2008
- Madhavi R. Chandrachood
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Process for etching a transparent workpiece including backside endp...
- Publication number 20080099432
- Publication date May 1, 2008
- APPLIED MATERIALS, INC.
- Richard Lewington
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

MICHAEL GRIMBERGEN

Person

Patents Grantslast 30 patents

Adjustable achromatic collimator assembly for endpoint detection sy...

Etch processing system having reflective endpoint detection

Adjustable achromatic collimator assembly for endpoint detection sy...

Etch processing system having reflective endpoint detection

Chamber lid heater ring assembly

Dual endpoint detection for advanced phase shift and binary photomasks

Plasma reactor having an array of plural individually controlled ga...

Dual endpoint detection for advanced phase shift and binary photomasks

Inductively coupled plasma reactor having RF phase control and meth...

Mask etch plasma reactor having an array of optical sensors viewing...

Etch rate detection for anti-reflective coating layer and absorber...

Etch rate detection for photomask etching

Apparatus and methods for etching quartz substrate in photomask man...

Etch rate detection for anti-reflective coating layer and absorber...

Etch rate detection for reflective multi-material layers etching

Methods for reducing photoresist interference when monitoring a tar...

Endpoint detection for photomask etching

Endpoint detection for photomask etching

Plasma mask etch method of controlling a reactor tunable element in...

Process for etching a transparent workpiece including backside endp...

Mask etch plasma reactor with cathode providing a uniform distribut...

Mask etch plasma reactor with variable process gas distribution

Plasma reactor for processing a workpiece and having a tunable cathode

Method for plasma etching a chromium layer suitable for photomask f...

Phase shifting photomask and a method of fabricating thereof

Apparatus and method for monitoring processing of a substrate

Method of processing a workpiece in a plasma reactor with dynamic a...

Method of processing a workpiece in a plasma reactor employing a dy...

Plasma reactor with a dynamically adjustable plasma source power ap...

Plasma reactor with apparatus for dynamically adjusting the plasma...

Patents Applicationslast 30 patents

ADJUSTABLE ACHROMATIC COLLIMATOR ASSEMBLY FOR ENDPOINT DETECTION SY...

ADJUSTABLE ACHROMATIC COLLIMATOR ASSEMBLY FOR ENDPOINT DETECTION SY...

ETCH PROCESSING SYSTEM HAVING REFLECTIVE ENDPOINT DETECTION

ETCH PROCESSING SYSTEM HAVING REFLECTIVE ENDPOINT DETECTION

DUAL ENDPOINT DETECTION FOR ADVANCED PHASE SHIFT AND BINARY PHOTOMASKS

DUAL ENDPOINT DETECTION FOR ADVANCED PHASE SHIFT AND BINARY PHOTOMASKS

PLASMA REACTOR HAVING AN ARRAY OF PLURAL INDIVIDUALLY CONTROLLED GA...

ETCH RATE DETECTION FOR ANTI-REFLECTIVE COATING LAYER AND ABSORBER...

APPARATUS AND METHODS FOR ETCHING QUARTZ SUBSTRATE IN PHOTOMASK MAN...

ETCH RATE DETECTION FOR ANTI-REFLECTIVE COATING LAYER AND ABSORBER...

ETCH RATE DETECTION FOR REFLECTIVE MULTI-MATERIAL LAYERS ETCHING

ETCH RATE DETECTION FOR PHOTOMASK ETCHING

METHOD FOR ETCHING AN EUV REFLECTIVE MULTI-MATERIAL LAYERS UTILIZED...

METHODS FOR IN-SITU CHAMBER DRY CLEAN IN PHOTOMASK PLASMA ETCHING P...

METHODS FOR REDUCING PHOTORESIST INTERFERENCE WHEN MONITORING A TAR...

CHAMBER LID HEATER RING ASSEMBLY

INDUCTIVELY COUPLED PLASMA REACTOR HAVING RF PHASE CONTROL AND METH...

INDUCTIVELY COUPLED PLASMA REACTOR HAVING RF PHASE CONTROL AND METH...

METHODS AND APPARATUS FOR IN-SITU CHAMBER DRY CLEAN DURING PHOTOMAS...

ENDPOINT DETECTION FOR PHOTOMASK ETCHING

Monitoring etching of a substrate in an etch chamber

ENDPOINT DETECTION FOR PHOTOMASK ETCHING

MASK ETCH PROCESS

ENDPOINT DETECTION FOR PHOTOMASK ETCHING

Plasma mask etch method of controlling a reactor tunable element in...

Mask etch plasma reactor with variable process gas distribution

Mask etch plasma reactor with backside optical sensors and multiple...

ENDPOINT DETECTION FOR PHOTOMASK ETCHING

Mask etch plasma reactor having an array of optical sensors viewing...

Process for etching a transparent workpiece including backside endp...