Michael J. Lercel

Person

Williston, VT, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method to predict yield of a device manufacturing process
- Patent number 11,714,357
- Issue date Aug 1, 2023
- ASML Netherlands B.V.
- Alexander Ypma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to predict yield of a device manufacturing process
- Patent number 11,086,229
- Issue date Aug 10, 2021
- ASML Netherlands B.V.
- Alexander Ypma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Graded spin-on organic antireflective coating for photolithography
- Patent number 7,816,069
- Issue date Oct 19, 2010
- International Business Machines Corporation
- Colin J. Brodsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Graded spin-on organic antireflective coating for photolithography
- Patent number 7,588,879
- Issue date Sep 15, 2009
- International Business Machines Corporation
- Colin J. Brodsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Evaporation control using coating
- Patent number 7,351,348
- Issue date Apr 1, 2008
- International Business Machines Corporation
- Daniel A. Corliss
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Monolithic hard pellicle
- Patent number 7,110,195
- Issue date Sep 19, 2006
- International Business Machines Corporation
- Emily F. Gallagher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern compensation techniques for charged particle lithographic m...
- Patent number 7,067,220
- Issue date Jun 27, 2006
- International Business Machines Corporation
- Michael James Lercel
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Integrated cooling substrate for extreme ultraviolet reticle
- Patent number 6,806,006
- Issue date Oct 19, 2004
- International Business Machines Corporation
- Michael J. Lercel
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method of defining and forming membrane regions in a substrate for...
- Patent number 6,635,389
- Issue date Oct 21, 2003
- International Business Machines Corporation
- Michael J. Lercel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Information storage on masks for microlithographic tools
- Patent number 6,610,446
- Issue date Aug 26, 2003
- International Business Machines Corporation
- Michael James Lercel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Etch stop barrier for stencil mask fabrication
- Patent number 6,555,297
- Issue date Apr 29, 2003
- International Business Machines Corporation
- Michael J. Lercel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate for diamond stencil mask and method for forming
- Patent number 6,528,215
- Issue date Mar 4, 2003
- International Business Machines Corporation
- Michael J. Lercel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Borderless contact to diffusion with respect to gate conductor and...
- Patent number 6,498,096
- Issue date Dec 24, 2002
- International Business Machines Corporation
- James Allan Bruce
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for selectively programming a semiconductor de...
- Patent number 6,461,797
- Issue date Oct 8, 2002
- International Business Machines Corporation
- Michael J. Lercel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Projection electron-beam lithography masks using advanced materials...
- Patent number 6,261,726
- Issue date Jul 17, 2001
- International Business Machines Corporation
- Cameron J. Brooks
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Borderless contact to diffusion with respect to gate conductor and...
- Patent number 6,215,190
- Issue date Apr 10, 2001
- International Business Machines Corporation
- James Allen Bruce
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD TO PREDICT YIELD OF A DEVICE MANUFACTURING PROCESS
- Publication number 20210325788
- Publication date Oct 21, 2021
- ASML NETHERLANDS B.V.
- Alexander YPMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD TO PREDICT YIELD OF A DEVICE MANUFACTURING PROCESS
- Publication number 20200103761
- Publication date Apr 2, 2020
- ASML NETHERLANDS B.V.
- Alexander YPMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Graded Spin-on Organic Antireflective Coating for Photolithography
- Publication number 20080213707
- Publication date Sep 4, 2008
- International Business Machines Corporation
- Colin J. Brodsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EVAPORATION CONTROL USING COATING
- Publication number 20080009142
- Publication date Jan 10, 2008
- International Business Machines Corporation
- Daniel A. Corliss
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Graded spin-on organic antireflective coating for photolithography
- Publication number 20080008955
- Publication date Jan 10, 2008
- International Business Machines Corporation
- Colin J. Brodsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EVAPORATION CONTROL USING COATING
- Publication number 20070034605
- Publication date Feb 15, 2007
- International Business Machines Corporation
- Daniel A. Corliss
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CONTACT HOLE PRINTING METHOD AND APPARATUS WITH SINGLE MASK, MULTIP...
- Publication number 20050287483
- Publication date Dec 29, 2005
- International Business Machines Corporation
- Michael Lercel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MONOLITHIC HARD PELLICLE
- Publication number 20050243452
- Publication date Nov 3, 2005
- International Business Machines Corporation
- Emily F. Gallagher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern compensation techniques for charged particle lithographic m...
- Publication number 20040110069
- Publication date Jun 10, 2004
- International Business Machines Corporation
- Michael James Lercel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Integrated cooling substrate for extreme ultraviolet reticle
- Publication number 20040009410
- Publication date Jan 15, 2004
- International Business Machines Corporation
- Michael J. Lercel
- B82 - NANO-TECHNOLOGY
Information Patent Application
Information storage on masks for microlithographic tools
- Publication number 20020102470
- Publication date Aug 1, 2002
- International Business Machines Corporation
- Michael James Lercel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Borderless contact to diffusion with respect to gate conductor and...
- Publication number 20010019886
- Publication date Sep 6, 2001
- International Business Machines Corporation
- James Allan Bruce
- H01 - BASIC ELECTRIC ELEMENTS

Michael J. Lercel

Person

Patents Grantslast 30 patents

Method to predict yield of a device manufacturing process

Method to predict yield of a device manufacturing process

Graded spin-on organic antireflective coating for photolithography

Graded spin-on organic antireflective coating for photolithography

Evaporation control using coating

Monolithic hard pellicle

Pattern compensation techniques for charged particle lithographic m...

Integrated cooling substrate for extreme ultraviolet reticle

Method of defining and forming membrane regions in a substrate for...

Information storage on masks for microlithographic tools

Etch stop barrier for stencil mask fabrication

Substrate for diamond stencil mask and method for forming

Borderless contact to diffusion with respect to gate conductor and...

Method and apparatus for selectively programming a semiconductor de...

Projection electron-beam lithography masks using advanced materials...

Borderless contact to diffusion with respect to gate conductor and...

Patents Applicationslast 30 patents

METHOD TO PREDICT YIELD OF A DEVICE MANUFACTURING PROCESS

METHOD TO PREDICT YIELD OF A DEVICE MANUFACTURING PROCESS

Graded Spin-on Organic Antireflective Coating for Photolithography

EVAPORATION CONTROL USING COATING

Graded spin-on organic antireflective coating for photolithography

EVAPORATION CONTROL USING COATING

CONTACT HOLE PRINTING METHOD AND APPARATUS WITH SINGLE MASK, MULTIP...

MONOLITHIC HARD PELLICLE

Pattern compensation techniques for charged particle lithographic m...

Integrated cooling substrate for extreme ultraviolet reticle

Information storage on masks for microlithographic tools

Borderless contact to diffusion with respect to gate conductor and...